Transient antennas and transient electronics
    3.
    发明授权
    Transient antennas and transient electronics 有权
    瞬态天线和瞬态电子学

    公开(公告)号:US09536844B1

    公开(公告)日:2017-01-03

    申请号:US14678512

    申请日:2015-04-03

    摘要: The disclosed antenna structures and electronic microsystems are capable of physically disappearing in a controlled, triggerable manner. Some variations provide an on-chip transient antenna comprising a semiconductor substrate containing ion-implanted hydrogen atoms and a conductor network comprising metals bridged by low-melting-temperature metals. Some variations provide an off-chip transient antenna comprising a flexible substrate containing a polymer, nanoporous silicon particles, and an oxidant for silicon, and a conductor network comprising metals bridged by low-melting-temperature metals. Other variations provide a method of introducing physical transience to a semiconductor integrated circuit, comprising thinning a substrate from the back side, implanting hydrogen ions into the thinned substrate to introduce latent structural flaws, depositing a semiconductor integrated circuit or sensor chip, and providing a controllable heating source capable of activating the latent structural flaws. These novel approaches are compatible with existing integrated circuits processing, preserve antenna performance, and use foundry-compatible techniques.

    摘要翻译: 所公开的天线结构和电子微系统能够以受控的,可触发的方式物理地消失。 一些变型提供包括含有离子注入的氢原子的半导体衬底的片上瞬态天线和包含由低熔点金属桥接的金属的导体网络。 一些变型提供了包括含有聚合物,纳米多孔硅颗粒和硅氧化剂的柔性基板的片外瞬态天线,以及包含由低熔点金属桥接的金属的导体网络。 其它变型提供了一种将物理瞬态引入半导体集成电路的方法,包括从背面稀释衬底,将氢离子注入到薄化衬底中以引入潜在的结构缺陷,沉积半导体集成电路或传感器芯片,以及提供可控制的 能够激活潜在结构缺陷的加热源。 这些新颖的方法与现有的集成电路处理兼容,保留天线性能,并使用代工兼容技术。

    Enhancement mode normally-off gallium nitride heterostructure field effect transistor
    4.
    发明授权
    Enhancement mode normally-off gallium nitride heterostructure field effect transistor 有权
    增强型常闭氮化镓异质结场场效应晶体管

    公开(公告)号:US09190534B1

    公开(公告)日:2015-11-17

    申请号:US14248695

    申请日:2014-04-09

    摘要: A method of fabricating a normally “off” GaN heterostructure field effect transistor having a source and a drain including depositing a passivation layer patterned to cover a channel region between a source and a drain, forming a first opening in the passivation layer, the first opening for defining a gate area in the channel region and the first opening having a first length dimension along a direction of current flow between the source and the drain, and implanting ions in an implant area within the gate area, wherein the implant area has a second length dimension along the direction of current flow shorter than the first length dimension.

    摘要翻译: 一种制造具有源极和漏极的正常“关闭”GaN异质结构场效应晶体管的方法,包括沉积图案化以覆盖源极和漏极之间的沟道区域的钝化层,在钝化层中形成第一开口,第一开口 用于在所述沟道区域中限定栅极区域,并且所述第一开口沿着所述源极和漏极之间的电流流动的方向具有第一长度尺寸,以及将离子注入所述栅极区域内的注入区域中,其中所述植入区域具有第二 沿着电流流动方向的长度尺寸短于第一长度尺寸。

    Thermal management for heterogeneously integrated technology
    5.
    发明授权
    Thermal management for heterogeneously integrated technology 有权
    用于非均匀集成技术的热管理

    公开(公告)号:US09087854B1

    公开(公告)日:2015-07-21

    申请号:US14158962

    申请日:2014-01-20

    摘要: A method of three dimensional heterogeneous integration including forming HBT devices on a first substrate, each HBT device having a collector, removing the first substrate, forming first bonding pads on each collector of the heterojunction bipolar transistor devices, forming high electron mobility transistor (HEMT) devices on a first side of a growth substrate, wherein the growth substrate comprises a thermally conductive substrate, such as SiC or diamond, forming second bonding pads on the first side of the growth substrate, aligning and bonding the first bonding pads to the second bonding pads, forming CMOS devices on a Si substrate, bonding the CMOS devices on the Si substrate to a second side of the growth substrate, and forming selectively interconnects between the HBT devices, the HEMT devices, and the CMOS devices by forming vias and first and second level metal interconnects.

    摘要翻译: 一种三维非均匀集成的方法,包括在第一衬底上形成HBT器件,每个HBT器件具有集电极,去除第一衬底,在异质结双极晶体管器件的每个集电极上形成第一接合焊盘,形成高电子迁移率晶体管(HEMT) 生长衬底的第一侧上的器件,其中所述生长衬底包括诸如SiC或金刚石的导热衬底,在所述生长衬底的第一侧上形成第二接合焊盘,将所述第一接合焊盘对准和接合到所述第二接合 衬垫,在Si衬底上形成CMOS器件,将Si衬底上的CMOS器件接合到生长衬底的第二侧,以及通过形成通孔,首先形成通孔并在HBT器件,HEMT器件和CMOS器件之间选择性地形成互连 二级金属互连。

    Integrated mechanical aids for high accuracy alignable-electrical contacts

    公开(公告)号:US11562984B1

    公开(公告)日:2023-01-24

    申请号:US17070826

    申请日:2020-10-14

    摘要: A method and apparatus for laterally urging two semiconductor chips, dies or wafers into an improved state of registration with each other, the method and apparatus employing microstructures comprising: a first microstructure disposed on a first major surface of a first one of said two semiconductor chips, dies or wafers, wherein the first microstructure includes a sidewall which is tapered thereby disposing it at an acute angle compared to a perpendicular of said first major surface, and a second microstructure disposed on a first surface of a second one of said two semiconductor chips, dies or wafers, wherein the shape of the second microstructure is complementary to, and mates with or contacts, in use, the first microstructure, the second microstructure including a surface which contacts said sidewall when the first and second microstructures are mated or being mated, the sidewall of the first microstructure and the surface of the second microstructure imparting a lateral force for urging the two semiconductor chips, dies or wafers into said improved state of registration.