公开(公告)号：US11932939B2

公开(公告)日：2024-03-19

申请号：US17242898

申请日：2021-04-28

申请人： APPLIED MATERIALS, INC.

发明人： Muhammad M. Rasheed ,  Srinivas Gandikota ,  Mario Dan Sanchez ,  Guoqiang Jian ,  Yixiong Yang ,  Deepak Jadhav ,  Ashutosh Agarwal

IPC分类号： C23C16/455 ,  C23C16/44 ,  C23C16/452 ,  H01J37/32

CPC分类号： C23C16/45544 ,  C23C16/4405 ,  C23C16/4408 ,  C23C16/4412 ,  C23C16/452 ,  C23C16/45502 ,  C23C16/45536 ,  C23C16/45565 ,  C23C16/45591 ,  H01J37/32357 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32834

摘要： Apparatus for processing a substrate are provided herein. In some embodiments, a lid for a substrate processing chamber includes: a lid plate comprising an upper surface and a contoured bottom surface, the upper surface having a central opening and the contoured bottom surface having a first portion that extends downwardly and outwardly from the central opening to a peripheral portion of the lid plate and a second portion that extends radially outward along the peripheral portion of the lid plate; an upper flange extending radially outward from the lid plate; and one or more channels formed through the lid plate from the upper surface of the lid plate to the second portion of the contoured bottom surface.

公开(公告)号：US11767593B2

公开(公告)日：2023-09-26

申请号：US17948571

申请日：2022-09-20

申请人： Applied Materials, Inc.

发明人： Muhannad Mustafa ,  Muhammad M. Rasheed

IPC分类号： C23C16/40 ,  C23C16/455 ,  C23C16/458 ,  F16J15/02

CPC分类号： C23C16/45565 ,  C23C16/458 ,  C23C16/45557 ,  C23C16/45574 ,  F16J15/021

摘要： Gas distribution assemblies and process chambers comprising gas distribution assemblies are described. The gas distribution assembly includes a gas distribution plate, a lid and a primary O-ring. The primary O-ring is positioned between a purge channel of a first contact surface of the gas distribution plate and a second contact surface. Methods of sealing a process chamber using the disclosed gas distribution assemblies are also described.

公开(公告)号：US11719255B2

公开(公告)日：2023-08-08

申请号：US17873706

申请日：2022-07-26

申请人： Applied Materials, Inc.

发明人： Muhannad Mustafa ,  Muhammad M. Rasheed ,  Mario D. Sanchez

IPC分类号： C23C16/40 ,  F04D29/42 ,  F04D29/62 ,  C23C16/44

CPC分类号： F04D29/4286 ,  C23C16/4412 ,  F04D29/62

摘要： Pumping liners for process chambers including a first ring-shaped body and a second ring-shaped body are described. The first ring-shaped body has a first plurality of openings and the second ring-shaped body has a second plurality of openings. The first ring-shaped body and the second ring-shaped body are rotatable relative to each other around a central axis to at least partially overlap the first plurality of openings and the second plurality of openings to change the area of conductance through the openings. Methods of removing gases from a processing chamber are also described.

公开(公告)号：US11479859B2

公开(公告)日：2022-10-25

申请号：US16844601

申请日：2020-04-09

申请人： Applied Materials, Inc.

发明人： Muhannad Mustafa ,  Muhammad M. Rasheed

IPC分类号： C23C16/40 ,  C23C16/455 ,  C23C16/458 ,  F16J15/02

摘要： Gas distribution assemblies and process chamber comprising gas distribution assemblies are described. The gas distribution assembly includes a gas distribution plate, a lid and a primary O-ring. The primary O-ring is positioned between a purge channel of a first contact surface of the gas distribution plate and a second contact surface. Methods of sealing a process chamber using the disclosed gas distribution assemblies are described.

公开(公告)号：US20210395892A1

公开(公告)日：2021-12-23

申请号：US17350073

申请日：2021-06-17

申请人： Applied Materials, Inc.

