公开(公告)号：US07333179B2

公开(公告)日：2008-02-19

申请号：US10918182

申请日：2004-08-13

Applicant: Bausan Yuan ,  Martin E. Lee ,  W. Thomas Novak

Inventor： Bausan Yuan ,  Martin E. Lee ,  W. Thomas Novak

IPC: G03B27/58 ,  G03B27/62

CPC classification number: G03F7/70775 ,  G03F7/70725 ,  G03F7/70758 ,  G03F7/70766

Abstract: Methods and apparatus for providing a stage with a relatively high positioning bandwidth and low transmissibility are disclosed. According to one aspect of the present invention, a method for positioning a stage including providing a first force of a first magnitude to the stage using a primary actuator and providing a second force of a second magnitude to the stage using a secondary actuator. The first force is arranged to cause the stage to translate along a first axis. The secondary actuator is also arranged to cause the stage to translate along the first axis, and has a relatively high positioning bandwidth. The first force is arranged to enable the stage to be relatively coarsely positioned and the second force is arranged to enable the stage to be relatively finely positioned. In one embodiment, the secondary actuator is one of a voice coil motor and a piezoelectric motor.

Abstract translation: 公开了提供具有相对高的定位带宽和低传输性的平台的方法和装置。 根据本发明的一个方面，一种用于定位平台的方法，包括使用主致动器向舞台提供第一幅度的第一力，并使用辅助致动器向舞台提供第二大小的第二力。 第一力布置成使得台架沿着第一轴线平移。 次级致动器还被布置成使得平台沿着第一轴线平移，并且具有相对较高的定位带宽。 第一力被布置成使得台架能够相对粗略地定位，并且第二力被布置成使得台架能够相对精细地定位。 在一个实施例中，次级致动器是音圈电动机和压电电动机之一。

公开(公告)号：US20070284502A1

公开(公告)日：2007-12-13

申请号：US11644467

申请日：2006-12-21

Applicant: Yi-Ping Hsin ,  Hideyuki Hashimoto ,  Jin Nishikawa ,  Scott Coakley ,  Kunitomo Fukai ,  Wen-Hou Ma ,  Bausan Yuan

Inventor： Yi-Ping Hsin ,  Hideyuki Hashimoto ,  Jin Nishikawa ,  Scott Coakley ,  Kunitomo Fukai ,  Wen-Hou Ma ,  Bausan Yuan

IPC: A47G1/24

CPC classification number: G02B7/005

Abstract: “Hexapod” mountings are disclosed for use with optical elements. An exemplary mounting includes a base, a platform that is movable relative to the base, and six legs having nominally identical length. Three pairs of legs, having substantially equal stiffness, extend between the base and platform and support the platform relative to the base. In each pair of legs, respective first ends are coupled together in a Λ-shaped manner forming a respective apex. Respective second ends are splayed relative to the apex, desirably forming an angle of substantially 109.5° at the apex. The apices are mounted equidistantly from each other on a circle on the platform. The respective second ends of the pairs of legs are mounted at respective locations on a circle on the base. The axes of each pair of legs define a respective leg plane substantially perpendicular to the base plane. Each leg has an actuator that, when energized, changes a length of the respective leg. Coordinated energization of the actuators in selected legs produces a desired movement of the platform relative to the base in all six degrees of freedom of motion.

Abstract translation: “六足”安装件被公开用于光学元件。 示例性的安装包括底座，相对于底座可移动的平台以及具有标称相同长度的六个腿。 具有基本上相同刚度的三对腿在基座和平台之间延伸并且相对于基座支撑平台。 在每对腿中，相应的第一端以形成相应顶点的L形方式联接在一起。 相对于顶点显示相应的第二端，期望在顶点形成大致109.5°的角度。 顶点在平台上的圆圈上彼此等距地安装。 成对的腿的相应的第二端安装在基座上的圆圈上的相应位置处。 每对腿的轴线限定基本上垂直于基础平面的相应腿部平面。 每个腿都有一个致动器，当被通电时，改变相应腿部的长度。 所选腿中的致动器的协调通电在所有六个运动自由度中产生平台相对于基座的期望运动。

公开(公告)号：US20070236854A1

公开(公告)日：2007-10-11

申请号：US11279296

申请日：2006-04-11

Applicant: Martin Lee ,  Bausan Yuan ,  Susumu Makinouchi

Inventor： Martin Lee ,  Bausan Yuan ,  Susumu Makinouchi

IPC: H01H47/00

CPC classification number: G03F7/709 ,  G03F7/70716

Abstract: Methods and apparatus for supporting the weight of a first stage of a stage apparatus using magnets are disclosed. According to one aspect of the present invention, and apparatus includes a first structure, a second structure, and an anti-gravity device. The anti-gravity device has a first magnet and a piston arrangement that includes a second magnet. The first magnet is coupled to the first structure, and the piston arrangement is movably interfaced with the second structure through an air bearing. The first magnet and the piston arrangement cooperate to support the first structure over the second structure relative to a vertical axis.

