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公开(公告)号：US20190394868A1
公开(公告)日：2019-12-26
申请号：US16560611
申请日：2019-09-04
Applicant: Gigaphoton Inc.
Inventor： Shinji OKAZAKI , Osamu WAKABAYASHI
Abstract: An EUV light generator including the following components: A. an electron storage ring including a first linear section and a second linear section; B. an electron supplier configured to supply the electron storage ring with an electron bunch; C. a high-frequency acceleration cavity disposed in the first linear section and configured to accelerate the electron bunch in such a way that a length Lez of the electron bunch satisfies “0.09 m≤Lez≤3 m;” and D. an undulator disposed in the second linear section and configured to output EUV light when the electron bunch enters the undulator.
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82.发明申请公开(公告)号：US20190305508A1
公开(公告)日：2019-10-03
申请号：US16446662
申请日：2019-06-20
Applicant: Gigaphoton Inc.
Inventor： Takashi ONOSE , Osamu WAKABAYASHI
IPC: H01S3/23 , H01S3/108 , G02F1/35 , G02F1/355 , H01S3/109 , H01S3/067 , H01S3/10 , H01S3/11 , H01S3/115 , H01S3/16 , H01S3/131
Abstract: A solid state laser device includes a seed laser that outputs continuous wave laser seed light, a light intensity changeable unit that changes a light intensity thereof and outputs seed pulse light, a CW excitation laser that outputs continuous wave excitation light, an amplifier that amplifies the seed pulse light and outputs amplified light based on an amplification gain increased by the excitation light, a wavelength conversion unit that converts a wavelength of the amplified light and outputs harmonic light, and a light intensity control unit that allows the light intensity changeable unit to output the seed pulse light after a certain time elapsed from an input of an external trigger signal each time the signal is input and output suppression light that suppresses an increase of the amplification gain in a period after an output of the seed pulse light until an input of a next external trigger signal.
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公开(公告)号：US20190237928A1
公开(公告)日：2019-08-01
申请号：US16375591
申请日：2019-04-04
Applicant: Gigaphoton Inc.
Inventor： Masanori YASHIRO , Hiroaki TSUSHIMA , Osamu WAKABAYASHI
CPC classification number: H01S3/036 , C01B7/20 , H01S3/03 , H01S3/09705 , H01S3/104 , H01S3/2258
Abstract: A laser gas regeneration system for an excimer laser includes a first pipe capable of supplying a laser chamber with a first laser gas, a second pipe capable of supplying the laser chamber with a second laser gas having a halogen gas concentration higher than that of the first laser gas, a third pipe allowing a gas exhausted from the laser chamber to pass therethrough, a gas refiner that refines the gas having passed through the third pipe, a branch that causes the refined gas to divide and flow into a fourth pipe and a fifth pipe, a first regenerated gas supplier that supplies the first pipe with a gas having divided and flowed into the fourth pipe, and a second regenerated gas supplier that adds a halogen gas to a gas having divided and flowed into the fifth pipe and supplies the second pipe with the halogen-added gas.
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公开(公告)号：US20190237303A1
公开(公告)日：2019-08-01
申请号：US16379539
申请日：2019-04-09
Applicant: Gigaphoton Inc.
Inventor： Fumio IWAMOTO , Yutaka SHIRAISHI , Tsukasa HORI , Osamu WAKABAYASHI
CPC classification number: H01J37/32449 , H05G2/00 , H05G2/005 , H05G2/006 , H05G2/008
Abstract: A target supply device may be provided with a tank configured to contain a metal as a target material, a nozzle having a nozzle hole through which the target material is output from the tank, a filter disposed in a communication portion for conducting the target material from the tank to the nozzle hole, a temperature adjuster configured to change the temperature of the target material in the tank, and a controller controlling the temperature adjuster to change the temperature of the target material in the tank such that oxygen in the target material is precipitated as metal oxide.
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公开(公告)号：US20190103724A1
公开(公告)日：2019-04-04
申请号：US16208815
申请日：2018-12-04
Applicant: GIGAPHOTON INC.
Inventor： Takashi ONOSE , Osamu WAKABAYASHI
Abstract: A laser system includes a laser device configured to output pulse laser light, and a first optical pulse stretcher including a delay optical path for stretching a pulse width of the pulse laser light. The first optical pulse stretcher is configured to change a beam waist position of circulation light that circulates through the delay optical path and is output therefrom, in an optical path axis direction according to a circulation count. When the circulation light is condensed by an ideal lens, a light condensing position of the circulation light is changed in the optical path axis direction according to the circulation count.
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Patent Agency Ranking
公开(公告)号：US20180323568A1
公开(公告)日：2018-11-08
申请号：US16033030
申请日：2018-07-11
Applicant: Gigaphoton Inc.
Inventor： Hiroshi FURUSATO , Takeshi OHTA , Natsuhiko KOUNO , Osamu WAKABAYASHI , Takahito KUMAZAKI
CPC classification number: H01S3/11 , H01S3/034 , H01S3/038 , H01S3/08009 , H01S3/134 , H01S3/137 , H01S3/2207 , H01S3/2222
Abstract: The line narrowed laser apparatus configured to perform a plurality of burst oscillations including a first burst oscillation and a second burst oscillation next to the first burst oscillation to output a pulse laser beam. The line narrowed laser apparatus comprises a laser resonator, a chamber provided in the laser resonator, a pair of electrodes provided in the chamber, an electric power source configured to apply a pulsed voltage to the pair of electrodes, a wavelength-selecting element provided in the laser resonator, a spectral width varying unit provided in the laser resonator, a wavelength variable unit configured to change a selected wavelength selected by the wavelength-selecting element, and a controller. The controller is configured to control the wavelength variable unit based on an amount of control of the spectral width varying unit in a period from a time of ending the first burst oscillation to a time of starting the second burst oscillation.
