公开(公告)号：US20030021015A1

公开(公告)日：2003-01-30

申请号：US10238099

申请日：2002-09-09

发明人： Robert L. Maier ,  Lisa A. Moore ,  Charlene M. Smith

IPC分类号： G02B001/00

CPC分类号： C03C17/02 ,  C03B19/1453 ,  C03B19/1461 ,  C03B2201/075 ,  C03B2201/12 ,  C03C3/06 ,  C03C17/3452 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/46 ,  G02B1/105 ,  G02B1/14 ,  G02B5/208 ,  G03F7/70958

摘要： The invention provides coated optical lithography elements and methods of coating optical elements, and particularly optical photolithography elements for use in below 240 nm optical photolithography systems utilizing vacuum ultraviolet light (VUV) lithography wavelengths no greater than about 193 nm, such as VUV projection lithography systems utilizing wavelengths in the 193 nm or 157 nm region. The optical devices manipulate vacuum ultraviolet lithography light less than 250 nm utilizing a deposited silicon oxyfluoride film. The deposited silicon oxyfluoride optical coating assists in the manipulation of incident light and protects the underlying optical materials, layers, and surfaces.

公开(公告)号：US06399229B1

公开(公告)日：2002-06-04

申请号：US09333326

申请日：1999-06-15

申请人： Hiromitsu Takeda ,  Kennichi Fujita ,  Taro Miyauchi ,  Toshifumi Tsujino ,  Tatsuya Noguchi ,  Hideki Okamoto ,  Takashi Muromachi

发明人： Hiromitsu Takeda ,  Kennichi Fujita ,  Taro Miyauchi ,  Toshifumi Tsujino ,  Tatsuya Noguchi ,  Hideki Okamoto ,  Takashi Muromachi

IPC分类号： B32B900

CPC分类号： C03C17/02 ,  C03C17/25 ,  C03C17/34 ,  C03C2217/23

摘要： The present invention is directed to a light-transmitting color film comprising oxides which have high chemical resistance and excellent light-absorption effect, making them available in a wide color range; a method for producing the same; and a coating solution used for forming the color film. In the light-transmitting color film comprising an oxide of an element which serves as a network former and oxides of transition metal elements serving as coloring components, the element serving as a network former is at least one selected from Si, Al, and B, and the transition metal elements comprise Cu, Mn, and Ni; and the two types of oxides form a complex oxide. Moreover, a method for producing the light-transmitting color film comprises: coating on the substrate a coating solution for forming the color film which contains at least one alkoxide of elements selected from Si, Al, and B which serve as network formers, and as coloring components, transition metal salts comprising at least Cu, Mn, and Ni, and at least one organic compound having a functional group which can coordinate the transition metals; and thereafter firing the substrate.

摘要翻译： 本发明涉及包含具有高耐化学性和优异的光吸收效果的氧化物的透光彩色胶片，使其在宽的色彩范围内可用; 其制造方法; 以及用于形成彩色膜的涂布溶液。 在作为网络形成体的元素的氧化物和作为着色成分的过渡金属元素的氧化物的透光性彩色膜中，作为网络形成体的元素为选自Si，Al，B中的至少一种， 过渡金属元素包括Cu，Mn和Ni; 并且这两种氧化物形成复合氧化物。 此外，透光性彩色膜的制造方法包括：在基板上涂布形成所述彩色膜的涂布液，所述涂布液含有选自Si，Al和B中的至少一种选自Si，Al和B的元素作为网络形成剂的醇盐，以及作为 着色组分，至少包含Cu，Mn和Ni的过渡金属盐和至少一种具有可以配位过渡金属的官能团的有机化合物; 然后烧制基板。

公开(公告)号：US6361867B2

公开(公告)日：2002-03-26

申请号：US4073498

申请日：1998-03-18

申请人： FUJITSU LTD

发明人： KISHIDA KATSUHIKO ,  TANAKA KATSUNORI ,  SHIONO FUMIKO ,  MIYAMOTO HIROFUMI

IPC分类号： G02F1/1333 ,  B24B9/10 ,  B32B17/10 ,  C03C17/02 ,  C03C27/06 ,  G02F1/1345 ,  B32B31/00

CPC分类号： B32B17/10917 ,  B24B9/10 ,  B32B17/10293 ,  B32B17/10981 ,  C03C17/02 ,  Y10T156/108 ,  Y10T428/10 ,  Y10T428/24777

摘要： A method of forming a laminated glass substrate structure suitable for use in a display device or the like, includes the steps of: a) preparing a first glass substrate having first and second main faces; b) preparing a second glass substrate having third and fourth main faces; c) after the steps a) and b), adhering the first and second glass substrates with a space formed therebetween and with the third main face facing to the second main face; and d) after the step c), performing a smoothing process relative to all edges excepting one edge among edges defining the first main face. The laminated glass substrate structure provides an improved load resistance.