Abstract translation: 公开了一种用于支撑使用磁体的平台装置的第一级的重量的方法和装置。 根据本发明的一个方面，并且装置包括第一结构，第二结构和反重力装置。 反重力装置具有包括第二磁体的第一磁体和活塞装置。 第一磁体联接到第一结构，并且活塞装置通过空气轴承与第二结构可移动地接合。 第一磁体和活塞装置配合以相对于垂直轴线支撑第二结构的第一结构。

公开(公告)号：US20070115451A1

公开(公告)日：2007-05-24

申请号：US11624908

申请日：2007-01-19

Applicant: Bausan Yuan

Inventor： Bausan Yuan

IPC: G03B27/62

CPC classification number: G03F7/709

Abstract: Methods and apparatus for isolating or separating a reticle stage arrangement from a lens assembly are disclosed. According to one aspect of the present invention, an apparatus includes a reticle stage assembly, a lens assembly, and an isolator assembly. The isolator assembly is arranged to substantially prevent vibrations from being transmitted from the reticle stage assembly to the lens assembly. In one embodiment, the apparatus also includes a frame structure that supports the lens assembly and the reticle stage assembly.

Abstract translation: 公开了用于将掩模版台装置与透镜组件隔离或分离的方法和装置。 根据本发明的一个方面，一种装置包括光罩台组件，透镜组件和隔离器组件。 隔离器组件布置成基本上防止振动从标线片台组件传递到透镜组件。 在一个实施例中，该装置还包括支撑透镜组件和标线片台组件的框架结构。

公开(公告)号：US07172493B2

公开(公告)日：2007-02-06

申请号：US11252483

申请日：2005-10-18

Applicant: W. Thomas Novak ,  Douglas C. Watson ,  Pai-Hsueh Yang ,  Bausan Yuan

Inventor： W. Thomas Novak ,  Douglas C. Watson ,  Pai-Hsueh Yang ,  Bausan Yuan

IPC: B24B49/00

CPC classification number: B24B37/042 ,  B24B37/005 ,  B24B37/30 ,  B24B41/068

Abstract: A polishing apparatus (10) for polishing a device (12) with a polishing pad (48) includes a pad holder (50) and an actuator assembly (432). The pad holder (50) retains the polishing pad (48). The actuator assembly (432) includes a plurality of spaced apart actuators (438F) (438S) (438T) that are coupled to the pad holder (50). The actuators (438F) (438S) (438T) cooperate to direct forces on the pad holder (50) to alter the pressure of the polishing pad (48) on the device (12). At least one of the actuators (438F) (438S) (438T) includes a first actuator subassembly (440) and a second actuator subassembly (442) that interacts with the first actuator subassembly (440) to direct a force on the pad holder (50). The second actuator subassembly (442) is coupled to the pad holder (50) and the second actuator subassembly (442) rotates with the pad holder (50) relative to the first actuator subassembly (440).

Abstract translation: 用于用抛光垫（48）抛光装置（12）的抛光装置（10）包括垫保持器（50）和致动器组件（432）。 垫保持器（50）保持抛光垫（48）。 致动器组件（432）包括多个间隔开的致动器（438F）（438S）（438T），其联接到所述垫保持器（50）。 致动器（438F）（438S）（438T）协作以引导焊盘保持器（50）上的力，以改变设备（12）上的抛光垫（48）的压力。 致动器（438F）（438T）（438T）中的至少一个包括与第一致动器子组件（440）相互作用的第一致动器子组件（440）和第二致动器子组件（442），以将力 垫座（50）。 第二致动器子组件（442）联接到焊盘保持器（50），并且第二致动器子组件（442）相对于第一致动器子组件（440）与焊盘保持器（50）一起旋转。

公开(公告)号：US20060170382A1

公开(公告)日：2006-08-03

申请号：US11046092

申请日：2005-01-28

Applicant: Pai-Hsueh Yang ,  Hideyuki Hashimoto ,  Bausan Yuan ,  Atsushi Yamaguchi

Inventor： Pai-Hsueh Yang ,  Hideyuki Hashimoto ,  Bausan Yuan ,  Atsushi Yamaguchi