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公开(公告)号：US20180123312A1
公开(公告)日：2018-05-03
申请号：US15857894
申请日：2017-12-29
Applicant: Gigaphoton Inc.
Inventor： Hiroshi FURUSATO , Keisuke ISHIDA , Takeshi OHTA , Takahito KUMAZAKI , Osamu WAKABAYASHI
CPC classification number: H01S3/11 , H01S3/0078 , H01S3/08004 , H01S3/08009 , H01S3/134 , H01S3/137 , H01S3/1398 , H01S3/225 , H01S2301/04
Abstract: The line narrowed laser apparatus configured to perform a plurality of burst oscillations including a first burst oscillation and a second burst oscillation next to the first burst oscillation to output a pulse laser beam. The line narrowed laser apparatus comprises a laser resonator, a chamber provided in the laser resonator, a pair of electrodes provided in the chamber, an electric power source configured to apply pulsed voltage to the pair of electrodes, a wavelength selecting element provided in the laser resonator, a spectral width varying unit provided in the laser resonator, and a controller. The controller is configured to measure a duty in a predetermined period before starting the second burst oscillation and a length of a suspension period from a time of ending the first burst oscillation to a time of starting the second burst oscillation, and perform a first control of the spectral width varying unit based on the duty and the length of the suspension period.
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公开(公告)号：US20180048109A1
公开(公告)日：2018-02-15
申请号：US15792111
申请日：2017-10-24
Applicant: Gigaphoton Inc.
Inventor： Takeshi ASAYAMA , Osamu WAKABAYASHI , Kouji KAKIZAKI
Abstract: The excimer laser apparatus may include a laser chamber configured to contain gas, a pair of electrodes provided in the laser chamber, a power source unit configured to supply a pulse voltage between the pair of electrodes, a gas supply unit configured to supply gas into the laser chamber, a gas exhaust unit configured to partially exhaust gas from within the laser chamber, and a gas control unit configured to control the gas supply unit and the gas exhaust unit, where a replacement ratio of gas to be replaced from within the laser chamber increases as deterioration of the pair of electrodes progresses, the deterioration being represented by a deterioration parameter of the pair of electrodes.
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公开(公告)号：US20170338619A1
公开(公告)日：2017-11-23
申请号：US15672754
申请日：2017-08-09
Applicant: GIGAPHOTON INC.
Inventor： Takashi ONOSE , Osamu WAKABAYASHI
CPC classification number: H01S3/10 , G02F1/37 , G02F2001/354 , G02F2201/16 , H01S3/0078 , H01S3/0092 , H01S3/06754 , H01S3/094003 , H01S3/09415 , H01S3/10015 , H01S3/10069 , H01S3/1608 , H01S3/1618 , H01S3/2251 , H01S3/23 , H01S3/2316 , H01S3/2375 , H01S3/2383 , H01S3/2391 , H01S5/06804 , H01S5/141
Abstract: A solid-state laser system may include a first solid-state laser unit, a second solid-state laser unit, a wavelength conversion system, a wavelength detector, and a wavelength controller. The wavelength conversion system may receive a first pulsed laser light beam with a first wavelength and a second pulsed laser light beam with a second wavelength, and output a third pulsed laser light beam with a third wavelength converted from the first and second wavelengths. The wavelength controller may control the first solid-state laser unit to vary the first wavelength on a condition that an absolute value of a difference between a value of a target wavelength and a value of the third wavelength detected by the wavelength detector is equal to or less than a predetermined value, and control the second solid-state laser unit to vary the second wavelength on a condition that the absolute value exceeds the predetermined value.
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公开(公告)号：US20170336282A1
公开(公告)日：2017-11-23
申请号：US15672961
申请日：2017-08-09
Applicant: The University of Tokyo , GIGAPHOTON INC.
Inventor： Yohei KOBAYASHI , Hakaru MIZOGUCHI , Junichi FUJIMOTO , Katsunori ISOMOTO , Osamu WAKABAYASHI , Georg SOUMAGNE
CPC classification number: G01M11/005 , G01N21/55 , G01N2201/06113 , G01N2201/0697 , G03F7/70033 , G03F7/70175 , G03F7/70591
Abstract: A spheroidal mirror reflectivity measuring apparatus for extreme ultraviolet light may include an extreme ultraviolet light source, an optical system, and a first photosensor. The extreme ultraviolet light source may be configured to output extreme ultraviolet light to a spheroidal mirror that includes a spheroidal reflection surface. The optical system may be configured to allow the extreme ultraviolet light to travel to the spheroidal reflection surface via a first focal position of the spheroidal mirror. The first photosensor may be provided at a second focal position of the spheroidal mirror, and may be configured to detect the extreme ultraviolet light that has passed through the first focal position and then has been reflected by the spheroidal reflection surface.
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