公开(公告)号：US10739678B2

公开(公告)日：2020-08-11

申请号：US15852363

申请日：2017-12-22

Applicant: FUJIFILM Corporation

Inventor： Hirotaka Kitagawa

IPC: C08F2/50 ,  H01L23/29 ,  G03F7/027 ,  C08F20/00 ,  C09D4/00 ,  G03F7/00 ,  C08F220/30 ,  C08F236/16 ,  C08F290/06 ,  C09J11/04 ,  C09J11/06 ,  C30B29/38 ,  G03F7/038 ,  H01L23/31 ,  H05K3/28 ,  H01L21/033 ,  H05K3/06

Abstract: Provided are a photocurable composition capable of suppressing both deformation (change in line width roughness (ΔLWR)) of a pattern after etching and breakage of a pattern after etching, a pattern forming method, and a method for manufacturing a device. Disclosed is a photocurable composition including a monofunctional (meth)acrylate represented by the following General Formula (I) and a photopolymerization initiator, where R1 represents a hydrogen atom or a methyl group; R2 represents an alkyl group which may be substituted with a fluorine atom, R3 represents a hydrogen atom, a linear alkyl group which may be substituted with a fluorine atom, or a branched alkyl group which may be substituted with a fluorine atom, R4 to R8 each independently represent a hydrogen atom, a halogen atom, a linear alkyl group having 1 to 4 carbon atoms, or a branched alkyl group having 3 or 4 carbon atoms, the total number of carbon atoms included in R2 and R3 is 1 to 6, and R2 and R3, or R2 and R4 may be bonded to each other and form a ring.

公开(公告)号：US10246605B2

公开(公告)日：2019-04-02

申请号：US15441716

申请日：2017-02-24

Applicant: FUJIFILM Corporation

Inventor： Tadashi Oomatsu ,  Hirotaka Kitagawa ,  Yuichiro Goto

IPC: C09D5/00 ,  C09D151/00 ,  B32B27/00 ,  C09D133/14 ,  C09D201/02 ,  B29C59/00 ,  B29C59/16 ,  G03F7/00 ,  H01L21/02 ,  H01L21/3105 ,  C08F290/14 ,  C09D151/08 ,  G03F7/075 ,  G03F7/09 ,  C09D7/40 ,  C09D5/32 ,  C09D7/65 ,  B29C59/02 ,  B29K33/00

Abstract: Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device.Disclosed is a resin composition for underlayer film formation which is used to form an underlayer film by being applied onto a base material, including a first resin having a radical reactive group in the side chain, a second resin containing at least one selected from a fluorine atom and a silicon atom, and a solvent. The second resin is preferably a resin containing a fluorine atom. The radical reactive group of the first resin is preferably a (meth)acryloyl group.

公开(公告)号：US10175576B2

公开(公告)日：2019-01-08

申请号：US14643512

申请日：2015-03-10

Applicant: FUJIFILM Corporation

Inventor： Hirotaka Kitagawa ,  Yuichiro Goto ,  Yuichiro Enomoto

IPC: G03F7/00 ,  G03F7/031 ,  C08F2/44 ,  C08F2/48 ,  G03F7/004 ,  G03F7/027 ,  G03F7/038 ,  C09D11/101 ,  C09D11/30 ,  H01L21/308

Abstract: Provided is a curable composition for photo imprints excellent in the mold releasability and the ink jettability. The curable composition for photo imprints, comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a mold releasing agent (C), the mold releasing agent (C) being represented by the formula (I) below. Rf represents a C1-8 fluorine-containing alkyl group having two or more fluorine atoms; m represents 1 or 2; L represents a single bond or divalent linking group; n represents 1 or 2; X represents a single bond, oxygen atom, sulfur atom, or nitrogen atom; R1 represents a C1-8 substituent being free from a polymerizable group; R2 represents a hydrogen atom, C1-8 substituent, or divalent linking group; p represents 1 or 2, q represents 0 or 1, and r represents 1 or 2; R1 and R2 may combine with each other to form a ring.

公开(公告)号：US09862847B2

公开(公告)日：2018-01-09

申请号：US14757424

申请日：2015-12-23

Applicant: FUJIFILM Corporation

Inventor： Yuichiro Goto ,  Tadashi Oomatsu ,  Hirotaka Kitagawa ,  Yuichiro Enomoto ,  Kenichi Kodama

IPC: C09D11/30 ,  B41J2/01 ,  C09D11/106 ,  G03F7/00 ,  C09D11/101 ,  C09D11/38 ,  C08G65/00 ,  C08G65/332 ,  C09D133/06 ,  C08K5/06 ,  C08K5/103 ,  C08K5/12

CPC classification number: C09D11/30 ,  B41J2/01 ,  C08G65/007 ,  C08G65/3322 ,  C08K5/06 ,  C08K5/103 ,  C08K5/12 ,  C09D11/101 ,  C09D11/106 ,  C09D11/38 ,  C09D133/06 ,  G03F7/0002

