公开(公告)号：US5814195A

公开(公告)日：1998-09-29

申请号：US736978

申请日：1996-10-25

申请人： John Lehan ,  Henry Byorum ,  Russell J. Hill ,  J. Kirkwood Rough

发明人： John Lehan ,  Henry Byorum ,  Russell J. Hill ,  J. Kirkwood Rough

IPC分类号： C23C14/34 ,  C23C14/35 ,  H01J37/34

CPC分类号： H01J37/3444 ,  C23C14/352 ,  H01J37/3405

摘要： A sputtering system using an AC power supply in the range of 10 kHz to 100 kHz uses two rotatable cylindrical magnetrons. The rotatable cylindrical magnetrons, when used for depositing a dielectric layer onto a substrate, clean off dielectric material that is deposited onto the target. This prevents a dielectric layer on the target from acting like a capacitor and may help avoid arcing. Additionally, an impedance-limiting capacitor can be placed in series in the electrical path between the targets through the transformer so as to reduce arcing. This impedance-limiting capacitor has a value much larger than the capacitors used to couple the power supply to a target in radio frequency sputtering systems.

摘要翻译： 使用10kHz至100kHz范围内的交流电源的溅射系统使用两个可旋转的圆柱形磁控管。 可旋转的圆柱形磁控管当用于将介电层沉积到基底上时，清除沉积在靶上的介电材料。 这样可防止目标上的电介质层像电容器那样起作用，并且有助于避免电弧。 此外，阻抗限制电容器可以通过变压器串联放置在目标之间的电气路径中，以减少电弧。 该阻抗限制电容器具有比用于将电源耦合到射频溅射系统中的目标的电容器的值大得多的值。

公开(公告)号：US5502306A

公开(公告)日：1996-03-26

申请号：US214377

申请日：1994-03-17

申请人： Dan Meisburger ,  Alan D. Brodie ,  Curt Chadwick ,  Anil Desai ,  Hans Dohse ,  Dennis Emge ,  John Greene ,  Ralph Johnson ,  Ming-Yie Ling ,  John McMurtry ,  Barry Becker ,  Ray Paul ,  Mike Robinson ,  Richard Simmons ,  David E. A. Smith ,  John Taylor ,  Lee Veneklasen ,  Dean Walters ,  Paul Wieczorek ,  Sam Wong ,  April Dutta ,  Surendra Lele ,  Kirkwood Rough ,  Henry Pearce-Percy ,  Jack Y. Jau ,  Chun C. Lin ,  Hoi T. Nguyen ,  Yen-Jen Oyang ,  Timothy L. Hutcheson ,  David J. Clark ,  Chung-Shih Pan ,  Chetana Bhaskar ,  Chris Kirk ,  Eric Munro

发明人： Dan Meisburger ,  Alan D. Brodie ,  Curt Chadwick ,  Anil Desai ,  Hans Dohse ,  Dennis Emge ,  John Greene ,  Ralph Johnson ,  Ming-Yie Ling ,  John McMurtry ,  Barry Becker ,  Ray Paul ,  Mike Robinson ,  Richard Simmons ,  David E. A. Smith ,  John Taylor ,  Lee Veneklasen ,  Dean Walters ,  Paul Wieczorek ,  Sam Wong ,  April Dutta ,  Surendra Lele ,  Kirkwood Rough ,  Henry Pearce-Percy ,  Jack Y. Jau ,  Chun C. Lin ,  Hoi T. Nguyen ,  Yen-Jen Oyang ,  Timothy L. Hutcheson ,  David J. Clark ,  Chung-Shih Pan ,  Chetana Bhaskar ,  Chris Kirk ,  Eric Munro

IPC分类号： G01B15/00 ,  G01B15/08 ,  G01N23/04 ,  G01N23/203 ,  G01N23/225 ,  G01R31/307 ,  G03F1/08 ,  G03F1/16 ,  H01J37/147 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01L21/027 ,  H01L21/66 ,  H01J37/26

