PLASMA-BASED DETECTOR AND METHODS USING THE SAME FOR MEASURING AND MONITORING PROPERTIES OF A GAS FLOW

    公开(公告)号:US20210156805A1

    公开(公告)日:2021-05-27

    申请号:US17045399

    申请日:2019-04-05

    IPC分类号: G01N21/67

    摘要: There is provided a method for measuring a composition of a gas circulating through a plasma-based detector, the plasma-based detector having a discharge chamber defining an internal volume and having discharge electrodes configured to apply a plasma-generating field across the discharge chamber. The method includes ramping a voltage until it reaches a breakdown voltage to generate a plasma, detecting the presence of the plasma, determining a pressure based on the breakdown voltage upon detection of the presence of the plasma, operating the detector at an operation voltage greater than the breakdown voltage, performing measurement(s) on the plasma, generating a detector signal based the measurement(s) and compensating the detector signal based on the determined pressure to obtain a compensated detector signal, the compensated detector signal being representative of the composition of the gas. A plasma-based detector for measuring the composition of the gas is also provided.

    Valve With a Loading Varying Mechanism, and Method of Operating the Same
    3.
    发明申请
    Valve With a Loading Varying Mechanism, and Method of Operating the Same 有权
    具有加载变化机构的阀门及其操作方法

    公开(公告)号:US20150198255A1

    公开(公告)日:2015-07-16

    申请号:US14420180

    申请日:2013-07-31

    发明人: Yves Gamache

    IPC分类号: F16K3/18 F16K11/074

    摘要: A valve is provided. The valve includes a body provided with fluid passages for circulating fluid therein. The body has a body interface with ports connected to the fluid passages. The valve also includes a valve element having a valve element interface facing the body interface. The valve element can move between different positions so as to permit or obstruct communication between the fluid passages. A biasing element biases the valve element interface against the body interface. A load varying mechanism is provided to load the biasing element with different sealing load forces according to the different positions of the valve element. The sealing load force applied on the rotor is thus decreased during rotation, reducing friction between the valve body and the valve element.

    摘要翻译: 提供阀门。 阀包括设置有用于使流体在其中循环的流体通道的主体。 主体具有与连接到流体通道的端口的主体接口。 阀还包括具有面向主体界面的阀元件接口的阀元件。 阀元件可以在不同位置之间移动,以便允许或妨碍流体通道之间的连通。 偏置元件将阀元件接口偏压在主体接口上。 提供了一种负载变化机构,以根据阀元件的不同位置以不同的密封负载力对偏压元件进行加载。 因此,旋转时施加在转子上的密封载荷力减小,从而减小阀体与阀体之间的摩擦。

    FITTING ASSEMBLY FOR ANALYTICAL APPLICATIONS

    公开(公告)号:US20180246003A1

    公开(公告)日:2018-08-30

    申请号:US15758340

    申请日:2016-09-08

    发明人: Yves Gamache

    IPC分类号: G01M3/22 F16L19/10 F16L19/12

    摘要: An improved fitting assembly for analytical devices is provided. The fitting assembly includes a tube securable to a fitting component via rear and front ferrules and a nut. The fitting component includes a body having a cavity for receiving the tube and ferrules. The body also includes a channel connecting the cavity to a leak chamber defined in a space between the tube, the fitting component and the inner sidewall of the nut body, the leak chamber being in fluid communication with the exterior of the nut body via the channel in the nut body. Sealing elements are provided between the tube and nut for encouraging leaks to flow through the leak path. A method for detecting leaks in the fitting assembly is also provided.

    SYSTEMS AND METHODS FOR TESTING FOR A GAS LEAK THROUGH A GAS FLOW COMPONENT

    公开(公告)号:US20180003641A1

    公开(公告)日:2018-01-04

    申请号:US15545974

    申请日:2016-01-29

    发明人: Yves GAMACHE

    IPC分类号: G01N21/73 G01M3/20 G01M3/38

    CPC分类号: G01N21/73 G01M3/20 G01M3/38

    摘要: Methods and systems of testing for a gas leak between an inlet zone and an outlet zone of a gas flow component in a shut state are provided. Different tracer and carrier gases are used. The carrier gas is circulated through the outlet zone of the gas flow component to purge the tracer gas from this outlet zone. A spectroscopic emission from the carrier gas indicative of an amount of the purged tracer gas is monitored. A test flow of the tracer gas is introduced in the inlet zone of the gas flow component, and the inlet pressure is increased for successive pressure increments. The presence of a gas leak is determined upon detecting an intensity step variation in the monitored spectroscopic emission following one of the pressure increments in the inlet pressure.

