公开(公告)号：US10317346B2

公开(公告)日：2019-06-11

申请号：US14241951

申请日：2012-08-30

申请人： Tomoharu Fujiwara

发明人： Tomoharu Fujiwara

IPC分类号： G03B27/54 ,  G01N21/95 ,  G02B26/06 ,  G03F7/20 ,  G06T7/00 ,  G01N21/55

摘要： A method for inspecting a spatial light modulator includes: performing such control that in an inspection target area in an array of mirror elements, the mirror elements in a first state in which incident light is given a phase change amount of 0 and the mirror elements in a second state in which incident light is given a phase change amount of 180° (π) become arrayed in a checkered pattern; guiding light having passed the inspection target area to a projection optical system with a resolution limit coarser than a width of an image of one mirror element, to form a spatial image; and inspecting a characteristic of the spatial light modulator from the spatial image. This method allows us to readily perform the inspection of the characteristic of the spatial light modulator having the array of optical elements.

公开(公告)号：US09335639B2

公开(公告)日：2016-05-10

申请号：US13317169

申请日：2011-10-12

申请人： Kenichi Shiraishi ,  Ryuichi Hoshika ,  Tomoharu Fujiwara

发明人： Kenichi Shiraishi ,  Ryuichi Hoshika ,  Tomoharu Fujiwara

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70608 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70858

摘要： A liquid immersion device that has an mixing mechanism that mixes and dissolves a predetermined substance for adjusting specific resistance of the liquid, which is supplied onto a liquid repellent film on the surface of an object (member) of a projection optical system placed on the light emitting side of projection optical system, and an liquid immersion area is formed by supplying the liquid in which the predetermined liquid is dissolved onto the liquid repellent film.

摘要翻译： 一种液浸装置，其具有混合并溶解用于调节液体的电阻率的预定物质的混合机构，所述混合机构被供给到放置在所述光上的投影光学系统的物体（构件）的表面上的防液膜 投影光学系统的发射侧，并且通过将预定液体溶解在其上的液体供应到防液膜上而形成液浸区域。

公开(公告)号：US09291814B2

公开(公告)日：2016-03-22

申请号：US13825634

申请日：2011-09-16

申请人： Soichi Owa ,  Yoji Watanabe ,  Tomoharu Fujiwara

发明人： Soichi Owa ,  Yoji Watanabe ,  Tomoharu Fujiwara

IPC分类号： G03B27/72 ,  G03B27/54 ,  G02B26/00 ,  G02B26/06 ,  G02B5/09 ,  G02B27/42 ,  G03F7/20

CPC分类号： G03F7/70191 ,  G02B5/09 ,  G02B7/1821 ,  G02B26/06 ,  G02B26/0833 ,  G02B27/425 ,  G03F7/70291

摘要： A spatial light modulator has a plurality of mirror elements each of which is controllable into a first state in which the mirror element reflects incident light with a change in a phase thereof by a first phase and a second state in which the mirror element reflects the incident light with a change in the phase thereof by a second phase 180° different from the first phase; and a boundary portion arranged between the mirror elements, which changes the phase of the incident light by a third phase substantially (90°+k·180°) (where k is an integer) different from the first phase. In projecting a pattern with the use of the spatial light modulator, an error caused in the pattern can be reduced even if the light quantity of light passing a gap region between the optical elements in the spatial light modulator is large.

摘要翻译： 空间光调制器具有多个反射镜元件，每个反射镜元件可控制到第一状态，其中反射镜元件将入射光的相位改变为第一相位和第二状态，反射镜元件反射入射光 光的相位相差不同于第一相的第二相180°; 以及布置在镜元件之间的边界部分，其使入射光的相位基本上与第一相位不同的第三相位（90°+ k·180°）（其中k是整数）改变。 在使用空间光调制器投射图案时，即使通过空间光调制器中的光学元件之间的间隙区域的光的光量大，也可以减小图案中引起的误差。

公开(公告)号：US08941808B2

公开(公告)日：2015-01-27

申请号：US12155714

申请日：2008-06-09

申请人： Katsushi Nakano ,  Masahiko Okumura ,  Tarou Sugihara ,  Takeyuki Mizutani ,  Tomoharu Fujiwara

发明人： Katsushi Nakano ,  Masahiko Okumura ,  Tarou Sugihara ,  Takeyuki Mizutani ,  Tomoharu Fujiwara

IPC分类号： G03B27/52 ,  G03F7/20 ,  G03F7/38

CPC分类号： G03F7/2041 ,  G03F7/38 ,  G03F7/70341 ,  G03F7/70925

摘要： An immersion type lithographic apparatus includes at least one immersion space and an immersion system configured to at least partially fill the immersion space with a liquid. The apparatus is configured to rinse at least part of the immersion space with a rinsing liquid before the apparatus is used to project a patterned beam of radiation onto a substrate.

