公开(公告)号：US20250004375A1

公开(公告)日：2025-01-02

申请号：US18829747

申请日：2024-09-10

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Masayuki MIYAKE ,  Michihiro MITA ,  Yudai ABE ,  Kazuya KIRIYAMA

IPC: G03F7/039 ,  G03F7/22

Abstract: A radiation-sensitive composition contains a polymer having an acid-releasable group, and a compound represented by formula (1). In the formula (1), A1 represents a (m+n+2)-valent aromatic ring group. Both —OH and —COO− are bound to a common benzene ring in A1. Atom to which —OH is bound is located next to an atom to which —COO31 is bound. R1 represents a monovalent group comprising a cyclic (thio)acetal structure. m is an integer of ≥0. n is an integer of ≥0. M+ represents a monovalent organic cation.

公开(公告)号：US12174538B2

公开(公告)日：2024-12-24

申请号：US17435408

申请日：2020-03-19

Applicant: JSR CORPORATION

Inventor： Naoki Nishiguchi ,  Tomoyuki Matsumoto ,  Ayako Endo

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40

Abstract: A photosensitive resin composition contains polymer (A) having an acid dissociative group, photoacid generator (B), and solvent (C), the solvent (C) containing 80 to 95% by mass of propylene glycol monomethyl ether acetate (C1) and 5 to 18% by mass of 3-methoxybutyl acetate (C2), a content ratio of other solvent (C3) in the solvent (C) being 0 to 10% by mass, and a content ratio of the solvent (C) contained in the photosensitive resin composition being less than 60% by mass.

公开(公告)号：US20240393644A1

公开(公告)日：2024-11-28

申请号：US18685497

申请日：2022-08-22

Applicant: JSR CORPORATION

Inventor： Yoshihiko Kuroda ,  Koichi Miyachi

IPC: G02F1/1337 ,  G02F1/1335 ,  G02F1/137

Abstract: A first and/or second alignment film is a photo-alignment film on which alignment division is performed. Each pixel has multiple alignment regions having different alignment directions of liquid crystal molecules of a liquid crystal layer by the alignment division. The number of times of exposure in each alignment region for the alignment division is two or more and the same number among the regions; in each time of exposure for the alignment division, exposure is performed on two or more alignment regions along an arrangement direction, the previous numbers of times of exposure in alignment regions to be exposed in each times of exposure are the same among the regions; and the angle formed by the alignment direction of the liquid crystal molecules of the liquid crystal layer in each region of the alignment regions and a direction where the polarizing axis of a polarizing plate extends is 45°.

公开(公告)号：US20240389227A1

公开(公告)日：2024-11-21

申请号：US18284345

申请日：2022-03-22

Applicant: JSR CORPORATION

Inventor： Ryouji TATARA ,  Hirokazu ITOU ,  Taku OGAWA ,  Shin-Ya NAKAFUJI ,  Shoma ANABUKI

IPC: H05K1/03 ,  G03F7/004 ,  G03F7/038 ,  G03F7/32

Abstract: A radiation-sensitive composition for forming an insulation film, includes: at least one polyfunctional compound (A) selected from the group consisting of a polyfunctional maleimide compound (A-1) and a polyfunctional styryl compound (A-2); a polymer (B) having a group Y that reacts with a maleimide group in the polyfunctional maleimide compound (A-1) or a styryl group in the polyfunctional styryl compound (A-2); and a photopolymerization initiator (C). The group Y is represented by Formula (Y1). In Formula (Y1), RY1 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, LY1 represents a single bond, an alkanediyl group having 1 to 5 carbon atoms, —C(O)O—, —NH—C(O)—NH—, or a group obtained by a combination thereof, and * represents a position bonded to a main chain or a side chain of the polymer (B).

公开(公告)号：US20240325458A1

公开(公告)日：2024-10-03

申请号：US17793280

申请日：2021-01-18

Applicant: KEIO UNIVERSITY ,  JSR CORPORATION

Inventor： Nobuyoshi HIROSE ,  Kenya HONDA ,  Yuko SATO ,  Koji ATARASHI ,  Seiko NARUSHIMA ,  Yasumichi ARAI ,  Kozue TAKESHITA ,  Satoshi SASAJIMA

IPC: A61K35/74 ,  A61P31/04 ,  C12N1/20 ,  C12N9/04 ,  C12P33/06 ,  G01N33/569

CPC classification number: A61K35/74 ,  A61P31/04 ,  C12N1/20 ,  C12N9/0006 ,  C12P33/06 ,  G01N33/56911 ,  C12Y101/01145 ,  C12Y103/99005 ,  C12Y103/99006

Abstract: The present inventors have found that the content ratios of isoalloLCA, 3-oxoLCA, alloLCA, and 3-oxoalloLCA in the feces of centenarians are higher than those of younger ones, and have also identified gut microbiomes peculiar to centenarians involved in the production of these bile acids. Furthermore, it has been found that these bile acids, enzymes involved in the production thereof, and bacteria producing the enzymes reduce the risk of infection with pathogens, prostate cancer, and the like, and are involved in longevity.

