Array substrate, method of manufacturing array substrate and display device
    51.
    发明授权
    Array substrate, method of manufacturing array substrate and display device 有权
    阵列基板,阵列基板和显示装置的制造方法

    公开(公告)号:US09508762B2

    公开(公告)日:2016-11-29

    申请号:US15068928

    申请日:2016-03-14

    Abstract: Embodiments of the present invention disclose an array substrate, a method of manufacturing an array substrate and a display device, which belong to field of display technology. The method includes: forming a gate metal pattern and a gate insulating layer in turn on a base substrate; forming a source-drain metal pattern that is made of a preset metal on the base substrate, on which the gate insulating layer is formed, the source-drain metal pattern comprising a source electrode and a drain electrode and the preset metal including at least copper; forming a silicon nitride layer and a silicon oxide layer in turn on the base substrate, which compose a passivation layer; forming a trench in the passivation layer at a position corresponding to a gap between the source electrode and the drain electrode, wherein a width of the trench in the silicon oxide layer is smaller than a width of the trench in the silicon nitride layer and is larger than or equal to a distance of the gap between the source electrode and the drain electrode; forming an oxide trench pattern on the source-drain metal pattern, with is not in contact with the silicon nitride layer. The present invention solves problems of high-degree oxidation of copper metal layer and poorer display performance of an existing array substrate, and achieves advantages of reducing oxidation of copper metal layer and improving display performance of the array substrate for a display device.

    Abstract translation: 本发明的实施例公开了属于显示技术领域的阵列基板,阵列基板的制造方法和显示装置。 该方法包括:依次在基底基板上形成栅极金属图案和栅极绝缘层; 在其上形成有栅极绝缘层的基底基板上形成由预置金属制成的源极 - 漏极金属图案,所述源极 - 漏极金属图案包括源极和漏极,并且所述预设金属至少包括铜 ; 依次在形成钝化层的基底上形成氮化硅层和氧化硅层; 在与源电极和漏电极之间的间隙相对应的位置处在钝化层中形成沟槽,其中氧化硅层中的沟槽的宽度小于氮化硅层中的沟槽的宽度并且较大 不大于或等于源电极和漏电极之间的间隙的距离; 在源极 - 漏极金属图案上形成氧化物沟槽图案,其不与氮化硅层接触。 本发明解决了铜金属层的高度氧化和现有阵列基板的显示性能差的问题,并且具有减少铜金属层的氧化和提高显示装置的阵列基板的显示性能的优点。

    ARRAY SUBSTRATE AND FABRICATION METHOD THEREOF, AND DISPLAY DEVICE
    52.
    发明申请
    ARRAY SUBSTRATE AND FABRICATION METHOD THEREOF, AND DISPLAY DEVICE 有权
    阵列基板及其制造方法及显示装置

    公开(公告)号:US20160190222A1

    公开(公告)日:2016-06-30

    申请号:US14785905

    申请日:2015-03-18

    Abstract: An array substrate and a fabrication method thereof, and a display device are provided. The array substrate comprises: a pattern of an organic light-emitting layer (11); a pattern of an active layer (4a) located in a thin film transistor region and a pattern of an absorbing layer (4b) located in an open region, which are arranged in a same layer, wherein, the pattern of the absorbing layer (4b) is located in a light outgoing direction of the pattern of the organic light-emitting layer (11), and is made of a transparent material having an ultraviolet absorbing function. In this way, the pattern of the absorbing layer located in the open region can absorb ultraviolet light from outgoing light, so that damage to eyes caused by the outgoing light can be reduced; and the pattern of the active layer and the pattern of the absorbing layer are arranged in a same layer, which, as compared with a manner of separately arranging a layer of an ultraviolet absorbing layer in the array substrate, can reduce a thickness of the array substrate, which is conducive to lighting and thinning a display device.

