公开(公告)号：US09601434B2

公开(公告)日：2017-03-21

申请号：US12964823

申请日：2010-12-10

申请人： Yaojian Lin ,  Kang Chen ,  Jianmin Fang

发明人： Yaojian Lin ,  Kang Chen ,  Jianmin Fang

IPC分类号： H01L23/52 ,  H01L23/538 ,  H01L23/498 ,  H01L21/56 ,  H01L23/00

CPC分类号： H01L23/49838 ,  H01L21/4853 ,  H01L21/4857 ,  H01L21/565 ,  H01L21/568 ,  H01L23/3114 ,  H01L23/49811 ,  H01L23/49816 ,  H01L23/49822 ,  H01L23/5389 ,  H01L24/19 ,  H01L24/20 ,  H01L2224/04105 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/1145 ,  H01L2224/1146 ,  H01L2224/11849 ,  H01L2224/12105 ,  H01L2224/13022 ,  H01L2224/131 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/2101 ,  H01L2224/215 ,  H01L2224/221 ,  H01L2924/00013 ,  H01L2924/01029 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/181 ,  H01L2924/00014 ,  H01L2924/014 ,  H01L2924/01082 ,  H01L2224/13099 ,  H01L2224/13599 ,  H01L2224/05599 ,  H01L2224/05099 ,  H01L2224/29099 ,  H01L2224/29599 ,  H01L2924/00 ,  H01L2924/00012

摘要： A semiconductor device has a semiconductor die mounted to a carrier. An encapsulant is deposited over the semiconductor die and carrier. The carrier is removed. A first insulating layer is formed over a portion of the encapsulant within an interconnect site outside a footprint of the semiconductor die. An opening is formed through the first insulating layer within the interconnect site to expose the encapsulant. The opening can be ring-shaped or vias around the interconnect site and within a central region of the interconnect site to expose the encapsulant. A first conductive layer is formed over the first insulating layer to follow a contour of the first insulating layer. A second conductive layer is formed over the first conductive layer and exposed encapsulant. A second insulating layer is formed over the second conductive layer. A bump is formed over the second conductive layer in the interconnect site.

公开(公告)号：US09082832B2

公开(公告)日：2015-07-14

申请号：US13478008

申请日：2012-05-22

申请人： Yaojian Lin ,  Kang Chen ,  Jianmin Fang

发明人： Yaojian Lin ,  Kang Chen ,  Jianmin Fang

IPC分类号： H01L21/50 ,  H01L21/768 ,  H01L23/00 ,  H01L23/498 ,  H01L21/48

CPC分类号： H01L21/76898 ,  H01L21/481 ,  H01L21/486 ,  H01L23/49827 ,  H01L24/03 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L2224/02372 ,  H01L2224/03002 ,  H01L2224/0347 ,  H01L2224/0391 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/05001 ,  H01L2224/05027 ,  H01L2224/05111 ,  H01L2224/05124 ,  H01L2224/05139 ,  H01L2224/05144 ,  H01L2224/05147 ,  H01L2224/05155 ,  H01L2224/05166 ,  H01L2224/05169 ,  H01L2224/05171 ,  H01L2224/05181 ,  H01L2224/0554 ,  H01L2224/05548 ,  H01L2224/05552 ,  H01L2224/05567 ,  H01L2224/05572 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/05666 ,  H01L2224/05671 ,  H01L2224/10126 ,  H01L2224/1147 ,  H01L2224/11849 ,  H01L2224/1191 ,  H01L2224/13013 ,  H01L2224/13014 ,  H01L2224/13022 ,  H01L2224/48091 ,  H01L2224/73104 ,  H01L2224/73265 ,  H01L2224/94 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/181 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2224/11 ,  H01L2224/03 ,  H01L2924/01029 ,  H01L2924/01074 ,  H01L2924/01007 ,  H01L2924/01023 ,  H01L2924/00012

摘要： A semiconductor device has a semiconductor wafer with a plurality of contact pads. A first insulating layer is formed over the semiconductor wafer and contact pads. A portion of the first insulating layer is removed, exposing a first portion of the contact pads, while leaving a second portion of the contact pads covered. An under bump metallization layer and a plurality of bumps is formed over the contact pads and the first insulating layer. A second insulating layer is formed over the first insulating layer, a sidewall of the under bump metallization layer, sidewall of the bumps, and upper surface of the bumps. A portion of the second insulating layer covering the upper surface of the bumps is removed, but the second insulating layer is maintained over the sidewall of the bumps and the sidewall of the under bump metallization layer.

