公开(公告)号：US20180081264A1

公开(公告)日：2018-03-22

申请号：US15824227

申请日：2017-11-28

Applicant: HOYA CORPORATION

Inventor： Kazuhiro HAMAMOTO ,  Toshihiko ORIHARA ,  Hirofumi KOZAKAI ,  Youichi USUI ,  Tsutomu SHOKI ,  Junichi HORIKAWA

IPC: G03F1/22 ,  H01L21/033 ,  G03F1/50 ,  G03F1/60 ,  G03F7/20

Abstract: Disclosed is a mask blank substrate for use in lithography, wherein a main surface of the substrate satisfies a relational equation of (BA70−BA30)/(BD70−BD30)≧350 (%/nm), and has a maximum height (Rmax)≦1.2 nm in a relation between a bearing area (%) and a bearing depth (nm) obtained by measuring, with an atomic force microscope, an area of 1 μm×1 μm in the main surface on the side of the substrate where a transfer pattern is formed, wherein BA30 is defined as a bearing area of 30%, BA70 is defined as a bearing area of 70%, and BD70 and BD30 are defined to respectively represent bearing depths for the bearing area of 30% and the bearing area of 70%.

公开(公告)号：US20170023853A1

公开(公告)日：2017-01-26

申请号：US15134776

申请日：2016-04-21

Applicant: HOYA CORPORATION

Inventor： Kazuhiro HAMAMOTO ,  Toshihiko ORIHARA ,  Hirofumi KOZAKAI ,  Youichi USUI ,  Tsutomu SHOKI ,  Junichi HORIKAWA

IPC: G03F1/22 ,  G03F1/60 ,  H01L21/033 ,  G03F7/20

CPC classification number: G03F1/22 ,  G03F1/50 ,  G03F1/60 ,  G03F7/2004 ,  H01L21/0332 ,  H01L21/0334

Abstract: Disclosed is a mask blank substrate for use in lithography, wherein a main surface of the substrate satisfies a relational equation of (BA70−BA30)/(BD70−BD30)≧350 (%/nm), and has a maximum height (Rmax)≦1.2 nm in a relation between a bearing area (%) and a bearing depth (nm) obtained by measuring, with an atomic force microscope, an area of 1 μm×1 μm in the main surface on the side of the substrate where a transfer pattern is formed, wherein BA30 is defined as a bearing area of 30%, BA70 is defined as a bearing area of 70%, and BD70 and BD30 are defined to respectively represent bearing depths for the bearing area of 30% and the bearing area of 70%.

Abstract translation: 公开了一种用于光刻的掩模空白基板，其中基板的主表面满足关系式（BA70-BA30）/（BD70-BD30）≥350（％/ nm），并具有最大高度（Rmax） 通过用原子力显微镜测量在基板一侧的主表面中的面积为1μm×1μm的轴承面积（％）和轴承深度（nm）之间的关系，≤1.2nm，其中， 形成转印图案，其中BA30被定义为30％的轴承面积，BA70被定义为70％的轴承面积，并且BD70和BD30分别表示承载面积为30％的轴承深度和轴承面积 70％。

公开(公告)号：US20160377769A1

公开(公告)日：2016-12-29

申请号：US14901575

申请日：2014-09-25

Applicant: HOYA CORPORATION

Inventor： Kazuhiro HAMAMOTO ,  Toshihiko ORIHARA

IPC: G02B5/08 ,  G03F1/24 ,  G03F7/20 ,  G02B1/14 ,  G02B5/00

CPC classification number: G02B5/0816 ,  G02B1/14 ,  G02B5/003 ,  G02B5/0891 ,  G02B5/26 ,  G02B5/285 ,  G03F1/24 ,  G03F1/52 ,  G03F1/84 ,  G03F7/70216

Abstract: A substrate with a multilayer reflective film capable of facilitating the discovery of contaminants, scratches and other critical defects by inhibiting the detection of pseudo defects attributable to surface roughness of a substrate or film in a defect inspection using a highly sensitive defect inspection apparatus.The substrate with a multilayer reflective film has a multilayer reflective film obtained by alternately laminating a high refractive index layer and a low refractive index layer on a main surface of a mask blank substrate used in lithography, wherein an integrated value I of the power spectrum density (PSD) at a spatial frequency of 1 μm−1 to 10 μm−1 of the surface of the substrate with a multilayer reflective film, obtained by measuring a region measuring 3 μm×3 μm with an atomic force microscope, is not more than 180×10−3 nm3, and the maximum value of the power spectrum density (PSD) at a spatial frequency of 1 μm−1 to 10 μm−1 is not more than 50 nm4.

