公开(公告)号：US12173801B2

公开(公告)日：2024-12-24

申请号：US18042933

申请日：2021-08-24

Applicant: Atlas Copco Airpower N.V.

Inventor： Johan Gustaaf Karel Aerts ,  Ronny Antoine J. Cools ,  Nils Van Hoof ,  Andries Desiron

IPC: F16K1/46 ,  F16K1/36 ,  F16K51/02

Abstract: Seal for a vacuum valve comprising a circular base element, wherein the base element has a non-circular cross-section having an outer side extending in an axial direction and an inner side extending radially such that the inner side of the seal can be clampingly fixed in a sealing element of a valve. Further, the present invention relates to a sealing element, such a seal and a valve with such a sealing element.

公开(公告)号：US12152686B2

公开(公告)日：2024-11-26

申请号：US17987975

申请日：2022-11-16

Applicant: VAT Holding AG

Inventor： Mathias Schön ,  Bernhard Litscher ,  Mario Moser ,  Alen Franic ,  Gregor Beck

IPC: F16K3/314 ,  F16K51/02

Abstract: A valve plate has a plate portion with a front side elastomeric seal fitted thereon, and a connection apparatus arranged at the rear side for connecting the valve plate to a carrier apparatus of a vacuum valve. The connection apparatus includes first and second elongate connection portions, the first connection portion is located at one side and the second connection portion is located at the other side of the longitudinal center of the plate portion, with each being connected to the plate portion with the two spaced-apart ends thereof. The connection portions are spaced apart from the plate portion in the region between the two ends thereof, with a respective slot formed between the plate portion and the respective connection portion, and have in a central region of the longitudinal extent thereof a connection structure for connection to an end portion of a respective valve rod of the carrier apparatus.

公开(公告)号：US12060951B2

公开(公告)日：2024-08-13

申请号：US17769215

申请日：2020-10-15

Applicant: VAT Holding AG

Inventor： Alejandro Marzinotto ,  Adrian Eschenmoser ,  Andreas Hofer ,  Frantisek Balon ,  Michael Zickar

IPC: F16K41/10 ,  F16K31/04 ,  F16K37/00 ,  F16K51/02 ,  H01L21/687

CPC classification number: F16K37/005 ,  F16K31/04 ,  F16K41/10 ,  F16K51/02 ,  H01L21/68742

Abstract: Vacuum adjustment device for an active element movable in a process atmosphere region, having a coupling, a drive unit having an electric motor, which cooperates with the coupling in such a way that the coupling can be adjusted from a normal position into an active position and back. The device has a mechanical interface for connecting the vacuum adjustment device to a process volume providing a process atmosphere, a dynamic separating device for separating the process atmosphere from an outer atmosphere region and a control and processing unit at least electrically connected to the drive unit and designed to control the electric motor. The control and processing unit is designed to derive motor state information based on the extent of a motor operating parameter, and has a pressure determination functionality designed in such a way that a load difference is derived by comparing the motor state information with a known motor target state, and a pressure difference between the outer atmosphere region and the process atmosphere region is derived on the basis of the load difference.

公开(公告)号：US20240229967A9

公开(公告)日：2024-07-11

申请号：US18546251

申请日：2022-02-16

Applicant: VAT HOLDING AG

Inventor： Andreas HOFER ,  Adrian ESCHENMOSER ,  Xunshuo ZHANG ,  Frantisek BALON

IPC: F16K37/00 ,  F16K51/02

CPC classification number: F16K37/0041 ,  F16K51/02

Abstract: Disclosed is a valve for regulating a volume or mass flow and/or for closing and opening a valve opening, having a valve seat, a valve closure and a drive unit which is coupled to the valve closure and is set up to provide a movement of the valve closure in such a way that the valve closure can be adjusted from an open position to a closed position and back. The vacuum valve includes a radio arrangement having at least one coupling element and a memory element, and information relating to a valve state can be provided by means of the memory element.

公开(公告)号：US20240183463A1

公开(公告)日：2024-06-06

申请号：US18408832

申请日：2024-01-10

Applicant: Ichor Systems, Inc.

Inventor： Philip Ryan BARROS ,  Greg Patrick MULLIGAN ,  Dustin TOMHAVE ,  Christopher Bryant DAVIS

IPC: F16K51/02 ,  F16K11/22 ,  H01L21/67

CPC classification number: F16K51/02 ,  F16K11/22 ,  H01L21/67017

Abstract: Systems for processing articles are essential for semiconductor fabrication. In one embodiment, a system is disclosed comprising a plurality of fluid supplies configured to supply process fluids, a plurality of apparatuses for controlling flow, a plurality of mounting substrates, a vacuum manifold fluidly coupled to the plurality of mounting substrates, an outlet manifold fluidly coupled to the plurality of mounting substrates, a vacuum source fluidly coupled to the vacuum manifold, and a processing chamber fluidly coupled to the outlet manifold. The plurality of apparatuses for controlling flow have a bleed port and an outlet. The outlets of the plurality of apparatuses are fluidly coupled to corresponding outlet ports of the plurality of mounting substrates. The bleed ports of the plurality of apparatuses are fluidly coupled to the corresponding vacuum ports of the plurality of mounting substrates.

