Exposure apparatus, exposure method, and method for producing device
    81.
    发明授权
    Exposure apparatus, exposure method, and method for producing device 有权
    曝光装置,曝光方法和制造装置的方法

    公开(公告)号:US07535550B2

    公开(公告)日:2009-05-19

    申请号:US11826622

    申请日:2007-07-17

    申请人: Hiroyuki Nagasaka

    发明人: Hiroyuki Nagasaka

    IPC分类号: G03B27/42 G03B27/32

    摘要: An exposure method exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate by using a projection optical system. The exposure method includes supplying the liquid onto a part of the substrate including a projection area of the projection optical system to form a liquid immersion area, the liquid having an affinity for a liquid contact surface disposed at an end of the projection optical system, the affinity being higher than an affinity for a surface of the substrate, and projecting the image of the predetermined pattern onto the substrate through the liquid supplied to the liquid immersion area.

    摘要翻译: 曝光方法通过使用投影光学系统将通过液体的预定图案的图像投影到基板上来曝光基板。 曝光方法包括将液体供应到包括投影光学系统的投影区域的基板的一部分上以形成液浸区域,该液体对设置在投影光学系统的端部处的液体接触表面具有亲和性, 亲和力高于对衬底表面的亲合力,并且通过供给到液浸区域的液体将预定图案的图像投影到衬底上。

    Maintenance system, substrate processing device, remote operation device, and communication method
    82.
    发明授权
    Maintenance system, substrate processing device, remote operation device, and communication method 有权
    维护系统,基板处理装置,远程操作装置和通信方法

    公开(公告)号:US07524378B2

    公开(公告)日:2009-04-28

    申请号:US10525090

    申请日:2003-08-08

    申请人: Takuya Mori

    发明人: Takuya Mori

    IPC分类号: B05C5/00

    摘要: A maintenance system of a substrate processing apparatus, including a remote operation unit for operating the substrate processing apparatus from a remote place by transmitting a remote operation information to a side of the substrate processing apparatus through a communication network and providing the remote operation information to the substrate processing apparatus, and a communication control unit for receiving the remote operation information transmitted to the side of the substrate processing apparatus and providing the remote operation information to the substrate processing apparatus. The communication control unit provides the remote operation information to the substrate processing apparatus only when there is an allow setting for the remote operation by a worker in the side of the substrate processing apparatus.

    摘要翻译: 一种基板处理装置的维护系统,包括:远程操作单元,用于通过通信网络将远程操作信息发送到基板处理设备的一侧,并从远程操作单元向远程操作单元提供远程操作信息; 基板处理装置和通信控制单元,用于接收发送到基板处理装置一侧的远程操作信息,并向基板处理装置提供远程操作信息。 通信控制单元仅在基板处理装置侧的工作人员进行远程操作的允许设定时,向基板处理装置提供远程操作信息。

    Optical glass suffering little change in refractive index by radiation of light
    83.
    发明授权
    Optical glass suffering little change in refractive index by radiation of light 失效
    光学玻璃通过光的辐射几乎没有折射率的变化

    公开(公告)号:US07371703B2

    公开(公告)日:2008-05-13

    申请号:US10666232

    申请日:2003-09-18

    摘要: An optical glass wherein an amount of change in refractive index (Δn: difference in refractive index between a state before radiation and a state after radiation) caused by radiation of laser beam at wavelength of 351 nm having average output power of 0.43 W, pulse repetition rate of 5 kHz and pulse width of 400 ns for one hour is 5 ppm or below is provided. The optical glass comprises a fluorine ingredient and/or a titanium oxide ingredient and/or an arsenic oxide ingredient. The optical glass suffers little change in refractive index by radiation of strong light having wavelengths of 300 nm to 400 nm such as ultraviolet laser.

