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    Exposure method, exposure apparatus, and device manufacturing method
    1.
    发明授权
    Exposure method, exposure apparatus, and device manufacturing method 有权
    曝光方法，曝光装置和装置制造方法

    公开(公告)号：US09335639B2

    公开(公告)日：2016-05-10

    申请号：US13317169

    申请日：2011-10-12

    申请人： Kenichi Shiraishi ,  Ryuichi Hoshika ,  Tomoharu Fujiwara

    发明人： Kenichi Shiraishi ,  Ryuichi Hoshika ,  Tomoharu Fujiwara

    IPC分类号： G03B27/42 ,  G03F7/20

    CPC分类号： G03F7/70608 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70858

    摘要： A liquid immersion device that has an mixing mechanism that mixes and dissolves a predetermined substance for adjusting specific resistance of the liquid, which is supplied onto a liquid repellent film on the surface of an object (member) of a projection optical system placed on the light emitting side of projection optical system, and an liquid immersion area is formed by supplying the liquid in which the predetermined liquid is dissolved onto the liquid repellent film.

    摘要翻译： 一种液浸装置，其具有混合并溶解用于调节液体的电阻率的预定物质的混合机构，所述混合机构被供给到放置在所述光上的投影光学系统的物体（构件）的表面上的防液膜 投影光学系统的发射侧，并且通过将预定液体溶解在其上的液体供应到防液膜上而形成液浸区域。

    Immersion lithographic apparatus and method for rinsing immersion space before exposure
    4.
    发明授权
    Immersion lithographic apparatus and method for rinsing immersion space before exposure 有权
    浸没式光刻设备及曝光前冲洗浸渍空间的方法

    公开(公告)号：US08704997B2

    公开(公告)日：2014-04-22

    申请号：US12134950

    申请日：2008-06-06

    申请人： Kenichi Shiraishi

    发明人： Kenichi Shiraishi

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70875 ,  G03B27/42 ,  G03F7/70341 ,  G03F7/70916

    摘要： There is provided an immersion type lithographic apparatus. The immersion type lithographic apparatus is provided with at least one immersion space and an immersion system configured to at least partially fill the immersion space with a liquid. The apparatus is configured to rinse at least part of the immersion space with a rinsing liquid before the apparatus is used to project a patterned beam of radiation onto a substrate, and the apparatus is configured to move a substrate holder with respect to a projection system during the rinsing, such that the position of the immersion space changes with respect to the substrate holder during the rinsing.

    摘要翻译： 提供了浸没式光刻设备。 浸没型光刻设备设置有至少一个浸没空间和浸没系统，其被配置为至少部分地用液体填充浸没空间。 该装置被配置为在装置用于将图案化的辐射束投影到基板之前用冲洗液冲洗至少一部分浸没空间，并且该装置被配置为在衬底保持器相对于投影系统移动衬底保持器 冲洗，使得在冲洗期间浸渍空间的位置相对于衬底保持器改变。

    Exposure method, exposure apparatus, method for producing device, and method for evaluating exposure apparatus
    5.
    发明授权
    Exposure method, exposure apparatus, method for producing device, and method for evaluating exposure apparatus 有权
    曝光方法，曝光装置，制造装置的方法以及曝光装置的评价方法

    公开(公告)号：US08638422B2

    公开(公告)日：2014-01-28

    申请号：US11886506

    申请日：2006-03-17

    申请人： Kenichi Shiraishi

    发明人： Kenichi Shiraishi

    IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/52 ,  G03B27/58 ,  G03C5/00

    CPC分类号： G03F7/70775 ,  G03F7/70341 ,  G03F7/70358 ,  G03F7/70516 ,  G03F7/70525 ,  G03F7/70616 ,  G03F7/70725

    摘要： An exposure method includes a first step for measuring position information of a substrate while controlling a substrate stage to move the substrate stage in a state that an optical path space is filled with a liquid under a predetermined condition; a second step for obtaining a movement control accuracy of the substrate stage based on a result of the measurement; a third step for determining an exposure condition, for exposing the substrate, based on the obtained movement control accuracy; and a fourth step for exposing the substrate based on the determined exposure condition. This makes it possible to satisfactorily expose the substrate at the time of exposing the substrate based on the liquid immersion method.