摘要翻译： 一种形成适用于显示装置等的夹层玻璃基板结构的方法包括以下步骤：a）制备具有第一和第二主面的第一玻璃基板; b）制备具有第三和第四主面的第二玻璃基板; c）在步骤a）和b）之后，将第一和第二玻璃基板粘附在其间形成的空间，并且第三主面面向第二主面; 以及d）在步骤c）之后，相对于除了限定第一主面的边缘之外的一个边缘的所有边缘进行平滑处理。 夹层玻璃基板结构提供了改进的负载电阻。

公开(公告)号：US06177290B1

公开(公告)日：2001-01-23

申请号：US09184232

申请日：1998-11-02

申请人： Woo-hyuk Jang ,  Sang-yun Yi ,  Byong-gwon You ,  Jung-hee Kim ,  Tae-hyung Rhee

发明人： Woo-hyuk Jang ,  Sang-yun Yi ,  Byong-gwon You ,  Jung-hee Kim ,  Tae-hyung Rhee

IPC分类号： H01L2131

CPC分类号： C03C17/02 ,  C03C17/3411 ,  C03C2218/33 ,  G02B6/136 ,  G02B2006/1215

摘要： A method of fabricating a planar optical waveguide in one chamber, comprising the steps of depositing a cladding layer and a core layer on a substrate, depositing an etch mask layer on the core layer, and forming a photoresist pattern on the etch mask layer. An etch mask pattern is formed by etching the etch mask layer according to the photoresist pattern using a first gas which reacts with the material of the etch mask layer, and removing the first gas. An optical waveguide is formed by etching the core layer according to the etch mask pattern using a second gas which reacts with the material of the core layer in the same chamber as the chamber where the above steps were performed, and removing the photoresist pattern and the second gas. The etch mask pattern is removed using the first gas which reacts with the material of the etch mask pattern in the same chamber as the chamber where the above steps were performed, and removing the first gas, and depositing an upper cladding layer formed of the same material as the core layer on the resultant structure of the above step. Accordingly, processes for fabricating an optical waveguide can be continuously performed in one chamber, thus simplifying and automating the optical waveguide fabrication method.

摘要翻译： 一种在一个室中制造平面光波导的方法，包括以下步骤：在衬底上沉积包覆层和芯层，在芯层上沉积蚀刻掩模层，以及在蚀刻掩模层上形成光致抗蚀剂图案。 通过使用与蚀刻掩模层的材料反应并且去除第一气体的第一气体，根据光致抗蚀剂图案蚀刻蚀刻掩模层来形成蚀刻掩模图案。 通过使用与在上述步骤的室相同的室中与芯层的材料反应的第二气体根据蚀刻掩模图案蚀刻芯层来形成光波导，并且去除光致抗蚀剂图案和 第二气。 使用与在其中执行上述步骤的室相同的腔室中与蚀刻掩模图案的材料反应的第一气体去除蚀刻掩模图案，并且去除第一气体，并沉积由其形成的上覆层 材料作为上述步骤的结果结构上的核心层。 因此，可以在一个室中连续地进行制造光波导的工艺，从而简化和自动化光波导制造方法。

公开(公告)号：US5736206A

公开(公告)日：1998-04-07

申请号：US640759

申请日：1996-05-07

申请人： Wolfgang Englisch ,  Stephan Moritz ,  Dietmar Hellmann

发明人： Wolfgang Englisch ,  Stephan Moritz ,  Dietmar Hellmann

IPC分类号： C03B20/00 ,  B22C9/12 ,  B28B1/26 ,  C03B19/06 ,  C03C3/06 ,  C03C11/00 ,  C03C17/02 ,  C04B33/28 ,  C04B35/14 ,  C30B35/00 ,  G01J1/42 ,  B01J3/00 ,  H01L21/02

CPC分类号： C03C17/02 ,  B22C9/12 ,  C03B19/06 ,  C03B19/066 ,  C03B20/00 ,  C03C11/00 ,  C03C3/06 ,  C30B35/002 ,  G01J1/429 ,  C03B2201/23 ,  C03C2201/02 ,  C03C2201/80 ,  C03C2203/52 ,  Y10T428/131 ,  Y10T428/1317