    摘要翻译: 一种光学玻璃,其中平均输出功率为0.43W,波长351nm的激光束的辐射引起的折射率变化量(Deltan:辐射前状态下的折射率与辐射后的差异)是脉冲重复 提供5kHz的速率和400ns的脉冲宽度为1ppm的时间为5ppm或更低。 光学玻璃包含氟成分和/或氧化钛成分和/或氧化砷成分。 光学玻璃通过辐射波长为300nm〜400nm的强光,例如紫外线激光器,折射率几乎没有变化。

    Lithographic apparatus, illumination system, illumination controller and control method
    84.
    发明授权
    Lithographic apparatus, illumination system, illumination controller and control method 有权
    光刻设备,照明系统,照明控制器和控制方法

    公开(公告)号:US07297911B2

    公开(公告)日:2007-11-20

    申请号:US11184066

    申请日:2005-07-19

    IPC分类号: G03B27/52

    摘要: A lithographic apparatus includes an illumination system configured to condition a radiation beam. The illumination system includes a pulsed source of radiation and a controller to control an output of the pulsed source of radiation. The controller includes a dose sensor to measure a dose of a pulse of the source of radiation. The dose sensor includes a dose sensor output to provide a dose signal representative of the measured dose. An integrator unit is connected to the dose sensor output. The integrator unit integrates the dose signal at least twice, an output of the integrator unit provides an integrator output signal including the at least twice integrated dose signal. The output of the integrator unit drives a driving input of the source of radiation with the integrator output signal.

    摘要翻译: 光刻设备包括被配置为调节辐射束的照明系统。 照明系统包括脉冲辐射源和控制脉冲辐射源的输出的控制器。 控制器包括用于测量辐射源的脉冲的剂量的剂量传感器。 剂量传感器包括剂量传感器输出以提供表示测量剂量的剂量信号。 积分器单元连接到剂量传感器输出。 积分器单元将剂量信号整合至少两次,积分器单元的输出提供包括至少两次积分的剂量信号的积分器输出信号。 积分器单元的输出通过积分器输出信号驱动辐射源的驱动输入。

    Narrow band electric discharge gas laser having improved beam direction stability

    公开(公告)号:US07283575B2

    公开(公告)日:2007-10-16

    申请号:US10762119

    申请日:2004-01-20

    申请人: Zsolt Bor

    发明人: Zsolt Bor

    IPC分类号: H01S3/22

    摘要: An electric discharge, narrow band gas laser with improvements in wavelength stability. Improvements result from reduced laser beam directional fluctuations or fast correction of those fluctuations. Applicant has discovered, using an extremely sensitive knife edge optical technique, that gas discharge laser windows in a trapezoidal configuration were causing slight wavelength perturbations when laser gas density varied during laser operation. The optical technique involves using test laser beam directed through the discharge region of the gas discharge laser, blocking a portion of the beam with a knife edge and measuring the non-blocked portion of the beam to monitor beam deflection. With this technique, Applicant can measure beams deflection with an accuracy of about 0.3 microradians and with a time response of about 1 microsecond. An improvement in wavelength stability is achieved by orienting the laser chamber windows parallel to each other at a selected angle between 40° and 70° with the laser beam direction. The change eliminates wavelength fluctuations caused by laser beam direction fluctuation caused pressure fluctuations and the prism effect resulting from windows mounted in a prior art trapezoidal configuration. Beam directional fluctuations can also be measured during laser operation using the knife edge technique or similar fast response techniques such as a quadrant detector and the measured values can be used in a feedback arrangement along with fast wavelength control unit to compensate for changes in beam direction. In addition techniques for reducing the causes of beam direction fluctuations are disclosed. These include techniques for minimizing the effects of laser discharge caused pressure waves.

    Systems and methods for retrieving residual liquid during immersion lens photolithography
    87.
    发明申请
    Systems and methods for retrieving residual liquid during immersion lens photolithography 有权
    浸没透镜光刻期间检索残留液体的系统和方法

    公开(公告)号:US20070019172A1

    公开(公告)日:2007-01-25

    申请号:US11189236

    申请日:2005-07-25

    申请人: Peter Benson

    发明人: Peter Benson

    IPC分类号: G03B27/42

    CPC分类号: G03F7/70341 G03F7/708

    摘要: Systems and methods for retrieving residual liquid during immersion lens photolithography are disclosed. A method in accordance with one embodiment includes directing radiation along a radiation path, through a lens and through a liquid volume in contact with the lens, to a microfeature workpiece in contact with the liquid volume. The method can further include, while moving at least one of the microfeature workpiece and the lens relative to the other, recovering liquid from the liquid volume and replenishing liquid in the liquid volume. A spacing between the lens and the microfeature workpiece can be controlled by providing a gas bearing between the lens and the microfeature workpiece. Residual liquid remaining on a surface on the microfeature workpiece can be directed back into the liquid volume, for example, by injecting a gas through at least one injection port that is oriented annularly inwardly toward the liquid volume.