Abstract translation: 具有多层反射膜的基板具有通过在光刻中使用的掩模坯料基板的主表面交替层叠高折射率层和低折射率层而获得的多层反射膜，其中功率谱密度的积分值I 通过使用原子力显微镜测量3μm×3μm的区域获得的具有多层反射膜的基板的表面的1μm-1〜10μm的空间频率的PSD（PSD）不大于 180×10-3nm 3，空间频率为1μm〜10μm的功率谱密度（PSD）的最大值不大于50nm 4。

公开(公告)号：US20180275507A1

公开(公告)日：2018-09-27

申请号：US15980783

申请日：2018-05-16

Applicant: HOYA CORPORATION

Inventor： Toshihiko ORIHARA ,  Kazuhiro HAMAMOTO ,  Hirofumi KOZAKAI ,  Youichi USUI ,  Tsutomu SHOKI ,  Junichi HORIKAWA

IPC: G03F1/48 ,  H01L21/308 ,  G03F1/22 ,  G02B5/08 ,  G03F7/20 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/16 ,  C03C17/36 ,  C03C23/00 ,  C03C3/06 ,  C03C17/34

CPC classification number: G03F1/48 ,  B82Y10/00 ,  B82Y40/00 ,  C03C3/06 ,  C03C17/3435 ,  C03C17/3626 ,  C03C17/3636 ,  C03C17/3639 ,  C03C17/3649 ,  C03C17/3665 ,  C03C23/0075 ,  C03C2201/42 ,  C03C2218/33 ,  G02B5/08 ,  G02B5/0816 ,  G02B5/0891 ,  G03F1/22 ,  G03F7/16 ,  G03F7/2002 ,  G03F7/2004 ,  G03F7/70733 ,  H01L21/3081 ,  H01L21/3085

Abstract: Disclosed is a mask blank substrate for use in lithography, wherein the main surface on which the transfer pattern of the substrate is formed has a root mean square roughness (Rms) of not more than 0.15 nm obtained by measuring an area of 1 μm×1 μm with an atomic force microscope, and has a power spectrum density of not more than 10 nm4 at a spatial frequency of not less than 1 μm−1.

公开(公告)号：US20170131629A1

公开(公告)日：2017-05-11

申请号：US15417846

申请日：2017-01-27

Applicant: HOYA CORPORATION

Inventor： Kazuhiro HAMAMOTO ,  Toshihiko ORIHARA ,  Tsutomu SHOKI ,  Junichi HORIKAWA

IPC: G03F1/60 ,  G03F7/20 ,  G03F1/84 ,  G03F1/24 ,  G03F1/80

CPC classification number: G03F1/60 ,  G03F1/24 ,  G03F1/80 ,  G03F1/84 ,  G03F7/20 ,  G03F7/2004

Abstract: An object of the present invention is to provide a mask blank substrate and the like that enables critical defects to be reliably detected as a result of reducing the number of detected defects, including pseudo defects, even when using highly sensitive defect inspection apparatuses that use light of various wavelengths. The present invention relates to a mask blank substrate that is used in lithography, wherein the power spectral density at a spatial frequency of 1×10−2 μm−1 to 1 μm−1, obtained by measuring a 0.14 mm×0.1 mm region on a main surface of the mask blank substrate on the side of which a transfer pattern is formed at 640×480 pixels with a white-light interferometer, is not more than 4×106 nm4, and the power spectral density at a spatial frequency of not less than 1 μm−1, obtained by measuring a 1 μm×1 μm region on the main surface with an atomic force microscope, is not more than 10 nm4.