    Abstract translation: 提供阵列基板及其制造方法以及显示装置。 阵列基板包括:有机发光层(11)的图案; 位于薄膜晶体管区域中的有源层(4a)的图案和布置在同一层中的位于开放区域中的吸收层(4b)的图案,其中,吸收层(4b)的图案 )位于有机发光层(11)的图案的光出射方向上,并且由具有紫外线吸收功能的透明材料制成。 以这种方式,位于开放区域中的吸收层的图案可以吸收出射光的紫外线,从而可以减少由出射光引起的对眼睛的损伤; 并且有源层的图案和吸收层的图案被布置在同一层中,与在阵列基板中分开布置一层紫外线吸收层的方式相比,可以减小阵列的厚度 衬底,这有利于照明和变薄显示装置。

    THIN-FILM TRANSISTOR (TFT), PREPARATION METHOD THEREOF, ARRAY SUBSTRATE AND DISPLAY DEVICE
    54.
    发明申请
    THIN-FILM TRANSISTOR (TFT), PREPARATION METHOD THEREOF, ARRAY SUBSTRATE AND DISPLAY DEVICE 审中-公开
    薄膜晶体管(TFT),其制备方法,阵列基板和显示器件

    公开(公告)号:US20150255618A1

    公开(公告)日:2015-09-10

    申请号:US14348427

    申请日:2013-06-20

    Abstract: A thin-film transistor (TFT), a preparation method thereof, an array substrate and a display device are disclosed. The TFT disclosed in the present invention includes a source electrode, a drain electrode, a semiconductor layer, a gate electrode and a gate insulating layer and further includes: a source conductive layer and a drain conductive layer which are disposed on the surface of the semiconductor layer and spaced from each other. The source conductive layer is connected with the source electrode; the drain conductive layer is connected with the drain electrode; and the minimum distance between the source conductive layer and the drain conductive layer is less than the minimum distance between the source electrode and the drain electrode. The TFT is applicable to a display device, in particular, to a LCD or OLED.

    Abstract translation: 公开了薄膜晶体管(TFT)及其制备方法,阵列基板和显示装置。 本发明公开的TFT包括源电极,漏电极,半导体层,栅电极和栅绝缘层,还包括:源极导电层和漏极导电层,其设置在半导体的表面上 层并且彼此间隔开。 源极导电层与源极连接; 漏极导电层与漏极连接; 并且源极导电层和漏极导电层之间的最小距离小于源极和漏极之间的最小距离。 TFT适用于显示装置,尤其适用于LCD或OLED。

    ORGANIC ELECTROLUMINESCENCE ARRAY SUBSTRATE, MANUFACTURING METHOD THEREOF AND DISPLAY DEVICE
    55.
    发明申请
    ORGANIC ELECTROLUMINESCENCE ARRAY SUBSTRATE, MANUFACTURING METHOD THEREOF AND DISPLAY DEVICE 审中-公开
    有机电致阵列基板,其制造方法及显示装置

    公开(公告)号:US20150249115A1

    公开(公告)日:2015-09-03

    申请号:US14342219

    申请日:2013-04-28

    CPC classification number: H01L27/3216 H01L27/3218 H01L27/3262 H01L51/56

    Abstract: An organic electroluminescence array substrate, a manufacturing method thereof and a display device are provided, and the organic electroluminescence array substrate an active backplane and a color display layer formed on the active backplane, wherein the color display layer includes a plurality of pixel units; and each pixel unit includes a red sub-pixel, a green sub-pixel and a blue sub-pixel. Both an area of the red sub-pixel and an area of the green sub-pixel are less than an area of the blue sub-pixel. The organic electroluminescence array substrate has increased aperture ratio thereof.

    Abstract translation: 提供一种有机电致发光阵列基板及其制造方法和显示装置,所述有机电致发光阵列基板是在有源背板上形成的有源底板和彩色显示层,其中,所述彩色显示层包括多个像素单元; 并且每个像素单元包括红色子像素,绿色子像素和蓝色子像素。 红色子像素的区域和绿色子像素的面积均小于蓝色子像素的面积。 有机电致发光阵列基板的开口率增加。

    THIN FILM TRANSISTOR AND MANUFACTURING METHOD THEREOF, ARRAY SUBSTRATE AND DISPLAY DEVICE
    56.
    发明申请
    THIN FILM TRANSISTOR AND MANUFACTURING METHOD THEREOF, ARRAY SUBSTRATE AND DISPLAY DEVICE 有权
    薄膜晶体管及其制造方法,阵列基板和显示器件

