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公开(公告)号：US20190323141A1
公开(公告)日：2019-10-24
申请号：US16386456
申请日：2019-04-17
发明人： Kyle M. Hanson , Manjunatha Vishwanatha Adagoor , Karthikeyan Balaraman , Karthick Vasu , Shailesh Chouriya
摘要： Electroplating system seals may include an annular busbar characterized by an inner annular radius and an outer annular radius. The annular busbar may include a plurality of contact extensions. The seals may include an external seal member characterized by an inner annular radius and an outer annular radius. The external seal member may be vertically aligned with and extend inward of the contact extensions at the inner annular radius of the external seal member. The external seal member may include an interior surface at least partially facing the contact extensions. The seals may also include an internal seal member extending a first distance along the interior surface of the external seal member from the inner annular radius. The internal seal member may include a deformable material configured to support a substrate between the internal seal member and the plurality of contact extensions.
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公开(公告)号：US20210391149A1
公开(公告)日：2021-12-16
申请号：US16898259
申请日：2020-06-10
发明人： Philip Allan Kraus , Robert Moore , James Carducci , Richard Fovell , Sathya Swaroop Ganta , Karthikeyan Balaraman , Silverst Rodrigues
IPC分类号： H01J37/32
摘要： Embodiments disclosed herein include a modular microwave source array. In an embodiment, a housing assembly for the source array comprises a first conductive layer, wherein the first conductive layer comprises a first coefficient of thermal expansion (CTE), and a second conductive layer over the first conductive layer, wherein the second conductive layer comprises a second CTE that is different than the first CTE. In an embodiment, the housing assembly further comprises a plurality of openings through the housing assembly, where each opening passes through the first conductive layer and the second conductive layer.
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公开(公告)号：US11810766B2
公开(公告)日：2023-11-07
申请号：US16401871
申请日：2019-05-02
发明人： Karthikeyan Balaraman , Sathyanarayana Bindiganavale , Rajasekhar Patibandla , Balamurugan Ramasamy , Kartik Shah , Umesh M. Kelkar , Mats Larsson , Kevin A. Papke , William M. Lu
CPC分类号： H01J37/32477 , C23C14/0641 , C23C14/16 , C23C16/06 , C23C16/34 , H01L21/68757
摘要： Embodiments of the present disclosure are directed towards a protective multilayer coating for process chamber components exposed to temperatures from about 20° C. to about 300° C. during use of the process chamber. The protective multilayer coating comprises a bond layer and a top layer, the bond layer is formed on a chamber component to reduce the stress between the top layer and the chamber component. The reduced stress decreases or prevents particle shedding from the top layer of the multilayer coating during and after use of the process chamber. The bond layer comprises titanium, titanium nitride, aluminum, or combinations thereof, and the top layer comprises tungsten nitride.
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公开(公告)号：US11586160B2
公开(公告)日：2023-02-21
申请号：US17360652
申请日：2021-06-28
发明人： Kartik B Shah , Satish Radhakrishnan , Karthik Ramanathan , Karthikeyan Balaraman , Adolph Miller Allen , Xinyuan Chong , Mitrabhanu Sahu , Wenjing Xu , Michael Sterling Jackson , Weize Hu , Feng Chen
摘要： Methods and systems for reducing substrate particle scratching using machine learning are provided. A machine learning model is trained to predict process recipe settings for a substrate temperature control process to be performed for a current substrate at a manufacturing system. First training data and second training data are generated for the machine learning model. The first training data includes historical data associated with prior process recipe settings for a prior substrate temperature control process performed for a prior substrate at a prior process chamber. The second training data is associated with a historical scratch profile of one or more surfaces of the prior substrate after performance of the prior substrate temperature control process according to the prior process recipe settings. The first training data and the second training data are provided to train the machine learning model to predict which process recipe settings for the substrate temperature control process to be performed for the current substrate correspond to a target scratch profile for one or more surfaces of the current substrate.
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公开(公告)号：US11835927B2
公开(公告)日：2023-12-05
申请号：US18068469
申请日：2022-12-19
发明人： Kartik B Shah , Satish Radhakrishnan , Karthik Ramanathan , Karthikeyan Balaraman , Adolph Miller Allen , Xinyuan Chong , Mitrabhanu Sahu , Wenjing Xu , Michael Sterling Jackson , Weize Hu , Feng Chen
CPC分类号： G05B13/0265 , G05B13/048
摘要： Process recipe data associated a process to be performed for a substrate at a process chamber is provided as input to a trained machine learning model. A set of process recipe settings for the process that minimizes scratching on one or more surfaces of the substrate is determined based on one or more outputs of the machine learning model. The process is performed for the substrate at the process chamber in accordance with the determined set of process recipe settings.
