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公开(公告)号：US12228435B2
公开(公告)日：2025-02-18
申请号：US17013968
申请日：2020-09-08
Applicant: Ichor Systems, Inc.
Inventor： Daniel T. Mudd , Patti J. Mudd
Abstract: In one embodiment, a method for delivering a gas at a predetermined rate includes providing a gas flow control apparatus comprising a gas flow path extending from a gas inlet to a gas outlet, a proportional valve coupled to the gas flow path, an on/off valve coupled to the gas flow path, a volume being defined between the proportional valve and the on/off valve, and a flow restrictor having a flow impedance located downstream of the proportional valve. The volume is pressurized with the gas to a target set point by opening the proportional valve while the on/off valve is in an off state. Finally, the on/off valve is moved to the on state, delivering gas to the gas outlet.
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公开(公告)号：US11899477B2
公开(公告)日：2024-02-13
申请号：US17670723
申请日：2022-02-14
Applicant: Ichor Systems, Inc.
Inventor： Philip Ryan Barros , Greg Patrick Mulligan
CPC classification number: G05D7/0652 , F16K27/003 , F16K37/005
Abstract: Systems for processing articles are essential for semiconductor fabrication. In one embodiment, a system is disclosed comprising a plurality of fluid supplies configured to supply process fluids, a plurality of apparatuses for controlling flow, a plurality of mounting substrates, a vacuum manifold fluidly coupled to the plurality of mounting substrates, an outlet manifold fluidly coupled to the plurality of mounting substrates, a vacuum source fluidly coupled to the vacuum manifold, and a processing chamber fluidly coupled to the outlet manifold. The plurality of apparatuses for controlling flow have a bleed port and an outlet. The outlets of the plurality of apparatuses are fluidly coupled to corresponding outlet ports of the plurality of mounting substrates. The bleed ports of the plurality of apparatuses are fluidly coupled to the corresponding vacuum ports of the plurality of mounting substrates.
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公开(公告)号：US20240028055A1
公开(公告)日：2024-01-25
申请号：US18481298
申请日：2023-10-05
Applicant: Ichor Systems, Inc.
Inventor： Daniel T. Mudd , Marshall B. Grill , Norman L. Batchelor, II , Sean Joseph Penley , Michael Maeder , Patti J. Mudd , Zachariah Ezekiel McIntyre , Tyler James Wright , Matthew Eric Kovacic , Christopher Bryant Davis
CPC classification number: G05D7/0126 , G05D7/0682 , G01F1/6842 , G01F1/6847 , G01F15/002 , G05D7/0635 , F16K27/003
Abstract: A gas flow control system for delivering a plurality of gas flows. The gas flow control system has a gas flow path extending from a gas inlet to first and second gas outlets. First and second flow restrictors are operably coupled to the gas flow path. First and second valves are operably coupled to the gas flow path such that when both first and second valves are in a fully open state, flows of gas from the first and second gas outlets are split according to the impedances of the first and second flow restrictors.
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4.发明公开公开(公告)号：US20230296175A1
公开(公告)日：2023-09-21
申请号：US18321873
申请日：2023-05-23
Applicant: Ichor Systems, Inc.
Inventor： Stephen CARSON , Randolph Treur
CPC classification number: F16J15/061 , B23P19/10 , F16J15/104 , H01L21/67017
Abstract: Apparatuses for controlling fluid flow are important components for delivering process fluids for semiconductor fabrication. These apparatuses for controlling fluid flow require a variety of fluid flow components which are tightly packaged within the apparatuses for controlling flow. Servicing the apparatuses requires specialized equipment and methods which enable installation of seals in close quarters in apparatuses which are installed in the field. Seal retainers may be used to retain the seals during assembly of fluid flow components into apparatus for controlling flow.
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公开(公告)号：US20220283596A1
公开(公告)日：2022-09-08
申请号：US17670723
申请日：2022-02-14
Applicant: Ichor Systems, Inc.
Inventor： Philip Ryan Barros , Greg Patrick Mulligan
Abstract: Systems for processing articles are essential for semiconductor fabrication. In one embodiment, a system is disclosed comprising a plurality of fluid supplies configured to supply process fluids, a plurality of apparatuses for controlling flow, a plurality of mounting substrates, a vacuum manifold fluidly coupled to the plurality of mounting substrates, an outlet manifold fluidly coupled to the plurality of mounting substrates, a vacuum source fluidly coupled to the vacuum manifold, and a processing chamber fluidly coupled to the outlet manifold. The plurality of apparatuses for controlling flow have a bleed port and an outlet. The outlets of the plurality of apparatuses are fluidly coupled to corresponding outlet ports of the plurality of mounting substrates. The bleed ports of the plurality of apparatuses are fluidly coupled to the corresponding vacuum ports of the plurality of mounting substrates.
