公开(公告)号：US10573486B2

公开(公告)日：2020-02-25

申请号：US15742283

申请日：2016-06-10

Applicant: VALUE ENGINEERING, LTD.

Inventor： Kyou Tae Hwang

IPC: H01J37/147 ,  H01L21/265 ,  H01J27/02 ,  H01J5/10 ,  H01J37/08 ,  H01J37/09 ,  H01J37/317

Abstract: Provided are elements for an ion implanter and an ion generating device including the same. The elements include a repeller, a cathode, a chamber wall, and a slit member constituting an arc chamber of an ion generating device for ion implantation used in the fabrication of a semiconductor device. A coating structure including a semicarbide layer is provided to each of the elements in order to stabilize the element against thermal deformation, protect the element from wear, and prevent a deposition product from being peeled off. The coating structure enables precise ion implantation without a change in the position of ion generation or distortion of the equipment. The coating structure allows electrons to be uniformly reflected into the arc chamber to increase the uniformity of plasma, resulting in an improvement in the dissociation efficiency of an ion source gas. The coating structure significantly improves the service life of the element compared to those of existing elements. Also provided are ion generating devices including the elements.

公开(公告)号：US20200006032A1

公开(公告)日：2020-01-02

申请号：US16337791

申请日：2016-11-24

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Takafumi MIWA ,  Seiichiro KANNO ,  Go MIYA

IPC: H01J37/09 ,  H01J37/20 ,  H01J37/28 ,  H01J37/02

Abstract: A charged particle beam device capable of removing a foreign matter adhered to an electric field-correcting electrode arranged in an outer peripheral portion of a measurement sample is provided. The invention is directed to a charged particle beam device including a sample stage provided with the measurement sample and an electric field-correcting electrode correcting an electric field in the vicinity of the outer peripheral portion of the measurement sample and in which the measurement sample is measured by being irradiated with a charged particle beam, wherein a foreign-matter removal control unit controls a power source connected to the electric field-correcting electrode such that an absolute value of a voltage to be applied to the electric field-correcting electrode is equal to or more than an absolute value of a voltage to be applied to the electric field-correcting electrode when the measurement sample is measured.

公开(公告)号：US10510508B2

公开(公告)日：2019-12-17

申请号：US15936074

申请日：2018-03-26

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Toshiyuki Iwahori

IPC: H01J37/04 ,  H01J37/244 ,  H01J37/20 ,  H01J37/22 ,  H01J37/09

Abstract: A charged particle beam apparatus includes a sample chamber; a sample stage; an electron beam column for irradiating a sample with an electron beam; and a focused ion beam column for irradiating the sample with a focused ion beam. The apparatus includes a displacement member having an open/close portion displaceable between an insertion position between a beam emitting end portion of the electron beam column and the sample stage, and a withdrawal position away from the insertion position, and a contact portion provided at a contact position capable of contacting the sample before the beam emitting end portion during operation of the sample stage. A driving unit displaces the displacement member, and a conduction sensor detects whether the sample is in contact with the contact portion.

公开(公告)号：US20190259563A1

公开(公告)日：2019-08-22

申请号：US15902392

申请日：2018-02-22

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Jürgen Frosien

IPC: H01J37/09 ,  H01J37/153 ,  H01J37/244 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28

Abstract: Disclosed herein is charged particle beam device and a a method of operating a charged particle beam device, comprising forming a plurality of focused charged particle beamlets. Charged particles are directed from a charged particle source to a multi-aperture plate. A plurality of beamlets are passed through a plurality of apertures of the multi-aperture plate. The beamlets include an inner beamlet of charged particles and a plurality of outer beamlets of charged particles. The outer beamlets are focused to form a plurality of outer focal points on a virtual ring having a center along an optical axis, the outer beamlets subjected to a field curvature aberration, such that the virtual ring is axially displaced relative to a virtual focal point of an uncompensated inner beamlet. A compensated inner beamlet is focused to a compensated focal point. The inner beamlet is compensated to form the compensated inner beamlet; and the compensated focal point is coplanar with the virtual ring.

公开(公告)号：US20190193192A1

公开(公告)日：2019-06-27

申请号：US16195970

申请日：2018-11-20

Applicant: Arcam AB

Inventor： Mattias Fager ,  Johan Backlund

IPC: B23K15/00 ,  H01J37/147 ,  H01J37/063 ,  H01J37/18 ,  H01J37/09 ,  H01J37/10 ,  B33Y10/00 ,  B33Y30/00

CPC classification number: B23K15/0086 ,  B22F3/1055 ,  B22F2003/1056 ,  B22F2003/1057 ,  B23K15/002 ,  B23K15/0026 ,  B23K15/0046 ,  B23K15/06 ,  B29C64/153 ,  B29C64/268 ,  B29C64/393 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  H01J37/063 ,  H01J37/09 ,  H01J37/10 ,  H01J37/147 ,  H01J37/18 ,  H01J37/301 ,  H01J37/3045 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/3128 ,  H01J2237/316

Abstract: An electron beam source comprising a cathode, an anode, a means for deflecting an electron beam over a target surface and at least one vacuum pump, the electron beam source further comprising a contraction area arranged between the anode and the means for deflecting the electron beam where a hole in the contraction area is aligned with a hole in the anode with respect to the cathode, a first vacuum pump is arranged between the contraction area and the anode and a second vacuum pump is arranged above the anode, a gas inlet is provided between the contraction area and the means for deflecting the electron beam, wherein a first crossover of the electron beam is arranged between the cathode and the anode and a second crossover is arranged at or in close proximity to the contraction area.

