Graphene sensor and method of fabricating the same and touch-sensitive display device
    2.
    发明授权
    Graphene sensor and method of fabricating the same and touch-sensitive display device 有权
    石墨烯传感器及其制造方法和触敏显示装置

    公开(公告)号:US09551937B2

    公开(公告)日:2017-01-24

    申请号:US14802752

    申请日:2015-07-17

    Inventor: Yunping Di Zhen Liu

    Abstract: The present disclosure provides a method of fabricating a graphene touch sensor, a graphene sensor and a touch-sensitive display device. The method comprises: forming a graphene layer on a substrate; forming a metal layer on the graphene layer; coating a photoresist layer on the metal layer; exposing the photoresist layer by using a gray-scale reticle and developing the exposed photoresist layer to obtain a photoresist completely removed region, a photoresist partially remained region, and a photoresist completely remained region; removing the metal layer located in the photoresist completely removed region; removing the graphene layer located in the photoresist completely removed region; removing the metal layer located in the photoresist partially remained region; coating a protective film on the graphene layer located in the photoresist partially remained region; striping off the remainder photoresist. The embodiment of the present disclosure avoids the alkaline developing solution and the alkaline stripping solution from contacting the graphene film to degrade the conduction of the graphene, thereby increasing yield and reducing cost.

    Abstract translation: 本公开提供了一种制造石墨烯触摸传感器,石墨烯传感器和触敏显示装置的方法。 该方法包括:在基底上形成石墨烯层; 在石墨烯层上形成金属层; 在金属层上涂覆光致抗蚀剂层; 通过使用灰度掩模版曝光光致抗蚀剂层并显影曝光的光致抗蚀剂层以获得光致抗蚀剂完全去除区域,光致抗蚀剂部分保留区域,光致抗蚀剂完全保留区域; 去除位于光致抗蚀剂完全去除区域中的金属层; 去除位于光致抗蚀剂完全去除区域中的石墨烯层; 去除位于光致抗蚀剂部分残留区域中的金属层; 在位于光致抗蚀剂部分残留区域的石墨烯层上涂覆保护膜; 剥离剩余的光刻胶。 本公开的实施方案避免了碱性显影溶液和碱性剥离溶液与石墨烯膜接触以降低石墨烯的传导,从而提高了产率并降低了成本。

    Substrate, method for manufacturing same, and display panel

    公开(公告)号:US12235558B2

    公开(公告)日:2025-02-25

    申请号:US18017413

    申请日:2022-03-31

    Abstract: Provided is a substrate. The substrate includes a base substrate; and a plurality of sub-pixel structures arranged in an array on the base substrate, wherein the sub-pixel structure comprises: a thin film transistor disposed on the base substrate, the thin film transistor comprising a source and a drain; an insulating layer disposed on a side of the thin film transistor distal from the base substrate, a first via hole being formed in the insulating layer; a pixel electrode disposed on a side of the insulating layer distal from the base substrate, the pixel electrode being electrically connected to either the source or the drain through the first via hole; and a filling block disposed at the first via hole.

    Display device, display panel and method for manufacturing same

    公开(公告)号:US11662635B2

    公开(公告)日:2023-05-30

    申请号:US17515243

    申请日:2021-10-29

    Inventor: Yunping Di

    Abstract: Provided is a display panel. The display panel includes an array substrate, a color filter substrate, and a backlight module, wherein the array substrate includes a substrate and a photoelectric sensing device, the substrate is provided with a fingerprint recognition region, and an orthographic projection of the photoelectric sensing device on the substrate is within the fingerprint recognition region. The color filter substrate is disposed opposite to the array substrate, the backlight module is disposed on a side, distal from the array substrate, of the film substrate, and light emitted from the backlight module is capable of passing through the fingerprint recognition region.

    METHOD FOR MANUFACTURING ARRAY SUBSTRATE, ARRAY SUBSTRATE AND FINGERPRINT RECOGNITION DEVICE

    公开(公告)号:US20190123073A1

    公开(公告)日:2019-04-25

    申请号:US15984810

    申请日:2018-05-21

    Inventor: Yunping Di

    Abstract: A method for manufacturing an array substrate, an array substrate, and a fingerprint recognition device. The method includes: forming a plurality of polysilicon patterns on a substrate, the plurality of polysilicon patterns including a first polysilicon pattern for forming the PIN-type diode and a second polysilicon pattern for forming the transistor, each polysilicon pattern including a first sub-region, a second sub-region, and a third sub-region between the first sub-region and the second sub-region; using a first doping process to dope the first sub-region of the first polysilicon pattern and the first sub-region and the second sub-region of the second polysilicon pattern with one of P-type ions and N-type ions respectively; and using a second doping process to dope the second sub-region of the first polysilicon pattern with the other of P-type ions and N-type ions.

    Display substrate and manufacturing method thereof, and display apparatus

    公开(公告)号:US12217651B2

    公开(公告)日:2025-02-04

    申请号:US17913258

    申请日:2021-11-04

    Abstract: A display substrate, a manufacturing method thereof and a display apparatus are provided. In the present disclosure, a first transistor group with oxide semiconductor as an active layer material is disposed on a side of a second transistor group with polysilicon as an active layer material away from the base, and an area enclosed by orthographic projections of the transistors in the first transistor group on the base is overlapped with an area enclosed by orthographic projections of the transistors in the second transistor group on the base. Stable performance of the transistors included can be ensured in a manufacturing process of the first transistor group and the second transistor group located in different layers, and at the same time, an area occupied by the driving circuit can be reduced so as to decrease a frame width of a display apparatus or improve resolution of the display apparatus.

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