公开(公告)号：US20180046081A1

公开(公告)日：2018-02-15

申请号：US15672660

申请日：2017-08-09

Applicant: JSR CORPORATION

Inventor： Masayuki MIYAKE ,  Goji WAKAMATSU ,  Tsubasa ABE ,  Kazunori TAKANASHI ,  Kazunori SAKAI

IPC: G03F7/09 ,  G03F7/004 ,  C08G8/20 ,  H01L21/027 ,  H01L21/033 ,  G03F7/11 ,  H01L21/02 ,  H01L21/768

Abstract: A resist underlayer film-forming composition includes a solvent, and a compound comprising an aromatic ring. The solvent includes a first solvent having a normal boiling point of less than 156° C., and a second solvent having a normal boiling point of no less than 156° C. and less than 300° C. The resist underlayer film-forming composition is for use in forming a resist underlayer film to be overlaid on a patterned substrate. A production method of a patterned substrate includes applying the resist underlayer film-forming composition on a patterned substrate to obtain a coating film on the patterned substrate. The coating film is heated to obtain a resist underlayer film. A resist pattern is formed on an upper face side of the resist underlayer film. The resist underlayer film and the substrate are etched using the resist pattern as a mask.

公开(公告)号：US20250004375A1

公开(公告)日：2025-01-02

申请号：US18829747

申请日：2024-09-10

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Masayuki MIYAKE ,  Michihiro MITA ,  Yudai ABE ,  Kazuya KIRIYAMA

IPC: G03F7/039 ,  G03F7/22

Abstract: A radiation-sensitive composition contains a polymer having an acid-releasable group, and a compound represented by formula (1). In the formula (1), A1 represents a (m+n+2)-valent aromatic ring group. Both —OH and —COO− are bound to a common benzene ring in A1. Atom to which —OH is bound is located next to an atom to which —COO31 is bound. R1 represents a monovalent group comprising a cyclic (thio)acetal structure. m is an integer of ≥0. n is an integer of ≥0. M+ represents a monovalent organic cation.

公开(公告)号：US20240319597A1

公开(公告)日：2024-09-26

申请号：US18678331

申请日：2024-05-30

Applicant: JSR CORPORATION

Inventor： Ryuichi NEMOTO ,  Michihiro MITA ,  Masayuki MIYAKE

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038 ,  G03F7/32

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/322 ,  G03F7/325

Abstract: A radiation-sensitive resin composition includes: a compound A represented by formula (I); a resin B including a structural unit having an acid-dissociable group; a radiation-sensitive acid generator other than the compound A; and a solvent. R1 is an (m+m′)-valent organic group and comprises a cyclopropane ring skeleton, a cyclobutane ring skeleton, or both; X1 is a group represented by formula (1-1) or a group represented by formula (1-2); X2 is a group represented by formula (2-1) or a group represented by formula (2-2); Y+ is a monovalent onium cation; m is an integer of 1 to 2, and m′ is an integer of 0 to 1. * represents a bond to another group.

公开(公告)号：US20190094695A1

公开(公告)日：2019-03-28

申请号：US16205502

申请日：2018-11-30

Applicant: JSR CORPORATION

Inventor： Naoya NOSAKA ,  Gouji WAKAMATSU ,  Tsubasa ABE ,  Yuushi MATSUMURA ,  Masayuki MIYAKE ,  Yoshio TAKIMOTO

IPC: G03F7/11 ,  C09D165/00 ,  G03F7/26 ,  C07D405/14 ,  C07D311/74 ,  C07D311/92 ,  C08G61/10 ,  H01L21/027

Abstract: The composition for film formation includes a compound including a group of the formula (1) and a solvent. In the formula (1), R1 to R4 each independently represent a hydrogen atom, a monovalent organic group having 1 to 20 carbon atoms, or R1 to R4 taken together represent a cyclic structure having 3 to 20 ring atoms together with the carbon atom or a carbon chain to which R1 to R4 bond. Ar1 represents a group obtained by removing (n+3) hydrogen atoms from an aromatic ring of an arene having 6 to 20 carbon atoms. n is an integer of 0 to 9. R5 represents a hydroxy group, a halogen atom, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms.