Particle beam device having a sample holder
    1.
    发明授权
    Particle beam device having a sample holder 有权
    具有样品架的颗粒束装置

    公开(公告)号:US09190242B2

    公开(公告)日:2015-11-17

    申请号:US13239535

    申请日:2011-09-22

    IPC分类号: H01J37/20 H01J37/28

    摘要: A particle beam device and a sample receptacle apparatus, which has a sample holder, are disclosed. The sample holder is arranged in a movable fashion along at least a first axis and along at least a second axis. Furthermore, the sample holder is arranged in a rotatable fashion about a first axis of rotation and about a second axis of rotation. A first sample holding device is arranged relative to the sample holder in a rotatable fashion about a third axis of rotation, in which the third axis of rotation and the second axis of rotation are at least in part arranged laterally offset with respect to one another. Furthermore, a control apparatus is provided, in which the first sample holding device is rotatable about the third axis of rotation into an analysis position and/or treating position using the control apparatus.

    摘要翻译: 公开了一种具有样品保持器的粒子束装置和样品容器装置。 样品保持器沿着至少第一轴线和至少第二轴线以可移动的方式布置。 此外,样品保持器围绕第一旋转轴线和约第二旋转轴线可旋转地布置。 第一样品保持装置以关于第三旋转轴线的可旋转方式相对于样品保持器布置,其中第三旋转轴线和第二旋转轴线至少部分地相对于彼此横向偏移地布置。 此外,提供一种控制装置,其中第一样品保持装置可以使用控制装置绕第三旋转轴线旋转到分析位置和/或处理位置。

    Aperture unit for a particle beam device
    2.
    发明授权
    Aperture unit for a particle beam device 有权
    用于粒子束装置的孔径单元

    公开(公告)号:US08779381B2

    公开(公告)日:2014-07-15

    申请号:US13200155

    申请日:2011-09-19

    IPC分类号: H01J27/00 H01J3/14

    摘要: An aperture unit for a particle beam device, in particular an electron beam device, is disclosed. Deposit supporting units are arranged at the aperture unit, with which deposit supporting units contaminations can be bound in such a way that the contaminations can no longer deposit at an aperture opening of the aperture unit. Coatings which can be arranged on the aperture unit make it possible to reduce interactions which cause contaminations to deposit at the aperture opening.

    摘要翻译: 公开了一种用于粒子束装置,特别是电子束装置的孔单元。 沉积支撑单元布置在孔单元处,沉积支撑单元污染物可以以这样的方式结合,使得污染物不再能够沉积在孔单元的孔口处。 可以布置在孔单元上的涂层使得可以减少导致污染物沉积在孔口处的相互作用。

    Transmission Electron Microscope and Method of Operating a Transmission Electron Microscope
    3.
    发明申请
    Transmission Electron Microscope and Method of Operating a Transmission Electron Microscope 有权
    透射电子显微镜和操作透射电子显微镜的方法

    公开(公告)号:US20130092836A1

    公开(公告)日:2013-04-18

    申请号:US13337033

    申请日:2011-12-23

    申请人: Joerg Fober

    发明人: Joerg Fober

    IPC分类号: H01J37/26

    摘要: A transmission electron microscope comprises a high-voltage source for outputting a high voltage at two high-voltage outputs and outputting a control signal at a controller output; a focusing lens for focusing a beam; a monochromator which allows only those particles of the particle beam to pass whose kinetic energy is within an adjustable energy interval; an energy-dispersive component which deflects particles of different kinetic energies differently; a detector; and a controller connected to the controller output, which controls a beam deflector, arranged between the energy-dispersive component and the detector, the monochromator, or the energy-dispersive component in dependence on the control signal, or superposes plural of intensity distributions detected by the detector with an offset relative to one another, which offset is set in dependence on the control signal.

