公开(公告)号：US20220177424A1

公开(公告)日：2022-06-09

申请号：US17679262

申请日：2022-02-24

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Katsuaki Nishikori ,  Ryosuke Nakamura ,  Takuhiro Taniguchi

IPC: C07C381/12 ,  G03F7/20 ,  G03F7/38 ,  G03F7/16 ,  G03F7/038 ,  G03F7/32

Abstract: A radiation-sensitive resin composition contains: an onium salt compound represented by formula (1); a resin containing a structural unit having an acid-dissociable group; and a solvent. R1 is a substituted or unsubstituted monovalent organic group having a cyclic structure, or a chain hydrocarbon group having 2 or more carbon atoms. X is an oxygen atom, a sulfur atom, or —NRα—. Rα is a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms. Z+ is a monovalent onium cation.

公开(公告)号：US20240393688A1

公开(公告)日：2024-11-28

申请号：US18796665

申请日：2024-08-07

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Taiichi FURUKAWA ,  Tsuyoshi FURUKAWA ,  Hajime INAMI

IPC: G03F7/039 ,  G03F7/004

Abstract: A radiation-sensitive resin composition includes: a polymer comprising a structural unit (I) represented by formula (1) and a structural unit different from the structural unit (I); an onium salt represented by formula (i); and a solvent. In formula (1), RK1 is a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group, L1 is an alkanediyl group having 1 to 5 carbon atoms, and Rf1 is a fluorinated hydrocarbon group having 2 to 10 carbon atoms and 5 to 7 fluorine atoms. In formula (i), Ra1 is a substituted or unsubstituted monovalent organic group having 1 to 40 carbon atoms with no fluorine atom or fluorinated hydrocarbon group attached to an atom adjacent to the sulfur atom, and X+ is a monovalent onium cation.

公开(公告)号：US20240393687A1

公开(公告)日：2024-11-28

申请号：US18795534

申请日：2024-08-06

Applicant: JSR CORPORATION

Inventor： Fuyuki EGAWA ,  Taiichi FURUKAWA ,  Tsuyoshi FURUKAWA ,  Hajime INAMI ,  Ryuichi NEMOTO

IPC: G03F7/039 ,  C08F220/28 ,  C08F220/36 ,  G03F7/004 ,  G03F7/038

Abstract: A radiation-sensitive resin composition includes: a polymer comprising a structural unit (I) represented by a formula (1) and a structural unit different from the structural unit (I); a radiation-sensitive acid generator represented by a formula (α); and a solvent. RK1 is a hydrogen atom, a fluorine atom, or the like, L1 is an alkanediyl group, and Rf1 is a fluorinated hydrocarbon group. RW is a monovalent organic group having 3 to 40 carbon atoms that contains a cyclic structure, Rfa and Rfb are each independently a fluorine atom or the like, R11 and R12 are each independently a hydrogen atom, a fluorine atom, or the like, n1 is an integer of 1 to 4, n2 is an integer of 0 to 4, no carbonyl group is present between a sulfur atom of the sulfonic acid ion and the cyclic structure of RW, and Z+ is a monovalent onium cation.

公开(公告)号：US20230393469A1

公开(公告)日：2023-12-07

申请号：US18235420

申请日：2023-08-18

Applicant: JSR CORPORATION

Inventor： Nozomi SAKANO ,  Ryuichi NEMOTO

IPC: G03F7/038 ,  C08F212/14 ,  C08F220/18 ,  C07D317/72 ,  C07D493/10 ,  C07D317/24 ,  C08F220/30 ,  C08F220/28 ,  G03F7/039

CPC classification number: G03F7/038 ,  C08F212/22 ,  C08F220/1807 ,  C07D317/72 ,  G03F7/039 ,  C07D317/24 ,  C08F220/303 ,  C08F220/283 ,  C07D493/10

Abstract: A radiation-sensitive resin composition includes a resin including a structural unit represented by formula (1), a radiation-sensitive acid generator, and a solvent. R1 is a hydrogen atom, a fluorine atom, or the like. R2 and R3 each independently represent a monovalent hydrocarbon group having 1 to 10 carbon atoms, or the like. R4 is a hydrogen atom, a monovalent hydrocarbon group having 1 to 10 carbon atoms, or the like. R5 and R6 each independently represent a hydrogen atom, a monovalent hydrocarbon group having 1 to 10 carbon atoms, or the like. R7 and R8 each independently represent a hydrogen atom, a monovalent hydrocarbon group having 1 to 10 carbon atoms, or the like. R9 and R10 each independently represent a monovalent organic group having 1 to 10 carbon atoms, or the like.

公开(公告)号：US20250004375A1

公开(公告)日：2025-01-02

申请号：US18829747

申请日：2024-09-10

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Masayuki MIYAKE ,  Michihiro MITA ,  Yudai ABE ,  Kazuya KIRIYAMA

IPC: G03F7/039 ,  G03F7/22

Abstract: A radiation-sensitive composition contains a polymer having an acid-releasable group, and a compound represented by formula (1). In the formula (1), A1 represents a (m+n+2)-valent aromatic ring group. Both —OH and —COO− are bound to a common benzene ring in A1. Atom to which —OH is bound is located next to an atom to which —COO31 is bound. R1 represents a monovalent group comprising a cyclic (thio)acetal structure. m is an integer of ≥0. n is an integer of ≥0. M+ represents a monovalent organic cation.

