公开(公告)号：US11130142B2

公开(公告)日：2021-09-28

申请号：US16846000

申请日：2020-04-10

Applicant: APPLIED MATERIALS, INC.

Inventor： Dmitry Lubomirsky ,  Vladimir Knyazik ,  Hamid Noorbakhsh ,  Jason Della Rosa ,  Zheng John Ye ,  Jennifer Y. Sun ,  Sumanth Banda

IPC: C23C16/40 ,  B05B1/00 ,  C23C16/455 ,  H01J37/32 ,  B05B1/18

Abstract: Embodiments of showerheads having a detachable gas distribution plate are provided herein. In some embodiments, a showerhead for use in a substrate processing chamber includes a body having a first side and an opposing second side; a gas distribution plate disposed proximate the second side of the body; and a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the body, wherein the body is electrically coupled to the gas distribution plate through the clamp.

公开(公告)号：US12033881B2

公开(公告)日：2024-07-09

申请号：US17205867

申请日：2021-03-18

Applicant: Applied Materials, Inc.

Inventor： Sumanth Banda ,  Vladimir Knyazik ,  Stephen D. Prouty

IPC: H01L21/683 ,  H01L21/673 ,  H02N13/00

CPC classification number: H01L21/6833 ,  H01L21/673 ,  H02N13/00

Abstract: Semiconductor substrate support assemblies may include an electrostatic chuck body having a substrate support surface. The electrostatic chuck body may define a plurality of protrusions extending from the substrate support surface. The assemblies may include an electrode embedded within the electrostatic chuck body. The electrode may define apertures through the electrode in line with the plurality of protrusions extending from the substrate support surface.

公开(公告)号：US10607816B2

公开(公告)日：2020-03-31

申请号：US15909118

申请日：2018-03-01

Applicant: APPLIED MATERIALS, INC.

Inventor： Jason Della Rosa ,  Hamid Noorbakhsh ,  Vladimir Knyazik ,  Jisoo Kim ,  Wonseok Lee ,  Usama Dadu

IPC: C23C16/40 ,  H01J37/32

Abstract: Embodiments of showerheads having a detachable gas distribution plate are provided herein. In some embodiments, a showerhead for use in a semiconductor processing chamber may include a body having a first side and a second side opposing the first side; a gas distribution plate disposed proximate the second side of the body, wherein the gas distribution plate is formed from a material having an electrical resistivity between about 60 ohm-cm to 90 ohm-cm; a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the body; and a thermal gasket disposed in a gap between the body and gas distribution plate.

公开(公告)号：US20190311920A1

公开(公告)日：2019-10-10

申请号：US16376367

申请日：2019-04-05

Applicant: Applied Materials, Inc.

Inventor： Kallol Bera ,  Shahid Rauf ,  James Carducci ,  Vladimir Knyazik ,  Anantha K. Subramani

IPC: H01L21/67 ,  H01J37/32

Abstract: Gas distribution modules comprising a housing with an upper plenum and a lower plenum are described. One of the upper plenum and lower plenum is in fluid communication with an inlet and the other is in fluid communication with an outlet. A plurality of upper passages connects the upper plenum to the bottom of the housing to allow a flow of gas to pass through and be isolated from the first plenum.

公开(公告)号：US10163606B2

公开(公告)日：2018-12-25

申请号：US14762224

申请日：2014-02-03

Applicant: APPLIED MATERIALS, INC.

Inventor： Yan Rozenzon ,  Kyle Tantiwong ,  Imad Yousif ,  Vladimir Knyazik ,  Bojenna Keating ,  Samer Banna

IPC: H01J37/32 ,  C23C16/455

Abstract: An annular lid plate of a plasma reactor has upper and lower layers of gas distribution channels distributing gas along equal length paths from gas supply lines to respective gas distribution passages of a ceiling gas nozzle.

公开(公告)号：US20150371831A1

公开(公告)日：2015-12-24

申请号：US14762219

申请日：2014-02-03

Applicant: APPLIED MATERIALS, INC.

