公开(公告)号：US20240274394A1

公开(公告)日：2024-08-15

申请号：US18437572

申请日：2024-02-09

Applicant: EBARA CORPORATION

Inventor： Yasushi TOMA ,  Tsutomu KARIMATA ,  Sadashi AOTA ,  Shinsetsu FUJISAWA

IPC: H01J37/12

CPC classification number: H01J37/12 ,  H01J37/28 ,  H01J2237/038

Abstract: Provided is an insulating structure used in a vacuum for a charged particle beam device, the insulating structure including: an anode; a cathode facing the anode; and an insulator disposed between the anode and the cathode, wherein the insulator has: an insulator flat surface; and an insulator convex portion protruding from the insulator flat surface, the cathode has: a cathode flat surface; and a cathode concave portion which is recessed from the cathode flat surface and into which the insulator convex portion is fitted; the insulator flat surface and the cathode flat surface are not in contact with each other; and an outer surface of the insulator convex portion and an inner surface of the cathode concave portion are not in contact with each other.

公开(公告)号：US20200066477A1

公开(公告)日：2020-02-27

申请号：US16461109

申请日：2018-04-04

Applicant: EBARA CORPORATION

Inventor： Keisuke MATSUSHIMA ,  Tsutomu KARIMATA

IPC: H01J37/147 ,  H01F7/20 ,  H01F27/28 ,  H01F41/04

Abstract: A coil-integrated-type yoke for realizing a deflector that can accurately deflect an orbit of an electron beam and a manufacturing method thereof are provided. There is provided a manufacturing method of a coil-integrated-type yoke, the manufacturing method including: a step of sequentially inserting a molding agent, a coil, and a spacer into a groove heading from a first surface toward a second surface of the yoke; and a step of polishing the first surface of the yoke and the spacer together.

公开(公告)号：US20200273658A1

公开(公告)日：2020-08-27

申请号：US16794948

申请日：2020-02-19

Applicant: EBARA CORPORATION

Inventor： Kenji WATANABE ,  Shinichi OKADA ,  Ryo TAJIMA ,  Tsutomu KARIMATA

IPC: H01J37/147 ,  H01J37/244

Abstract: Provided is an electron beam irradiation apparatus including: an aligner configured to perform an alignment of an electron beam by deflecting the electron beam; a deflector having a plurality of electrodes and configured to deflect the electron beam after passing through the aligner; and an adjuster configured to adjust deflection caused by the aligner, wherein the adjuster is configured to perform, on each of the plurality of electrodes, detecting an image of the electron beam by applying a test voltage to one of the plurality of electrodes and applying a reference voltage to the other electrodes, determine a position shift of the electron beam based on each position of the image of the electron beam corresponding to each electrode, and adjust deflection of the aligner so as to cancel the position shift of the electron beam.

公开(公告)号：US20150340193A1

公开(公告)日：2015-11-26

申请号：US14813768

申请日：2015-07-30

Applicant: EBARA CORPORATION

Inventor： Shoji YOSHIKAWA ,  Kiwamu TSUKAMOTO ,  Takeshi MURAKAMI ,  Masahiro HATAKEYAMA ,  Tsutomu KARIMATA

IPC: H01J37/02 ,  H01J37/20 ,  H01J37/285

CPC classification number: H01J37/023 ,  G01N21/9501 ,  G01N23/2204 ,  H01J37/09 ,  H01J37/16 ,  H01J37/20 ,  H01J37/285 ,  H01J2237/022 ,  H01J2237/0264 ,  H01J2237/1501 ,  H01J2237/166 ,  H01J2237/20 ,  H01J2237/2007 ,  H01J2237/20221 ,  H01J2237/20278 ,  H01J2237/26

Abstract: An inspection apparatus capable of facilitating reduction in cost of the apparatus is provided. The inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held on a movable stage in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The inspection apparatus further includes: a linear motor that drives the movable stage; and a Helmholtz coil that causes a magnetic field for canceling a magnetic field caused by the linear motor when the movable stage is driven.