    摘要翻译: 公开了在浸没透镜光刻期间检索残留液体的系统和方法。 根据一个实施例的方法包括将辐射沿着辐射路径引导通过透镜并且通过与透镜接触的液体体积指向与液体体积接触的微特征工件。 该方法还可以包括在微动工件和透镜中的至少一个相对于另一个移动时,从液体体积中回收液体并补充液体中的液体。 可以通过在透镜和微特征工件之间提供气体轴承来控制透镜和微特征工件之间的间隔。 残留在微特征工件表面上的剩余液体可以被引回到液体体积中,例如通过将气体通过至少一个朝向液体体积的环向内部的注入口注入。

    Maintenance system, substrate processing device, remote operation device, and communication method
    88.
    发明申请
    Maintenance system, substrate processing device, remote operation device, and communication method 有权
    维护系统,基板处理装置,远程操作装置和通信方法

    公开(公告)号:US20060073654A1

    公开(公告)日:2006-04-06

    申请号:US10525090

    申请日:2003-08-08

    申请人: Takuya Mori

    发明人: Takuya Mori

    IPC分类号: H01L21/8238

    摘要: An object of the present invention is to maintain a coating and developing system by remotely operating it more safely. The present invention is a maintenance system of a substrate processing apparatus, including a remote operation unit for operating the substrate processing apparatus from a remote place by transmitting a remote operation information to a side of the substrate processing apparatus through a communication network and providing the remote operation information to the substrate processing apparatus, and a communication control unit for receiving the remote operation information transmitted to the side of the substrate processing apparatus and providing the remote operation information to the substrate processing apparatus. The communication control unit provides the remote operation information to the substrate processing apparatus only when there is an allow setting for the remote operation by a worker in the side of the substrate processing apparatus.

    摘要翻译: 本发明的目的是通过更安全地远程操作来保持涂层和显影系统。 本发明是一种基板处理装置的维护系统,其包括:远程操作单元,用于通过通信网络将远程操作信息发送到基板处理设备的一侧,并从远程操作基板处理装置提供远程 操作信息提供给基板处理装置,以及通信控制单元,用于接收发送到基板处理装置一侧的远程操作信息,并将该远程操作信息提供给基板处理装置。 通信控制单元仅在基板处理装置侧的工作人员进行远程操作的允许设定时,向基板处理装置提供远程操作信息。

    Information processing method and apparatus used in an exposure system and exposure apparatus
    89.
    发明授权
    Information processing method and apparatus used in an exposure system and exposure apparatus 失效
    在曝光系统和曝光装置中使用的信息处理方法和装置

    公开(公告)号:US07016755B2

    公开(公告)日:2006-03-21

    申请号:US10728817

    申请日:2003-12-08

    申请人: Yuji Abuku

    发明人: Yuji Abuku

    摘要: An information processing apparatus used for an exposure system. The apparatus includes a generation unit which generates a parameter file described in a markup language based on a parameter used in the exposure system, the parameter file including information for displaying an image concerning at least one of a shot layout and a sample shot for an exposure process to be performed by the exposure system, and a program for editing the image, and a providing unit which provides the parameter file to another information processing apparatus out of the exposure system.

    摘要翻译: 用于曝光系统的信息处理设备。 该装置包括生成单元,该生成单元基于在曝光系统中使用的参数生成以标记语言描述的参数文件,该参数文件包括用于显示关于曝光的拍摄布局和采样镜头中的至少一个的图像的信息 由曝光系统执行的处理,以及用于编辑图像的程序,以及提供单元,其将参数文件提供给曝光系统之外的另一个信息处理设备。