摘要翻译： 浸没型光刻设备包括至少一个浸没空间和浸没系统，其被配置为至少部分地用液体填充浸没空间。 该装置被配置为在装置用于将图案化的辐射束投射到基板之前用冲洗液冲洗至少部分浸没空间。

公开(公告)号：US08724077B2

公开(公告)日：2014-05-13

申请号：US13299891

申请日：2011-11-18

申请人： Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Tomoharu Fujiwara ,  Soichi Owa ,  Akihiro Miwa

发明人： Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Tomoharu Fujiwara ,  Soichi Owa ,  Akihiro Miwa

IPC分类号： G03B27/32 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/70858 ,  G03F7/70891

摘要： An exposure apparatus includes an immersion space forming member (70) which fills an optical path space (K1) for exposure light (EL) with a first liquid (LQ) to form an immersion space, and a temperature regulating mechanism (60) which suppresses a change in the temperature of the immersion space forming member (70) accompanying deactivation of formation of the immersion space.

摘要翻译： 曝光装置包括：浸没空间形成部件，其用第一液体（LQ）填充曝光用光（EL）的光路空间（K1），形成浸渍空间;以及温度调节机构（60），其抑制 伴随着形成浸入空间的失活，浸渍空间形成部件（70）的温度变化。

公开(公告)号：US20130314683A1

公开(公告)日：2013-11-28

申请号：US13993145

申请日：2011-09-22

申请人： Yoji Watanabe ,  Soichi Owa ,  Tomoharu Fujiwara

发明人： Yoji Watanabe ,  Soichi Owa ,  Tomoharu Fujiwara

IPC分类号： G02B26/06

CPC分类号： G03F7/70425 ,  G02B26/06 ,  G02B26/0841 ,  G03F7/70291 ,  G03F7/70508

摘要： A method of driving a spatial light modulator includes: setting, in an array of mirror elements, mirror elements in a first state for turning incident light into reflected light with the same phase as that of the incident light or with a phase different by a first phase from that of the incident light and mirror elements in a second state for turning incident light into reflected light with a phase different approximately 180° from the first phase to an arrangement with a first phase distribution; and setting, in the array of mirror elements, the first mirror elements and the second mirror elements to an arrangement with a second phase distribution which is an inversion of the first phase distribution.

摘要翻译： 一种驱动空间光调制器的方法包括：以镜像元件的阵列设置在第一状态下的镜元件，用于将入射光转换成具有与入射光相同相位的反射光或具有与第一 与来自第一状态的入射光和反射镜元件的入射光和反射镜元件的相位相反，用于将入射光以与第一相位不同大约180°的相位转换成具有第一相位分布的布置的反射光; 并且将所述第一反射镜元件和所述第二反射镜元件的阵列中的所述第一反射镜元件和所述第二反射镜元件设置为具有所述第一相位分布的反转的第二相位分布的布置。

公开(公告)号：US20120225388A1

公开(公告)日：2012-09-06

申请号：US13227178

申请日：2011-09-07

申请人： Toshikazu UMATATE ,  Soichi OWA ,  Tomoharu FUJIWARA

发明人： Toshikazu UMATATE ,  Soichi OWA ,  Tomoharu FUJIWARA

IPC分类号： G03F7/20 ,  B44C1/22

CPC分类号： G03F7/70466 ,  H01L21/0337 ,  H01L21/0338 ,  H01L21/31144 ,  H01L21/76816

摘要： In a pattern forming method, a first L & S pattern is formed on a wafer; a first protective layer, a second L & S pattern having a perpendicular periodic direction to that of the first L & S pattern, and a photoresist layer are formed to cover the first L & S pattern; a third pattern having first apertures is formed in the photoresist layer to be overlapped with a part of the second L & S pattern; second apertures are formed in the first protective layer via the first apertures; and a part of the first L & S pattern is removed via the second apertures. Accordingly, a pattern including a non-periodic portion finer than a resolution limit of an exposure apparatus is formed.