    摘要翻译： 曝光方法包括：第一步骤，用于在预定条件下，在光路空间被填充有液晶的状态的同时控制衬底台移动衬底台，同时测量衬底的位置信息; 基于测量结果获得衬底载物台的移动控制精度的第二步骤; 第三步骤，用于基于所获得的移动控制精度来确定用于使基板曝光的曝光条件; 以及基于所确定的曝光条件曝光所述基板的第四步骤。 这使得可以在基于浸液方法使基板曝光时令人满意地曝光基板。

    Immersion exposure apparatus and device manufacturing method with measuring device
    6.
    发明授权
    Immersion exposure apparatus and device manufacturing method with measuring device 有权
    浸渍曝光装置及装置制造方法与测量装置

    公开(公告)号：US08520184B2

    公开(公告)日：2013-08-27

    申请号：US11570219

    申请日：2005-06-07

    申请人： Kenichi Shiraishi

    发明人： Kenichi Shiraishi

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70875 ,  G03B27/42 ,  G03F7/70341 ,  G03F7/70916

    摘要： There is provided an exposure apparatus capable of accurately performing an exposure process and a measurement process based on a liquid immersion method. The exposure apparatus (EX), which forms a liquid immersion area (AR2) of a liquid (LQ) on an image surface side of a projection optical system (PL), and exposes a substrate (P) via the projection optical system (PL) and the liquid (LQ) of the immersion area (AR2), is provided with a measuring device (60) which measures at least one of a property and composition of the liquid (LQ) for forming the liquid immersion area (AR2).

    摘要翻译： 提供一种能够精确地进行基于液浸法的曝光处理和测量处理的曝光装置。 在投影光学系统（PL）的像面侧形成液体（LQ）的液浸区域（AR2）的曝光装置（EX），经由投影光学系统（PL）露出基板 ）和浸渍区域（AR2）的液体（LQ）之间设置有测量装置（60），其测量用于形成液浸区域（AR2）的液体（LQ）的性质和成分中的至少一种。

    Exposure apparatus, exposure method, and method for producing device
    9.
    发明授权
    Exposure apparatus, exposure method, and method for producing device 有权
    曝光装置，曝光方法和制造装置的方法

    公开(公告)号：US08130361B2

    公开(公告)日：2012-03-06

    申请号：US11399537

    申请日：2006-04-07

    申请人： Masahiko Yasuda ,  Takahiro Masada ,  Yuho Kanaya ,  Tadashi Nagayama ,  Kenichi Shiraishi

    发明人： Masahiko Yasuda ,  Takahiro Masada ,  Yuho Kanaya ,  Tadashi Nagayama ,  Kenichi Shiraishi

    IPC分类号： G03B27/42 ,  G03B27/52

    CPC分类号： G03F7/70341 ,  G03F7/70141 ,  G03F7/70716 ,  G03F9/7088

    摘要： An exposure apparatus includes a substrate stage movable while holding a substrate, a substrate alignment system which detects an alignment mark (1) on the substrate held by the substrate stage and detects a reference mark (PFM) provided on the substrate stage, and a mask alignment system which detects, via a projection optical system, a reference mark (MFM) provided on the substrate stage. The reference mark (PFM) on the substrate stage is detected without a liquid by using the substrate alignment system, and the reference mark (MFM) on the substrate stage is detected using the mask alignment system via the projection optical system and the liquid. Then, a positional relationship between a detection reference position of the substrate alignment system and a projection position of an image of a pattern is obtained, thereby accurately performing alignment processing in the liquid immersion exposure.

    摘要翻译： 一种曝光装置，包括：在保持基板的同时可移动的基板台;基板对准系统，其检测由基板台保持的基板上的对准标记（1），并检测设置在基板台上的基准标记（PFM）;以及掩模 对准系统，其经由投影光学系统检测设置在基板台上的参考标记（MFM）。 通过使用衬底对准系统，无需液体检测衬底台上的参考标记（PFM），并且通过投影光学系统和液体使用掩模对准系统检测衬底台上的参考标记（MFM）。 然后，获得基板对准系统的检测基准位置与图案的图像的投影位置之间的位置关系，从而在液浸曝光中精确地进行取向处理。

    Exposure apparatus, device manufacturing method, maintenance method, and exposure method
    10.
    发明授权
    Exposure apparatus, device manufacturing method, maintenance method, and exposure method 有权
    曝光装置，装置制造方法，维护方法和曝光方法

    公开(公告)号：US08115902B2

    公开(公告)日：2012-02-14

    申请号：US12457247

    申请日：2009-06-04

    申请人： Kenichi Shiraishi

    发明人： Kenichi Shiraishi

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70341

    摘要： An exposure apparatus can prevent disadvantages of supplying liquid of reduced cleanliness and formation of watermarks. The exposure apparatus exposes a substrate by irradiating exposure light onto the substrate via a projection optical system and a liquid, and includes a liquid supply mechanism for supplying the liquid, and a measuring device which measures a time during which the supply of the liquid from the liquid supply mechanism is stopped.

    摘要翻译： 曝光装置可以防止提供降低清洁度和形成水印的液体的缺点。 曝光装置通过投影光学系统和液体将曝光的光照射到基板上来曝光基板，并且包括用于供给液体的液体供给机构和测量装置，该测量装置测量从 液体供给机构停止。