    摘要翻译: 透射电子显微镜包括用于在两个高电压输出端输出高电压并在控制器输出端输出控制信号的高电压源; 用于聚焦光束的聚焦透镜; 单色仪,其仅允许粒子束的那些粒子通过,其动能在可调节的能量间隔内; 能量分散组件,其不同地偏转不同动能的颗粒; 检测器 以及控制器,其连接到控制器输出,其根据控制信号控制布置在能量色散部件和检测器,单色器或能量色散部件之间的光束偏转器,或叠加由 检测器相对于彼此具有偏移,该偏移根据控制信号设定。

    Device for deflecting or guiding in a particle beam
    4.
    发明授权
    Device for deflecting or guiding in a particle beam 有权
    用于在粒子束中偏转或引导的装置

    公开(公告)号:US08421028B2

    公开(公告)日:2013-04-16

    申请号:US12733931

    申请日:2008-09-26

    申请人: Dirk Preikszas

    发明人: Dirk Preikszas

    IPC分类号: H01J37/30

    摘要: A device for deflecting a particle beam out of a beam axis, or for guiding a particle beam into the beam axis, has a simple design, requires little space, and additionally ensures that no area of an object that is not to be struck is struck by a particle beam. The device may include components in the following sequence along the beam axis: first deflection element, a magnetic apparatus for providing a magnetic field axially to the beam axis, and a second deflection element. A particle beam apparatus may have a device of this type.

    摘要翻译: 用于将粒子束偏离射束轴线或用于将粒子束引导到射束轴线中的装置具有简单的设计,需要很小的空间,并且另外确保不会撞击不被撞击的物体的区域 通过粒子束。 装置可以沿着光束轴线包括以下顺序的部件:第一偏转元件,用于向光束轴线轴向提供磁场的磁性装置和第二偏转元件。 粒子束装置可以具有这种类型的装置。

    Particle beam device with deflection system
    5.
    发明授权
    Particle beam device with deflection system 有权
    带偏转系统的粒子束装置

    公开(公告)号:US08405045B2

    公开(公告)日:2013-03-26

    申请号:US13306529

    申请日:2011-11-29

    IPC分类号: H01J3/26 H01J3/14

    摘要: A particle beam device includes a particle beam generator, an objective lens, and first and second deflection systems for deflecting the particle beam in an object plane defined by the objective lens. In a first operating mode, the first deflection system generates a first deflection field and the second deflection system generates a second deflection field. In a second operating mode, the first deflection system generates a third deflection field and the second deflection system generates a fourth deflection field.

    摘要翻译: 粒子束装置包括粒子束发生器,物镜,以及用于使粒子束偏转在由物镜限定的物平面中的第一和第二偏转系统。 在第一操作模式中,第一偏转系统产生第一偏转场,而第二偏转系统产生第二偏转场。 在第二操作模式中,第一偏转系统产生第三偏转场,第二偏转系统产生第四偏转场。

    Particle Beam Microscope
    6.
    发明申请
    Particle Beam Microscope 审中-公开
    粒子束显微镜

    公开(公告)号:US20120326030A1

    公开(公告)日:2012-12-27

    申请号:US13337268

    申请日:2011-12-26

    IPC分类号: H01J37/26

    摘要: A particle beam microscope comprises a magnetic lens 3 having an optical axis 53 and a pole piece 21. An object 5 to be examined is mounted at a point of intersection 51 between an optical axis 53 and the object plane 19. First and second X-ray detectors 33 have first and second radiation-sensitive substrates 35 arranged such that a first elevation angle β1 between a first straight line 551 extending through the point of intersection 51 and a centre of the first substrate 351 and the object plane 19 differs from a second elevation angle β2 between a second straight line 552 extending through the point of intersection 51 and a centre of the second substrate 352 and the object plane 19 by more than 14°.

    摘要翻译: 粒子束显微镜包括具有光轴53和极片21的磁透镜3.被检查物5安装在光轴53与物面19之间的交点51处。第一和第二X射线 射线检测器33具有第一和第二辐射敏感基板35,其布置成使得延伸穿过交点51的第一直线551与第一基板351的中心与物平面19之间的第一仰角& 在相交点51延伸的第二直线552和第二基板352的中心与物平面19之间的第二仰角& bgr2大于14°。

    Positioning device for a particle beam apparatus
    7.
    发明授权
    Positioning device for a particle beam apparatus 有权
    粒子束装置的定位装置

    公开(公告)号:US08283641B2

    公开(公告)日:2012-10-09

    申请号:US12454268

    申请日:2009-05-14

    IPC分类号: H01J37/26

    摘要: A positioning device and a particle beam apparatus including a positioning device ensure reliable positioning of a holder for holding an object at any working distance. The positioning device includes a positionable holder for holding the object. A light source generates a light beam which is guided in the direction of the positionable holder. A detector detects the light beam. An injection area injects particles of a particle beam such that they are guided in the direction of the positionable holder. The light beam passes the injection area. The injection area has an output side for the light beam and the particle beam, which is directed toward the holder. The detector includes a detector element situated in an area between the output side and the holder. The light source includes a light source element situated in an area which extends away from the holder, starting from the output side.