公开(公告)号：US20190180972A1

公开(公告)日：2019-06-13

申请号：US16003870

申请日：2018-06-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hyun Ho LEE ,  Jong Mun PARK ,  Byoung Sup AHN ,  Jin CHOI ,  Shuichi TAMAMUSHI

IPC: H01J37/09 ,  H01J37/10

Abstract: An aperture system of an electron beam apparatus includes a plurality of apertures each including a first area including at least one through hole allowing an electron beam to pass therethrough and a second area disposed outside the first area and including first and second alignment keys, wherein two apertures, among the plurality of apertures, include the first alignment keys arranged in mutually overlapping positions and having the same size, and an aperture, excluding the two apertures, among the plurality of apertures, includes the second alignment keys arranged to overlap the first alignment keys and having an area larger than an area of the first alignment keys.

公开(公告)号：US20190088440A1

公开(公告)日：2019-03-21

申请号：US16196081

申请日：2018-11-20

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Dirk Zeidler ,  Thomas Kemen ,  Christof Riedesel ,  Ralf Lenke

IPC: H01J37/10 ,  H01J37/28 ,  H01J37/12 ,  H01J37/26 ,  H01J37/24 ,  H01J37/09

CPC classification number: H01J37/10 ,  H01J37/09 ,  H01J37/12 ,  H01J37/24 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/1202

Abstract: Particle beam system comprising a particle source; a first multi-aperture plate with a multiplicity of openings downstream of which particle beams are formed; a second multi-aperture plate with a multiplicity of openings which are penetrated by the particle beams; an aperture plate with an opening which is penetrated by all the particles which also penetrate the openings in the first and the second multi-aperture plate; a third multi-aperture plate with a multiplicity of openings which are penetrated by the particle beams, and with a multiplicity of field generators which respectively provide a dipole field or quadrupole field for a beam; and a controller for feeding electric potentials to the multi-aperture plates and the aperture plate so that the second openings in the second multi-aperture plate respectively act as a lens on the particle beams 3 and feed adjustable excitations to the field generators.

公开(公告)号：US20190043693A1

公开(公告)日：2019-02-07

申请号：US16052823

申请日：2018-08-02

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi MATSUMOTO

IPC: H01J37/304 ,  H01J37/09 ,  H01J37/317

CPC classification number: H01J37/304 ,  H01J37/09 ,  H01J37/3177 ,  H01J2237/0453 ,  H01J2237/24514 ,  H01J2237/30461 ,  H01J2237/31761 ,  H01J2237/31774

Abstract: A multiple charged particle beam writing apparatus includes a distribution coefficient calculation circuitry to calculate, using defective beam information based on which a defective beam can be identified, for each design grid in a plurality of design grids being irradiation positions in design of multiple charged particle beams, a distribution coefficient for each of three or more beams, for distributing a dose to irradiate a design grid concerned in the plurality of design grids to the three or more beams, excluding the defective beam, whose actual irradiation positions are close to or approximately coincident with the design grid concerned, such that the position of the gravity center of each distributed dose coincides with the position of the design grid concerned and the sum of each distributed dose after distribution coincides with the dose to irradiate the design grid concerned.

公开(公告)号：US20180330913A1

公开(公告)日：2018-11-15

申请号：US15966372

申请日：2018-04-30

Applicant: JEOL Ltd.

Inventor： Shogo Kataoka ,  Akio Isono

IPC: H01J37/20 ,  H01J37/09

CPC classification number: H01J37/20 ,  H01J37/09 ,  H01J37/3053 ,  H01J2237/20214 ,  H01J2237/3151

Abstract: A sample holder unit includes a sample holding portion, a shielding plate, and a rotating mechanism. The rotating mechanism supports the sample and the shielding plate and allows the sample and the shielding plate to rotate. The rotating mechanism is oriented such that an axis of rotation thereof is parallel to both a processing surface of the sample and a direction orthogonal to a direction of projection of the sample from the shielding plate. A center of rotation of the rotating mechanism resides on the processing surface of the sample.

公开(公告)号：US10092256B2

公开(公告)日：2018-10-09

申请号：US14397916

申请日：2013-05-17

Applicant: Carestream Health, Inc.

Inventor： John Yorkston ,  David H. Foos

IPC: A61B6/06 ,  H01J35/24 ,  H01J37/09 ,  A61B6/00 ,  A61B6/03

Abstract: Embodiments of methods and/or apparatus for a radiographic imaging can include a plurality of x-ray sources disposed in a curve and a detector configured to revolve relative thereto. In one embodiment, a CBCT imaging method and/or apparatus can include performing a first scan at a first speed using stationary angularly distributed x-ray sources to acquire first CBCT projection data that impinge a detector of a first field of view (FOV), identifying an area of interest within the first FOV, and performing a second scan at a second speed using the x-ray sources acquire second CBCT projection data that impinge a portion of the detector of a second smaller FOV including the area of interest within the first FOV using second emissions by the x-ray sources, where the second speed is greater than the first speed.