公开(公告)号：US11994234B2

公开(公告)日：2024-05-28

申请号：US17990397

申请日：2022-11-18

Applicant: Tokyo Electron Limited

Inventor： Norihiko Amikura ,  Masatomo Kita

IPC: F16K51/02 ,  F16K31/42

CPC classification number: F16K31/423 ,  F16K51/02

Abstract: A gate valve opens and closes a first opening of a first chamber in a vacuum processing apparatus. The gate valve includes: a valve element configured to open and close the first opening; a drive configured to move the valve element so that the valve element takes at least a closing position, where the valve element closes the first opening, and an opening position, where the valve element opens the first opening; a first gas line and a second gas line; and a first switching valve that connects one of the first gas line and the second gas line to the drive. The drive moves the valve element from the opening position to the closing position by pressure of gas supplied from the first gas line or the second gas line, and holds the valve element at the closing position by pressure of gas supplied from the second gas line.

公开(公告)号：US11971118B2

公开(公告)日：2024-04-30

申请号：US17767525

申请日：2020-12-03

Applicant: VAT Holding AG

Inventor： Marc Hübener ,  Arthur Büchel ,  Markus Poppeller

IPC: F16K51/02 ,  F16K3/02 ,  F16K3/18 ,  F16K27/04

CPC classification number: F16K51/02 ,  F16K3/0227 ,  F16K3/18 ,  F16K27/044

Abstract: A vacuum valve or door having a closure plate for closing an opening in a wall. The opening has opposing first and second longitudinal edges and shorter opposing first and second transverse edges. A sealing unit seals the closure plate against the wall in the closed position. The sealing unit includes a supporting frame having opposing first and second longitudinal legs and shorter opposing first and second transverse legs, on which supporting frame there is mounted on one side a circumferential closure plate seal and on the other side a circumferential wall seal. The supporting frame is secured to fastening points on the wall, with central portions of the first and second longitudinal legs being free with respect to the wall, or the supporting frame is secured to fastening points on the closure plate, with the central being free with respect to the closure plate.

公开(公告)号：US11948814B2

公开(公告)日：2024-04-02

申请号：US17747270

申请日：2022-05-18

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kangmin Park ,  Hyungho Kim ,  Dongwoo Wi ,  Hyunsoo Chun ,  Jiho Uh

IPC: H01L21/67 ,  F16K3/18 ,  F16K3/314 ,  F16K51/02 ,  H01L21/677 ,  F16K3/02

CPC classification number: H01L21/67126 ,  F16K51/02 ,  H01L21/67017 ,  H01L21/67739 ,  F16K3/0281 ,  F16K3/18 ,  F16K3/314

Abstract: A process chamber door for closing or opening an entrance of a process chamber through which a substrate to be process is loaded includes a seal plate including a front surface and a rear surface opposite to each other in a first direction, a connection block connected to the rear surface of the seal plate and including a central portion and two side portions connected to the rear surface of the seal plate, and a shaft connected to the central portion of the connection block. The connection block includes a first hinge groove and a second hinge groove. The first hinge groove is exposed at a bottom surface and a side surface of the connection block and the second hinge groove is exposed at an upper surface and the side surface of the connection block.

公开(公告)号：US11920696B2

公开(公告)日：2024-03-05

申请号：US18050260

申请日：2022-10-27

Applicant: SMC CORPORATION

Inventor： Takeshi Nishikawa

IPC: F16K31/163 ,  F16K3/02 ,  F16K3/18 ,  F16K3/312 ,  F16K31/12 ,  F16K31/524 ,  F16K51/02

CPC classification number: F16K31/163 ,  F16K3/0254 ,  F16K3/029 ,  F16K3/184 ,  F16K3/188 ,  F16K3/312 ,  F16K31/12 ,  F16K31/52475 ,  F16K51/02

Abstract: A first opening and closing mechanism, which includes a first cam groove and a first cam roller and which causes a valve assembly to reciprocate between an intermediate position and a first closed position, and a second opening and closing mechanism, which includes a second cam groove and a second cam roller and which causes the valve assembly to reciprocate between the intermediate position and a second closed position, are provided so as to be operable separately, the first and second opening and closing mechanisms being disposed adjacent to each other in a thickness direction D of a gate valve.

公开(公告)号：US11835146B2

公开(公告)日：2023-12-05

申请号：US17539372

申请日：2021-12-01

Applicant: Applied Materials, Inc.

Inventor： Andrew Nguyen ,  Yogananda Sarode Vishwanath ,  Xue Chang ,  Anilkumar Rayaroth ,  Chetan Naik ,  Balachandra Jatak Narayan

IPC: F16K11/22 ,  F16K1/42 ,  F16K1/36 ,  F16K51/02

CPC classification number: F16K1/42 ,  F16K1/36 ,  F16K11/22 ,  F16K51/02 ,  Y10T137/87877

Abstract: Embodiments of symmetric flow valves for use in a substrate processing chamber are provided herein. In some embodiments, a symmetric flow valve includes a valve body having sidewalls, a bottom plate, and a top plate that together define an interior volume, wherein the top plate includes one or more axisymmetrically disposed openings; a poppet disposed in the interior volume, wherein the poppet includes a central opening and a plurality of portions configured to selectively seal the one or more axisymmetrically disposed openings of the top plate when the symmetric flow valve is in a closed position; and a first actuator coupled to the poppet to position the poppet within the interior volume in at least an open position, where the poppet is spaced apart from the top plate to allow flow through the one or more axisymmetrically disposed openings of the top plate, and the closed position.