Invention Grant
- Patent Title: Plasma reactor with highly symmetrical four-fold gas injection
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Application No.: US16226536Application Date: 2018-12-19
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Publication No.: US11244811B2Publication Date: 2022-02-08
- Inventor: Yan Rozenzon , Kyle Tantiwong , Imad Yousif , Vladimir Knyazik , Bojenna Keating , Samer Banna
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: H01J37/32
- IPC: H01J37/32 ; C23C16/455
Abstract:
An annular lid plate of a plasma reactor has upper and lower layers of gas distribution channels distributing gas along equal length paths from gas supply lines to respective gas distribution passages of a ceiling gas nozzle.
Public/Granted literature
- US20190122861A1 Plasma Reactor with Highly Symmetrical Four-Fold Gas Injection Public/Granted day:2019-04-25
Information query
