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公开(公告)号：US20210263413A9
公开(公告)日：2021-08-26
申请号：US16815075
申请日：2020-03-11
申请人： JSR CORPORATION
IPC分类号： G03F7/039 , G03F7/004 , C07C309/06 , C08L33/06 , C08L25/06
摘要： A radiation-sensitive resin composition contains: a polymer that includes a structural unit including an acid-labile group; and a radiation-sensitive acid generating agent. The radiation-sensitive acid generating agent includes a sulfonate anion and a radiation-sensitive cation. The sulfonate anion includes two or more rings, and an iodine atom and a monovalent group having 0 to 10 carbon atoms which includes at least one of an oxygen atom and a nitrogen atom bond to at least one of the two or more rings. The ring is preferably an aromatic ring. The radiation-sensitive acid generating agent is preferably a compound represented by formula (1). In the formula (1), A1 represents a group obtained from a compound which includes a ring having 3 to 20 ring atoms by removing (p+q+r+1) hydrogen atoms on the ring.
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公开(公告)号：US11592746B2
公开(公告)日：2023-02-28
申请号：US16815075
申请日：2020-03-11
申请人： JSR CORPORATION
IPC分类号： C07C309/06 , G03F7/039 , G03F7/004 , C08L25/06 , C08L33/06 , C07C309/12
摘要： A radiation-sensitive resin composition contains: a polymer that includes a structural unit including an acid-labile group; and a radiation-sensitive acid generating agent. The radiation-sensitive acid generating agent includes a sulfonate anion and a radiation-sensitive cation. The sulfonate anion includes two or more rings, and an iodine atom and a monovalent group having 0 to 10 carbon atoms which includes at least one of an oxygen atom and a nitrogen atom bond to at least one of the two or more rings. The ring is preferably an aromatic ring. The radiation-sensitive acid generating agent is preferably a compound represented by formula (1). In the formula (1), A1 represents a group obtained from a compound which includes a ring having 3 to 20 ring atoms by removing (p+q+r+1) hydrogen atoms on the ring.
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公开(公告)号：US11966161B2
公开(公告)日：2024-04-23
申请号：US17854048
申请日：2022-06-30
申请人： JSR CORPORATION
IPC分类号： G03F7/004 , C07C303/32 , C07C381/12 , C08G75/20 , G03F7/039
CPC分类号： G03F7/0045 , C07C303/32 , C07C381/12 , C08G75/20 , G03F7/0392 , G03F7/0397
摘要： A radiation-sensitive resin composition includes: a polymer including a structural unit including an acid-labile group; and a compound represented by formula (1). R1, R2, and R3 each independently represent a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms; X1, X2, and X3 each independently represent a group represented by formula (2); a sum of d, e, and f is no less than 1; R4 represents a hydrocarbon group having 1 to 20 carbon atoms and R5 represents a hydrocarbon group having 1 to 20 carbon atoms, or R4 and R5 taken together represent a heterocyclic structure having 4 to 20 ring atoms, together with the sulfur atom to which R4 and R5 bond; n is 0 or 1; A− represents a monovalent sulfonic acid anion; and Y represents —COO—, —OCO—, or —N(R7)CO—.
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公开(公告)号：US11609495B2
公开(公告)日：2023-03-21
申请号：US17081000
申请日：2020-10-27
申请人： JSR CORPORATION
IPC分类号： G03F7/004 , G03F7/039 , C08F220/18 , C07D317/70 , C07C381/12 , C07C309/17 , C07D327/04 , C07C309/12 , C07C65/10 , C07C59/115 , C07C69/63 , C07C65/05
摘要： A radiation-sensitive resin composition includes a polymer including a phenolic hydroxyl group, a compound represented by formula (1-1) or formula (1-2), and a compound represented by formula (2). In the formula (1-1), a sum of a, b, and c is no less than 1; at least one of R1, R2, and R3 represents a fluorine atom or the like; and R4 and R5 each independently represent a hydrogen atom, a fluorine atom, or the like. In the formula (1-2), in a case in which d is 1, R6 represents a fluorine atom or the like, and in a case in which d is no less than 2, at least one of the plurality of R6s represents a fluorine atom or the like; and R8 represents a single bond or a divalent organic group having 1 to 20 carbon atoms.
