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公开(公告)号：US12125695B2
公开(公告)日：2024-10-22
申请号：US17795775
申请日：2021-01-26
申请人： Cymer, LLC
IPC分类号： H01S3/036 , F16C19/06 , F16C35/04 , H01J61/02 , H01J61/16 , H01J61/30 , H01J61/52 , H01S3/225
CPC分类号： H01J61/30 , F16C19/06 , F16C35/04 , H01J61/025 , H01J61/16 , H01J61/52 , H01S3/036 , H01S3/225
摘要： A light source apparatus (100) includes: a chamber (101) having a chamber wall (103) defining an opening (107); and a support apparatus (110) including a support device (111) positioned within the opening of the chamber wall. The support device includes: a cup (112) having an inner surface (114) configured to retain a movable apparatus and an outer surface (116) having a first outer diameter; and a plurality of rods (118) arranged at the outer surface of the cup such that the arrangement of the plurality of rods defines a second outer diameter, the second outer diameter greater than the first outer diameter. The chamber wall is configured to hold the support device such that the chamber wall contacts the plurality of rods when the support device is positioned within the opening of the chamber wall, and the outer surface of the cup does not contact the chamber wall.
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公开(公告)号：US12124053B2
公开(公告)日：2024-10-22
申请号：US18081971
申请日：2022-12-15
申请人： Cymer, LLC
发明人： Eric Anders Mason
IPC分类号： G02B26/00 , G01J3/06 , G01J3/14 , G01J3/18 , G02B5/04 , G02B27/12 , G02B27/14 , G02B27/42 , G03F7/00 , H01L21/027 , H01S3/00 , H01S3/08 , H01S3/23 , G01J3/12 , H01S3/225
CPC分类号： G02B27/4244 , G01J3/06 , G01J3/14 , G01J3/1804 , G02B26/007 , G03F7/70575 , H01L21/0275 , H01S3/0085 , H01S3/08004 , H01S3/2308 , G01J2003/061 , G01J2003/063 , G01J2003/064 , G01J2003/069 , G01J2003/1208 , H01S3/08009 , H01S3/225 , H01S3/2366
摘要： A spectral feature selection apparatus includes a dispersive optical element arranged to interact with a pulsed light beam; three or more refractive optical elements arranged in a path of the pulsed light beam between the dispersive optical element and a pulsed optical source; and one or more actuation systems, each actuation system associated with a refractive optical element and configured to rotate the associated refractive optical element to thereby adjust a spectral feature of the pulsed light beam. At least one of the actuation systems is a rapid actuation system that includes a rapid actuator configured to rotate its associated refractive optical element about a rotation axis. The rapid actuator includes a rotary stepper motor having a rotation shaft that rotates about a shaft axis that is parallel with the rotation axis of the associated refractive optical element.
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公开(公告)号：US20240319612A1
公开(公告)日：2024-09-26
申请号：US18576277
申请日：2022-06-06
申请人： Cymer, LLC
CPC分类号： G03F7/705 , G03F7/2004 , G03F7/70033 , G03F7/70041 , G03F7/70525 , G03F7/70575
摘要： A prediction apparatus is in communication with an optical source configured to produce a pulsed light beam for use by a photolithography exposure apparatus. The prediction apparatus includes: a photolithography module in communication with the photolithography exposure apparatus and configured to receive an identifier, the received identifier lacking data relating to an actual firing pattern defining properties of the pulsed light beam; and an optical source module in communication with the optical source, the optical source module configured to provide a forecast firing pattern to the optical source. The forecast firing pattern is associated with and determined from the received identifier, and forecasts one or more properties of the actual firing pattern.
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公开(公告)号：US20240291226A1
公开(公告)日：2024-08-29
申请号：US18571826
申请日：2022-06-02
申请人： Cymer, LLC
发明人： Siyu Chen , Spencer Ryan Williams
CPC分类号： H01S3/134 , H01S3/036 , H01S3/1305 , H01S3/225 , H01S3/2308 , H01S3/2366 , G03F7/2004 , G03F7/70025
摘要： A gas control apparatus includes a control system in communication with a gas discharge chamber. The control system includes a performance monitoring module configured to, during standard mode of operation of the gas discharge chamber and in between performance of gas recovery schemes on the gas discharge chamber that use a gas recovery setting: compare one or more performance parameters of the gas discharge chamber to respective thresholds; determine whether the gas recovery setting needs to be adjusted based on the comparison; and adjust the value for the gas recovery setting based on the determination. The control system includes a gas recovery module configured to perform the gas recovery scheme, the gas recovery module being configured to access the most recently adjusted value for the gas recovery setting from the performance monitoring module when performing the current gas recovery scheme.
