摘要:
An exposure method exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate by using a projection optical system. The exposure method includes supplying the liquid onto a part of the substrate including a projection area of the projection optical system to form a liquid immersion area, the liquid having an affinity for a liquid contact surface disposed at an end of the projection optical system, the affinity being higher than an affinity for a surface of the substrate, and projecting the image of the predetermined pattern onto the substrate through the liquid supplied to the liquid immersion area.
摘要:
A maintenance system of a substrate processing apparatus, including a remote operation unit for operating the substrate processing apparatus from a remote place by transmitting a remote operation information to a side of the substrate processing apparatus through a communication network and providing the remote operation information to the substrate processing apparatus, and a communication control unit for receiving the remote operation information transmitted to the side of the substrate processing apparatus and providing the remote operation information to the substrate processing apparatus. The communication control unit provides the remote operation information to the substrate processing apparatus only when there is an allow setting for the remote operation by a worker in the side of the substrate processing apparatus.
摘要:
An optical glass wherein an amount of change in refractive index (Δn: difference in refractive index between a state before radiation and a state after radiation) caused by radiation of laser beam at wavelength of 351 nm having average output power of 0.43 W, pulse repetition rate of 5 kHz and pulse width of 400 ns for one hour is 5 ppm or below is provided. The optical glass comprises a fluorine ingredient and/or a titanium oxide ingredient and/or an arsenic oxide ingredient. The optical glass suffers little change in refractive index by radiation of strong light having wavelengths of 300 nm to 400 nm such as ultraviolet laser.
摘要:
A lithographic apparatus includes an illumination system configured to condition a radiation beam. The illumination system includes a pulsed source of radiation and a controller to control an output of the pulsed source of radiation. The controller includes a dose sensor to measure a dose of a pulse of the source of radiation. The dose sensor includes a dose sensor output to provide a dose signal representative of the measured dose. An integrator unit is connected to the dose sensor output. The integrator unit integrates the dose signal at least twice, an output of the integrator unit provides an integrator output signal including the at least twice integrated dose signal. The output of the integrator unit drives a driving input of the source of radiation with the integrator output signal.
摘要:
An electric discharge, narrow band gas laser with improvements in wavelength stability. Improvements result from reduced laser beam directional fluctuations or fast correction of those fluctuations. Applicant has discovered, using an extremely sensitive knife edge optical technique, that gas discharge laser windows in a trapezoidal configuration were causing slight wavelength perturbations when laser gas density varied during laser operation. The optical technique involves using test laser beam directed through the discharge region of the gas discharge laser, blocking a portion of the beam with a knife edge and measuring the non-blocked portion of the beam to monitor beam deflection. With this technique, Applicant can measure beams deflection with an accuracy of about 0.3 microradians and with a time response of about 1 microsecond. An improvement in wavelength stability is achieved by orienting the laser chamber windows parallel to each other at a selected angle between 40° and 70° with the laser beam direction. The change eliminates wavelength fluctuations caused by laser beam direction fluctuation caused pressure fluctuations and the prism effect resulting from windows mounted in a prior art trapezoidal configuration. Beam directional fluctuations can also be measured during laser operation using the knife edge technique or similar fast response techniques such as a quadrant detector and the measured values can be used in a feedback arrangement along with fast wavelength control unit to compensate for changes in beam direction. In addition techniques for reducing the causes of beam direction fluctuations are disclosed. These include techniques for minimizing the effects of laser discharge caused pressure waves.
摘要:
A composite wafer carrier according to an embodiment of the present invention comprises an operative portion formed of a first thermoplastic material and a support portion formed of a second different thermoplastic material. One of the operative portion and support portion is overmolded onto the other to form a gapless hermitic interface that securely bonds the portions together. The operative portion may be a transparent window, a portion of a latching mechanism or a wafer contact portion. Preferred embodiments of the invention include wafer carriers with said features, process carriers with said features and a process for manufacturing wafer carriers with said features.
摘要:
Systems and methods for retrieving residual liquid during immersion lens photolithography are disclosed. A method in accordance with one embodiment includes directing radiation along a radiation path, through a lens and through a liquid volume in contact with the lens, to a microfeature workpiece in contact with the liquid volume. The method can further include, while moving at least one of the microfeature workpiece and the lens relative to the other, recovering liquid from the liquid volume and replenishing liquid in the liquid volume. A spacing between the lens and the microfeature workpiece can be controlled by providing a gas bearing between the lens and the microfeature workpiece. Residual liquid remaining on a surface on the microfeature workpiece can be directed back into the liquid volume, for example, by injecting a gas through at least one injection port that is oriented annularly inwardly toward the liquid volume.
摘要:
An object of the present invention is to maintain a coating and developing system by remotely operating it more safely. The present invention is a maintenance system of a substrate processing apparatus, including a remote operation unit for operating the substrate processing apparatus from a remote place by transmitting a remote operation information to a side of the substrate processing apparatus through a communication network and providing the remote operation information to the substrate processing apparatus, and a communication control unit for receiving the remote operation information transmitted to the side of the substrate processing apparatus and providing the remote operation information to the substrate processing apparatus. The communication control unit provides the remote operation information to the substrate processing apparatus only when there is an allow setting for the remote operation by a worker in the side of the substrate processing apparatus.
摘要:
An information processing apparatus used for an exposure system. The apparatus includes a generation unit which generates a parameter file described in a markup language based on a parameter used in the exposure system, the parameter file including information for displaying an image concerning at least one of a shot layout and a sample shot for an exposure process to be performed by the exposure system, and a program for editing the image, and a providing unit which provides the parameter file to another information processing apparatus out of the exposure system.
摘要:
A composite wafer carrier according to an embodiment of the present invention comprises an operative portion formed of a first thermoplastic material and a support portion formed of a second different thermoplastic material. One of the operative portion and support portion is overmolded onto the other to form a gapless hermitic interface that securely bonds the portions together. The operative portion may be a transparent window, a portion of a latching mechanism or a wafer contact portion. Preferred embodiments of the invention include wafer carriers with said features, process carriers with said features and a process for manufacturing wafer carriers with said features.