REFERENCE CALIBRATION FOR AN ADAPTIVE OPTICS SYSTEM
    1.
    发明申请
    REFERENCE CALIBRATION FOR AN ADAPTIVE OPTICS SYSTEM 有权
    自适应光学系统的参考校准

    公开(公告)号:US20160246053A1

    公开(公告)日:2016-08-25

    申请号:US15142238

    申请日:2016-04-29

    发明人: Per KNUTSSON

    摘要: A method of determining a reference calibration setting for an adaptive optics system (1) comprising a detecting device (8) for detecting light from an object (5); and at least one controllable wavefront modifying device (9) arranged such that light from the object (5) passes via the wavefront modifying device (9) to the detecting device (8). The method comprises the steps of: arranging (100) a light-source between the object (5) and the wavefront modifying device (9) to provide a reference light beam to the detecting device (8) via the wavefront modifying device; for each of a plurality of orthogonal wavefront modes of the wavefront modifying device: controlling (101) the wavefront modifying device to vary a magnitude of the orthogonal wavefront mode over a predetermined number of magnitude settings; acquiring (102) a series of readings of the detecting device, each reading corresponding to one of the magnitude settings; determining (103) a quality metric value indicative of an information content of the reading for each reading in the series of readings, resulting in a series of quality metric values; and determining (106) a reference parameter set for the wavefront modifying device corresponding to an optimum quality metric value based on the series of quality metric values.

    摘要翻译: 一种确定用于自适应光学系统(1)的参考校准设置的方法,包括用于检测来自对象(5)的光的检测装置(8); 以及至少一个可控波前修正设备(9),其布置成使得来自对象(5)的光经由波前修改设备(9)经过检测设备(8)。 该方法包括以下步骤:在对象(5)和波前修改设备(9)之间布置(100)光源,以通过波前修改设备向检测设备(8)提供参考光束; 对于波前修改设备的多个正交波阵面模式中的每一个:控制(101)波前修改设备以在预定数量的幅度设置上改变正交波阵面模式的幅度; 获取(102)所述检测装置的一系列读数,每个读数对应于所述幅度设置之一; 确定(103)指示所述阅读系列中每次阅读的阅读的信息内容的质量度量值,得到一系列质量度量值; 以及基于所述一系列质量度量值,确定(106)对应于最佳质量度量值的波前修正设备的参考参数集。

    Display device with metal-organic mixed layer anodes
    4.
    发明申请
    Display device with metal-organic mixed layer anodes 有权
    具有金属 - 有机混合阳极的显示装置

    公开(公告)号:US20060263628A1

    公开(公告)日:2006-11-23

    申请号:US11133977

    申请日:2005-05-20

    IPC分类号: H01L51/52 H05B33/26

    摘要: A display device comprises an anode, a cathode, and a luminescent region disposed between the anode and the cathode, wherein the anode comprises a metal-organic mixed layer operatively combined with an electron-accepting material. An anode may comprise a mixture of a metal-organic mixed layer and an electron-accepting material within a single layer of the anode. Alternatively, the anode may have a multilayer configuration comprising a metal-organic mixed layer and a buffer layer adjacent the metal-organic mixed layer, wherein the buffer layer comprises an electron-accepting material and optionally a hole transport material.

    摘要翻译: 显示装置包括阳极,阴极和设置在阳极和阴极之间的发光区域,其中阳极包括与电子接受材料可操作地组合的金属 - 有机混合层。 阳极可以包括在阳极的单层内的金属 - 有机混合层和电子接受材料的混合物。 或者,阳极可以具有包括金属 - 有机混合层和与金属 - 有机混合层相邻的缓冲层的多层构造,其中缓冲层包括电子接受材料和任选的空穴传输材料。

    REFERENCE CALIBRATION FOR AN ADAPTIVE OPTICS SYSTEM
    5.
    发明申请
    REFERENCE CALIBRATION FOR AN ADAPTIVE OPTICS SYSTEM 有权
    自适应光学系统的参考校准