Abstract translation: 提供了能够有助于降低设备成本的检查装置。 检查装置包括：用于产生任何带电粒子和电磁波作为光束的光束产生装置; 将光束引导到保持在工作室中的可移动台上的检查对象中并用该束照射检查对象的主光学系统; 第二光学系统，其检测从检查对象发生的次级带电粒子; 以及基于检测到的二次带电粒子形成图像的图像处理系统。 检查装置还包括：驱动可动台的直线电机; 以及亥姆霍兹线圈，其在驱动可动载物台时引起磁场消除由线性马达引起的磁场。

公开(公告)号：US20230393085A1

公开(公告)日：2023-12-07

申请号：US18326051

申请日：2023-05-31

Applicant: EBARA CORPORATION

Inventor： Kenji WATANABE ,  Takeshi MURAKAMI ,  Yasushi TOMA ,  Ryo TAJIMA ,  Tsutomu KARIMATA

IPC: G01N23/2251

CPC classification number: G01N23/2251 ,  G01N2223/20 ,  G01N2223/418

Abstract: Provided is a method of evaluating a deviation of a trajectory of a primary electron beam in a primary optical system in an electron beam observation device including the primary optical system that irradiates a sample with the primary electron beam including a plurality of primary electrons and a secondary optical system that detects, by a detector, a secondary electron beam including a plurality of secondary electrons emitted from the sample irradiated with the primary electron beam.

公开(公告)号：US20190279839A1

公开(公告)日：2019-09-12

申请号：US16287268

申请日：2019-02-27

Applicant: EBARA CORPORATION

Inventor： Takashi OHARA ,  Tsutomu KARIMATA

IPC: H01J37/26 ,  F04D19/04 ,  G01N23/225 ,  F16L51/03

Abstract: A vacuum connection mechanism includes: a main body part having a first opening and a first sub opening opened symmetrically in a first direction, and a second opening and a second sub opening opened symmetrically in a second direction; a first bellows connected to the first opening and to the end of which a first flange is provided; a first sub bellows connected to the first sub opening and to the end of which a first blind flange is provided; a first supporting member coupling the first flange and the first blind flange; a second bellows connected to the second opening and to the end of which a second flange is provided; a second sub bellows connected to the second sub opening and to the end of which a second blind flange is provided; and a second supporting member coupling the second flange and the second blind flange.

公开(公告)号：US20210012997A1

公开(公告)日：2021-01-14

申请号：US16879151

申请日：2020-05-20

Applicant: EBARA CORPORATION

Inventor： Takehide HAYASHI ,  Ryo TAJIMA ,  Tatsuya KOHAMA ,  Kenji WATANABE ,  Tsutomu KARIMATA

IPC: H01J37/147 ,  H01J37/244 ,  H01J37/14 ,  H01J37/32

Abstract: An adjustment method for adjusting a path of an electron beam passing through an electron beam device including at least one unit having at least one lens and at least one aligner electrode, and a detector configured to detect the electron beam, the method including: a step of measuring, by a coordinate measuring machine, an assembly tolerance for each of a plurality of the units constituting the electron beam device; a step of determining a shift amount of the electron beam at a position of the at least one of the lenses; a step of determining an electrode condition for each of a plurality of the aligner electrodes included in the units in a manner such that a shift amount of the electron beam is to be the determined shift amount; and a step of setting each of the aligner electrodes to the corresponding determined electrode condition.

公开(公告)号：US20200027686A1

公开(公告)日：2020-01-23

申请号：US16511363

申请日：2019-07-15

Applicant: EBARA CORPORATION

Inventor： Tsutomu KARIMATA

IPC: H01J37/02

Abstract: A gate valve 1 includes: a plate 2 having an opening portion 9; a plate 3 located opposite to the plate 2; a guide space 5 formed between the plates 2, 3; and a plate 6 provided in the space 5. The plate 6 is slidable along a direction in which an opening portion 11 is offset from the opening portion 9 in the space 5 in a state in which the plate 6 is pressed by the pressing portion 13 and separated from the plate 2, and a position of the plate 6 is fixed with respect to the plate 2 in the space 5 in a state in which the plate 6 is pressed by the pressing portion 16 and is in contact with the plate 2. The pressing portions 13, 16 each have a bellows structure formed by diffusion-bonding metal plates 18 and 19 to each other.