发明授权
- 专利标题： Immersion lithographic apparatus rinsing outer contour of substrate with immersion space
- 专利标题（中）： 浸没光刻设备用浸没空间冲洗衬底的外部轮廓
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申请号： US12155714申请日： 2008-06-09
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公开(公告)号： US08941808B2公开(公告)日： 2015-01-27
- 发明人: Katsushi Nakano , Masahiko Okumura , Tarou Sugihara , Takeyuki Mizutani , Tomoharu Fujiwara
- 申请人： Katsushi Nakano , Masahiko Okumura , Tarou Sugihara , Takeyuki Mizutani , Tomoharu Fujiwara
- 申请人地址： JP Tokyo
- 专利权人： Nikon Corporation
- 当前专利权人： Nikon Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Oliff PLC
- 优先权： JP2004-310993 20041026
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03F7/20 ; G03F7/38
摘要：
An immersion type lithographic apparatus includes at least one immersion space and an immersion system configured to at least partially fill the immersion space with a liquid. The apparatus is configured to rinse at least part of the immersion space with a rinsing liquid before the apparatus is used to project a patterned beam of radiation onto a substrate.
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