公开(公告)号：US20240038485A1

公开(公告)日：2024-02-01

申请号：US18486106

申请日：2023-10-12

Applicant: ASML Netherlands B.V.

Inventor： Stijn Wilem Herman Karel STEENBRINK

IPC: H01J37/244 ,  H01J37/317 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/3177 ,  H01J37/28 ,  H01J2237/1516 ,  H01J2237/0453 ,  H01J2237/2817

Abstract: Disclosed herein is a charged-particle apparatus configured to inspect a sample with a charged-particle beam. The charged-particle apparatus comprises a detector assembly or an array of multipole elements. The charged-particle apparatus comprises an electronic device, a power source configured to output radiation, and a power converter configured to receive radiation from the power source, to convert the received radiation into electrical energy and to output the electrical energy to the electronic device. The power source is electrically isolated from the power converter.

公开(公告)号：US20220392729A1

公开(公告)日：2022-12-08

申请号：US17891913

申请日：2022-08-19

Applicant: ASML Netherlands B.V.

Inventor： Arjen Benjamin STORM ,  Johan Frederik Cornelis VAN GURP ,  Henri Kristian ERVASTI ,  Aaron Yang-Fay AYAL ,  Stijn Wilem Herman Karel STEENBRINK ,  Marco Jan-Jaco WIELAND

IPC: H01J9/42 ,  H01J37/244

Abstract: Disclosed herein is an electron-optical assembly testing system for testing an electron-optical assembly, the system comprising: a source of charged particles configured to emit a beam of charged particles; an electron-optical assembly holder configured to hold an electron-optical assembly to be tested such that, when the system is in use with an electron-optical assembly held by the electron-optical assembly holder, the electron-optical assembly is illuminated by the beam; and a sub-beam detector for detecting sub-beams of charged particles that have been transmitted through the electron-optical assembly.

公开(公告)号：US20230207255A1

公开(公告)日：2023-06-29

申请号：US18117373

申请日：2023-03-03

Applicant: ASML Netherlands B.V.

Inventor： Vincent Claude BEUGIN ,  Stijn Wilem Herman Karel STEENBRINK ,  Martin EBERT ,  Diego MARTINEZ NEGRETE GASQUE ,  Hindrik Willem MOOK ,  Albertus Victor Gerardus MANGNUS

IPC: H01J37/20

CPC classification number: H01J37/20 ,  H01J37/28

Abstract: Disclosed herein is a multi-beam charged particle column configured to project a multi-beam of charged particles towards a target, the multi-beam charged particle column comprising at least one aperture array comprising at least two different aperture patterns; and a rotator configured to rotate the aperture array between the different aperture patterns.

公开(公告)号：US20240029995A1

公开(公告)日：2024-01-25

申请号：US18478771

申请日：2023-09-29

Applicant: ASML Netherlands B.V.

Inventor： Stijn Wilem Herman Karel STEENBRINK

IPC: H01J37/244 ,  H01J37/10 ,  H01J37/26

CPC classification number: H01J37/244 ,  H01J37/10 ,  H01J37/265 ,  H01J2237/028 ,  H01J2237/0453 ,  H01J2237/2817 ,  H01J37/28

Abstract: Electron-optical systems comprising a particle trap and methods of operating electron-optical systems using a particle trap are disclosed. In one arrangement, a stage supports a sample. An objective lens arrangement projects electrons towards the sample along an electron-beam path. A particle trap comprises an electrode assembly radially outside of the objective lens arrangement and facing the sample. The electrode assembly draws a particle away from a surface of the sample and/or stage as the sample moves relative to the electron-beam path.

公开(公告)号：US20230352266A1

公开(公告)日：2023-11-02

申请号：US18213765

申请日：2023-06-23

Applicant: ASML Netherlands B.V.

Inventor： Stijn Wilem Herman Karel STEENBRINK ,  Johan Joost KONING ,  Jurgen VAN SOEST ,  Marco Jan-Jaco WIELAND

IPC: H01J37/12

CPC classification number: H01J37/12 ,  H01J37/28

Abstract: Disclosed herein is an electron-optical device, a lens assembly and an electron-optical column. The electron-optical device comprises an array substrate and an adjoining substrate and is configured to provide a potential difference between the substrates. An array of apertures is defined in each of the substrates for the path of electron beamlets. The array substrate has a thickness which is stepped so that the array substrate is thinner in the region corresponding to the array of apertures than another region of the array substrate.

公开(公告)号：US20220415611A1

公开(公告)日：2022-12-29

申请号：US17778036

申请日：2020-11-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Stijn Wilem Herman Karel STEENBRINK ,  Marco Jan-Jaco WIELAND ,  Albertus Victor Gerardus MANGNUS

IPC: H01J37/317 ,  H01J37/28 ,  H01J37/141 ,  H01J37/147

Abstract: A multi-source illumination apparatus for illuminating a sample with charged particles, wherein beams, from a plurality of sources, are arranged such that a beam from at least one source intersects, at a plane of a condenser lens, with at least part of one other beam from a different one of the plurality of sources. The condenser lens is configured to separately collimate the received beams from each source. A manipulator array arrangement is configured to manipulate the collimated beams to generate one or more beams, in a single column, that include charged particles from the plurality of sources. The manipulator array arrangement includes a multi-beam generator configured to receive the plurality of substantially parallel substantially collimated beams generated by the deflector array, and generate a multibeam in dependence on the received plurality of substantially parallel substantially collimated beams, wherein the multi-beam includes a plurality of substantially collimated sub-beams.