Inventor： Yan Rozenzon ,  Kyle Tantiwong ,  Imad Yousif ,  Vladimir Knyazik ,  Bojenna Keating ,  Samer Banna

IPC: H01J37/32

CPC classification number: H01J37/32449 ,  C23C16/45561 ,  C23C16/45563 ,  C23C16/45578 ,  H01J37/3244

Abstract: A gas injection system includes (a) a side gas plenum, (b) a plurality of N gas inlets coupled to said side gas plenum, (c) plural side gas outlets extending radially inwardly from said plenum, (d) an N-way gas flow ratio controller having N outputs coupled to said N gas inlets respectively, and (e) an M-way gas flow ratio controller having M outputs, respective ones of said M outputs coupled to said tunable gas nozzle and a gas input of said N-way gas flow ratio controller.

Abstract translation: 气体注入系统包括（a）侧气室，（b）多个与所述侧气室连通的N个气体入口，（c）从所述气室径向向内延伸的多个侧气体出口，（d）N路 具有分别与所述N个气体入口相连的N个输出的气体流量比控制器，以及（e）具有M个输出的M路气体流量比控制器，耦合到所述可调气体喷嘴的所述M个输出中的相应的M个输出端和所述N个气体入口 - 天然气流量比控制器。

公开(公告)号：US20150097479A1

公开(公告)日：2015-04-09

申请号：US14107184

申请日：2013-12-16

Applicant: APPLIED MATERIALS, INC.

Inventor： Vladimir Knyazik ,  Samer Banna ,  Kyle R. Tantiwong

IPC: H01J37/32

CPC classification number: H01J37/3211

Abstract: A low inductance coil antenna for a plasma reactor has multiple radial zones of plural conductor lobes extending radially from respective RF supply and ground rings.

Abstract translation: 用于等离子体反应器的低电感线圈天线具有从相应的RF电源和接地环径向延伸的多个导体突起的多个径向区域。

公开(公告)号：US12191118B2

公开(公告)日：2025-01-07

申请号：US18419389

申请日：2024-01-22

Applicant: Applied Materials, Inc.

Inventor： James Carducci ,  Richard C. Fovell ,  Larry D. Elizaga ,  Silverst Rodrigues ,  Vladimir Knyazik ,  Philip Allan Kraus ,  Thai Cheng Chua

IPC: H01J37/32 ,  C23C16/455 ,  C23C16/511

Abstract: Embodiments disclosed herein include a housing for a source array. In an embodiment, the housing comprises a conductive body, where the conductive body comprises a first surface and a second surface opposite from the first surface. In an embodiment a plurality of openings are formed through the conductive body and a channel is disposed into the second surface of the conductive body. In an embodiment, a cover is over the channel, and the cover comprises first holes that pass through a thickness of the cover. In an embodiment, the housing further comprises a second hole through a thickness of the conductive body. In an embodiment, the second hole intersects with the channel.

公开(公告)号：US11728141B2

公开(公告)日：2023-08-15

申请号：US17590681

申请日：2022-02-01

Applicant: Applied Materials, Inc.

Inventor： Yan Rozenzon ,  Kyle Tantiwong ,  Imad Yousif ,  Vladimir Knyazik ,  Bojenna Keating ,  Samer Banna

IPC: H01J37/32 ,  C23C16/455

CPC classification number: H01J37/3244 ,  C23C16/4558 ,  C23C16/45561 ,  C23C16/45578 ,  H01J37/32082

Abstract: A gas distribution hub for a plasma chamber. The hub has a nozzle including a plurality of inner gas injection passage and a plurality of outer gas injection passages. The first plurality of gas injection passages are angularly spaced-apart arcuate channels at a first radial distance from a center of the hub, and the second plurality of gas injection passages are angularly spaced apart arcuate channels at a different second radial distance from the center of the hub.

公开(公告)号：US11244811B2

公开(公告)日：2022-02-08

申请号：US16226536

申请日：2018-12-19

Applicant: Applied Materials, Inc.

Inventor： Yan Rozenzon ,  Kyle Tantiwong ,  Imad Yousif ,  Vladimir Knyazik ,  Bojenna Keating ,  Samer Banna

IPC: H01J37/32 ,  C23C16/455

Abstract: An annular lid plate of a plasma reactor has upper and lower layers of gas distribution channels distributing gas along equal length paths from gas supply lines to respective gas distribution passages of a ceiling gas nozzle.