摘要翻译： 半导体器件具有带有多个接触焊盘的半导体晶片。 在半导体晶片和接触焊盘上形成第一绝缘层。 去除第一绝缘层的一部分，暴露接触焊盘的第一部分，同时留下覆盖的接触焊盘的第二部分。 在接触焊盘和第一绝缘层之上形成凸起下金属化层和多个凸点。 在第一绝缘层，凸块下金属化层的侧壁，凸起的侧壁和凸块的上表面上形成第二绝缘层。 去除了覆盖凸起的上表面的第二绝缘层的一部分，但是第二绝缘层保持在突起的侧壁和凸块下金属化层的侧壁上。

公开(公告)号：US20130069227A1

公开(公告)日：2013-03-21

申请号：US13478008

申请日：2012-05-22

申请人： Yaojian Lin ,  Kang Chen ,  Jianmin Fang

发明人： Yaojian Lin ,  Kang Chen ,  Jianmin Fang

IPC分类号： H01L23/485 ,  H01L21/78 ,  H01L21/768

CPC分类号： H01L21/76898 ,  H01L21/481 ,  H01L21/486 ,  H01L23/49827 ,  H01L24/03 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L2224/02372 ,  H01L2224/03002 ,  H01L2224/0347 ,  H01L2224/0391 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/05001 ,  H01L2224/05027 ,  H01L2224/05111 ,  H01L2224/05124 ,  H01L2224/05139 ,  H01L2224/05144 ,  H01L2224/05147 ,  H01L2224/05155 ,  H01L2224/05166 ,  H01L2224/05169 ,  H01L2224/05171 ,  H01L2224/05181 ,  H01L2224/0554 ,  H01L2224/05548 ,  H01L2224/05552 ,  H01L2224/05567 ,  H01L2224/05572 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/05666 ,  H01L2224/05671 ,  H01L2224/10126 ,  H01L2224/1147 ,  H01L2224/11849 ,  H01L2224/1191 ,  H01L2224/13013 ,  H01L2224/13014 ,  H01L2224/13022 ,  H01L2224/48091 ,  H01L2224/73104 ,  H01L2224/73265 ,  H01L2224/94 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/181 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2224/11 ,  H01L2224/03 ,  H01L2924/01029 ,  H01L2924/01074 ,  H01L2924/01007 ,  H01L2924/01023 ,  H01L2924/00012

摘要： A semiconductor device has a semiconductor wafer with a plurality of contact pads. A first insulating layer is formed over the semiconductor wafer and contact pads. A portion of the first insulating layer is removed, exposing a first portion of the contact pads, while leaving a second portion of the contact pads covered. An under bump metallization layer and a plurality of bumps is formed over the contact pads and the first insulating layer. A second insulating layer is formed over the first insulating layer, a sidewall of the under bump metallization layer, sidewall of the bumps, and upper surface of the bumps. A portion of the second insulating layer covering the upper surface of the bumps is removed, but the second insulating layer is maintained over the sidewall of the bumps and the sidewall of the under bump metallization layer.