    摘要翻译: 包括定位装置的定位装置和粒子束装置确保用于在任何工作距离处保持物体的保持器的可靠定位。 定位装置包括用于保持物体的可定位保持器。 光源产生沿可定位的保持器的方向被引导的光束。 检测器检测光束。 注射区域注入粒子束的颗粒,使得它们在可定位保持器的方向上被引导。 光束通过注射区域。 注射区域具有用于光束的输出侧和朝向保持器的粒子束。 检测器包括位于输出侧和保持器之间的区域中的检测器元件。 光源包括从输出侧开始位于远离保持器延伸的区域中的光源元件。

    Particle Beam Microscope and Method for Operating the Particle Beam Microscope
    9.
    发明申请
    Particle Beam Microscope and Method for Operating the Particle Beam Microscope 有权
    粒子束显微镜及粒子束显微镜的操作方法

    公开(公告)号:US20120074317A1

    公开(公告)日:2012-03-29

    申请号:US13249006

    申请日:2011-09-29

    IPC分类号: H01J37/26

    摘要: A method for operating a particle beam microscope comprising detecting light rays or particles which emanate from a structure, wherein the structure comprises at least one of: at least a portion of a surface of an object and at least a portion of a surface of an object holder of the particle beam microscope; generating a surface model of the structure depending on the at least one of the detected light rays and the particles; determining a position and an orientation of the surface model of the structure relative to the object region; determining a measurement location relative to the surface model of the structure; and positioning the object depending on the generated surface model of the structure, depending on the determined position and orientation of the surface model of the structure, and depending on the determined measurement location.

    摘要翻译: 一种用于操作粒子束显微镜的方法,包括检测从结构发出的光线或颗粒,其中所述结构包括以下至少一个:物体的表面的至少一部分和物体的表面的至少一部分 粒子束显微镜的夹持器; 根据检测到的光线和颗粒中的至少一个产生结构的表面模型; 确定所述结构的表面模型相对于所述对象区域的位置和取向; 确定相对于所述结构的表面模型的测量位置; 并且取决于结构的表面模型的确定的位置和取向,并且取决于所确定的测量位置,根据所生成的结构的表面模型来定位对象。

    CHARGED PARTICLE BEAM SYSTEM
    10.
    发明申请
    CHARGED PARTICLE BEAM SYSTEM 有权
    充电颗粒光束系统

    公开(公告)号:US20120025094A1

    公开(公告)日:2012-02-02

    申请号:US13190871

    申请日:2011-07-26

    IPC分类号: G21K1/08

    CPC分类号: H01J37/295 G01N23/20058

    摘要: A charged particle beam system for performing precession diffraction includes a lens 11 for focusing a beam 5 in an object plane 9, and an objective lens 13 having a diffraction plane 27. A doublet 53 of lenses 35, 63 images the diffraction plane 27 into an intermediate diffraction plane 69 where a multipole 55 is located. A doublet 57 of lenses 65, 93 images the intermediate diffraction plane 69 into an intermediate diffraction plane 71 where a multipole 59 is located. A first deflection system 15 upstream of the object plane 9 can tilt to change an angle of incidence of the beam on the object plane. A second deflection system 37 between lenses 35 and 63 tilts the beam such that the change of the angle of incidence of the charged particle beam on the object plane is compensated.

    摘要翻译: 用于进行进动衍射的带电粒子束系统包括用于将光束5聚焦在物平面9中的透镜11和具有衍射平面27的物镜13.透镜35,63的双折射53将衍射平面27成像为 中间衍射平面69,其中多极55位于其中。 透镜65,93的双重透镜57将中间衍射平面69成像为多极59所在的中间衍射平面71。 在物平面9上游的第一偏转系统15可以倾斜以改变光束在物平面上的入射角。 透镜35和63之间的第二偏转系统37使光束倾斜,使得补偿了物体平面上的带电粒子束的入射角的变化。