CPC分类号： H01J37/28 ,  G01R31/307 ,  H01J2237/063 ,  H01J2237/184 ,  H01J2237/204 ,  H01J2237/24495 ,  H01J2237/30438

摘要： There is disclosed numerous embodiments of a method and apparatus for a particle scanning system and an automatic inspection system. In each of these a particle beam is directed at the surface of a substrate for scanning that substrate. Also included are a selection of detectors to detect at least one of the secondary particles, back-scattered particles and transmitted particles from the substrate. The substrate is mounted on an x-y stage to provide it with at least one degree of freedom while the substrate is being scanned by the/particle beam. The substrate is also subjected to an electric field on it's surface to accelerate the secondary particles. The system also has the capability to accurately measure the position of the substrate with respect to the charged particle beam. Additionally, there is an optical alignment means for initially aligning the substrate beneath the,particle beam means. To function most efficiently there is also a vacuum means for evacuating and repressurizing a chamber containing the substrate. The vacuum means can be used to hold one substrate at vacuum while a second one is being loaded/unloaded, evacuated or repressurized. Alternately, the vacuum means can simultaneously evacuate a plurality of substrates prior to inspection and repressurize of the same plurality of substrates following inspection. In the inspection configuration, there is also a comparison means for comparing the pattern on the substrate with a second pattern.

摘要翻译： 公开了用于粒子扫描系统和自动检查系统的方法和装置的许多实施例。 在其中的每一个中，粒子束被引导到用于扫描该衬底的衬底的表面。 还包括一些检测器，用于检测来自基底的二次粒子，背散射粒子和透射粒子中的至少一个。 衬底被安装在x-y平台上，以在衬底被/粒子束扫描的过程中提供至少一个自由度。 衬底也在其表面上经受电场以加速次级颗粒。 该系统还具有准确地测量衬底相对于带电粒子束的位置的能力。 另外，存在用于最初对准在粒子束装置下面的衬底的光学对准装置。 为了最有效地起作用，还有一种用于对含有基底的腔室进行抽空和再加压的真空装置。 真空装置可用于将一个基板保持在真空状态，而第二个装载/卸载，抽真空或再加压。 或者，真空装置可以在检查之后同时抽空多个基板，同时在检查之后检查并重新加压相同的​​多个基板。 在检查配置中，还存在用于将衬底上的图案与第二图案进行比较的比较装置。

公开(公告)号：US20090026912A1

公开(公告)日：2009-01-29

申请号：US11829034

申请日：2007-07-26

申请人： Vincenzo Lordi ,  Kirkwood Rough ,  Xuefeng Liu ,  Shem-Tov Levi

发明人： Vincenzo Lordi ,  Kirkwood Rough ,  Xuefeng Liu ,  Shem-Tov Levi

IPC分类号： H01J37/302 ,  H01J29/51 ,  H01J37/30

CPC分类号： H01J37/063 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/073 ,  H01J37/075 ,  H01J37/3174 ,  H01J2237/0432

摘要： Method and apparatus for achieving an intensity modulated electron blanker are disclosed. An apparatus includes a cathode exposed to an activation source to generate an electron beam. Cathode control circuitry adjusts a cathode control amplifier to regulate cathode voltage and the potential of the electron beam. In some approaches the electron beam potential is used to control the blanking frequency, switching speeds, and duty cycle. In another approach electron generating beams directed on to the cathode are modulated to control the electron beam.

摘要翻译： 公开了用于实现强度调制的电子消除器的方法和装置。 一种装置包括暴露于激活源的阴极以产生电子束。 阴极控制电路调节阴极控制放大器以调节阴极电压和电子束的电位。 在一些方法中，电子束电位用于控制消隐频率，开关速度和占空比。 在另一种方法中，调节指向阴极的电子产生光束以控制电子束。