IPC: H02K33/00 ,  H02K41/00

CPC classification number: G03F7/70758 ,  G03F7/70725 ,  G05B19/258 ,  G05B2219/41132 ,  G05B2219/41209 ,  G05B2219/41337 ,  G05B2219/42065 ,  G05B2219/42141 ,  G05B2219/45031 ,  H02P1/16 ,  H02P23/02 ,  H02P23/04 ,  H02P25/06

Abstract: Embodiments of the present invention are directed to compensating for force ripple of an apparatus driven by a force produced by a linear motor. In one embodiment, a method of compensating for force ripple comprises generating force commands for a trajectory starting at a plurality of starting positions of the apparatus driven by the linear motor to produce different trajectory motions based on the same trajectory at the plurality of starting positions, the force commands each including peaks of large acceleration/deceleration and valleys of low force levels; calculating an average of the force commands during large acceleration/deceleration generated based on trajectory motions for the plurality of starting positions; calculating a variation ratio of the force command for each trajectory motion to the calculated average of the force commands; and compensating for force ripple in the apparatus based on the calculated variation ratio to control the force applied by the linear motor to the apparatus.

Abstract translation: 本发明的实施例涉及补偿由线性马达产生的力驱动的装置的力波动。 在一个实施例中，补偿力波动的方法包括：产生用于由线性马达驱动的装置的多个起始位置开始的轨迹的力命令，以基于多个起始位置处的相同轨迹产生不同的轨迹运动， 力指令各自包括大加速/减速峰值和低力水平的谷值; 基于多个起始位置的轨迹运动产生的大的加速/减速期间的力命令的平均值; 计算每个轨迹运动的力命令的变化比与计算的力命令的平均值; 并且基于所计算的变化比来补偿所述装置中的力波动，以控制由所述线性电动机施加到所述装置的力。

公开(公告)号：US07061577B2

公开(公告)日：2006-06-13

申请号：US10107269

申请日：2002-03-26

Applicant: Bausan Yuan ,  Martin Lee ,  Takeshi Asami

Inventor： Bausan Yuan ,  Martin Lee ,  Takeshi Asami

IPC: G03B27/42 ,  G03B27/58 ,  G03B27/32

CPC classification number: G03F7/70716 ,  G03B27/42 ,  G03F7/709

Abstract: An adjuster assembly (12) that adjusts the location where an image (18) from an object (20) is transferred onto a device (16) includes an adjuster (54) and a stage mover assembly (244). The stage mover assembly (244) adjusts the position of the adjuster (54). This moves the position where the image (18) is transferred onto the device (16). The adjuster assembly (12) can include a damper assembly (250) that is coupled to the stage mover assembly (244) and reduces the effect of vibration from the stage mover assembly (244) causing vibration on the rest of the apparatus.

Abstract translation: 调节器（12），其调节来自物体（20）的图像（18）被转移到装置（16）上的位置包括调节器（54）和载物台移动器组件（244）。 平台移动器组件（244）调节调节器（54）的位置。 这将图像（18）传送到设备（16）上的位置移动。 调节器组件（12）可以包括阻尼器组件（250），该阻尼器组件（250）联接到载物台移动器组件（244）并且减小来自载物台组件（244）的振动对设备的其余部分产生振动的影响。

公开(公告)号：US20060035564A1

公开(公告)日：2006-02-16

申请号：US11252483

申请日：2005-10-18

Applicant: W. Novak ,  Douglas Watson ,  Pai-Hsueh Yang ,  Bausan Yuan

Inventor： W. Novak ,  Douglas Watson ,  Pai-Hsueh Yang ,  Bausan Yuan

IPC: B24B51/00

CPC classification number: B24B37/042 ,  B24B37/005 ,  B24B37/30 ,  B24B41/068

Abstract: A polishing apparatus (10) for polishing a device (12) with a polishing pad (48) includes a pad holder (50) and an actuator assembly (432). The pad holder (50) retains the polishing pad (48). The actuator assembly (432) includes a plurality of spaced apart actuators (438F) (438S) (438T) that are coupled to the pad holder (50). The actuators (438F) (438S) (438T) cooperate to direct forces on the pad holder (50) to alter the pressure of the polishing pad (48) on the device (12). At least one of the actuators (438F) (438S) (438T) includes a first actuator subassembly (440) and a second actuator subassembly (442) that interacts with the first actuator subassembly (440) to direct a force on the pad holder (50). The second actuator subassembly (442) is coupled to the pad holder (50) and the second actuator subassembly (442) rotates with the pad holder (50) relative to the first actuator subassembly (440).