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公开(公告)号：US11591689B2
公开(公告)日：2023-02-28
申请号：US16791264
申请日：2020-02-14
发明人： Mats Larsson , Kevin A. Papke , Chirag Shaileshbhai Khairnar , Rajasekhar Patibandla , Karthikeyan Balaraman , Balamurugan Ramasamy , Kartik Shah , Umesh M. Kelkar
IPC分类号： C23C16/02 , C23C16/40 , C23C16/56 , C23C16/513 , C23C16/44 , C04B35/18 , C04B35/44 , C04B35/10 , C04B35/20 , C04B35/505 , C04B35/14 , C04B35/04 , C04B35/16 , C04B35/01 , C04B35/195
摘要： One embodiment of the disclosure provides a method of fabricating a chamber component with a coating layer disposed on an interface layer with desired film properties. In one embodiment, a method of fabricating a coating material includes providing a base structure comprising an aluminum or silicon containing material, forming an interface layer on the base structure, wherein the interface layer comprises one or more elements from at least one of Ta, Al, Si, Mg, Y, or combinations thereof, and forming a coating layer on the interface layer, wherein the coating layer has a molecular structure of SivYwMgxAlyOz. In another embodiment, a chamber component includes an interface layer disposed on a base structure, wherein the interface layer is selected from at least one of Ta, Al, Si, Mg, Y, or combinations thereof, and a coating layer disposed on the interface layer, wherein the coating layer has a molecular structure of SivYwMgxAlyOz.
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公开(公告)号：US20220413452A1
公开(公告)日：2022-12-29
申请号：US17360652
申请日：2021-06-28
发明人： Kartik B. Shah , Satish Radhakrishnan , Karthik Ramanathan , Karthikeyan Balaraman , Adolph Miller Allen , Xinyuan Chong , Mitrabhanu Sahu , Wenjing Xu , Michael Sterling Jackson , Weize Hu , Feng Chen
摘要： Methods and systems for reducing substrate particle scratching using machine learning are provided. A machine learning model is trained to predict process recipe settings for a substrate temperature control process to be performed for a current substrate at a manufacturing system. First training data and second training data are generated for the machine learning model. The first training data includes historical data associated with prior process recipe settings for a prior substrate temperature control process performed for a prior substrate at a prior process chamber. The second training data is associated with a historical scratch profile of one or more surfaces of the prior substrate after performance of the prior substrate temperature control process according to the prior process recipe settings. The first training data and the second training data are provided to train the machine learning model to predict which process recipe settings for the substrate temperature control process to be performed for the current substrate correspond to a target scratch profile for one or more surfaces of the current substrate.
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公开(公告)号：US12033835B2
公开(公告)日：2024-07-09
申请号：US16898259
申请日：2020-06-10
发明人： Philip Allan Kraus , Robert Moore , James Carducci , Richard Fovell , Sathya Swaroop Ganta , Karthikeyan Balaraman , Silverst Rodrigues
IPC分类号： H01J37/32
CPC分类号： H01J37/32467 , H01J37/3222 , H01J37/3244 , H01J37/32513
摘要： Embodiments disclosed herein include a modular microwave source array. In an embodiment, a housing assembly for the source array comprises a first conductive layer, wherein the first conductive layer comprises a first coefficient of thermal expansion (CTE), and a second conductive layer over the first conductive layer, wherein the second conductive layer comprises a second CTE that is different than the first CTE. In an embodiment, the housing assembly further comprises a plurality of openings through the housing assembly, where each opening passes through the first conductive layer and the second conductive layer.
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公开(公告)号：US20230121513A1
公开(公告)日：2023-04-20
申请号：US18068469
申请日：2022-12-19
发明人： Kartik B. Shah , Satish Radhakrishnan , Karthik Ramanathan , Karthikeyan Balaraman , Adolph Miller Allen , Xinyuan Chong , Mitrabhanu Sahu , Wenjing Xu , Michael Sterling Jackson , Weize Hu , Feng Chen
摘要： Process recipe data associated a process to be performed for a substrate at a process chamber is provided as input to a trained machine learning model. A set of process recipe settings for the process that minimizes scratching on one or more surfaces of the substrate is determined based on one or more outputs of the machine learning model. The process is performed for the substrate at the process chamber in accordance with the determined set of process recipe settings.
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公开(公告)号：US11274377B2
公开(公告)日：2022-03-15
申请号：US16386456
申请日：2019-04-17
发明人： Kyle M. Hanson , Manjunatha Vishwanatha Adagoor , Karthikeyan Balaraman , Karthick Vasu , Shailesh Chouriya
摘要： Electroplating system seals may include an annular busbar characterized by an inner annular radius and an outer annular radius. The annular busbar may include a plurality of contact extensions. The seals may include an external seal member characterized by an inner annular radius and an outer annular radius. The external seal member may be vertically aligned with and extend inward of the contact extensions at the inner annular radius of the external seal member. The external seal member may include an interior surface at least partially facing the contact extensions. The seals may also include an internal seal member extending a first distance along the interior surface of the external seal member from the inner annular radius. The internal seal member may include a deformable material configured to support a substrate between the internal seal member and the plurality of contact extensions.
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