公开(公告)号：US09230789B2

公开(公告)日：2016-01-05

申请号：US12931272

申请日：2011-01-27

Applicant: Alexander Laue ,  Albrecht Glasmachers ,  Christian Hendrich ,  Dirk Preikszas ,  Michel Aliman ,  Hubert Mantz ,  Ulrike Zeile ,  Holger Dömer

Inventor： Alexander Laue ,  Albrecht Glasmachers ,  Christian Hendrich ,  Dirk Preikszas ,  Michel Aliman ,  Hubert Mantz ,  Ulrike Zeile ,  Holger Dömer

IPC: H01J49/42 ,  H01J49/06 ,  H01J49/14

CPC classification number: H01J49/065 ,  H01J49/067 ,  H01J49/068 ,  H01J49/14 ,  H01J49/4225 ,  H01J49/4235

Abstract: An apparatus for focusing and for storage of ions and an apparatus for separation of a first pressure area from a second pressure area are disclosed, in particular for an analysis apparatus for ions. A particle beam device may have at least one of the abovementioned apparatuses. A container for holding ions and at least one multipole unit are provided. The multipole unit has a through-opening with a longitudinal axis as well as a multiplicity of electrodes. A first set of the electrodes is at a first radial distance from the longitudinal axis. A second set of the electrodes is in each case at a second radial distance from the longitudinal axis. The first radial distance is less than the second radial distance. Alternatively or additionally, the apparatus may have an elongated opening with a radial extent. The opening has a longitudinal extent which is greater than the radial extent.

Abstract translation: 公开了一种用于聚焦和存储离子的装置和用于将第一压力区域与第二压力区域分离的装置，特别是用于离子分析装置。 粒子束装置可以具有上述装置中的至少一个。 提供了用于保持离子和至少一个多极单元的容器。 多极单元具有纵向轴线的通孔以及多个电极。 第一组电极处于距纵向轴线的第一径向距离处。 在每种情况下，第二组电极距离纵向轴线的第二径向距离。 第一径向距离小于第二径向距离。 或者或另外，该装置可以具有径向范围的细长开口。 开口具有大于径向范围的纵向范围。

公开(公告)号：US20120025077A1

公开(公告)日：2012-02-02

申请号：US13247979

申请日：2011-09-28

Applicant: Hubert Mantz ,  Rainer Arnold ,  Michael Albiez

Inventor： Hubert Mantz ,  Rainer Arnold ,  Michael Albiez

IPC: H01J37/26

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/222 ,  H01J37/244 ,  H01J37/256

Abstract: A particle beam system comprises a particle beam source 5 for generating a primary particle beam 13, an objective lens 19 for focusing the primary particle beam 13 in an object plane 23; a particle detector 17; and an X-ray detector 47 arranged between the objective lens and the object plane. The X-ray detector comprises plural semiconductor detectors, each having a detection surface 51 oriented towards the object plane. A membrane is disposed between the object plane and the detection surface of the semiconductor detector, wherein different semiconductor detectors have different membranes located in front, the different membranes differing with respect to a secondary electron transmittance.

Abstract translation: 粒子束系统包括用于产生一次粒子束13的粒子束源5，用于将一次粒子束13聚焦在物平面23中的物镜19; 粒子检测器17; 以及布置在物镜和物平面之间的X射线检测器47。 X射线检测器包括多个半导体检测器，每个半导体检测器具有朝向物体平面的检测表面51。 膜位于物体平面和半导体检测器的检测表面之间，其中不同的半导体检测器具有位于前面的不同的膜，不同的膜相对于二次电子透射率不同。

公开(公告)号：US08368020B2

公开(公告)日：2013-02-05

申请号：US13247995

申请日：2011-09-28

Applicant: Hubert Mantz ,  Rainer Arnold ,  Michael Albiez

Inventor： Hubert Mantz ,  Rainer Arnold ,  Michael Albiez

IPC: H01J37/26 ,  H01J37/244 ,  H01J37/10

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/222 ,  H01J37/244 ,  H01J37/256

