Abstract:
There is a control device for controlling a vacuum valve device which includes a valve body configured to open and close a transfer path through which a first chamber and a second chamber communicate with each other, a seal member provided in the valve body, and a valve body driver having a motor and configured to drive the valve body, wherein the control device is configured to be switchable between a first operation pattern for controlling the motor at a first separation speed and a second operation pattern for controlling the motor at a second separation speed lower than the first separation speed.
Abstract:
In an existing specimen cryo holder, a change in the orientation of a specimen would lead to tilting of a dewar together with the specimen and hence to bubbling of a cooling source contained in the dewar. In view of this, a specimen cryo holder, including a mechanism capable of cooling a specimen while keeping the posture of a dewar in a fixed direction even when the specimen is tilted into a direction suitable for processing or observation thereof, is provided. Also provided is a dewar in which a vacuum maintenance mechanism is mounted to an outer vessel so that an inner vessel holding a cooling source therein is vacuum-insulated from the outside air.
Abstract:
This ion milling device is provided with a vacuum chamber (105), an exhaust device (101) for evacuating the interior of the vacuum chamber, a sample stage (103) for supporting a sample (102) to be irradiated inside the vacuum chamber, a heater (107) for heating the interior of the vacuum chamber, a gas source (106) for introducing into the vacuum chamber a gas serving as a heating medium, and a controller (110) for controlling the gas source, the controller controlling the gas source so that the vacuum chamber internal pressure is in a predetermined state during heating by the heater. This enables the control in a short time of the temperature for suppressing condensation, or the like, occurring at atmospheric release after cooling and ion milling a sample.
Abstract:
A sample introduction device (100) has a pre-evacuation chamber (2), a sample holder (10), a mechanical drive arrangement (30) for moving the sample holder (10), and a controller (90). The controller (90) performs a first operation for controlling the mechanical drive arrangement (30) to move a support member (20) such that this support member (20) supports the sample holder (10) when its sample holding portion (12) is in the pre-evacuation chamber (2) and to bring the support member (20) to a halt, a second operation for making a decision as to whether the sample holding portion (12) can be moved into the sample chamber (1), based on the position at which the support member (20) is halted, and a third operation for moving the support member (20) supporting the sample holder (10) such that the sample holding portion (12) moves from the pre-evacuation chamber (2) into the sample chamber (1) if the decision is affirmative to indicate that the sample holding portion (12) can be moved into the sample chamber (1).
Abstract:
The invention relates to an analysis device comprising a main enclosure fitted with a secondary enclosure, a microprobe placed inside the main enclosure and fitted with an airlock and with a motion object, and a movable sample support that is movable from the secondary enclosure to the airlock and from the airlock to the motion object. Each of the airlock and the motion object includes a respective guide member for guiding the movable sample support and a respective sensor for detecting the presence of the movable sample support.
Abstract:
A charged particle beam instrument is offered which has a specimen pre-evacuation chamber. An outflow flow rate adjusting valve (70) adjusts the flow rate of gas exhausted from the specimen pre-evacuation chamber (20) under control of controller (82). The controller (82) for making a decision as to whether the difference between a first pressure in the pre-evacuation chamber (20) before the adjusting valve (70) is controlled to the first degree of opening and a second pressure in the pre-evacuation chamber (20) after the adjusting valve (70) has been controlled to the first degree of opening is greater than a first reference value.
Abstract:
Disclosed are embodiments of an ion beam sample preparation apparatus and methods. The apparatus has disposed in a vacuum chamber at least one tilting ion beam irradiating means with intensity control, a rotation stage with rotation control, a sample holder, and an adjustable positioning stage that has two axes of positional adjustment that are operable to move the region of the sample being prepared by the ion beam relative to the ion beam. The apparatus may also include a vacuum-tight optical window for observing the sample and a shutter for protecting the optical window from debris while the sample is prepared in the ion beam.
Abstract:
Disclosed are embodiments of an ion beam sample preparation apparatus and methods. The methods operate on a sample disposed in a vacuum chamber and include steps of directing an intensity-controllable, tilt-angle controllable ion beam at a sample holder coupled to a rotation stage. The methods further include illuminating and capturing one or more images of the sample, extracting useful features from one or more images and thereafter adjusting the sample preparation steps. Further methods are disclosed for capturing sequences of images, programmatically rotating images, and displaying sequences of images with similar rotation angles. Further methods include extracting useful features from sequences of images that may change with respect to time as ion beam preparation continues.
Abstract:
Provided is a charged particle beam device that outputs both an ion beam and an electron beam at a sample, has a common detector for both the ion beam and the electron beam in the charged particle beam device that processes and observes the sample, and is able to provide a detection unit to an appropriate position corresponding to the process details and observation technique of the sample. Provided are an electron beam optical column in which an electron beam for observing the observation surface of a sample is generated, an ion beam optical column in which an ion beam that processes the sample is generated, a detection device that detects a secondary signal generated from the sample or transmitted electrons, and a sample stage that is capable of mounting the detection device thereon; is rotatable in a horizontal plane that includes the optical axis of the electron beam and the optical axis of the ion beam about a cross point where both optical axes intersect; and is able to change the distance between the observation surface of the sample and the cross point.
Abstract:
A system, apparatus, and method is provided for preventing condensation on a workpiece in an end station of an ion implantation system. A workpiece is cooled in a first environment, and is transferred to a load lock chamber that is in selective fluid communication with the end station and a second environment, respectively. A workpiece temperature monitoring device is configured to measure a temperature of the workpiece in the load lock chamber. An external monitoring device measures a temperature and relative humidity in the second environment, and a controller is configured to determine a temperature of the workpiece at which condensation will not form on the workpiece when the workpiece is transferred from the load lock chamber to the second environment.