公开(公告)号：US20150331312A1

公开(公告)日：2015-11-19

申请号：US14655190

申请日：2013-12-27

Applicant: HOYA CORPORATION

Inventor： Kazuhiro HAMAMOTO ,  Toshihiko ORIHARA ,  Tsutomu SHOKI ,  Junichi HORIKAWA

IPC: G03F1/60 ,  G03F1/80 ,  G03F7/20 ,  G03F1/24

CPC classification number: G03F1/60 ,  G03F1/24 ,  G03F1/80 ,  G03F1/84 ,  G03F7/20 ,  G03F7/2004

Abstract: An object of the present invention is to provide a mask blank substrate and the like that enables critical defects to be reliably detected as a result of reducing the number of detected defects, including pseudo defects, even when using highly sensitive defect inspection apparatuses that use light of various wavelengths. The present invention relates to a mask blank substrate that is used in lithography, wherein the power spectral density at a spatial frequency of 1×10−2 μm−1 to 1 μm−1, obtained by measuring a 0.14 mm×0.1 mm region on a main surface of the mask blank substrate on the side of which a transfer pattern is formed at 640×480 pixels with a white-light interferometer, is not more than 4×106 nm4, and the power spectral density at a spatial frequency of not less than 1 μm−1, obtained by measuring a 1 μm×1 μm region on the main surface with an atomic force microscope, is not more than 10 nm4.

Abstract translation: 本发明的目的是提供一种掩模板基板等，即使使用使用光的高灵敏度缺陷检查装置，由于减少包括伪缺陷在内的检测缺陷的数量，能够可靠地检测临界缺陷 的各种波长。 本发明涉及一种用于光刻的掩模坯料基板，其中通过测量0.14mm×0.1mm的区域得到的空间频率为1×10 -2μm-1 -1μm-1的功率谱密度 用白光干涉仪在640×480像素上形成转印图案的掩模坯料基板的主表面不大于4×106nm 4，空间频率处的功率谱密度不为 通过用原子力显微镜测量主表面上的1μm×1μm的区域获得的小于1μm的不超过10nm 4。

公开(公告)号：US20130078555A1

公开(公告)日：2013-03-28

申请号：US13630622

申请日：2012-09-28

Applicant: HOYA CORPORATION

Inventor： Toshihiko ORIHARA ,  Akihiro KAWAHARA ,  Tsutomu SHOKI

IPC: G03F1/24

CPC classification number: G03F1/24 ,  G03F1/38 ,  G03F1/60

Abstract: Provided is a mask blank glass substrate that has high surface smoothness, that is formed with a fiducial mark capable of improving the detection accuracy of a defect position or the like, and that enables reuse or recycling of a glass substrate included therein. An underlayer is formed on a main surface, on the side where a transfer pattern is to be formed, of a glass substrate for a mask blank. The underlayer serves to reduce surface roughness of the main surface of the glass substrate or to reduce defects of the main surface of the glass substrate. A surface of the underlayer is a precision-polished surface. A fiducial mark which provides a reference for a defect position in defect information is formed on the underlayer.

Abstract translation: 提供了具有高表面平滑度的掩模坯料玻璃基板，其形成有能够提高缺陷位置等的检测精度的基准标记，并且能够重复利用或再循环包含在其中的玻璃基板。 在掩模坯料用玻璃基板的主表面上形成有转印图案的一侧的底层形成。 底层用于降低玻璃基板的主表面的表面粗糙度或减少玻璃基板的主表面的缺陷。 底层的表面是精密抛光的表面。 在缺陷信息中提供缺陷位置的基准的基准标记形成在底层上。

公开(公告)号：US20180067238A1

公开(公告)日：2018-03-08

申请号：US15705304

申请日：2017-09-15

Applicant: Hoya Corporation

Inventor： Kazuhiro HAMAMOTO ,  Toshihiko ORIHARA

IPC: G02B5/08 ,  G03F7/20 ,  G03F1/84 ,  G03F1/52 ,  G03F1/24 ,  G02B5/28 ,  G02B5/26 ,  G02B5/00

CPC classification number: G02B5/0816 ,  G02B1/14 ,  G02B5/003 ,  G02B5/0891 ,  G02B5/26 ,  G02B5/285 ,  G03F1/24 ,  G03F1/52 ,  G03F1/84 ,  G03F7/70216

