公开(公告)号：US20080117393A1

公开(公告)日：2008-05-22

申请号：US12007348

申请日：2008-01-09

申请人： Tomoharu Fujiwara ,  Yuichi Shibazaki

发明人： Tomoharu Fujiwara ,  Yuichi Shibazaki

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70733

摘要： The present invention provides an exposure apparatus can suppress the occurrence of residual liquid. An exposure apparatus comprises: a first stage that holds the substrate and is movable; a second stage that is movable independently of the first stage; and a liquid immersion mechanism that forms a liquid immersion region of a liquid on an upper surface of at least one stage of the first stage and the second stage; wherein, a recovery port that is capable of recovering the liquid is provided to the upper surface of the second stage.

摘要翻译： 本发明提供一种能够抑制残留液体的产生的曝光装置。 曝光装置包括：保持基板并可移动的第一阶段; 第二阶段可独立于第一阶段移动; 以及液浸机构，其在所述第一阶段和所述第二阶段的至少一个阶段的上表面上形成液体的液浸区域; 其中，能够回收液体的回收口被设置在第二级的上表面。

公开(公告)号：US08922754B2

公开(公告)日：2014-12-30

申请号：US12007348

申请日：2008-01-09

申请人： Tomoharu Fujiwara ,  Yuichi Shibazaki

发明人： Tomoharu Fujiwara ,  Yuichi Shibazaki

IPC分类号： G03B27/58 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/70733

摘要： The present invention provides an exposure apparatus can suppress the occurrence of residual liquid. An exposure apparatus comprises: a first stage that holds the substrate and is movable; a second stage that is movable independently of the first stage; and a liquid immersion mechanism that forms a liquid immersion region of a liquid on an upper surface of at least one stage of the first stage and the second stage; wherein, a recovery port that is capable of recovering the liquid is provided to the upper surface of the second stage.

摘要翻译： 本发明提供一种能够抑制残留液体的产生的曝光装置。 曝光装置包括：保持基板并可移动的第一阶段; 第二阶段可独立于第一阶段移动; 以及液浸机构，其在所述第一阶段和所述第二阶段的至少一个阶段的上表面上形成液体的液浸区域; 其中，能够回收液体的回收口被设置在第二级的上表面。

公开(公告)号：US20080002163A1

公开(公告)日：2008-01-03

申请号：US11666420

申请日：2005-10-31

申请人： Tomoharu Fujiwara ,  Yuichi Shibazaki

发明人： Tomoharu Fujiwara ,  Yuichi Shibazaki

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70733

摘要： The present invention provides an exposure apparatus can suppress the occurrence of residual liquid. An exposure apparatus (EX) comprises: a first stage (ST1) that holds the substrate (P) and is movable; a second stage (ST2) that is movable independently of the first stage (ST1); and a liquid immersion mechanism (12, and the like) that forms a liquid immersion region (LR) of a liquid (LQ) on an upper surface of at least one stage of the first stage (ST1) and the second stage (ST2); wherein, a recovery port (51) that is capable of recovering the liquid (LQ) is provided to the upper surface of the second stage (ST2).

摘要翻译： 本发明提供一种能够抑制残留液体的产生的曝光装置。 曝光装置（EX）包括：保持基板（P）并可移动的第一级（ST1）; 能够独立于第一级（ST 1）移动的第二级（ST2）; 以及在第一级（ST1）和第二级（ST）的至少一级的上表面上形成液体（LQ）的液浸区域（LR）的液浸机构（12等） 2）; 其中，能够回收液体（LQ）的回收口（51）设置在第二级（ST2）的上表面。

公开(公告)号：US08330939B2

公开(公告)日：2012-12-11

申请号：US11666420

申请日：2005-10-31

申请人： Tomoharu Fujiwara ,  Yuichi Shibazaki

发明人： Tomoharu Fujiwara ,  Yuichi Shibazaki

IPC分类号： G03B27/58

CPC分类号： G03F7/70341 ,  G03F7/70733

摘要： The present invention provides an exposure apparatus can suppress the occurrence of residual liquid. An exposure apparatus comprises: a first stage that holds the substrate and is movable; a second stage that is movable independently of the first stage; and a liquid immersion mechanism that forms a liquid immersion region of a liquid on an upper surface of at least one stage of the first stage and the second stage; wherein, a recovery port that is capable of recovering the liquid is provided to the upper surface of the second stage.