Abstract: A particle beam system comprises a particle beam source 5 for generating a primary particle beam 13, an objective lens 19 for focusing the primary particle beam 13 in an object plane 23; a particle detector 17; and an X-ray detector 47 arranged between the objective lens and the object plane. The X-ray detector comprises plural semiconductor detectors, each having a detection surface 51 oriented towards the object plane. A membrane is disposed between the object plane and the detection surface of the semiconductor detector, wherein different semiconductor detectors have different membranes located in front, the different membranes differing with respect to a secondary electron transmittance.

公开(公告)号：US08368019B2

公开(公告)日：2013-02-05

申请号：US13247979

申请日：2011-09-28

Applicant: Hubert Mantz ,  Rainer Arnold ,  Michael Albiez

Inventor： Hubert Mantz ,  Rainer Arnold ,  Michael Albiez

IPC: H01J37/26 ,  H01J37/244 ,  H01J37/10

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/222 ,  H01J37/244 ,  H01J37/256

Abstract: A particle beam system comprises a particle beam source 5 for generating a primary particle beam 13, an objective lens 19 for focusing the primary particle beam 13 in an object plane 23; a particle detector 17; and an X-ray detector 47 arranged between the objective lens and the object plane. The X-ray detector comprises plural semiconductor detectors, each having a detection surface 51 oriented towards the object plane. A membrane is disposed between the object plane and the detection surface of the semiconductor detector, wherein different semiconductor detectors have different membranes located in front, the different membranes differing with respect to a secondary electron transmittance.

Abstract translation: 粒子束系统包括用于产生一次粒子束13的粒子束源5，用于将一次粒子束13聚焦在物平面23中的物镜19; 粒子检测器17; 以及布置在物镜和物平面之间的X射线检测器47。 X射线检测器包括多个半导体检测器，每个半导体检测器具有朝向物体平面的检测表面51。 膜位于物体平面和半导体检测器的检测表面之间，其中不同的半导体检测器具有位于前面的不同的膜，不同的膜相对于二次电子透射率不同。

公开(公告)号：US20110031215A1

公开(公告)日：2011-02-10

申请号：US12806111

申请日：2010-08-05

Applicant: Hubert Mantz ,  Rainer Arnold ,  Michael Albiez

Inventor： Hubert Mantz ,  Rainer Arnold ,  Michael Albiez

IPC: G01N23/083 ,  G01N23/00 ,  C23F1/00

CPC classification number: G01N23/2252 ,  H01J37/222 ,  H01J37/244 ,  H01J37/256 ,  H01J37/28 ,  H01J2237/226 ,  H01J2237/2442 ,  H01J2237/24465 ,  H01J2237/2448

Abstract: An inspection method comprises focusing a particle beam onto a sample; operating at least one detector located close to the sample; assigning detection signals generated by the at least one detector to different intensity intervals; determining, based on the detection signals assigned to the intensity intervals, at least one first signal component related to electrons incident on the detector; and determining, based on the detection signals assigned to the intensity intervals, at least one second signal component related to X-rays incident on the detector.

Abstract translation: 检查方法包括将颗粒束聚焦到样品上; 操作位于样品附近的至少一个检测器; 将由所述至少一个检测器产生的检测信号分配给不同的强度间隔; 基于分配给所述强度间隔的检测信号，确定与入射到所述检测器上的电子有关的至少一个第一信号分量; 以及基于分配给所述强度间隔的检测信号，确定与入射在所述检测器上的X射线有关的至少一个第二信号分量。

