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    Exposure apparatus, maintaining method and device fabricating method
    3.
    发明申请
    Exposure apparatus, maintaining method and device fabricating method 审中-公开
    曝光装置，维护方法和装置制造方法

    公开(公告)号：US20100045949A1

    公开(公告)日：2010-02-25

    申请号：US12461370

    申请日：2009-08-10

    申请人： Katsushi Nakano ,  Tomoharu Fujiwara

    发明人： Katsushi Nakano ,  Tomoharu Fujiwara

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70341

    摘要： An exposure apparatus exposes a substrate with exposure light that passes through a liquid. The exposure apparatus comprises: a porous member that has a first surface, which is capable of opposing an object disposed at an irradiation position of the exposure light, and a second surface, which is opposite the first surface, and forms a first space that is capable of holding the liquid between the first surface and the object; a supply port, which is capable of supplying the liquid to the first space; a prescribed member, which forms a second space that faces the second surface; an adjusting apparatus, which is capable of decreasing a pressure in the second space such that the liquid in the first space moves to the second space via holes in the porous member; and a control apparatus, which controls an operation of supplying the liquid via the supply ports and a pressure adjustment operation performed by the adjusting apparatus. The control apparatus repetitively executes a first operation, which supplies the liquid to the first space, and a second operation, which stops the supply of the liquid to the first space and negatively pressurizes the second space such that the liquid is substantially eliminated from the first space, to clean the porous member.

    摘要翻译： 曝光装置用通过液体的曝光光使基板曝光。 曝光装置包括：多孔构件，其具有能够与设置在曝光光的照射位置的物体相对的第一表面和与第一表面相对的第二表面，并形成第一空间， 能够将液体保持在第一表面和物体之间; 供给口，其能够将液体供给到第一空间; 规定的构件，其形成面向第二表面的第二空间; 调节装置，其能够降低第二空间中的压力，使得第一空间中的液体经由多孔构件中的孔移动到第二空间; 以及控制装置，其控制经由供给口供给液体的动作和由所述调整装置进行的压力调整动作。 控制装置重复执行向第一空间供给液体的第一操作和停止向第一空间供给液体并对第二空间进行负压的第二操作，使得液体基本上从第一空间 空间，以清洁多孔构件。

    Exposure apparatus, substrate processing method, and device producing method
    4.
    发明申请
    Exposure apparatus, substrate processing method, and device producing method 审中-公开
    曝光装置，基板处理方法和装置制造方法

    公开(公告)号：US20090033890A1

    公开(公告)日：2009-02-05

    申请号：US11922415

    申请日：2006-06-29

    申请人： Tomoharu Fujiwara ,  Katsushi Nakano

    发明人： Tomoharu Fujiwara ,  Katsushi Nakano

    IPC分类号： G03B27/62

    CPC分类号： G03F7/70341 ,  G03F7/70608

    摘要： An exposure apparatus includes a detector which detects a defect in a thin film formed on a substrates. When the detector is provided for liquid immersion exposure in which the substrate is exposed through liquid, outflow of the liquid due to by any defect in the thin film is detected before the liquid outflows, thereby suppressing reduction in throughput in producing device and preventing any problem or inconvenience from occurring in the exposure apparatus.

    摘要翻译： 曝光装置包括检测基板上形成的薄膜中的缺陷的检测器。 当检测器被设置用于通过液体暴露基板的液浸曝光时，在液体流出之前检测由于薄膜中的任何缺陷而导致的液体的流出，从而抑制生产装置中的生产量的降低并防止任何问题 或不便于在曝光设备中发生。

    Immersion exposure apparatus and device fabricating method with two substrate stages and metrology station
    9.
    发明授权
    Immersion exposure apparatus and device fabricating method with two substrate stages and metrology station 有权
    浸渍曝光装置和装置制造方法，具有两个基板台和测量台

    公开(公告)号：US08922754B2

    公开(公告)日：2014-12-30

    申请号：US12007348

    申请日：2008-01-09

    申请人： Tomoharu Fujiwara ,  Yuichi Shibazaki

    发明人： Tomoharu Fujiwara ,  Yuichi Shibazaki

    IPC分类号： G03B27/58 ,  G03F7/20

    CPC分类号： G03F7/70341 ,  G03F7/70733

    摘要： The present invention provides an exposure apparatus can suppress the occurrence of residual liquid. An exposure apparatus comprises: a first stage that holds the substrate and is movable; a second stage that is movable independently of the first stage; and a liquid immersion mechanism that forms a liquid immersion region of a liquid on an upper surface of at least one stage of the first stage and the second stage; wherein, a recovery port that is capable of recovering the liquid is provided to the upper surface of the second stage.

    摘要翻译： 本发明提供一种能够抑制残留液体的产生的曝光装置。 曝光装置包括：保持基板并可移动的第一阶段; 第二阶段可独立于第一阶段移动; 以及液浸机构，其在所述第一阶段和所述第二阶段的至少一个阶段的上表面上形成液体的液浸区域; 其中，能够回收液体的回收口被设置在第二级的上表面。

    METHOD AND DEVICE FOR INSPECTING SPATIAL LIGHT MODULATOR, AND EXPOSURE METHOD AND DEVICE
    10.
    发明申请
    METHOD AND DEVICE FOR INSPECTING SPATIAL LIGHT MODULATOR, AND EXPOSURE METHOD AND DEVICE 审中-公开
    用于检查空调光调制器的方法和装置，以及曝光方法和装置

    公开(公告)号：US20140320835A1

    公开(公告)日：2014-10-30

    申请号：US14241951

    申请日：2012-08-30

    申请人： Tomoharu Fujiwara

    发明人： Tomoharu Fujiwara

    IPC分类号： G01N21/95 ,  G03F7/20

    CPC分类号： G01N21/95 ,  G01N21/55 ,  G01N2021/9511 ,  G02B26/06 ,  G03F7/70058 ,  G03F7/70291 ,  G03F7/70425 ,  G03F7/7065 ,  G06T7/0004 ,  G06T2207/10061 ,  G06T2207/30148

    摘要： A method for inspecting a spatial light modulator includes: performing such control that in an inspection target area in an array of mirror elements, the mirror elements in a first state in which incident light is given a phase change amount of 0 and the mirror elements in a second state in which incident light is given a phase change amount of 180° (π) become arrayed in a checkered pattern; guiding light having passed the inspection target area to a projection optical system with a resolution limit coarser than a width of an image of one mirror element, to form a spatial image; and inspecting a characteristic of the spatial light modulator from the spatial image. This method allows us to readily perform the inspection of the characteristic of the spatial light modulator having the array of optical elements.

    摘要翻译： 一种用于检查空间光调制器的方法包括：执行这样的控制：在反射镜元件阵列中的检查目标区域中，将反射镜元件置于入射光被赋予相位变化量为0的第一状态下， 使入射光的相位变化量为180°（＆pgr）的第二状态排列成方格图案; 将已经通过检查对象区域的光引导到具有比一个镜像元件的图像的宽度更大的分辨率极限的投影光学系统，以形成空间图像; 并从空间图像检查空间光调制器的特性。 该方法允许我们容易地执行具有光学元件阵列的空间光调制器的特性的检查。