公开(公告)号：US20210115591A1

公开(公告)日：2021-04-22

申请号：US17081341

申请日：2020-10-27

Applicant: ELEMENT SIX TECHNOLOGIES LIMITED

Inventor： HERMAN PHILIP GODFRIED ,  GEOFFREY ALAN SCARSBROOK ,  DANIEL JAMES TWITCHEN ,  EVERT PIETER HOUWMAN ,  WILHELMUS GERTRUDA MARIA NELISSEN ,  ANDREW JOHN WHITEHEAD ,  CLIVE EDWARD HALL ,  PHILIP MAURICE MARTINEAU

IPC: C30B29/04 ,  C30B25/20 ,  C30B33/02 ,  C01B32/25 ,  C01B32/26 ,  C30B25/02 ,  G02B1/00 ,  C30B9/00 ,  C30B19/02 ,  C30B25/16 ,  C30B33/12 ,  G02B1/02

Abstract: A CVD single crystal diamond material suitable for use in, or as, an optical device or element. It is suitable for use in a wide range of optical applications such as, for example, optical windows, laser windows, optical reflectors, optical refractors and gratings, and etalons. The CVD diamond material is produced by a CVD method in the presence of a controlled low level of nitrogen to control the development of crystal defects and thus achieve a diamond material having key characteristics for optical applications.

公开(公告)号：US20170037539A1

公开(公告)日：2017-02-09

申请号：US15298380

申请日：2016-10-20

Applicant: ELEMENT SIX TECHNOLOGIES LIMITED

Inventor： GEOFFREY ALAN SCARSBROOK ,  PHILIP MAURICE MARTINEAU ,  DANIEL JAMES TWITCHEN

IPC: C30B29/04 ,  C30B25/20

CPC classification number: C30B29/04 ,  C30B25/02 ,  C30B25/20 ,  C30B33/00

Abstract: A method of producing a large area plate of single crystal diamond from CVD diamond grown on a substrate substantially free of surface defects by chemical vapour deposition (CVD). The homoepitaxial CVD grown diamond and the substrate are severed transverse to the surface of the substrate on which diamond growth took place to produce the large area plate of single crystal CVD diamond.

Abstract translation: 从通过化学气相沉积（CVD）基本上没有表面缺陷的基板上生长的CVD金刚石生产大面积单晶金刚石的方法。 同质外延CVD生长的金刚石和基底横切于衬底的表面，在其上发生金刚石生长以产生大面积单晶CVD金刚石板。

公开(公告)号：US20170040145A1

公开(公告)日：2017-02-09

申请号：US15304366

申请日：2015-06-10

Applicant: ELEMENT SIX TECHNOLOGIES LIMITED

Inventor： JOHN ROBERT BRANDON ,  IAN FRIEL ,  MICHAEL ANDREW COOPER ,  GEOFFREY ALAN SCARSBROOK ,  BEN LLEWLYN GREEN

IPC: H01J37/32 ,  C23C16/511 ,  C30B29/04 ,  C30B25/10 ,  C30B25/20 ,  C23C16/27 ,  C23C16/458

CPC classification number: H01J37/32201 ,  C23C16/274 ,  C23C16/458 ,  C23C16/511 ,  C30B25/105 ,  C30B25/205 ,  C30B29/04 ,  H01J37/32192 ,  H01J37/3222 ,  H01J37/32247 ,  H01J37/32284 ,  H01J37/32293 ,  H01J37/32302 ,  H01J37/3244 ,  H01J37/32715 ,  H01J2237/3321 ,  H01J2237/3323

Abstract: A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapour deposition, the microwave plasma reactor comprising: a plasma chamber defining a resonant cavity for supporting a primary microwave resonance mode having a primary microwave resonance mode frequency f; a plurality of microwave sources coupled to the plasma chamber for generating and feeding microwaves having a total microwave power Pτ into the plasma chamber; a gas flow system for feeding process gases into the plasma chamber and removing them therefrom; and a substrate holder disposed in the plasma chamber and comprising a supporting surface for supporting a substrate on which the synthetic diamond material is to be deposited in use, wherein the plurality of microwave sources are configured to couple at least 30% of the total microwave power Pτ into the plasma chamber in the primary microwave resonance mode frequency f, and wherein at least some of the plurality of microwave sources are solid state microwave sources.