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Patent Agency Ranking
公开(公告)号：US20210366735A1
公开(公告)日：2021-11-25
申请号：US17393468
申请日：2021-08-04
Applicant: Ichor Systems, Inc.
Inventor： Philip Ryan Barros , Greg Patrick Mulligan , Chris Melcer
IPC: H01L21/67 , H01J37/32 , H01L21/677
Abstract: An improved fluid delivery system and method that directly controls the concentration of constituent components in a fluid mixture delivered, for example, to a process chamber. Pressure of the fluid mixture can also be directly controlled. A concentration sensor capable of measuring concentration of all of the constituent components in a fluid mixture is used to provide signals used to vary the flow rate of constituent gases under a closed loop feedback system. The signal output of one or more pressure sensors can also be used to provide a signal used to vary the flow rate of constituent gases under a closed loop feedback system. By directly controlling these two extremely important process variables, embodiments of the present invention provide a significant advantage in measurement accuracy over the prior art, enable real-time process control, reduce system level response time, and allow for a system with a significant footprint reduction.
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公开(公告)号：US20210356041A1
公开(公告)日：2021-11-18
申请号：US17318241
申请日：2021-05-12
Applicant: Ichor Systems, Inc.
Inventor： Stephen CARSON , Randolph TREUR
Abstract: Apparatuses for controlling fluid flow are important components for delivering process fluids for semiconductor fabrication. These apparatuses for controlling fluid flow require a variety of fluid flow components which are tightly packaged within the apparatuses for controlling flow. Servicing the apparatuses requires specialized equipment and methods which enable installation of seals in close quarters in apparatuses which are installed in the field. Seal retainers may be used to retain the seals during assembly of fluid flow components into apparatus for controlling flow.
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公开(公告)号：US12222039B2
公开(公告)日：2025-02-11
申请号：US17697038
申请日：2022-03-17
Applicant: Ichor Systems, Inc.
Inventor： Stephen Carson
Abstract: Apparatuses for controlling fluid flow are important components for delivering process fluids for semiconductor fabrication. These apparatuses for controlling fluid flow frequently rely on valves which can provide flows at different rates and in a minimally turbulent manner. In one embodiment, a valve assembly is disclosed, the valve assembly having a valve body, a closure member, a seat, and a radial flow guide. The radial flow guide has a plurality of flow passages. The closure member has a needle, the needle having a plurality of grooves therein. The resulting valve assembly enables improved control of fluid and reduces turbulence in the resultant flow.
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公开(公告)号：US20240026909A1
公开(公告)日：2024-01-25
申请号：US18375629
申请日：2023-10-02
Applicant: Ichor Systems, Inc.
Inventor： Sean Joseph Penley , Zachariah Ezekiel McIntyre , Tyler James Wright , Matthew Eric Kovacic , Christopher Bryant Davis
CPC classification number: F15D1/025 , H01L21/67017 , F16K1/32
Abstract: Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. These apparatuses for controlling gas flow frequently rely on flow restrictors which can provide a known flow impedance of the process gas. In one embodiment, a flow restrictor is disclosed, the flow restrictor constructed of a plurality of layers, one or more of the layers having a flow passage therein that extends from a first aperture at a first end of the flow restrictor to a second aperture at a second end of the flow restrictor.
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公开(公告)号：US11682565B2
公开(公告)日：2023-06-20
申请号：US17393468
申请日：2021-08-04
Applicant: Ichor Systems, Inc.
Inventor： Philip Ryan Barros , Greg Patrick Mulligan , Chris Melcer
IPC: H01J37/32 , H01L21/67 , H01L21/677
CPC classification number: H01L21/67017 , H01J37/32449 , H01L21/6715 , H01L21/67161 , H01L21/67739
Abstract: An improved fluid delivery system and method that directly controls the concentration of constituent components in a fluid mixture delivered, for example, to a process chamber. Pressure of the fluid mixture can also be directly controlled. A concentration sensor capable of measuring concentration of all of the constituent components in a fluid mixture is used to provide signals used to vary the flow rate of constituent gases under a closed loop feedback system. The signal output of one or more pressure sensors can also be used to provide a signal used to vary the flow rate of constituent gases under a closed loop feedback system. By directly controlling these two extremely important process variables, embodiments of the present invention provide a significant advantage in measurement accuracy over the prior art, enable real-time process control, reduce system level response time, and allow for a system with a significant footprint reduction.
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