摘要： Molded bodies of quartz glass have at least one surface area of transparent quartz glass, the exposed surfaces of which are smooth and which have a surface microroughness of less than 8 .mu.m. The base material has a chemical purity of at least 99.9% and a cristobalite content of no more than 1%; is gas-impermeable and opaque; and contains pores. At a wall thickness of 1 mm, the base material has a nearly uniform direct spectral transmission of less than 10% in the wavelength range of .lambda.=190-2,650 nm; and which has a density of at least 2.215 g/cm.sup.3. The transparent surface area is formed from base material by heating it to a temperature above 1,650.degree. C. The thickness of the transparent layer is at least 0.5 mm, and its direct spectral transmission in the wavelength range of .lambda.=6001-2,650 nm is at least 60% for a layer thickness of 1 mm.

摘要翻译： PCT No.PCT / EP94 / 03722 Sec。 371日期：1996年5月7日 102（e）日期1996年5月7日PCT 1994年11月10日PCT PCT。 公开号WO95 / 13248 日期1995年5月18日石英玻璃体的模体具有透明石英玻璃的至少一个表面积，其露出表面光滑，表面微粗糙度小于8μm。 基材的化学纯度为99.9％以上，方石方含量不超过1％。 是不透气和不透明的; 并含有毛孔。 在壁厚为1mm的情况下，基材在λ= 190-2,650nm的波长范围内具有小于10％的几乎均匀的直接光谱透射; 并且其密度为至少2.215g / cm 3。 透明表面积由基材通过加热至1650℃以上而形成。透明层的厚度至少为0.5mm，其在λ= 6001-2,650nm的波长范围内的直接光谱透过率为 对于层厚为1mm，最少为60％。

公开(公告)号：US5368887A

公开(公告)日：1994-11-29

申请号：US51285

申请日：1993-04-23

申请人： Sumio Hoshino ,  Masumi Ito ,  Hiroo Kanamori

发明人： Sumio Hoshino ,  Masumi Ito ,  Hiroo Kanamori

IPC分类号： C03B8/02 ,  C03C1/00 ,  C03C17/02 ,  C23C18/12 ,  B05D3/02

CPC分类号： C03C17/02 ,  C03C1/008 ,  C23C18/1212 ,  C23C18/1254 ,  C23C18/1275

摘要： A thin glass film is formed on a substrate using a sol-gel method by applying to the substrate a hydrolyzable solution which contains a metal alkoxide, water, an alcohol and an acid, contacting the applied solution with an atmosphere containing ammonia and an alcohol to polycondensate the metal alkoxide, and heating to form the thin glass film.

摘要翻译： 使用溶胶 - 凝胶法在基板上形成薄玻璃膜，通过向基板施加含有金属醇盐，水，醇和酸的可水解溶液，使所施加的溶液与含有氨和醇的气氛接触， 使金属醇盐缩聚，并加热形成薄玻璃膜。

公开(公告)号：US5203902A

公开(公告)日：1993-04-20

申请号：US796834

申请日：1991-11-25

申请人： Johannes J. W. Murkens

发明人： Johannes J. W. Murkens

IPC分类号： C03C8/02 ,  C03C17/02

CPC分类号： C03C8/14 ,  C03C17/02 ,  C03C8/02 ,  C03C2209/00

摘要： A glass flux composition consisting essentially by weight of 45-65% Bi.sub.2 O.sub.3, 25-36% SiO.sub.2, 4-6% TiO.sub.2, 1-3% Na.sub.2 O, 0.5-2% K.sub.2 O, 2-6% Li.sub.2 O, 0-3% Al.sub.2 O.sub.3, 0-1% ZrO.sub.2, 0-1% BaO, 0-1% CaO, 0-1% MgO, 0-1% ZnO, 0-3% PbO and 0-0.5% CdO is useful for preparing a glaze or enamel composition especially for application to glass such that the composition is then fired in contact with a mould surface or with another glass surface.