Abstract: A substrate with a multilayer reflective film capable of facilitating the discovery of contaminants, scratches and other critical defects by inhibiting the detection of pseudo defects attributable to surface roughness of a substrate or film in a defect inspection using a highly sensitive defect inspection apparatus.The substrate with a multilayer reflective film has a multilayer reflective film obtained by alternately laminating a high refractive index layer and a low refractive index layer on a main surface of a mask blank substrate used in lithography, wherein an integrated value 1 of the power spectrum density (PSD) at a spatial frequency of 1 μm−1 to 10 μm−1 of the surface of the substrate with a multilayer reflective film, obtained by measuring a region measuring 3 μm×3 μm with an atomic force microscope, is not more than 180×10 μm−3, and the maximum value of the power spectrum density (PSD) at a spatial frequency of 1 μm−1 to 10 μm−1 is not more than 50 nm4.

公开(公告)号：US20170010527A1

公开(公告)日：2017-01-12

申请号：US15275719

申请日：2016-09-26

Applicant: HOYA CORPORATION

Inventor： Toshihiko ORIHARA ,  Kazuhiro HAMAMOTO ,  Hirofumi KOZAKAI ,  Youichi USUI ,  Tsutomu SHOKI ,  Junichi HORIKAWA

IPC: G03F1/48 ,  H01L21/308 ,  G03F7/20 ,  G03F1/22 ,  G03F7/16

CPC classification number: G03F1/48 ,  B82Y10/00 ,  B82Y40/00 ,  C03C3/06 ,  C03C17/3435 ,  C03C17/3626 ,  C03C17/3636 ,  C03C17/3639 ,  C03C17/3649 ,  C03C17/3665 ,  C03C23/0075 ,  C03C2201/42 ,  C03C2218/33 ,  G02B5/08 ,  G02B5/0816 ,  G02B5/0891 ,  G03F1/22 ,  G03F7/16 ,  G03F7/2002 ,  G03F7/2004 ,  G03F7/70733 ,  H01L21/3081 ,  H01L21/3085

Abstract: Disclosed is a mask blank substrate for use in lithography, wherein the main surface on which the transfer pattern of the substrate is formed has a root mean square roughness (Rms) of not more than 0.15 nm obtained by measuring an area of 1 μm×1 μm with an atomic force microscope, and has a power spectrum density of not more than 10 nm4 at a spatial frequency of not less than 1 μm−1.

Abstract translation: 公开了一种用于光刻的掩模空白基板，其中形成基板的转印图案的主表面具有通过测量1μm×1的面积获得的不大于0.15nm的均方根粗糙度（Rms） 具有原子力显微镜，并且在不小于1μm-1的空间频率下具有不大于10nm 4的功率谱密度。

公开(公告)号：US20160041462A1

公开(公告)日：2016-02-11

申请号：US14919994

申请日：2015-10-22

Applicant: HOYA CORPORATION

Inventor： Toshihiko ORIHARA ,  Akihiro Kawahara ,  Tsutomu Shoki

IPC: G03F1/24 ,  G03F1/60

CPC classification number: G03F1/24 ,  G03F1/38 ,  G03F1/60

Abstract: Provided is a mask blank glass substrate that has high surface smoothness, that is formed with a fiducial mark capable of improving the detection accuracy of a defect position or the like, and that enables reuse or recycling of a glass substrate included therein. An underlayer is formed on a main surface, on the side where a transfer pattern is to be formed, of a glass substrate for a mask blank. The underlayer serves to reduce surface roughness of the main surface of the glass substrate or to reduce defects of the main surface of the glass substrate. A surface of the underlayer is a precision-polished surface. A fiducial mark which provides a reference for a defect position in defect information is formed on the underlayer.