Abstract translation: 一种用于通过化学气相沉积制造合成金刚石材料的微波等离子体反应器，所述微波等离子体反应器包括：等离子体室，其限定用于支撑具有初级微波谐振模式频率f的初级微波谐振模式的谐振腔; 耦合到等离子体室的多个微波源，用于产生并馈送具有总微波功率Pτ的微波进入等离子体室; 用于将工艺气体进料到等离子体室中并从中除去它们的气体流动系统; 以及衬底保持器，其设置在所述等离子体室中并且包括用于支撑在其上沉积所述合成金刚石材料的衬底的支撑表面，其中所述多个微波源被配置为耦合所述总微波功率的至少30％ Pτ以初级微波共振模式频率f进入等离子体室，并且其中多个微波源中的至少一些是固态微波源。

公开(公告)号：US20170306524A1

公开(公告)日：2017-10-26

申请号：US15507539

申请日：2015-11-02

Applicant: ELEMENT SIX TECHNOLOGIES LIMITED

Inventor： ANDREW MICHAEL BENNETT ,  LAURA ANNE HUTTON ,  GEOFFREY ALAN SCARSBROOK

IPC: C30B25/20 ,  C30B33/02 ,  C30B29/04 ,  C23C16/27 ,  B23K26/38 ,  B23K15/08 ,  B23K15/00 ,  B23K26/402 ,  C30B33/04 ,  B23K26/146 ,  B23K103/00

CPC classification number: C30B25/20 ,  B23K15/0006 ,  B23K15/08 ,  B23K26/146 ,  B23K26/38 ,  B23K26/402 ,  B23K2103/50 ,  B28D1/221 ,  C23C16/27 ,  C30B29/04 ,  C30B33/02 ,  C30B33/04 ,  C30B33/06

Abstract: A method of fabricating plates of super-hard material and cutting techniques suitable for such a method. A method of fabricating a plate (14) of super-hard material, the method comprising: • providing a substrate (4) have a lateral dimension of at least 40 mm; • growing a layer of super-hard material on the substrate (4) using a chemical vapour deposition process; and • slicing one or more plates (14) of super-hard material from the substrate using a collimated cutting beam (8), the or each plate of super-hard material (14) having a lateral dimension of at least 40 mm, wherein the collimated cutting beam (8) is collimated with a half angle divergence of no more than 5 degrees.

公开(公告)号：US20190055669A1

公开(公告)日：2019-02-21

申请号：US16165868

申请日：2018-10-19

Applicant: ELEMENT SIX TECHNOLOGIES LIMITED

Inventor： HERMAN PHILIP GODFRIED ,  GEOFFREY ALAN SCARSBROOK ,  DANIEL JAMES TWITCHEN ,  EVERT PIETER HOUWMAN ,  WILHEMUS GERTRUDA MARIA NELISSEN ,  ANDREW JOHN WHITEHEAD ,  CLIVE EDWARD HALL ,  PHILIP MAURICE MARTINEAU

IPC: C30B29/04 ,  C30B9/00 ,  C30B25/16 ,  C30B33/02 ,  C01B32/25 ,  G02B1/02 ,  C30B19/02 ,  C30B25/20 ,  G02B1/00 ,  C30B25/02 ,  C30B33/12

Abstract: A CVD single crystal diamond material suitable for use in, or as, an optical device or element. It is suitable for use in a wide range of optical applications such as, for example, optical windows, laser windows, optical reflectors, optical refractors and gratings, and etalons. The CVD diamond material is produced by a CVD method in the presence of a controlled low level of nitrogen to control the development of crystal defects and thus achieve a diamond material having key characteristics for optical applications.

公开(公告)号：US20170183794A1

公开(公告)日：2017-06-29

申请号：US15374071

申请日：2016-12-09

Applicant: ELEMENT SIX TECHNOLOGIES LIMITED

Inventor： HERMAN PHILIP GODFRIED ,  GEOFFREY ALAN SCARSBROOK ,  DANIEL JAMES TWITCHEN ,  EVERT PIETER HOUWMAN ,  WILHEMUS GERTRUDA MARIA NELISSEN ,  ANDREW JOHN WHITEHEAD ,  CLIVE EDWARD HALL ,  PHILIP MAURICE MARTINEAU

IPC: C30B29/04 ,  C30B25/16 ,  G02B1/02 ,  C30B9/00 ,  C30B33/12 ,  C30B25/20 ,  C30B19/02

CPC classification number: C30B29/04 ,  C01B32/25 ,  C01P2006/60 ,  C01P2006/80 ,  C30B9/00 ,  C30B19/02 ,  C30B25/02 ,  C30B25/165 ,  C30B25/20 ,  C30B25/205 ,  C30B33/02 ,  C30B33/12 ,  G02B1/002 ,  G02B1/02

Abstract: A CVD single crystal diamond material suitable for use in, or as, an optical device or element. It is suitable for use in a wide range of optical applications such as, for example, optical windows, laser windows, optical reflectors, optical refractors and gratings, and etalons. The CVD diamond material is produced by a CVD method in the presence of a controlled low level of nitrogen to control the development of crystal defects and thus achieve a diamond material having key characteristics for optical applications.