Abstract translation: 用于用抛光垫（48）抛光装置（12）的抛光装置（10）包括垫保持器（50）和致动器组件（432）。 垫保持器（50）保持抛光垫（48）。 致动器组件（432）包括多个间隔开的致动器（438F）（438S）（438T），其联接到所述垫保持器（50）。 致动器（438F）（438S）（438T）协作以引导焊盘保持器（50）上的力，以改变设备（12）上的抛光垫（48）的压力。 致动器（438F）（438T）（438T）中的至少一个包括与第一致动器子组件（440）相互作用的第一致动器子组件（440）和第二致动器子组件（442），以将力 垫座（50）。 第二致动器子组件（442）联接到焊盘保持器（50），并且第二致动器子组件（442）相对于第一致动器子组件（440）与焊盘保持器（50）一起旋转。

公开(公告)号：US20050231706A1

公开(公告)日：2005-10-20

申请号：US10825022

申请日：2004-04-14

Applicant: Pai-Hsueh Yang ,  Hideyuki Hashimoto ,  Bausan Yuan ,  Atsushi Yamaguchi ,  Susumu Makinouchi

Inventor： Pai-Hsueh Yang ,  Hideyuki Hashimoto ,  Bausan Yuan ,  Atsushi Yamaguchi ,  Susumu Makinouchi

IPC: G03B27/58 ,  G03F7/20

CPC classification number: G03F7/70725

Abstract: Embodiments of the present invention are directed to a control system and method for controlling the trajectory and alignment of one or more stages by incorporating a grouping method in the control methodology. In one embodiment, a method of controlling movement of one or more stages of a precision assembly to process a substrate having a plurality of process regions comprises dividing the substrate into blocks according to one or more preset criteria, each block of the substrate including one or more process regions; generating learning data for one or more representative process regions for each block of the substrate; and using the generated learning data of the one or more representative process regions of each block to control movement of the one or more stages to process the block of one or more process regions of the substrate.

Abstract translation: 本发明的实施例涉及一种用于通过在控制方法中并入分组方法来控制一个或多个阶段的轨迹和对准的控制系统和方法。 在一个实施例中，一种控制精密组件的一个或多个阶段的运动以处理具有多个工艺区域的衬底的方法包括根据一个或多个预设标准将衬底划分成块，衬底的每个块包括一个或多个 更多的工艺区域; 为所述基板的每个块生成用于一个或多个代表性处理区域的学习数据; 以及使用所生成的每个块的一个或多个代表性处理区域的学习数据来控制所述一个或多个阶段的移动以处理所述衬底的一个或多个处理区域的块。

公开(公告)号：US20050221736A1

公开(公告)日：2005-10-06

申请号：US10812562

申请日：2004-03-30

Applicant: Yi-Ping Hsin ,  Yutaka Uda ,  Christopher Smith ,  Bausan Yuan ,  Takeshi Soma ,  Gabor Szoboszlay ,  Hiroshi Arai

Inventor： Yi-Ping Hsin ,  Yutaka Uda ,  Christopher Smith ,  Bausan Yuan ,  Takeshi Soma ,  Gabor Szoboszlay ,  Hiroshi Arai

IPC: B24B23/00 ,  B24B37/04 ,  B24B49/16

CPC classification number: B24B49/16 ,  B24B37/042

Abstract: Methods and apparatus for applying a uniform polishing pressure on a wafer are disclosed. According to one aspect of the present invention, a chemical mechanical planarization polishing apparatus includes a polishing pad, a wafer holder, and a force control system. The wafer holder supports a wafer to be polished using the polishing pad. The polishing pad is arranged to move relative to the wafer holder such that an area of contact between the wafer holder and the polishing pad varies. The force control system including a controller and a plurality of actuators that apply forces to the polishing pad. The controller controls the forces as the area of contact varies to substantially maintain a first polishing pressure on the wafer arranged to be supported by the wafer holder.

Abstract translation: 公开了在晶片上施加均匀抛光压力的方法和装置。 根据本发明的一个方面，化学机械平面化抛光装置包括抛光垫，晶片保持器和力控制系统。 晶片保持器使用抛光垫支撑待抛光的晶片。 抛光垫布置成相对于晶片保持器移动，使得晶片保持器和抛光垫之间的接触面积发生变化。 力控制系统包括控制器和向抛光垫施加力的多个致动器。 当接触区域变化时，控制器控制力，从而基本上保持晶片上所设置的晶片上的第一抛光压力。