    公开(公告)号:US20140233087A1

    公开(公告)日:2014-08-21

    申请号:US14349093

    申请日:2012-10-04

    发明人: Per Knutsson

    IPC分类号: G02F1/19

    摘要: A method of determining a reference calibration setting for an adaptive optics system (1) comprising a detecting device (8) for detecting light from an object (5); and at least one controllable wavefront modifying device (9) arranged such that light from the object (5) passes via the wavefront modifying device (9) to the detecting device (8). The method comprises the steps of: arranging (100) a light-source between the object (5) and the wavefront modifying device (9) to provide a reference light beam to the detecting device (8) via the wavefront modifying device; for each of a plurality of orthogonal wavefront modes of the wavefront modifying device: controlling (101) the wavefront modifying device to vary a magnitude of the orthogonal wavefront mode over a predetermined number of magnitude settings; acquiring (102) a series of readings of the detecting device, each reading corresponding to one of the magnitude settings; determining (103) a quality metric value indicative of an information content of the reading for each reading in the series of readings, resulting in a series of quality metric values; and determining (106) a reference parameter set for the wavefront modifying device corresponding to an optimum quality metric value based on the series of quality metric values.

    摘要翻译: 一种确定用于自适应光学系统(1)的参考校准设置的方法,包括用于检测来自对象(5)的光的检测装置(8); 以及至少一个可控波前修正设备(9),其布置成使得来自对象(5)的光经由波前修改设备(9)经过检测设备(8)。 该方法包括以下步骤:在对象(5)和波前修改设备(9)之间布置(100)光源,以通过波前修改设备向检测设备(8)提供参考光束; 对于波前修改设备的多个正交波阵面模式中的每一个:控制(101)波前修改设备以在预定数量的幅度设置上改变正交波阵面模式的幅度; 获取(102)所述检测装置的一系列读数,每个读数对应于所述幅度设置之一; 确定(103)指示所述阅读系列中每次阅读的阅读的信息内容的质量度量值,得到一系列质量度量值; 以及基于所述一系列质量度量值,确定(106)对应于最佳质量度量值的波前修正设备的参考参数集。

    Contactless system and method for detecting defective points on a chargeable surface
    9.
    发明申请
    Contactless system and method for detecting defective points on a chargeable surface 有权
    用于检测可充电表面上的缺陷点的非接触式系统和方法

    公开(公告)号:US20070080693A1

    公开(公告)日:2007-04-12

    申请号:US11247576

    申请日:2005-10-11

    IPC分类号: G01N27/60

    CPC分类号: G03G15/751 G03G15/55

    摘要: A method for detecting charge defect spots (CDSs) on a chargeable surface is provided, including charging the chargeable surface to receive and hold a first voltage charge, spacing a surface of a scanner probe a distance from the chargeable surface, the scanner probe having a diameter, and biasing the scanner probe to a second voltage charge within a predetermined voltage threshold of the first voltage charge, wherein a parallel plate capacitor is established with the chargeable surface and a dielectric substance between the scanner probe and the chargeable surface. The method further includes reading with the scanner probe potentials associated with charges induced from the applied charges and any CDSs on the chargeable surface, including sensing the potentials and generating a signal corresponding to the sensing, applying a reference charge to the chargeable surface, and determining the potential of a CDS on the chargeable surface based on the scanner probe readings and at least one of the applied charges, which includes correcting for non-uniform charge distribution caused by a point-like nature of the CDS on the chargeable surface.

    摘要翻译: 提供了一种用于检测可充电表面上的电荷缺陷点(CDS)的方法,包括对可充电表面充电以接收和保持第一电荷电荷,将扫描器探针的表面与可充电表面间隔一定距离,扫描仪探针具有 并且将扫描仪探针偏置到第一电压电荷的预定电压阈值内的第二电压电荷,其中与可充电表面建立平行板电容器,并且在扫描仪探针与可充电表面之间建立介电物质。 该方法还包括利用扫描器探针电位读取与所施加的电荷和可计费表面上的任何CDS相关的电荷,包括感测电位并产生对应于感测的信号,向可计费表面施加参考电荷,以及确定 基于扫描器探针读数和所施加的电荷中的至少一个,可充电表面上的CDS的电位,其包括校正由可充电表面上的CDS的点状特性引起的不均匀的电荷分布。