公开(公告)号：US08487252B2

公开(公告)日：2013-07-16

申请号：US13249006

申请日：2011-09-29

Applicant: Simon Diemer ,  Hubert Mantz ,  Jaroslaw Paluszynski

Inventor： Simon Diemer ,  Hubert Mantz ,  Jaroslaw Paluszynski

IPC: H01J37/26 ,  H01J37/10 ,  G01N23/00

CPC classification number: H01J37/222 ,  H01J37/226 ,  H01J37/28

Abstract: A method for operating a particle beam microscope comprising detecting light rays or particles which emanate from a structure, wherein the structure comprises at least one of: at least a portion of a surface of an object and at least a portion of a surface of an object holder of the particle beam microscope; generating a surface model of the structure depending on the at least one of the detected light rays and the particles; determining a position and an orientation of the surface model of the structure relative to the object region; determining a measurement location relative to the surface model of the structure; and positioning the object depending on the generated surface model of the structure, depending on the determined position and orientation of the surface model of the structure, and depending on the determined measurement location.

Abstract translation: 一种用于操作粒子束显微镜的方法，包括检测从结构发出的光线或颗粒，其中所述结构包括以下至少一个：物体的表面的至少一部分和物体的表面的至少一部分 粒子束显微镜的夹持器; 根据检测到的光线和颗粒中的至少一个产生结构的表面模型; 确定所述结构的表面模型相对于所述对象区域的位置和取向; 确定相对于所述结构的表面模型的测量位置; 并且取决于结构的表面模型的确定的位置和取向，并且取决于所确定的测量位置，根据所生成的结构的表面模型来定位对象。

公开(公告)号：US08227752B1

公开(公告)日：2012-07-24

申请号：US13029998

申请日：2011-02-17

Applicant: Hubert Mantz ,  Jaroslaw Paluszynski

Inventor： Hubert Mantz ,  Jaroslaw Paluszynski

IPC: H01J37/28 ,  H01J37/256

CPC classification number: H01J37/28 ,  H01J2237/226 ,  H01J2237/2611

Abstract: A method of inspecting an object using a scanning particle beam microscope, the method comprising: operating the microscope in a high-resolution mode by laterally scanning a particle beam of the high-resolution mode; operating the microscope in a 3D-mode for acquiring a three-dimensional representation of the object by laterally scanning a particle beam of the 3D-mode; wherein the particle beam of the high-resolution mode and the particle beam of the 3D-mode have a same beam energy and a same focus distance; and wherein an aperture angle of the particle beam of the 3D-mode is at least 2 times greater, or at least 5 times greater, or at least 10 times greater, or at least 100 times greater than an aperture angle of the particle beam of the high-resolution mode.

Abstract translation: 一种使用扫描粒子束显微镜检查物体的方法，所述方法包括：通过横向扫描高分辨率模式的粒子束以高分辨率模式操作显微镜; 以3D模式操作显微镜，用于通过横向扫描3D模式的粒子束来获取对象的三维表示; 其中高分辨率模式的粒子束和3D模式的粒子束具有相同的光束能量和相同的焦距; 并且其中所述3D模式的所述粒子束的孔径角比所述三维模式的所述粒子束的孔径角大至少为所述三维模式的所述粒子束的孔径角的2倍，或至少大于或等于5倍，或者至少大于10倍， 高分辨率模式。

公开(公告)号：US20110220788A1

公开(公告)日：2011-09-15

申请号：US12931272

申请日：2011-01-27

Applicant: Alexander Laue ,  Albrecht Glasmachers ,  Christian Hendrich ,  Dirk Preikszas ,  Michel Aliman ,  Hubert Mantz ,  Ulrike Zeile ,  Holger Dömer

Inventor： Alexander Laue ,  Albrecht Glasmachers ,  Christian Hendrich ,  Dirk Preikszas ,  Michel Aliman ,  Hubert Mantz ,  Ulrike Zeile ,  Holger Dömer

IPC: H01J49/26 ,  H01J3/14

CPC classification number: H01J49/065 ,  H01J49/067 ,  H01J49/068 ,  H01J49/14 ,  H01J49/4225 ,  H01J49/4235

Abstract: An apparatus for focusing and for storage of ions and an apparatus for separation of a first pressure area from a second pressure area are disclosed, in particular for an analysis apparatus for ions. A particle beam device may have at least one of the abovementioned apparatuses. A container for holding ions and at least one multipole unit are provided. The multipole unit has a through-opening with a longitudinal axis as well as a multiplicity of electrodes. A first set of the electrodes is at a first radial distance from the longitudinal axis. A second set of the electrodes is in each case at a second radial distance from the longitudinal axis. The first radial distance is less than the second radial distance. Alternatively or additionally, the apparatus may have an elongated opening with a radial extent. The opening has a longitudinal extent which is greater than the radial extent.