    公开(公告)号:US20150214373A1

    公开(公告)日:2015-07-30

    申请号:US14348763

    申请日:2013-07-15

    Abstract: A thin film transistor (TFT) and manufacturing method thereof, an array substrate and a display device are provided. The thin film transistor comprises a substrate; an active layer formed on the substrate; a first conductive contact layer and a second conductive contact layer formed on the active layer; an etch-stop layer formed over the first contact layer and the second contact layer; and a source connected with the first contact layer, a drain connected with the second contact layer and a gate arranged between the source and the drain formed over the etch-stop layer. The TFT has a simple structure and better performance.

    Abstract translation: 提供薄膜晶体管(TFT)及其制造方法,阵列基板和显示装置。 薄膜晶体管包括基板; 形成在所述基板上的有源层; 第一导电接触层和形成在有源层上的第二导电接触层; 形成在所述第一接触层和所述第二接触层上的蚀刻停止层; 以及与第一接触层连接的源极,与第二接触层连接的漏极和布置在蚀刻停止层上形成的源极和漏极之间的栅极。 TFT具有结构简单,性能更好的特点。

    Method of manufacturing transistor, transistor, array substrate and display device
    59.
    发明授权
    Method of manufacturing transistor, transistor, array substrate and display device 有权
    制造晶体管,晶体管,阵列基板和显示装置的方法

    公开(公告)号:US08889444B2

    公开(公告)日:2014-11-18

    申请号:US13876630

    申请日:2012-11-28

    Inventor: Chunsheng Jiang

    Abstract: Embodiments of the present invention provide a method for manufacturing a transistor, a transistor, an array substrate and a display device. The method comprises: forming a first source/drain metal layer on a substrate; forming an insulating layer above the first source/drain metal layer; forming a gate metal layer on the insulating layer; forming a gate insulating layer on the gate metal layer; forming a semiconductor layer above the gate insulating layer; forming an etching blocking layer on the semiconductor layer; forming a second source/drain metal layer above the etching blocking layer; forming an insulating layer above the second source/drain metal layer.

    Abstract translation: 本发明的实施例提供一种制造晶体管,晶体管,阵列基板和显示装置的方法。 该方法包括:在衬底上形成第一源极/漏极金属层; 在第一源极/漏极金属层上形成绝缘层; 在所述绝缘层上形成栅极金属层; 在栅极金属层上形成栅极绝缘层; 在栅绝缘层上方形成半导体层; 在半导体层上形成蚀刻阻挡层; 在蚀刻阻挡层上形成第二源极/漏极金属层; 在第二源极/漏极金属层上方形成绝缘层。

    Method And Apparatus For Controlling Image Display
    60.
    发明申请
    Method And Apparatus For Controlling Image Display 有权
    用于控制图像显示的方法和装置

    公开(公告)号:US20140063080A1

    公开(公告)日:2014-03-06

    申请号:US13964785

    申请日:2013-08-12

    Abstract: The present disclosure discloses a method and an apparatus for controlling image display, which achieve uniformity of image display and remove the image-retention in a compensation manner of high precision, high efficiency and low cost. The method for controlling image display comprises: reading gray scales of all sub-pixels of a current frame image displayed by a display device; determining an ideal luminance corresponding to the gray scale according to a predetermined ideal corresponding relationship between the gray scales and luminance of respective sub-pixels respectively; determining an adjusted gray scale corresponding to the ideal luminance according to the predetermined original corresponding relationship between the gray scales and the luminance of respective sub-pixels respectively; driving the display device to display the current frame image according to the adjusted gray scale.

    Abstract translation: 本公开公开了一种用于控制图像显示的方法和装置,其以高精度,高效率和低成本的补偿方式实现图像显示的均匀性并去除图像保持。 用于控制图像显示的方法包括:读取由显示装置显示的当前帧图像的所有子像素的灰度级; 根据各个子像素的灰度级和亮度之间的预定理想对应关系,确定与灰度级对应的理想亮度; 根据灰度级和各子像素的亮度之间的预定原始对应关系,确定对应于理想亮度的调整灰度; 驱动显示装置根据调整后的灰度显示当前帧图像。

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