公开(公告)号：US20210142978A1

公开(公告)日：2021-05-13

申请号：US17064815

申请日：2020-10-07

申请人： NuFlare Technology, Inc.

发明人： Atsushi ANDO ,  Takahiro MURATA

IPC分类号： H01J37/244 ,  H01J37/04 ,  H01J37/32

摘要： An electron beam inspection apparatus includes a plurality of electrodes to surround an inspection substrate placed on a stage, a camera to measure, for each of the plurality of electrodes, a gap between a peripheral edge of the inspection substrate and an electrode of the plurality of electrodes, a retarding potential application circuit to apply a retarding potential to the inspection substrate, an electrode potential application circuit to apply, to each electrode, a corresponding potential of potentials each obtained by adding an offset potential, which is variable according to a measured gap, to the retarding potential to be applied to the inspection substrate, and an electron optical system to irradiate the inspection substrate with electron beams, in the state where the retarding potential has been applied to the inspection substrate and the corresponding potential of the potentials has been individually applied to each of the plurality of electrodes.

公开(公告)号：US20210013003A1

公开(公告)日：2021-01-14

申请号：US16924828

申请日：2020-07-09

申请人： NuFlare Technology, Inc.

发明人： Hiroshi Matsumoto

IPC分类号： H01J37/317 ,  G03F7/20

摘要： In one embodiment, a multi-beam writing method includes forming a beam array of a multi-beam, assigning sub-beam arrays to each of a plurality of sub-stripe regions, the sub-stripe regions being obtained by dividing a region on the substrate, and the sub-beam arrays being obtained by dividing the beam array, calculating an irradiation time modulation rate being used for each beam belonging to each of the sub-beam arrays, calculating a weight for each of the sub-beam arrays based on the irradiation time modulation rate for each of the beams belonging to a group of the sub-beam arrays, and assigning the calculated weight to the sub-beam array, and performing multiple writing on each of the sub-stripe regions by performing writing on each of the sub-stripe regions with the sub-beam arrays, based on the weight assigned to the sub-beam array and the irradiation time modulation rate of the beam belonging to the sub-beam array.

公开(公告)号：US20210010959A1

公开(公告)日：2021-01-14

申请号：US16907925

申请日：2020-06-22

申请人： NuFlare Technology, Inc.

发明人： Masataka SHIRATSUCHI ,  Riki OGAWA ,  Hiromu INOUE

IPC分类号： G01N23/2251 ,  H01J37/30 ,  H01J37/317

摘要： Provided is an inspection apparatus including: an irradiation source irradiating a first pattern formed on an inspection target object with an electron beam; a detection circuit acquiring a first inspection image generated from the first pattern by irradiation; a filter circuit performing smoothing using a local region having a first size in a direction parallel to a first outline included in the first inspection image and a second size smaller than the first size in a direction perpendicular to the first outline and acquiring a second inspection image including a second outline generated by the smoothing; and a comparison circuit comparing the second inspection image with a predetermined reference image.

公开(公告)号：US10886103B2

公开(公告)日：2021-01-05

申请号：US16432009

申请日：2019-06-05

申请人： NuFlare Technology, Inc.

发明人： Kei Hasegawa ,  Yoshiaki Onimaru ,  Hayato Kimura

IPC分类号： H01J37/30 ,  H01J37/317 ,  H01J37/20 ,  H01J37/302 ,  H01J37/04 ,  H01J37/09

摘要： In one embodiment, a data processing method is for processing data in a writing apparatus performing multiple writing by using multiple beams. The data is for controlling an irradiation amount for each beam. The method includes generating irradiation amount data for each of a plurality of layers, the irradiation amount data defining an irradiation amount for each of a plurality of irradiation position, and the plurality of layers corresponding to writing paths in multiple writing, performing a correction process on the irradiation amounts defined in the irradiation amount data provided for each layer, calculating a sum of the irradiation amounts for the respective irradiation positions defined in the corrected irradiation amount data, comparing the sums between the plurality of layers, and determining whether or not an error has occurred in the correction process based on the comparison result.

公开(公告)号：US20200343073A1

公开(公告)日：2020-10-29

申请号：US16835369

申请日：2020-03-31

申请人： NuFlare Technology, Inc.

发明人： Mitsuhiro OKAZAWA ,  Hirofumi MORITA

IPC分类号： H01J37/317 ,  H01J37/09 ,  H01J37/04 ,  H01J37/12

摘要： Provided is a multi charged particle beam writing apparatus including: an emission unit emitting a charged particle beam; a restriction aperture unit having a first opening having a variable opening area, the restriction aperture unit shielding a portion of the charged particle beam; a shaping aperture array substrate having a plurality of second openings, the shaping aperture array substrate forming multiple beams by allowing the shaping aperture array substrate to be irradiated with the charged particle beam passing through the first opening and allowing a portion of the charged particle beam to pass through the plurality of second openings; and a blanking aperture array substrate having a plurality of third openings, each beam of the multiple beams passing through the plurality of third openings, the blanking aperture array substrate being capable of independently deflecting each beam of the multiple beams.