摘要翻译： 本发明提供一种能够抑制残留液体的产生的曝光装置。 曝光装置包括：保持基板并可移动的第一阶段; 第二阶段可独立于第一阶段移动; 以及液浸机构，其在所述第一阶段和所述第二阶段的至少一个阶段的上表面上形成液体的液浸区域; 其中，能够回收液体的回收口被设置在第二级的上表面。

公开(公告)号：US09632431B2

公开(公告)日：2017-04-25

申请号：US11812919

申请日：2007-06-22

申请人： Yuichi Shibazaki

发明人： Yuichi Shibazaki

IPC分类号： G03F7/20

CPC分类号： G03F7/70725 ,  G03F7/70341 ,  G03F7/70666 ,  G03F7/70733 ,  Y10T29/49155

摘要： A lithographic apparatus includes a substrate table capable of holding a substrate, a projection system that projects a patterned beam of radiation onto the substrate held by the substrate table, and a sensor table that is not capable of holding a substrate but that includes a sensor capable of sensing a property of the patterned beam of radiation. In addition, a first positioning system is connected to the substrate table and displaces the substrate table into and out of a path of the patterned beam of radiation, and a second positioning system is capable of positioning the sensor table into the path of the patterned beam of radiation when the substrate table is displaced out of the path of the patterned beam of radiation.

公开(公告)号：US09081301B2

公开(公告)日：2015-07-14

申请号：US13363079

申请日：2012-01-31

申请人： Yuichi Shibazaki

发明人： Yuichi Shibazaki

IPC分类号： G01B11/00 ,  G03B27/32 ,  G03B27/42 ,  G03B27/58 ,  G03B27/62 ,  G03F7/20 ,  H01L21/68

CPC分类号： G03F7/70775 ,  G01B21/042 ,  G03F7/70341 ,  G03F7/70483 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70975 ,  G03F9/70 ,  G03F9/7046 ,  G03F9/7049 ,  H01L21/68 ,  H01L21/681 ,  Y10T29/49002

摘要： A controller measures positional information of a stage within an XY plane using three encoders which at least include one each of an X encoder and a Y encoder of an encoder system, and the stage is driven in the XY plane, based on measurement results of the positional information and positional information (p1, q1), (p2, q2), and (p3, q3) in a surface parallel to the XY plane of a head (an encoder) used for measurement of the positional information. Accordingly, it becomes possible to control the movement of the stage with good precision, while switching the head (the encoder) used for control during the movement of the stage using the encoder system which includes a plurality of heads.

摘要翻译： 控制器使用至少包括编码器系统的X编码器和Y编码器中的每一个的三个编码器来测量XY平面内的台的位置信息，并且基于测量结果，在XY平面中驱动该平台 在与用于测量位置信息的头（编码器）的XY平面平行的表面中的位置信息和位置信息（p1，q1），（p2，q2）和（p3，q3）。 因此，在使用包括多个头的编码器系统的台架移动期间切换用于控制的头（编码器）的同时，可以高精度地控制台的移动。

公开(公告)号：US08860925B2

公开(公告)日：2014-10-14

申请号：US11896577

申请日：2007-09-04

申请人： Yuichi Shibazaki

发明人： Yuichi Shibazaki

IPC分类号： G03F7/20

CPC分类号： G03F7/70725 ,  G03F7/70758 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70975 ,  Y10T29/49117

摘要： A controller inclines a movable body with respect to an XY plane at an angle α in a periodic direction of a grating, based on a measurement value of an interferometer which measures an angle of inclination of the movable body to the XY plane, and based on a measurement value of an encoder system and information of angle α before and after the inclination, and computes an Abbe offset quantity of the grating surface with respect to a reference surface (e.g., an image plane of a projection optical system) which serves as a reference for position control of the movable body in the XY plane. Then, the controller drives the movable body, based on positional information of the movable body in the XY plane measured by the encoder system and a measurement error of the encoder system corresponding to an angle of inclination of the movable body to the XY plane due to the Abbe offset quantity of the grating surface.