摘要翻译： 基本上由45-65％Bi2O3，25-36％SiO2，4-6％TiO2，1-3％Na2O，0.5-2％K2O，2-6％Li2O，0-3％Al2O3重量组成的玻璃助熔剂组合物 ，0-1％ZrO 2，0-1％BaO，0-1％CaO，0-1％MgO，0-1％ZnO，0-3％PbO和0-0.5％CdO可用于制备釉料或搪瓷 组合物特别适用于玻璃，使得组合物然后与模具表面或与另一玻璃表面接触地烧制。

公开(公告)号：US5175130A

公开(公告)日：1992-12-29

申请号：US303374

申请日：1989-01-30

申请人： Kazuo Kondo ,  Asao Morikawa

发明人： Kazuo Kondo ,  Asao Morikawa

IPC分类号： C03C10/00 ,  C03C11/00 ,  C03C14/00 ,  C03C17/02 ,  H01L23/15 ,  H01L23/498 ,  H01L23/538 ,  H01L23/66 ,  H05K1/03

CPC分类号： H01L23/49894 ,  C03C10/0009 ,  C03C11/00 ,  C03C14/004 ,  C03C17/02 ,  H01L23/15 ,  H01L23/49822 ,  H01L23/5383 ,  H01L23/66 ,  H05K1/0306 ,  C03C2214/04 ,  H01L2924/0002 ,  H01L2924/09701 ,  Y10T428/24917 ,  Y10T428/24926 ,  Y10T428/24942 ,  Y10T428/24967 ,  Y10T428/24975 ,  Y10T428/249956 ,  Y10T428/249981 ,  Y10T428/249988 ,  Y10T428/24999

摘要： A substrate having a low dielectric constant for use with electronic devices consisting essentially of porous crystalline glass. The composition of the crystalline glass is represented by the formula X-Al.sub.2 O.sub.3 -SiO.sub.2, where X is one or more of the metal oxides ZnO, MgO, Li.sub.2 O, ZrO.sub.2, B.sub.2 O.sub.3, P.sub.2 O.sub.5, Y.sub.2 O.sub.3 and BaO. The crystalline glass may also include a filler material such as a ceramic powder or non-glass material. The substrate initially has a particle size of approximately 5 microns or less, which provides a high mechanical strength to the substrate even at high porosities.

摘要翻译： 具有低介电常数的衬底，用于与基本上由多孔结晶玻璃组成的电子器件。 结晶玻璃的组成由式X-Al 2 O 3 -SiO 2表示，其中X是一种或多种金属氧化物ZnO，MgO，Li 2 O，ZrO 2，B 2 O 3，P 2 O 5，Y 2 O 3和BaO。 结晶玻璃还可以包括诸如陶瓷粉末或非玻璃材料的填充材料。 基底最初具有大约5微米或更小的粒度，即使在高孔隙率下也能提供高的机械强度。

公开(公告)号：US5143533A

公开(公告)日：1992-09-01

申请号：US748585

申请日：1991-08-22

申请人： Raymond M. Brusasco

发明人： Raymond M. Brusasco

IPC分类号： C03C1/00 ,  C03C17/02 ,  C03C23/00

CPC分类号： C03C1/008 ,  C03C17/02 ,  C03C23/0025 ,  Y10S65/04

摘要： Disclosed is a method of producing thin films by sintering which comprises:a. coating a substrate with a thin film of an inorganic glass forming parulate material possessing the capability of being sintered, andb. irridiating said thin film of said particulate material with a laser beam of sufficient power to cause sintering of said material below the temperature of liquidus thereof.Also disclosed is the article produced by the method claimed.

摘要翻译： 公开了一种通过烧结制造薄膜的方法，其包括：a。 用具有烧结能力的无机玻璃形成颗粒材料的薄膜涂覆基材，b。 用足够功率的激光束对所述颗粒材料的所述薄膜进行冲洗，以使所述材料的烧结低于液相线的温度。 还公开了通过所要求保护的方法制造的物品。

公开(公告)号：US5093285A

公开(公告)日：1992-03-03

申请号：US431888

申请日：1989-11-06

申请人： Johannes J. W. Murkens

发明人： Johannes J. W. Murkens

IPC分类号： C03C8/02 ,  C03C17/02

CPC分类号： C03C17/02 ,  C03C8/02 ,  C03C2209/00

摘要： A glass flux composition consisting essentially by weight of 45-65% Bi.sub.2 O.sub.3, 25-36% SiO.sub.2, 4-6% B.sub.2 O.sub.3, 3-6% TiO.sub.2, 1-3% Na.sub.2 O, 0.5-2% K.sub.2 O, 2-6% Li.sub.2 O, 0-3% Al.sub.2 O.sub.3, 0-1% ZrO.sub.2, 0-1% BaO, 0-1% CaO, 0-1% MgO, 0-1% ZnO, 0-3% PbO and 0-0.5% CdO is useful for preparing a glaze or enamel composition especially for application to glass such that the composition is then fired in contact with a mould surface or with another glass surface.