Abstract translation: 公开了一种用于聚焦和存储离子的装置和用于将第一压力区域与第二压力区域分离的装置，特别是用于离子分析装置。 粒子束装置可以具有上述装置中的至少一个。 提供了用于保持离子和至少一个多极单元的容器。 多极单元具有纵向轴线的通孔以及多个电极。 第一组电极处于距纵向轴线的第一径向距离处。 在每种情况下，第二组电极距离纵向轴线的第二径向距离。 第一径向距离小于第二径向距离。 或者或另外，该装置可以具有径向范围的细长开口。 开口具有大于径向范围的纵向范围。

公开(公告)号：US20100200750A1

公开(公告)日：2010-08-12

申请号：US12658476

申请日：2010-02-08

Applicant: Hubert Mantz ,  Rainer Arnold ,  Michael Albiez

Inventor： Hubert Mantz ,  Rainer Arnold ,  Michael Albiez

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/244 ,  H01J37/10

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/222 ,  H01J37/244 ,  H01J37/256

Abstract: A particle beam system comprises a particle beam source 5 for generating a primary particle beam 13, an objective lens 19 for focusing the primary particle beam 13 in an object plane 23; a particle detector 17; and an X-ray detector 47 arranged between the objective lens and the object plane. The X-ray detector comprises plural semiconductor detectors, each having a detection surface 51 oriented towards the object plane. A membrane is disposed between the object plane and the detection surface of the semiconductor detector, wherein different semiconductor detectors have different membranes located in front, the different membranes differing with respect to a secondary electron transmittance.

Abstract translation: 粒子束系统包括用于产生一次粒子束13的粒子束源5，用于将一次粒子束13聚焦在物平面23中的物镜19; 粒子检测器17; 以及布置在物镜和物平面之间的X射线检测器47。 X射线检测器包括多个半导体检测器，每个半导体检测器具有朝向物体平面的检测表面51。 膜位于物体平面和半导体检测器的检测表面之间，其中不同的半导体检测器具有位于前面的不同的膜，不同的膜相对于二次电子透射率不同。

公开(公告)号：US08450215B2

公开(公告)日：2013-05-28

申请号：US12806111

申请日：2010-08-05

Applicant: Hubert Mantz ,  Rainer Arnold ,  Michael Albiez

Inventor： Hubert Mantz ,  Rainer Arnold ,  Michael Albiez

IPC: H01L21/302 ,  H01L21/461

CPC classification number: G01N23/2252 ,  H01J37/222 ,  H01J37/244 ,  H01J37/256 ,  H01J37/28 ,  H01J2237/226 ,  H01J2237/2442 ,  H01J2237/24465 ,  H01J2237/2448

Abstract: An inspection method comprises focusing a particle beam onto a sample; operating at least one detector located close to the sample; assigning detection signals generated by the at least one detector to different intensity intervals; determining, based on the detection signals assigned to the intensity intervals, at least one first signal component related to electrons incident on the detector; and determining, based on the detection signals assigned to the intensity intervals, at least one second signal component related to X-rays incident on the detector.

Abstract translation: 检查方法包括将颗粒束聚焦到样品上; 操作位于样品附近的至少一个检测器; 将由所述至少一个检测器产生的检测信号分配给不同的强度间隔; 基于分配给所述强度间隔的检测信号，确定与入射到所述检测器上的电子有关的至少一个第一信号分量; 以及基于分配给所述强度间隔的检测信号，确定与入射在所述检测器上的X射线有关的至少一个第二信号分量。