Abstract: The present invention provides a discharge method which makes it possible to appropriately perform discharge even when a head for discharging microdroplets having a size of equal to or less than 6 pL that is necessary for controlling a residual film (forming a thin film and achieving uniformity) is used, and makes it possible to obtain an excellent pattern having excellent release properties. The discharge method is an inkjet discharge method including discharging a photocurable composition in the form of liquid droplets having a size of equal to or less than 6 pL, in which the composition satisfies the following (a) to (c), (a) containing a fluorine-containing material in a proportion of equal to or less than 4% by mass of the composition; (b) having a surface tension of 25 mN/m to 35 mN/m; and (c) containing a solvent having a boiling point of equal to or less than 200° C. in an amount of 5% by mass of the composition.

公开(公告)号：US10191375B2

公开(公告)日：2019-01-29

申请号：US15423734

申请日：2017-02-03

Applicant: FUJIFILM Corporation

Inventor： Tadashi Oomatsu ,  Hirotaka Kitagawa ,  Yuichiro Goto

IPC: G03F7/11 ,  C09D7/40 ,  B32B27/00 ,  C09D133/14 ,  C09D201/06 ,  H01L21/027 ,  B29C35/08 ,  B29C59/00 ,  B29C59/02 ,  C09D133/08 ,  G03F7/00 ,  G03F7/004 ,  C09D5/00 ,  C09D201/02

Abstract: Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device.A resin composition for underlayer film formation includes a resin having a group represented by General Formula (A) and at least one group selected from a group represented by General Formula (B), an oxiranyl group and an oxetanyl group, a nonionic surfactant and a solvent. Ra1 represents a hydrogen atom or a methyl group, Rb1 and Rb2 each independently represent a group selected from an unsubstituted linear or branched alkyl group having 1 to 20 carbon atoms and an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, Rb3 represents a group selected from an unsubstituted linear or branched alkyl group having 2 to 20 carbon atoms and an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, and Rb2 and Rb3 may be bonded to each other to form a ring.

公开(公告)号：US10189928B2

公开(公告)日：2019-01-29

申请号：US15465080

申请日：2017-03-21

Applicant: FUJIFILM Corporation

Inventor： Hirotaka Kitagawa ,  Yuichiro Goto

IPC: C08F222/10 ,  B41J2/01 ,  C08F2/48 ,  B29C59/02 ,  B29C59/00 ,  G03F7/00 ,  H01L21/027 ,  G03F7/027 ,  B29K33/00 ,  B29K105/00

Abstract: Provided are a curable composition having excellent releasability and ink jet discharge accuracy, a pattern forming method, a pattern, and a method for manufacturing a device.The curable composition includes a polymerizable compound and a photopolymerization initiator, in which neopentyl glycol diacrylate accounts for 10% by mass or more of the polymerizable compound, and the total content of a compound represented by the following Formula (I) and a compound represented by the following Formula (II) is 5% by mass or less with respect to the content of neopentyl glycol diacrylate.

公开(公告)号：US09868846B2

公开(公告)日：2018-01-16

申请号：US14151367

申请日：2014-01-09

Applicant: FUJIFILM Corporation

Inventor： Kunihiko Kodama ,  Yuichiro Enomoto ,  Kazuyuki Usuki ,  Tadashi Omatsu ,  Hirotaka Kitagawa

IPC: C08K5/053 ,  C08F220/22 ,  C08F222/10 ,  G11B5/855 ,  B29C59/00 ,  C08F2/48 ,  C08F220/10 ,  C09D4/06 ,  C08F2/46 ,  C08F220/18 ,  C08F230/08 ,  C08F220/38

CPC classification number: C08K5/053 ,  B29C59/005 ,  C08F2/46 ,  C08F2/48 ,  C08F220/10 ,  C08F220/22 ,  C08F222/1006 ,  C08F230/08 ,  C08F2220/1833 ,  C08F2220/185 ,  C08F2220/1875 ,  C08F2220/1891 ,  C08F2220/382 ,  C08F2222/1013 ,  C08F2222/102 ,  C09D4/06 ,  G11B5/855 ,  Y10T428/24479 ,  C09D133/04 ,  C08L71/02

Abstract: Disclosed is a to provide a curable composition for imprints capable of keeping a good patternability and of producing less defects even after repetitive pattern transfer. The curable composition for imprints comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a non-polymerizable compound (C) having a polyalkylene glycol structure having at least one terminal hydroxy group, or at least one etherified terminal hydroxy group, and containing substantially no fluorine atom and no silicon atom.

