Invention Publication
- Patent Title: MULTI-BEAM CHARGED PARTICLE COLUMN
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Application No.: US18117373Application Date: 2023-03-03
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Publication No.: US20230207255A1Publication Date: 2023-06-29
- Inventor: Vincent Claude BEUGIN , Stijn Wilem Herman Karel STEENBRINK , Martin EBERT , Diego MARTINEZ NEGRETE GASQUE , Hindrik Willem MOOK , Albertus Victor Gerardus MANGNUS
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP 200741.5 2020.10.08
- Main IPC: H01J37/20
- IPC: H01J37/20
Abstract:
Disclosed herein is a multi-beam charged particle column configured to project a multi-beam of charged particles towards a target, the multi-beam charged particle column comprising at least one aperture array comprising at least two different aperture patterns; and a rotator configured to rotate the aperture array between the different aperture patterns.
Information query