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公开(公告)号：US12007696B2
公开(公告)日：2024-06-11
申请号：US17779290
申请日：2020-11-18
申请人： Cymer, LLC
CPC分类号： G03F7/70508 , G03F7/70025 , G03F7/70041 , H01S3/1305 , G03F7/70033
摘要： A system includes a laser source configured to generate one or more bursts of laser pulses and a data collection and analysis system. The data collection and analysis system is configured to receive, from the laser source, data associated with the one or more bursts of laser pulses and determine, based on the received data, that the one or more bursts of laser pulses are for external use. The data collection and analysis system is further configured to determine, based on the received data, whether the one or more bursts of laser pulses are for an on-wafer operation or are for a calibration operation.
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公开(公告)号：US11988966B2
公开(公告)日：2024-05-21
申请号：US15734359
申请日：2019-05-16
申请人： Cymer, LLC
发明人： Andrei Dorobantu , Shreyas Bhaban
CPC分类号： G03F7/70025 , G03F7/70483 , H01S3/036 , H01S3/097 , H01S3/10069 , H01S3/134 , H01S3/225 , H01S3/2308
摘要： A system includes an optical source configured to emit a pulsed light beam, the optical source comprising one or more chambers, each of the one or more chambers configured to hold a gaseous gain medium, the gaseous gain medium being associated with an assumed gas life; at least one detection module configured to: receive and analyze data related to the pulsed light beam, and produce a beam quality metric based on the data related to the pulsed light beam; and a monitoring module configured to: analyze the beam quality metric, determine a health status of the gaseous gain medium based on the analysis of the beam quality metric, and produce a status signal based on the determined health status, the status signal indicating whether to extend use of the gaseous gain medium beyond the assumed gas life or to end use of the gaseous gain medium.
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公开(公告)号：US20240152063A1
公开(公告)日：2024-05-09
申请号：US18281676
申请日：2022-02-24
申请人： Cymer, LLC
IPC分类号： G03F7/00
CPC分类号： G03F7/70975 , G03F7/70025 , G03F7/70525 , G03F7/70533
摘要： Systems for maintaining light sources for semiconductor photolithography in which a module making up part of the light source is evaluated at various pulse counts to produce a binary prediction as to whether the module is sufficiently likely to operate without failure in an ensuing sequence of pulses. The binary prediction may be made by a machine learning model trained on metrics extracted from measurements taken on deinstalled modules. A group of models, each trained differently, can be made available according to a selection made by the user or according to the maintenance objectives of the user.
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公开(公告)号：US20240036475A1
公开(公告)日：2024-02-01
申请号：US18481524
申请日：2023-10-05
申请人： Cymer, LLC
发明人： Kuo-Tai Teng , Rahul Ahlawat
CPC分类号： G03F7/70025 , G03F7/70575 , H01S3/08004 , H01S3/10046
摘要： A radiation system for controlling pulses of radiation comprising an optical element configured to interact with the pulses of radiation to control a characteristic of the pulses of radiation, an actuator configured to actuate the optical element according to a control signal received from a controller, the control signal at least partially depending on a reference pulse repetition rate of the radiation system and, a processor configured to receive pulse information from the controller and use the pulse information to determine an adjustment to the control signal. The radiation system may be used to improve an accuracy of a lithographic apparatus operating in a multi-focal imaging mode.
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公开(公告)号：US20240030673A1
公开(公告)日：2024-01-25
申请号：US18265765
申请日：2021-12-09
申请人： Cymer, LLC
发明人： Changqi You , Paul Christopher Melcher , Yuda Wang
CPC分类号： H01S3/0912 , H01S3/2308 , H01S3/225 , H01S3/094076 , H01F27/24 , H01S2302/00
摘要： One or more properties of an electrical quantity are determined based on one or more operating characteristics of an optical system that includes a laser system; an impedance of a magnetic core of a magnetic switching network is adjusted by providing the electrical quantity to a coil that is magnetically coupled to the magnetic core; and after adjusting the impedance of the magnetic core, a pulse of light is produced. Producing the pulse of light includes: saturating the magnetic core such that an electrical pulse is provided to an excitation mechanism of the laser system.
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公开(公告)号：US11860036B2
公开(公告)日：2024-01-02
申请号：US17928384
申请日：2021-05-25
申请人： Cymer, LLC
IPC分类号： G01B9/02055 , G01J3/28 , G01J3/26 , G01J9/02 , G03F7/00
CPC分类号： G01J3/28 , G01B9/02074 , G01J3/26 , G01J9/0246 , G03F7/70575
摘要： Information relating to an etalon is accessed, the etalon being associated with a calibration parameter having a pre-set default value, the etalon being configured to produce an interference pattern including a plurality of fringes from a received light beam, and the information relating to the etalon including first spatial information related to a first fringe of the plurality of fringes and second spatial information related to a second fringe of the plurality of fringes. A first wavelength value of the received light beam is determined based on the spatial information related to the first fringe and an initial value of the calibration parameter. A second wavelength value of the received light beam is determined based on the spatial information related to the second fringe and the initial value of the calibration parameter. The first wavelength value and the second wavelength value are compared to determine a measurement error value.
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