摘要翻译： 控制器基于测量可移动体与XY平面的倾斜角度的干涉仪的测量值，相对于XY平面在光栅的周期方向上以角度α倾斜移动体，并且基于 编码器系统的测量值和倾斜前后的角度α的信息，并且计算相对于参考表面（例如，投影光学系统的像面）的光栅表面的阿贝偏移量，其作为 参考用于XY平面中可动体的位置控制。 然后，控制器基于由编码器系统测量的XY平面中的可移动体的位置信息和与可移动体相对于XY平面的倾斜角相对应的编码器系统的测量误差驱动可移动体，由于 光栅表面的阿贝偏移量。

公开(公告)号：US08711327B2

公开(公告)日：2014-04-29

申请号：US12331863

申请日：2008-12-10

申请人： Yuichi Shibazaki

发明人： Yuichi Shibazaki

IPC分类号： G03B27/42 ,  G03B27/58

CPC分类号： G03F7/70775 ,  G03F7/70733

摘要： Two X encoder heads (X heads) and one Y head are mounted on one wafer stage, and an X scale and a Y scale corresponding to these heads are arranged on a surface facing the wafer stage so that the scales connect the exposure area and the alignment area. The wafer stage is made to move back and forth between the exposure area and the alignment area along a path where the X scale and the Y scale are set, while performing position measurement using three encoder heads. In this case, a switching process between XZ interferometer will not be necessary.

摘要翻译： 两个X编码器头（X头）和一个Y头安装在一个晶片台上，并且与这些磁头相对应的X刻度和Y刻度布置在面向晶片台的表面上，使得刻度尺连接曝光区域和 对齐区域。 在使用三个编码器头执行位置测量的同时，使晶片台沿着X标尺和Y标尺设置的路径在曝光区域和对准区域之间来回移动。 在这种情况下，不需要XZ干涉仪之间的切换处理。

公开(公告)号：US08668191B2

公开(公告)日：2014-03-11

申请号：US13317994

申请日：2011-11-02

申请人： Yuichi Shibazaki

发明人： Yuichi Shibazaki

IPC分类号： B25B11/00 ,  H01L39/24

CPC分类号： G03F7/70758 ,  G03F7/70816 ,  Y10T29/49014 ,  Y10T29/49998 ,  Y10T29/53961

摘要： Because an electromagnetic chuck supplies current to a specific microcoil among a plurality of microcoils and makes an object exert an electromagnetic force working together with a magnet of the object, the object can be held in a state where the object is set at a desired position (a position that corresponds to the microcoil to which current has been supplied) on a base surface. Further, by gas that blows out from a gas supply passage, a levitation force is given to the object, which can reduce effects of a friction force that acts between the object and an upper surface of the electromagnetic chuck when the position of the object is set.

摘要翻译： 由于电磁卡盘将电流供给到多个微线圈之间的特定微线圈，并且使物体施加与物体的磁体一起工作的电磁力，所以可以将物体保持在将物体设置在期望位置的状态（ 一个对应于已经供应了电流的微线圈的位置）。 此外，通过从气体供给通道吹出的气体，向物体施加悬浮力，当物体的位置为物体时，这可以降低作用在物体与电磁卡盘的上表面之间的摩擦力的影响 组。

公开(公告)号：US08553204B2

公开(公告)日：2013-10-08

申请号：US12782310

申请日：2010-05-18

申请人： Yuichi Shibazaki

发明人： Yuichi Shibazaki

IPC分类号： G03B27/58 ,  G03B27/42 ,  G01B11/14 ,  G03F7/20

CPC分类号： G03F7/70725 ,  G03F7/70775 ,  G03F7/7085

摘要： A fine movement stage is driven by a controller, based on positional information of the fine movement stage in a measurement direction measured by a measurement system and correction information of a measurement error caused by a tilt of the fine movement stage included in the positional information. Accordingly, driving the fine movement stage with high precision becomes possible, which is not affected by a measurement error included in the positional information in a measurement direction of the measurement system that occurs due to a tilt of the fine movement stage.

摘要翻译： 基于由测量系统测量的测量方向上的精细运动级的位置信息和由位置信息中包括的微动台的倾斜引起的测量误差的校正信息，由控制器驱动精细运动级。 因此，可以高精度地进行微动作阶段的驱动，不会受到微小移动台的倾斜而导致的测量系统的测量方向上的位置信息中包含的测量误差的影响。