公开(公告)号：US20240319597A1

公开(公告)日：2024-09-26

申请号：US18678331

申请日：2024-05-30

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Michihiro MITA ,  Masayuki MIYAKE

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038 ,  G03F7/32

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/322 ,  G03F7/325

Abstract: A radiation-sensitive resin composition includes: a compound A represented by formula (I); a resin B including a structural unit having an acid-dissociable group; a radiation-sensitive acid generator other than the compound A; and a solvent. R1 is an (m+m′)-valent organic group and comprises a cyclopropane ring skeleton, a cyclobutane ring skeleton, or both; X1 is a group represented by formula (1-1) or a group represented by formula (1-2); X2 is a group represented by formula (2-1) or a group represented by formula (2-2); Y+ is a monovalent onium cation; m is an integer of 1 to 2, and m′ is an integer of 0 to 1. * represents a bond to another group.

公开(公告)号：US20220229367A1

公开(公告)日：2022-07-21

申请号：US17713278

申请日：2022-04-05

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Satoshi OKAZAKI ,  Taiichi FURUKAWA

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/20 ,  G03F7/32

Abstract: A radiation-sensitive resin composition includes: a first polymer including a structural unit which includes an acid-labile group; a second polymer including a structural unit represented by formula (1); and a radiation-sensitive acid generator. R1 represents a monovalent organic group having 1 to 20 carbon atoms; R2 represents a monovalent organic group having 1 to 20 carbon atoms; X represents a divalent organic group having 1 to 20 carbon atoms; and Y represents a divalent hydrocarbon group having 1 to 20 carbon atoms. The divalent organic group represented by X, the monovalent organic group represented by R2, or both has a fluorine atom.

公开(公告)号：US20250013150A1

公开(公告)日：2025-01-09

申请号：US18882982

申请日：2024-09-12

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Kota FURUICHI ,  Ryosuke NAKAMURA ,  Tsuyoshi FURUKAWA

IPC: G03F7/004 ,  C07C69/75 ,  C07C309/12 ,  C07C309/17 ,  C07C309/27 ,  C07D207/416 ,  C07D307/00 ,  C07D307/94 ,  C07D311/00 ,  C07D313/06 ,  C07D321/06 ,  C07D327/04 ,  C07D327/06 ,  G03F7/039 ,  G03F7/32

Abstract: A radiation-sensitive composition contains a polymer having an acid-releasable group, and a compound (Q) represented by formula (1). In the formula (1), L1 represents an ester group, —CO—NR3—, a (thio)ether group, or a sulfonyl group. R4 represents a hydrogen atom, a substituted or unsubstituted C1 to C20 monovalent hydrocarbon group, a halogen atom, a hydroxy group, or a nitro group. R5 represents a C1 to C20 monovalent hydrocarbon group, a C1 to C20 monovalent halogenated hydrocarbon group, or a halogen atom, and optionally two R5s taken together represent an alicyclic structure together with the carbon atom(s) between the two R5s. L2 represents a single bond or a divalent linking group.

公开(公告)号：US20230340266A1

公开(公告)日：2023-10-26

申请号：US18198954

申请日：2023-05-18

Applicant: JSR CORPORATION

Inventor： Tomoaki SEKO ,  Yusuke ANNO ,  Akitaka NII ,  Ryuichi NEMOTO ,  Souta NISHIMURA

IPC: G03F7/32 ,  C08L83/04 ,  G03F7/11 ,  G03F7/20

CPC classification number: C08L83/04 ,  G03F7/11 ,  G03F7/322 ,  G03F7/70025 ,  G03F7/70033 ,  C08L2203/20

Abstract: A silicon-containing composition includes: a polysiloxane including a first structural unit represented by formula (1); and a solvent. X is an alkali-dissociable group; a is an integer of 1 to 3; and when a is 2 or more, a plurality of Xs are the same or different from each other. R1 is a monovalent organic group having 1 to 20 carbon atoms, a hydroxy group, or a halogen atom; b is an integer of 0 to 2; and when b is 2, two R1s are the same or different from each other. a + b is 3 or less.

公开(公告)号：US20220342307A1

公开(公告)日：2022-10-27

申请号：US17854012

申请日：2022-06-30

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Kota FURUICH ,  Hajime INAMI

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/20

Abstract: A radiation-sensitive resin composition includes: a resin including a structural unit (A) represented by formula (1) and a structural unit (B) having an acid-dissociable group; a radiation-sensitive acid generator; and a solvent. R1 is a halogen atom-substituted or unsubstituted monovalent hydrocarbon group having 1 to 20 carbon atoms; X is —O— or —S—; La1 is a halogen atom-substituted or unsubstituted divalent hydrocarbon group having 1 to 10 carbon atoms, and RP is a monovalent organic group having at least one structure selected from the group consisting of a lactone structure, a cyclic carbonate structure, and a sultone structure.