发明人： Muhannad Mustafa ,  Muhammad M. Rasheed ,  Mario D. Sanchez ,  Srinivas Gandikota ,  Wei V. Tang

IPC分类号： C23C16/455 ,  C23C16/50 ,  C23C16/52

摘要： Process chamber lids, processing chambers and methods using the lids are described. The lid includes a pumping liner with a showerhead, blocker plate and gas funnel positioned therein. A liner heater is positioned on the pumping liner to control temperature in the pumping liner. Gas is flowed into the gas funnel using a dead-volume free one-way valve with a remote plasma source.

公开(公告)号：USD936187S1

公开(公告)日：2021-11-16

申请号：US29724071

申请日：2020-02-12

申请人： Applied Materials, Inc.

设计人： Muhannad Mustafa ,  Muhammad M. Rasheed

公开(公告)号：US09914632B2

公开(公告)日：2018-03-13

申请号：US14522142

申请日：2014-10-23

申请人： APPLIED MATERIALS, INC.

发明人： Ilker Durukan ,  Muhammad M. Rasheed ,  Paul F. Ma

IPC分类号： B67D7/02 ,  C23C16/448 ,  B67D7/36 ,  C23C16/44

CPC分类号： B67D7/0272 ,  B67D7/362 ,  C23C16/4409 ,  C23C16/4482

摘要： Methods and apparatus for delivering precursor materials derived from liquid chemicals to a process chamber are provided herein. In some embodiments, a liquid chemical delivery apparatus includes: a body having an inner volume to hold a liquid chemical, an inlet to receive a carrier gas into the inner volume, and an outlet to flow the carrier gas from the inner volume, wherein a bottom of the inner volume includes a reduced volume portion; and a level sensor configured to detect a level of the liquid chemical in the reduced volume portion.

公开(公告)号：US12054826B2

公开(公告)日：2024-08-06

申请号：US18224206

申请日：2023-07-20

申请人： Applied Materials, Inc.

发明人： Muhannad Mustafa ,  Muhammad M. Rasheed ,  Mario D. Sanchez ,  Anqing Cui

IPC分类号： C23C16/455 ,  C23C16/44

CPC分类号： C23C16/45544 ,  C23C16/4408

摘要： Process chamber lids having a pumping liner with a showerhead and gas funnel within an open central region are described. The showerhead is spaced a distance from the gas funnel to form a gap and the gas funnel has an opening to provide a flow of gas into the gap. The gas funnel includes a plurality of apertures extending from the front surface to a common region adjacent the back surface of the gas funnel. A purge ring is in contact with the back surface of the gas funnel and aligned so that a circular channel formed in the bottom surface of the purge ring body is positioned adjacent the common area of the apertures in the gas funnel.

公开(公告)号：US11598454B2

公开(公告)日：2023-03-07

申请号：US16750595

申请日：2020-01-23

申请人： Applied Materials, Inc.

发明人： Muhannad Mustafa ,  Muhammad M. Rasheed

IPC分类号： F16L19/02 ,  F16L19/025

摘要： Connector assemblies for holding two tubes together and methods of use are described. The connector assemblies have an inner bolt, a split outer bolt comprising at least two outer bolt sections and a clamp bolt. The clamp bolt holds the outer bolt sections together to form the split outer bolt and the inner bolt is screwed into the outer bolt to enclose the two tube ends.

公开(公告)号：US11566327B2

公开(公告)日：2023-01-31

申请号：US17100249

申请日：2020-11-20

申请人： Applied Materials, Inc.

发明人： Ilker Durukan ,  Muhammad M. Rasheed ,  Kenric Choi ,  Tatsuya Sato

IPC分类号： C23C16/40 ,  C23C16/455

摘要： Methods and apparatus to reduce pressure fluctuations in a chemical delivery system for a process chamber are provided herein. In some embodiments, a chemical delivery system for a process chamber, includes: a carrier gas supply; an ampoule fluidly coupled to the carrier gas supply via a first supply line, wherein the ampoule is configured to supply one or more process gases to the process chamber via a second supply line; an inlet valve disposed in line with the first supply line to control a flow of a carrier gas from the carrier gas supply to the ampoule; and a first control valve disposed in line with a pressure regulation line, wherein the pressure regulation line is fluidly coupled to the first supply line at a tee location between the carrier gas supply and the inlet valve.