    PHOTOIONIZATION DETECTOR AND METHOD FOR GAS SAMPLE ANALYSIS

    公开(公告)号:US20230145929A1

    公开(公告)日:2023-05-11

    申请号:US17920487

    申请日:2021-04-22

    发明人: Yves GAMACHE

    IPC分类号: G01N27/64

    CPC分类号: G01N27/64

    摘要: A photoionization detector (PID) is disclosed that includes an ionization chamber configured to allow a flow of a gas sample therethrough, the ionization chamber defining an ionization region and a detection region, a photoionization source configured to generate ionizing radiation for irradiating the flow of the gas sample in the ionization region, an electric-field ionization source configured to apply an ionizing electric field inside the ionization chamber to intersect the flow of the gas sample in the ionization region, the ionizing radiation and the ionizing electric field being configured to ionize the gas sample, and an ion detector configured to detect, in the detection region, an ionization current resulting from the ionized gas sample. The PID may also include an optical window, for example, made of a window material including sapphire, configured to allow at least part of the ionizing radiation to pass therethrough prior to entering the ionization region.

    Pulsing Purge Diaphragm Valve and Related Method

    公开(公告)号:US20230028446A1

    公开(公告)日:2023-01-26

    申请号:US17785984

    申请日:2020-12-16

    IPC分类号: G01N30/20 F16K11/02 F16K15/18

    摘要: A diaphragm valve for gas analysis applications is provided. The valve includes a valve cap provided with a plurality of process conduits extending therethrough, a valve body engageable with the valve cap and having a body interface provided with a recess, a diaphragm positioned between the valve cap and valve body and having a process groove for circulating fluid therein, the process groove engaging the recess, a plunger assembly provided within the valve body, the plunger assembly comprising a plurality of plungers movable between a closed position wherein the plunger engages the diaphragm, and an open position wherein the plunger is spaced from the diaphragm, and an actuating assembly comprising a gas inlet to allow the injection of actuating gas therein, the actuating assembly comprising a purging system for purging a region located between the diaphragm and the body interface, whereby the actuating gas is used for purging the region.

    Plasma-based detector and methods using the same for measuring and monitoring properties of a gas flow

    公开(公告)号:US11474043B2

    公开(公告)日:2022-10-18

    申请号:US17045399

    申请日:2019-04-05

    IPC分类号: G01N21/67

    摘要: There is provided a method for measuring a composition of a gas circulating through a plasma-based detector, the plasma-based detector having a discharge chamber defining an internal volume and having discharge electrodes configured to apply a plasma-generating field across the discharge chamber. The method includes ramping a voltage until it reaches a breakdown voltage to generate a plasma, detecting the presence of the plasma, determining a pressure based on the breakdown voltage upon detection of the presence of the plasma, operating the detector at an operation voltage greater than the breakdown voltage, performing measurement(s) on the plasma, generating a detector signal based the measurement(s) and compensating the detector signal based on the determined pressure to obtain a compensated detector signal, the compensated detector signal being representative of the composition of the gas. A plasma-based detector for measuring the composition of the gas is also provided.

    ELECTRODE ASSEMBLIES FOR PLASMA DISCHARGE DEVICES

    公开(公告)号:US20220030693A1

    公开(公告)日:2022-01-27

    申请号:US17414036

    申请日:2019-12-20

    IPC分类号: H05H1/24

    摘要: There is provided a compound electrode assembly for generating a plasma in a plasma chamber of a plasma discharge device. The compound electrode assembly includes a casing, a discharge electrode and a sealing compound. The casing is made of a dielectric material and includes at least one side wall and an end wall defining a closed end. The discharge electrode is mounted in the casing and is bonded to the end wall. The sealing compound surrounds the discharge electrode and extends within the casing.