摘要翻译： 在图案形成方法中，在晶片上形成第一L＆S图案; 第一保护层，具有与第一L＆S图案的垂直周期方向的第二L＆S图案和光致抗蚀剂层形成以覆盖第一L＆S图案; 在光致抗蚀剂层中形成具有第一孔的第三图案，以与第二L＆S图案的一部分重叠; 经由第一孔形成在第一保护层中的第二孔; 并且通过第二孔除去第一L＆S图案的一部分。 因此，形成包括比曝光装置的分辨率极限更细的非周期性部分的图案。

公开(公告)号：US20100045949A1

公开(公告)日：2010-02-25

申请号：US12461370

申请日：2009-08-10

申请人： Katsushi Nakano ,  Tomoharu Fujiwara

发明人： Katsushi Nakano ,  Tomoharu Fujiwara

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： An exposure apparatus exposes a substrate with exposure light that passes through a liquid. The exposure apparatus comprises: a porous member that has a first surface, which is capable of opposing an object disposed at an irradiation position of the exposure light, and a second surface, which is opposite the first surface, and forms a first space that is capable of holding the liquid between the first surface and the object; a supply port, which is capable of supplying the liquid to the first space; a prescribed member, which forms a second space that faces the second surface; an adjusting apparatus, which is capable of decreasing a pressure in the second space such that the liquid in the first space moves to the second space via holes in the porous member; and a control apparatus, which controls an operation of supplying the liquid via the supply ports and a pressure adjustment operation performed by the adjusting apparatus. The control apparatus repetitively executes a first operation, which supplies the liquid to the first space, and a second operation, which stops the supply of the liquid to the first space and negatively pressurizes the second space such that the liquid is substantially eliminated from the first space, to clean the porous member.

摘要翻译： 曝光装置用通过液体的曝光光使基板曝光。 曝光装置包括：多孔构件，其具有能够与设置在曝光光的照射位置的物体相对的第一表面和与第一表面相对的第二表面，并形成第一空间， 能够将液体保持在第一表面和物体之间; 供给口，其能够将液体供给到第一空间; 规定的构件，其形成面向第二表面的第二空间; 调节装置，其能够降低第二空间中的压力，使得第一空间中的液体经由多孔构件中的孔移动到第二空间; 以及控制装置，其控制经由供给口供给液体的动作和由所述调整装置进行的压力调整动作。 控制装置重复执行向第一空间供给液体的第一操作和停止向第一空间供给液体并对第二空间进行负压的第二操作，使得液体基本上从第一空间 空间，以清洁多孔构件。

公开(公告)号：US20090323035A1

公开(公告)日：2009-12-31

申请号：US11915886

申请日：2007-06-30

申请人： Tomoharu Fujiwara

发明人： Tomoharu Fujiwara

IPC分类号： G03B27/42 ,  G03B27/32

CPC分类号： G03F7/70341 ,  G03F7/70066 ,  G03F7/70925

摘要： An exposure apparatus (EX) includes a setting apparatus (45) that sets an irradiation region (AR) of exposure light (EL) in a first state in which the irradiation light (EL) is irradiated onto a substrate (P) and irradiates, in a second state in which the exposure light (EL) is not irradiated onto the substrate (P), the exposure light (EL) onto a second region, which is different from a first region through which the exposure light (EL) passes in the first state, of a first surface of an optical member (FL) that is contacted with a liquid (LQ), to clean the second region by photochemical action.

摘要翻译： 曝光装置（EX）包括设置装置（45），其将照射光（EL）照射在基板（P）上的第一状态下设定曝光用光（EL）的照射区域（AR） 在曝光光（EL）不照射到基板（P）上的第二状态下，曝光光（EL）到不同于曝光光（EL）通过的第一区域的第二区域上 与液体（LQ）接触的光学部件（FL）的第一表面的第一状态，通过光化学作用清洁第二区域。

公开(公告)号：US20090305150A1

公开(公告)日：2009-12-10

申请号：US11919352

申请日：2006-04-28

申请人： Kenichi Shiraishi ,  Tomoharu Fujiwara

发明人： Kenichi Shiraishi ,  Tomoharu Fujiwara

IPC分类号： G03F7/20 ,  G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/2041

摘要： An exposure method comprises: forming an immersion region on a substrate; exposing the substrate by irradiating the substrate with an exposure light via a liquid of the immersion region; and preventing an integration value of a contact time during which the liquid of the immersion region and a first region on the substrate are in contact, from exceeding a predetermined tolerance value.

摘要翻译： 曝光方法包括：在基板上形成浸渍区域; 通过用浸渍区域的液体用曝光光照射基板来曝光基板; 并且防止浸没区域的液体和基板上的第一区域接触的接触时间的积分值超过预定的公差值。