公开(公告)号：US20050221736A1

公开(公告)日：2005-10-06

申请号：US10812562

申请日：2004-03-30

申请人： Yi-Ping Hsin ,  Yutaka Uda ,  Christopher Smith ,  Bausan Yuan ,  Takeshi Soma ,  Gabor Szoboszlay ,  Hiroshi Arai

发明人： Yi-Ping Hsin ,  Yutaka Uda ,  Christopher Smith ,  Bausan Yuan ,  Takeshi Soma ,  Gabor Szoboszlay ,  Hiroshi Arai

IPC分类号： B24B23/00 ,  B24B37/04 ,  B24B49/16

CPC分类号： B24B49/16 ,  B24B37/042

摘要： Methods and apparatus for applying a uniform polishing pressure on a wafer are disclosed. According to one aspect of the present invention, a chemical mechanical planarization polishing apparatus includes a polishing pad, a wafer holder, and a force control system. The wafer holder supports a wafer to be polished using the polishing pad. The polishing pad is arranged to move relative to the wafer holder such that an area of contact between the wafer holder and the polishing pad varies. The force control system including a controller and a plurality of actuators that apply forces to the polishing pad. The controller controls the forces as the area of contact varies to substantially maintain a first polishing pressure on the wafer arranged to be supported by the wafer holder.

摘要翻译： 公开了在晶片上施加均匀抛光压力的方法和装置。 根据本发明的一个方面，化学机械平面化抛光装置包括抛光垫，晶片保持器和力控制系统。 晶片保持器使用抛光垫支撑待抛光的晶片。 抛光垫布置成相对于晶片保持器移动，使得晶片保持器和抛光垫之间的接触面积发生变化。 力控制系统包括控制器和向抛光垫施加力的多个致动器。 当接触区域变化时，控制器控制力，从而基本上保持晶片上所设置的晶片上的第一抛光压力。

公开(公告)号：US6002320A

公开(公告)日：1999-12-14

申请号：US891377

申请日：1997-07-11

申请人： Yutaka Uda ,  Toshihide Kikuchi

发明人： Yutaka Uda ,  Toshihide Kikuchi

IPC分类号： H01F5/00 ,  H01F5/02 ,  H01F7/20 ,  H01F27/28 ,  H01F41/06 ,  H02K3/04 ,  H02K33/18 ,  H01F27/30

CPC分类号： H01F27/2823 ,  H01F41/066 ,  H01F41/098 ,  H01F5/00 ,  H01F5/02 ,  Y10T29/4902

摘要： The present invention relates to an electrical coil assembly having at least two interconnected electrical coils forming a coil pair with each coil formed with a laminated multiple winding of flat wire.

摘要翻译： 本发明涉及一种电线圈组件，其具有至少两个互连的电线圈，其形成线圈对，每个线圈形成有扁平线的叠层多重绕组。

公开(公告)号：US06857950B2

公开(公告)日：2005-02-22

申请号：US09862323

申请日：2001-05-23

申请人： Yutaka Hayashi ,  Yutaka Uda

发明人： Yutaka Hayashi ,  Yutaka Uda

IPC分类号： B24B37/005 ,  B24B41/04 ,  B24B49/10 ,  H01L21/304 ,  B24B41/06 ,  B24D9/10 ,  B24D11/00 ,  H01L21/302

CPC分类号： B24B37/30 ,  B24B41/042 ,  B24B41/068 ,  B24B49/10

摘要： The present invention provides a polishing apparatus with a construction which makes it possible to prevent the peripheral portions of a substrate from sloping downward as a result of the polishing member tilting at the peripheral portions of the substrate during the polishing of the substrate, and which makes it possible to adjust the contact pressure quickly in accordance with changes in the contact area between the polishing surface and the substrate surface.

摘要翻译： 本发明提供一种抛光装置，其结构是能够防止基板的周边部分在基板的抛光期间由于抛光部件在基板的周边部分倾斜而倾斜向下倾斜，并且这使得 可以根据研磨面和基板表面之间的接触面积的变化快速地调节接触压力。

公开(公告)号：US06590355B1

公开(公告)日：2003-07-08

申请号：US09588713

申请日：2000-06-07

申请人： Toshihide Kikuchi ,  Masahiro Totsu ,  Kazuya Ono ,  Yutaka Uda

发明人： Toshihide Kikuchi ,  Masahiro Totsu ,  Kazuya Ono ,  Yutaka Uda

IPC分类号： H02K4102

CPC分类号： G03F7/70716 ,  G03F7/70758 ,  H02K41/03

摘要： Disclosed is a linear motor device provided with a movable member, a stator having coils, and a control system for powering selected coils among the coils in accordance with a position of the movable member. The control system powers only the minimum number of coils contributing to the generation of thrust in relation with the current position of the movable member.

摘要翻译： 公开了一种线性电动机装置，其具有可动部件，具有线圈的定子，以及用于根据可动部件的位置为线圈间选择的线圈供电的控制系统。 控制系统仅对有助于产生推力的最小数量的线圈相对于可动构件的当前位置起作用。

公开(公告)号：US6121867A

公开(公告)日：2000-09-19

申请号：US418976

申请日：1999-10-14

申请人： Yutaka Uda ,  Toshihide Kikuchi

发明人： Yutaka Uda ,  Toshihide Kikuchi

IPC分类号： H01F5/00 ,  H01F5/02 ,  H01F7/20 ,  H01F27/28 ,  H01F41/06 ,  H02K3/04 ,  H02K33/18 ,  H01F27/30

CPC分类号： H01F27/2823 ,  H01F41/066 ,  H01F41/098 ,  H01F5/00 ,  H01F5/02 ,  Y10T29/4902

摘要： An electrical coil assembly and method of manufacturing an electrical coil assembly having at least two interconnected electrical coils forming a coil pair with each coil formed with a multiple winding of wire. The electrical coil assembly preferably has at least one pair of electrical coils with a first coil, a second coil and a third coil aligned in tandem. The first coil is formed from a first wire having an inner end and an outer end with the first wire wound in a clockwise or counterclockwise direction from the inner end to the outer end to form multiple layers of the first wire aligned relative to one another in a single row. The second coil is located between the first coil and the third coil, and is formed from a second wire having an inner end and an outer end with the second wire wound in a direction opposite to the direction of the first wire to form multiple layers of the wire aligned relative to one another in a single row. The third coil is formed from a third wire having an inner end and an outer end with the third wire wound in the same direction of the first wire to form multiple layers of the wire aligned relative to one another in a single row. The inner end of the first coil is connected to the inner end of the second coil and the outer end of the second coil is connected to the outer end of the third coil.

摘要翻译： 一种电线圈组件和电线圈组件的制造方法，该电线圈组件具有至少两个互连的电线圈，该电线圈与形成有多个线圈的每个线圈形成线圈对。 电线圈组件优选地具有至少一对电线圈，其具有串联对准的第一线圈，第二线圈和第三线圈。 第一线圈由具有内端和外端的第一线形成，其中第一线从内端到外端沿顺时针或逆时针方向缠绕，以形成彼此相对的彼此对准的多层第一线 单排。 第二线圈位于第一线圈和第三线圈之间，并且由具有内端和外端的第二线形成，其中第二线沿与第一线的方向相反的方向缠绕以形成多个层 电线在单列中相对于彼此对准。 第三线圈由具有内端和外端的第三线形成，其中第三线缠绕在与第一线相同的方向上，以形成多条相对于彼此排列的线。 第一线圈的内端连接到第二线圈的内端，第二线圈的外端连接到第三线圈的外端。