公开(公告)号：US10811224B2

公开(公告)日：2020-10-20

申请号：US16142200

申请日：2018-09-26

申请人： NuFlare Technology, Inc.

发明人： Hirofumi Morita

IPC分类号： H01J37/30 ,  H01J37/04 ,  H01J37/317

摘要： In one embodiment, a multi-charged-particle beam writing apparatus includes an emission unit emitting a charged-particle beam, a limiting aperture substrate including a single first aperture, a shaping aperture array that has a plurality of second apertures and that is irradiated with the charged-particle beam having passed through the first aperture in a region including the plurality of second apertures and forms multi-beams by letting part of the charged-particle beam pass through the plurality of second apertures, and a blanking aperture array member including a plurality of third apertures through each of which a corresponding one of the multi-beams that have passed through the plurality of second apertures passes, the blanking aperture array member having a blanker in each of the third apertures, the blanker performing blanking deflection on the corresponding beam.

公开(公告)号：US10796877B2

公开(公告)日：2020-10-06

申请号：US16434897

申请日：2019-06-07

申请人： NUFLARE TECHNOLOGY, INC.

发明人： Yoshihiro Izumi ,  Hideki Ito ,  Toshikatsu Akiba

IPC分类号： H01J37/06 ,  H01J37/20 ,  H01J37/147

摘要： According to one aspect of the present invention, a charged particle beam image acquisition apparatus includes a rectangular parallelepiped chamber where a target object is disposed; a primary electron optical column placed on an upper surface of the chamber so that a point of intersection between two diagonal lines on the upper surface of the chamber is located at a center of a horizontal section of the primary electron optical column, a primary charged particle beam optics irradiating the target object with a primary charged particle beam being disposed in the primary electron optical column; and a secondary electron optical column connected to a lower portion of the primary electron optical column, a secondary charged particle beam optics being disposed in the secondary electron optical column and a secondary charged particle beam passing through the secondary charged particle beam optics.

公开(公告)号：US10784081B2

公开(公告)日：2020-09-22

申请号：US16854405

申请日：2020-04-21

申请人： NuFlare Technology, Inc.

发明人： Munehiro Ogasawara

IPC分类号： H01J37/317 ,  H01J37/30 ,  H01J37/06 ,  H01J37/12 ,  H01J37/147

摘要： A charged particle beam lithography apparatus, includes a plurality of multiple-beam sets, each of which including a plurality of irradiation sources each generating an independent charged particle beam, a plurality of objective deflectors, each arranged for a corresponding charged particle beam, and configured to deflect the corresponding charged particle beam to a desired position on a substrate, and a plurality of electrostatic or electromagnetic lens fields each to focus the corresponding charged particle beam on the target object; a plurality of common deflection amplifiers, arranged for each multiple-beam set, and each of the plurality of common deflection amplifiers being configured to commonly control the plurality of objective deflectors arranged in a same multiple-beam set; a plurality of individual ON/OFF mechanisms configured to individually turn ON/OFF a beam irradiated from each irradiation source; and one or more multiple-beam clusters including the plurality of multiple-beam sets.

公开(公告)号：US10784080B2

公开(公告)日：2020-09-22

申请号：US16363487

申请日：2019-03-25

申请人： NuFlare Technology, Inc.

发明人： Ryoichi Yoshikawa ,  Hideo Inoue

IPC分类号： H01J37/304 ,  H01J37/31 ,  H01J37/317

摘要： A multiple charged particle beam writing apparatus includes a defective pattern data generation circuitry configured to generate defective pattern data of a defective pattern having a shape of the defective region in the writing region; a reverse pattern data generation circuitry configured to generate reverse pattern data by reversing the defective pattern data; a combined-value pixel data generation circuitry configured to generate, for the each pixel, combined-value pixel data by adding a value defined in a reverse pattern pixel data and a value defined in a writing pattern pixel data; and a writing mechanism configured to perform multiple writing, using multiple charged particle beams, on the target object such that the each pixel is irradiated with a beam of a dose corresponding to a value defined in the combined-value pixel data.

公开(公告)号：US10719928B2

公开(公告)日：2020-07-21

申请号：US15213695

申请日：2016-07-19

申请人： NuFlare Technology, Inc.

发明人： Toshiaki Otaki ,  Riki Ogawa

IPC分类号： G06T7/00 ,  G01N21/956 ,  G02B21/24 ,  G02B21/36 ,  G02B21/08 ,  G03F1/84

摘要： A pattern inspection apparatus includes a transmitted illumination optical system to illuminate change the shape of a first inspection light, a reflected illumination optical system to illuminate a mask substrate with a second inspection light by using an objective lens and a polarizing element, and let a reflected light from the mask substrate pass therethrough, a drive mechanism to enable the polarizing element to be moved from/to outside/inside an optical path, a sensor to receive a transmitted light from the mask substrate illuminated with the first inspection light during stage moving, and an aperture stop, between the mask substrate and the sensor, to adjust a light flux diameter of the transmitted light so that the transmitted light reaching the sensor can be switched between high and low numerical aperture (NA) states with which the transmitted light from the mask substrate can enter the objective lens.