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    Multidimensional Structural Access
    3.
    发明申请
    Multidimensional Structural Access 审中-公开
    多维结构访问

    公开(公告)号：US20150260784A1

    公开(公告)日：2015-09-17

    申请号：US14432712

    申请日：2013-10-04

    申请人： FEI COMPANY

    发明人： Jeffrey Blackwood ,  Sang Hoon Lee ,  Michael Schmidt ,  Stacey Stone ,  Karey Holland

    IPC分类号： G01R31/265 ,  H01J37/153

    CPC分类号： G01R31/2653 ,  G01N1/286 ,  G01N1/32 ,  G01R31/2808 ,  G01R31/2898 ,  G01R31/307 ,  G01R31/312 ,  H01J37/153 ,  H01J37/3005 ,  H01J2237/208 ,  H01J2237/24564 ,  H01J2237/2817 ,  H01J2237/31749 ,  H01L22/14 ,  H01L2924/0002 ,  H01L2924/00

    摘要： Multiple planes within the sample are exposed from a single perspective for contact by an electrical probe. The sample can be milled at a non-orthogonal angle to expose different layers as sloped surfaces. The sloped edges of multiple, parallel conductor planes provide access to the multiple levels from above. The planes can be accessed, for example, for contacting with an electrical probe for applying or sensing a voltage. The level of an exposed layer to be contacted can be identified, for example, by counting down the exposed layers from the sample surface, since the non-orthogonal mill makes all layers visible from above. Alternatively, the sample can be milled orthogonally to the surface, and then tilted and/or rotated to provide access to multiple levels of the device. The milling is preferably performed away from the region of interest, to provide electrical access to the region while minimizing damage to the region.

    摘要翻译： 样品中的多个平面从单个角度暴露出来，用于通过电探针进行接触。 样品可以以非正交角度研磨，以将不同的层暴露于倾斜的表面。 多个平行导体平面的倾斜边缘可从上方进入多个层次。 例如，可以访问平面，以便与用于施加或感测电压的电探针接触。 可以例如通过从样品表面倒下暴露的层来鉴定待接触的暴露层的水平，因为非正交磨机使得所有层从上方可见。 或者，样品可以与表面正交地研磨，然后倾斜和/或旋转以提供对该装置的多个级别的访问。 铣削优选地远离感兴趣的区域进行，以提供对该区域的电通路，同时使对该区域的损害最小化。

    Method for preparing samples for imaging
    5.
    发明授权
    Method for preparing samples for imaging 有权
    准备成像样品的方法

    公开(公告)号：US08822921B2

    公开(公告)日：2014-09-02

    申请号：US14144902

    申请日：2013-12-31

    申请人： FEI Company

    发明人： Michael Schmidt ,  Jeffrey Blackwood ,  Stacey Stone ,  Sang Hoon Lee ,  Ronald Kelley

    IPC分类号： G01N23/00 ,  G01N1/32

    CPC分类号： G01N1/32 ,  G01N1/286 ,  G01N2001/2886 ,  H01J37/3056 ,  H01J2237/31745

    摘要： A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.

    摘要翻译： 提供了一种方法和装置，用于以减少或防止伪影的方式制备用于在带电粒子束系统中观察的样品。 在最终研磨之前或期间，使用带电粒子束沉积将材料沉积到样品上，这导致无伪影的表面。 实施例对于制备具有不同硬度的材料层的样品的SEM观察的截面是有用的。 实施例可用于制备薄TEM样品。

    FIDUCIAL DESIGN FOR TILTED OR GLANCING MILL OPERATIONS WITH A CHARGED PARTICLE BEAM
    7.
    发明申请
    FIDUCIAL DESIGN FOR TILTED OR GLANCING MILL OPERATIONS WITH A CHARGED PARTICLE BEAM 审中-公开

    公开(公告)号：US20180301319A1

    公开(公告)日：2018-10-18

    申请号：US16012888

    申请日：2018-06-20

    申请人： FEI Company

    发明人： Stacey Stone ,  Sang Hoon Lee ,  Jeffrey Blackwood ,  Michael Schmidt ,  Hyun Hwa Kim

    IPC分类号： H01J37/317 ,  H01J37/305

    摘要： A method for analyzing a sample with a charged particle beam including directing the beam toward the sample surface; milling the surface to expose a second surface in the sample in which the end of the second surface distal to ion source is milled to a greater depth relative to a reference depth than the end of the first surface proximal to ion source; directing the charged particle beam toward the second surface to form one or more images of the second surface; forming images of the cross sections of the multiple adjacent features of interest by detecting the interaction of the electron beam with the second surface; assembling the images of the cross section into a three-dimensional model of one or more of the features of interest. A method for forming an improved fiducial and determining the depth of an exposed feature in a nanoscale three-dimensional structure is presented.

    Fiducial design for tilted or glancing mill operations with a charged particle beam
    8.
    发明授权
    Fiducial design for tilted or glancing mill operations with a charged particle beam 有权

    公开(公告)号：US10026590B2

    公开(公告)日：2018-07-17

    申请号：US14758466

    申请日：2013-12-30

    申请人： FEI Company

    发明人： Stacey Stone ,  Sang Hoon Lee ,  Jeffrey Blackwood ,  Michael Schmidt ,  Hyun Hwa Kim

    IPC分类号： H01J37/317 ,  H01J37/305

    摘要： A method for analyzing a sample with a charged particle beam including directing the beam toward the sample surface; milling the surface to expose a second surface in the sample in which the end of the second surface distal to ion source is milled to a greater depth relative to a reference depth than the end of the first surface proximal to ion source; directing the charged particle beam toward the second surface to form one or more images of the second surface; forming images of the cross sections of the multiple adjacent features of interest by detecting the interaction of the electron beam with the second surface; assembling the images of the cross section into a three-dimensional model of one or more of the features of interest. A method for forming an improved fiducial and determining the depth of an exposed feature in a nanoscale three-dimensional structure is presented.