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公开(公告)号：US20220413385A1
公开(公告)日：2022-12-29
申请号：US17829432
申请日：2022-06-01
申请人： JSR CORPORATION
摘要： The radiation-sensitive resin composition contains: a polymer, solubility of which in a developer solution is capable of being altered by an action of an acid, and which has a structural unit represented by the following formula (1); and a radiation-sensitive acid generating agent. L represents a single bond, —COO—, —O—, or —CONH—. X represents a single bond, —O—, -G-O—, —CH2—, —S—, —SO2—, —NRA—, or —CONH—, wherein G represents a divalent aliphatic hydrocarbon group having 1 to 20 carbon atoms, and RA represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms. R2 and R3 each independently represent a halogen atom, a hydroxy group, a sulfanyl group, or an organic group having 1 to 20 carbon atoms.
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公开(公告)号：US20220283498A1
公开(公告)日：2022-09-08
申请号：US17669577
申请日：2022-02-11
申请人： JSR CORPORATION
IPC分类号： G03F7/039 , G03F7/038 , C08F220/18
摘要： A radiation-sensitive resin composition includes: a resin having a polystyrene-equivalent weight-average molecular weight of 8,000 or less; a radiation-sensitive acid generator; and a solvent. The resin includes: a structural unit A represented by formula (1); a structural unit B having a phenolic hydroxyl group; and a structural unit C having an acid-dissociable group. The structural unit B is other than the structural unit A; and the structural unit C is other than the structural unit A or B. In the formula (1), RX is a hydrogen atom or a methyl group; and Ar is a monovalent aromatic hydrocarbon group having a substituent represented by —ORY. The substituent is bonded to a carbon atom next to a carbon atom bonded to a main chain of the resin. RY is a hydrogen atom or a protective group to be deprotected by action of an acid.
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公开(公告)号：US12092957B2
公开(公告)日：2024-09-17
申请号：US17508191
申请日：2021-10-22
申请人： JSR CORPORATION
IPC分类号： G03F7/039 , C07C31/13 , C07C69/608 , G03F7/20 , G03F7/32
CPC分类号： G03F7/0392 , C07C31/13 , C07C69/608 , G03F7/2006 , G03F7/327
摘要： A radiation-sensitive resin composition includes a resin having a partial structure represented by formula (1). R1 and R2 each independently represent a substituted or unsubstituted chain aliphatic hydrocarbon group having 1 to 6 carbon atoms or a substituted or unsubstituted alicyclic hydrocarbon group having 3 to 6 carbon atoms, or R1 and R2 are bonded to each other to form a part of a 3- to 6-membered cyclic structure together with the carbon atom to which R1 and R2 are bonded; R3 represents a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms and containing a fluorine atom. No fluorine atom is bonded to carbon atoms located at α-, β- and γ-positions of the carbon atom to which R1 and R2 are bonded; and No fluorine atom is bonded to carbon atoms located at α- and β-positions of the carbon atom to which R3 is bonded.
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公开(公告)号：US20220177424A1
公开(公告)日：2022-06-09
申请号：US17679262
申请日：2022-02-24
申请人： JSR CORPORATION
摘要： A radiation-sensitive resin composition contains: an onium salt compound represented by formula (1); a resin containing a structural unit having an acid-dissociable group; and a solvent. R1 is a substituted or unsubstituted monovalent organic group having a cyclic structure, or a chain hydrocarbon group having 2 or more carbon atoms. X is an oxygen atom, a sulfur atom, or —NRα—. Rα is a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms. Z+ is a monovalent onium cation.
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9.发明申请公开(公告)号：US20200341376A1
公开(公告)日：2020-10-29
申请号：US16815075
申请日：2020-03-11
申请人： JSR CORPORATION
IPC分类号： G03F7/039 , G03F7/004 , C07C309/06 , C08L33/06 , C08L25/06
摘要： A radiation-sensitive resin composition contains: a polymer that includes a structural unit including an acid-labile group; and a radiation-sensitive acid generating agent. The radiation-sensitive acid generating agent includes a sulfonate anion and a radiation-sensitive cation. The sulfonate anion includes two or more rings, and an iodine atom and a monovalent group having 0 to 10 carbon atoms which includes at least one of an oxygen atom and a nitrogen atom bond to at least one of the two or more rings. The ring is preferably an aromatic ring. The radiation-sensitive acid generating agent is preferably a compound represented by formula (1). In the formula (1), A1 represents a group obtained from a compound which includes a ring having 3 to 20 ring atoms by removing (p+q+r+1) hydrogen atoms on the ring.
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