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公开(公告)号：US11932939B2
公开(公告)日：2024-03-19
申请号：US17242898
申请日：2021-04-28
Applicant: APPLIED MATERIALS, INC.
Inventor： Muhammad M. Rasheed , Srinivas Gandikota , Mario Dan Sanchez , Guoqiang Jian , Yixiong Yang , Deepak Jadhav , Ashutosh Agarwal
IPC: C23C16/455 , C23C16/44 , C23C16/452 , H01J37/32
CPC classification number: C23C16/45544 , C23C16/4405 , C23C16/4408 , C23C16/4412 , C23C16/452 , C23C16/45502 , C23C16/45536 , C23C16/45565 , C23C16/45591 , H01J37/32357 , H01J37/3244 , H01J37/32449 , H01J37/32834
Abstract: Apparatus for processing a substrate are provided herein. In some embodiments, a lid for a substrate processing chamber includes: a lid plate comprising an upper surface and a contoured bottom surface, the upper surface having a central opening and the contoured bottom surface having a first portion that extends downwardly and outwardly from the central opening to a peripheral portion of the lid plate and a second portion that extends radially outward along the peripheral portion of the lid plate; an upper flange extending radially outward from the lid plate; and one or more channels formed through the lid plate from the upper surface of the lid plate to the second portion of the contoured bottom surface.
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公开(公告)号：US20200235017A1
公开(公告)日：2020-07-23
申请号：US16842429
申请日：2020-04-07
Applicant: Applied Materials, Inc.
Inventor： Deepak Jadhav
Abstract: Thermal monitors comprising a substrate with at least one camera position on a bottom surface thereof, a wireless communication controller and a battery. The camera has a field of view sufficient to produce an image of at least a portion of a wafer support, the image representative of the temperature within the field of view. Methods of using the thermal monitors are also described.
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公开(公告)号：US20180047643A1
公开(公告)日：2018-02-15
申请号：US15672886
申请日：2017-08-09
Applicant: Applied Materials, Inc.
Inventor： Deepak Jadhav
CPC classification number: H01L22/12 , G01J5/0215 , G01J5/025 , G01J5/028 , G01J5/042 , G01J2005/0077 , H01L21/67248 , H01L22/26 , H01L22/34 , H04N5/2258 , H04N5/23296 , H04N5/247 , H04N5/33
Abstract: Thermal monitors comprising a substrate with at least one camera position on a bottom surface thereof, a wireless communication controller and a battery. The camera has a field of view sufficient to produce an image of at least a portion of a wafer support, the image representative of the temperature within the field of view. Methods of using the thermal monitors are also described.
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公开(公告)号：US11043364B2
公开(公告)日：2021-06-22
申请号：US15614595
申请日：2017-06-05
Applicant: APPLIED MATERIALS, INC.
Inventor： Hanbing Wu , Anantha K. Subramani , Ashish Goel , Deepak Jadhav , Rongjun Wang , Chi Hong Ching
IPC: H01J37/34 , H01J37/32 , C23C14/34 , C23C16/458
Abstract: Embodiments of a process kit for use in a multi-cathode process chamber are disclosed herein. In some embodiments, a process kit includes a rotatable shield having a base, a conical portion extend downward and radially outward from the base, and a collar portion extending radially outward from a bottom of the conical portion; an inner deposition ring having a leg portion, a flat portion extending radially inward from the leg portion, a first recessed portion extending radially inward from the flat portion, and a first lip extending upward from an innermost section of the first recessed portion; and an outer deposition ring having a collar portion, an upper flat portion disposed above and extending radially inward from the collar portion, a second recessed portion extending inward from the upper flat portion, and a second lip extending upward from an innermost section of the second recessed portion.
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5.发明授权公开(公告)号：US09879341B2
公开(公告)日：2018-01-30
申请号：US15188103
申请日：2016-06-21
Applicant: Applied Materials, Inc.
Inventor： Kaushal K. Singh , Deepak Jadhav , Ashutosh Agarwal , Ashish Goel , Vijay Parihar , Er-Xuan Ping , Randhir P. S. Thakur
IPC: H01L21/67 , H01L21/02 , C23C16/54 , C23C14/56 , C23C16/455
CPC classification number: C23C16/45525 , C23C14/56 , C23C16/54 , H01L21/0217 , H01L21/02181 , H01L21/02381 , H01L21/02568 , H01L21/0262 , H01L21/02658 , H01L21/67167 , H01L21/6719 , H01L21/6723
Abstract: Embodiments described herein provide a remote plasma system utilizing a microwave source. Additionally, generation and deposition techniques for 2D transition metal chalcogenides with large area uniformity utilizing microwave assisted generation of radicals is disclosed. Plasma may be generated remotely utilizing the microwave source. A processing platform configured to deposit 2D transition metal chalcogenides is also disclosed.