公开(公告)号：US20240319599A1

公开(公告)日：2024-09-26

申请号：US18125934

申请日：2023-03-24

Applicant: Inpria Corporation ,  JSR Corporation

Inventor： Kazunori Sakai ,  Tatsuya Kasai ,  Akitaka Nii ,  Peter de Schepper

IPC: G03F7/11 ,  C09D7/63 ,  C09D183/16

CPC classification number: G03F7/11 ,  C09D7/63 ,  C09D183/16

Abstract: Gas releasing compositions that can facilitate improved patterning of organometallic resists are described. The gas releasing compositions can release water, carbon dioxide, or alcohols in response to radiation or heating. A film-forming composition is composed of a flowable blend of a reactive gas releasing moiety, a matrix forming species, an organic solvent, and an optional activating agent. An underlayer composition is composed of a blend of a reactive gas releasing moiety, a polymer matrix and an optional activating additive. Multilayer structures are described based on organometallic radiation sensitive patterning compositions, such as alkyl tin oxo-hydroxo compositions, which are placed over a gas releasing underlayer formed on a substrate, such as a semiconductor wafer. Methods for patterning multilayer structures are also described.

公开(公告)号：US20240319597A1

公开(公告)日：2024-09-26

申请号：US18678331

申请日：2024-05-30

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Michihiro MITA ,  Masayuki MIYAKE

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038 ,  G03F7/32

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/322 ,  G03F7/325

Abstract: A radiation-sensitive resin composition includes: a compound A represented by formula (I); a resin B including a structural unit having an acid-dissociable group; a radiation-sensitive acid generator other than the compound A; and a solvent. R1 is an (m+m′)-valent organic group and comprises a cyclopropane ring skeleton, a cyclobutane ring skeleton, or both; X1 is a group represented by formula (1-1) or a group represented by formula (1-2); X2 is a group represented by formula (2-1) or a group represented by formula (2-2); Y+ is a monovalent onium cation; m is an integer of 1 to 2, and m′ is an integer of 0 to 1. * represents a bond to another group.

公开(公告)号：US20240279605A1

公开(公告)日：2024-08-22

申请号：US18648566

申请日：2024-04-29

Applicant: JSR CORPORATION ,  KEIO UNIVERSITY

Inventor： Hayato HIRAMINE ,  Ryosuke NAGASHIMA ,  Sumihiro MAEDA ,  Hideyuki OKANO ,  Mitsuru ISHIKAWA

IPC: C12N5/0793

CPC classification number: C12N5/0619 ,  C12N2500/36 ,  C12N2501/13 ,  C12N2513/00

Abstract: A culture method includes culturing a spheroid of a human neural cell-like cell in the presence of a tau protein aggregate and culturing a culture product in a culture medium containing 5 μg/mL or greater of a lipid, in which the lipid is one or more selected from the group consisting of a glycerolipid, a glycerophospholipid, and a sphingolipid. The culture method includes culturing a spheroid of a human neural cell-like cell in the presence of a tau protein aggregate and culturing a culture product in a culture medium containing a neurotrophic factor.

公开(公告)号：US20240231231A1

公开(公告)日：2024-07-11

申请号：US18440124

申请日：2024-02-13

Applicant: JSR CORPORATION

Inventor： Daiki TATSUBO ,  Tomoharu KAWAZU ,  Hiroyuki MIYAUCHI ,  Yuya HAYASHI ,  Takashi KATAGIRI ,  Ryotaro TANAKA

IPC: G03F7/11 ,  C09D161/06 ,  C09D161/12 ,  H01L21/308 ,  H01L21/311

CPC classification number: G03F7/11 ,  C09D161/06 ,  C09D161/12 ,  H01L21/3081 ,  H01L21/31116

Abstract: A method for forming a resist underlayer film includes applying a composition for forming a resist underlayer film directly or indirectly to a substrate to form a coating film. The coating film is heated at a heating temperature of higher than 450° C. and 600° C. or lower in an atmosphere having an oxygen concentration of less than 0.01% by volume. The composition for forming a resist underlayer film includes: a compound including an aromatic ring; a polymer which thermally decomposes at the heating temperature in heating the coating film, and which is other than the compound; and a solvent. The compound has a molecular weight of 400 or more. A content of the polymer is less than a content of the compound in the composition for forming a resist underlayer film.

公开(公告)号：US20240184203A1

公开(公告)日：2024-06-06

申请号：US18422098

申请日：2024-01-25

Applicant: JSR CORPORATION

Inventor： Yuki OZAKI ,  Ryuichi SERIZAWA ,  Kengo HIRASAWA ,  Hiroki HIRABAYASHI

IPC: G03F7/039 ,  G03F7/00 ,  G03F7/004 ,  G03F7/038

CPC classification number: G03F7/0392 ,  G03F7/0035 ,  G03F7/0047 ,  G03F7/0048 ,  G03F7/0382

Abstract: A composition includes a metal compound, a polymer including a first structural unit represented by formula (1) and a second structural unit represented by formula (2), and a solvent. R1 is a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group having 1 to 20 carbon atoms; and R2 is a substituted or unsubstituted monovalent hydrocarbon group having 1 to 20 carbon atoms. R3 is a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group having 1 to 20 carbon atoms; L is a single bond or a divalent linking group; Ar is a group obtained by removing (n+1) hydrogen atoms from a substituted or unsubstituted aromatic ring having 6 to 20 ring members; R4 is a monovalent hydroxyalkyl group having 1 to 10 carbon atoms or a hydroxy group; and n is an integer of 0 to 8.