公开(公告)号：US09796803B2

公开(公告)日：2017-10-24

申请号：US14549068

申请日：2014-11-20

Applicant: FUJIFILM Corporation

Inventor： Hirotaka Kitagawa ,  Akiko Hattori ,  Yuichiro Enomoto

IPC: C08F220/32 ,  G03F7/00 ,  B29C59/00 ,  C08F220/18 ,  C08F220/28 ,  H01L21/02 ,  B29K33/00

CPC classification number: C08F220/32 ,  B29C59/005 ,  B29K2033/12 ,  C08F220/18 ,  C08F220/28 ,  C08F2220/281 ,  C08F2220/325 ,  G03F7/0002 ,  H01L21/02356

Abstract: An under layer film having excellent surface planarity is provided. In one aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A) containing an ethylenic unsaturated group (P) and a nonionic hydrophilic group (Q), and having a weight average molecular weight of 1,000 or larger; and a solvent (B), the resin (A) having an acid value of smaller than 1.0 mmol/g. In another aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A2) containing an ethylenic unsaturated group (P), and containing, as a nonionic hydrophilic group (Q), a cyclic substituent (Q2) having a carbonyl group in the cyclic structure thereof, with a weight average molecular weight of 1,000 or larger; and a solvent (B).

公开(公告)号：US09376581B2

公开(公告)日：2016-06-28

申请号：US14483860

申请日：2014-09-11

Applicant: FUJIFILM Corporation

Inventor： Hirotaka Kitagawa ,  Masafumi Yoshida

IPC: C08F2/46 ,  C08F2/50 ,  C08G61/04 ,  C09D11/101 ,  C08F220/18 ,  C08F236/20 ,  C08F2/48 ,  G03F7/00 ,  G03F7/004 ,  G03F7/027 ,  B05D5/00 ,  B29C59/00 ,  B29C59/16 ,  H01L21/027 ,  H01L21/308 ,  B29K33/00 ,  C08F220/58 ,  C08F220/32 ,  H01L21/311

CPC classification number: C09D11/101 ,  B05D5/00 ,  B29C59/005 ,  B29C59/16 ,  B29K2033/12 ,  C08F2/48 ,  C08F220/18 ,  C08F220/58 ,  C08F236/20 ,  C08F2220/325 ,  G03F7/0002 ,  G03F7/0046 ,  G03F7/027 ,  H01L21/0274 ,  H01L21/3086 ,  H01L21/31138 ,  H01L21/31144 ,  Y10T428/24802 ,  C08F2220/185 ,  C08F2222/1013 ,  C08F2220/1858

Abstract: To provide a photo-curable composition for imprints which can ensure high ratio of mold filling and low defect density during mold releasing, and can provide a resist material with high etching durability. A photo-curable composition for imprints comprising a monofunctional monomer, a polyfunctional monomer and a photo-polymerization initiator, having a viscosity at 25° C. of 15 mPa·s or smaller, an Ohnishi parameter of 3.0 or smaller, and a crosslink density calculated by (Formula 1) of 0.6 mmol/cm3 or larger; Crosslink density={Σ(Ratio of mixing of polyfunctional monomer (parts by mass)*Number of functional groups of polyfunctional monomer/Molecular weight of polyfunctional monomer)}/Specific gravity.

Abstract translation: 为了提供可以确保模具填充的高比例和脱模时的低缺陷密度的用于印痕的光固化性组合物，并且可以提供具有高蚀刻耐久性的抗蚀剂材料。 在25℃下的粘度为15mPa·s以下，Ohnishi参数为3.0以下的单官能单体，多官能单体和光聚合引发剂的印模用光固化性组合物和交联密度 由（式1）计算为0.6mmol / cm 3以上; 交联密度= {＆Sgr（多官能单体的混合比例（质量份）*多官能单体的官能团数/多官能单体的分子量）} /比重。

公开(公告)号：US08901351B2

公开(公告)日：2014-12-02

申请号：US13774936

申请日：2013-02-22

Applicant: FUJIFILM Corporation

Inventor： Akihito Amao ,  Hirotaka Kitagawa

IPC: C07C233/18 ,  C07C233/05 ,  C07C231/12

CPC classification number: C07C233/18 ,  C07C231/12 ,  C07C233/20

Abstract: A compound represented by formula (I): wherein, in formula (I), R represents a hydrogen atom or an alkyl group having 1 to 4 carbon atom(s); Ra represents a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group; X represents a halogen atom, or an alkyl- or aryl-sulfonyloxy group; L represents a divalent linking group; Z represents a (n+1)-valent organic group; and n represents an integer of 1 to 6, a plurality of Rs and Ras and Xs may be the same or different from each other, respectively, and when n represents 2 to 6, a plurality of Ls may be the same or different from each other.

Abstract translation: 式（I）表示的化合物：其中，在式（I）中，R表示氢原子或碳原子数为1〜4的烷基。 Ra表示氢原子，烷基，芳基或杂环基; X表示卤原子，或烷基 - 或芳基 - 磺酰氧基; L表示二价连接基团; Z表示（n + 1）价有机基团; n表示1〜6的整数，多个R a，Ras和X可分别相同或不同，n为2〜6时，多个L可以相同也可以不同 其他。