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Patent Agency Ranking
6.发明申请公开(公告)号：US20150279635A1
公开(公告)日：2015-10-01
申请号：US14606367
申请日：2015-01-27
Applicant: Applied Materials, Inc.
Inventor： Anantha K. Subramani , Deepak Jadhav , Ashish Goel , Hanbing Wu , Prashanth Kothnur , Chi Hong Ching
CPC classification number: H01J37/3408 , C23C16/34 , C23C16/405 , H01J37/3417 , H01J37/3435 , H01J37/3447
Abstract: A deposition system, and a method of operation thereof, includes: a cathode; a shroud below the cathode; a rotating shield below the cathode for exposing the cathode through the shroud and through a shield hole of the rotating shield; and a rotating pedestal for producing a material to form a carrier over the rotating pedestal, wherein the material having a non-uniformity constraint of less than 1% of a thickness of the material and the cathode having an angle between the cathode and the carrier.
Abstract translation: 沉积系统及其操作方法包括：阴极; 阴极下方的护罩; 在阴极下面的旋转屏蔽件，用于使阴极暴露于护罩并通过旋转屏蔽的屏蔽孔; 以及用于产生在所述旋转底座上形成载体的材料的旋转底座，其中所述材料具有小于所述材料和所述阴极的厚度的1％的不均匀约束，所述材料和所述阴极在所述阴极和所述载体之间具有角度。
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公开(公告)号：US11600476B2
公开(公告)日：2023-03-07
申请号：US17503994
申请日：2021-10-18
Applicant: Applied Materials, Inc.
Inventor： Anantha K. Subramani , Deepak Jadhav , Ashish Goel , Hanbing Wu , Prashanth Kothnur , Chi Hong Ching
Abstract: A deposition system, and a method of operation thereof, includes: a cathode; a shroud below the cathode; a rotating shield below the cathode for exposing the cathode through the shroud and through a shield hole of the rotating shield; and a rotating pedestal for producing a material to form a carrier over the rotating pedestal, wherein the material having a non-uniformity constraint of less than 1% of a thickness of the material and the cathode having an angle between the cathode and the carrier.
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8.发明授权公开(公告)号：US11384432B2
公开(公告)日：2022-07-12
申请号：US14734838
申请日：2015-06-09
Applicant: APPLIED MATERIALS, INC.
Inventor： Muhammad M. Rasheed , Srinivas Gandikota , Mario Dan Sanchez , Guoqiang Jian , Yixiong Yang , Deepak Jadhav , Ashutosh Agarwal
IPC: C23C16/455 , C23C16/44 , C23C16/452 , H01J37/32
Abstract: Methods and apparatus for processing a substrate are provided herein. In some embodiments, a substrate processing chamber includes: a chamber body; a chamber lid assembly having a housing enclosing a central channel that extends along a central axis and has an upper portion and a lower portion; a lid plate coupled to the housing and having a contoured bottom surface that extends downwardly and outwardly from a central opening coupled to the lower portion of the central channel to a peripheral portion of the lid plate; and a gas distribution plate disposed below the lid plate and having a plurality of apertures disposed through the gas distribution plate.
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公开(公告)号：US11183375B2
公开(公告)日：2021-11-23
申请号：US14606367
申请日：2015-01-27
Applicant: Applied Materials, Inc.
Inventor： Anantha K. Subramani , Deepak Jadhav , Ashish Goel , Hanbing Wu , Prashanth Kothnur , Chi Hong Ching
Abstract: A deposition system, and a method of operation thereof, includes: a cathode; a shroud below the cathode; a rotating shield below the cathode for exposing the cathode through the shroud and through a shield hole of the rotating shield; and a rotating pedestal for producing a material to form a carrier over the rotating pedestal, wherein the material having a non-uniformity constraint of less than 1% of a thickness of the material and the cathode having an angle between the cathode and the carrier.
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公开(公告)号：US10651095B2
公开(公告)日：2020-05-12
申请号：US15672886
申请日：2017-08-09
Applicant: Applied Materials, Inc.
Inventor： Deepak Jadhav
IPC: H01L21/66 , H04N5/33 , H04N5/232 , G01J5/02 , H04N5/225 , G01J5/04 , H01L21/67 , H04N5/247 , G01J5/00
Abstract: Thermal monitors comprising a substrate with at least one camera position on a bottom surface thereof, a wireless communication controller and a battery. The camera has a field of view sufficient to produce an image of at least a portion of a wafer support, the image representative of the temperature within the field of view. Methods of using the thermal monitors are also described.
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