公开(公告)号：US20130069225A1

公开(公告)日：2013-03-21

申请号：US13239080

申请日：2011-09-21

申请人： Yaojian Lin ,  Kang Chen ,  Jianmin Fang

发明人： Yaojian Lin ,  Kang Chen ,  Jianmin Fang

IPC分类号： H01L21/768 ,  H01L23/485 ,  H01L21/78

CPC分类号： H01L21/76898 ,  H01L21/481 ,  H01L21/486 ,  H01L23/49827 ,  H01L24/03 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L2224/02372 ,  H01L2224/03002 ,  H01L2224/0347 ,  H01L2224/0391 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/05001 ,  H01L2224/05027 ,  H01L2224/05124 ,  H01L2224/05139 ,  H01L2224/05144 ,  H01L2224/05147 ,  H01L2224/05155 ,  H01L2224/05164 ,  H01L2224/05166 ,  H01L2224/05169 ,  H01L2224/05171 ,  H01L2224/05181 ,  H01L2224/0554 ,  H01L2224/05548 ,  H01L2224/05552 ,  H01L2224/05567 ,  H01L2224/05572 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05657 ,  H01L2224/05666 ,  H01L2224/05671 ,  H01L2224/10126 ,  H01L2224/1147 ,  H01L2224/11849 ,  H01L2224/1191 ,  H01L2224/13013 ,  H01L2224/13014 ,  H01L2224/13022 ,  H01L2224/131 ,  H01L2224/13109 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/48091 ,  H01L2224/73104 ,  H01L2224/73265 ,  H01L2224/93 ,  H01L2224/94 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/181 ,  H01L2224/11 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2924/01082 ,  H01L2924/01029 ,  H01L2924/01074 ,  H01L2924/01007 ,  H01L2924/01023 ,  H01L2924/014 ,  H01L2924/00012

摘要： A semiconductor device has a semiconductor wafer with a plurality of contact pads. A first insulating layer is formed over the semiconductor wafer and contact pads. A portion of the first insulating layer is removed, exposing a first portion of the contact pads, while leaving a second portion of the contact pads covered. An under bump metallization layer and a plurality of bumps is formed over the contact pads and the first insulating layer. A second insulating layer is formed over the first insulating layer, a sidewall of the under bump metallization layer, sidewall of the bumps, and upper surface of the bumps. A portion of the second insulating layer covering the upper surface of the bumps is removed, but the second insulating layer is maintained over the sidewall of the bumps and the sidewall of the under bump metallization layer.

摘要翻译： 半导体器件具有带有多个接触焊盘的半导体晶片。 在半导体晶片和接触焊盘上形成第一绝缘层。 去除第一绝缘层的一部分，暴露接触焊盘的第一部分，同时留下覆盖的接触焊盘的第二部分。 在接触焊盘和第一绝缘层之上形成凸起下金属化层和多个凸点。 在第一绝缘层，凸块下金属化层的侧壁，凸起的侧壁和凸块的上表面上形成第二绝缘层。 去除了覆盖凸起的上表面的第二绝缘层的一部分，但是第二绝缘层保持在凸块的侧壁和凸块下金属化层的侧壁上。

公开(公告)号：US20130015554A1

公开(公告)日：2013-01-17

申请号：US13615308

申请日：2012-09-13

申请人： Yaojian Lin ,  Haijing Cao ,  Qing Zhang ,  Kang Chen ,  Jianmin Fang

发明人： Yaojian Lin ,  Haijing Cao ,  Qing Zhang ,  Kang Chen ,  Jianmin Fang

IPC分类号： H01L29/86 ,  H01L21/02

CPC分类号： H01L25/16 ,  H01L21/76898 ,  H01L23/3114 ,  H01L23/481 ,  H01L24/11 ,  H01L24/12 ,  H01L25/0652 ,  H01L2224/05571 ,  H01L2224/05573 ,  H01L2224/13022 ,  H01L2224/13025 ,  H01L2224/16 ,  H01L2224/2518 ,  H01L2924/00014 ,  H01L2924/01019 ,  H01L2924/01077 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/04941 ,  H01L2924/12044 ,  H01L2924/14 ,  H01L2924/19015 ,  H01L2924/19041 ,  H01L2924/19104 ,  H01L2924/19105 ,  H01L2224/05599

摘要： A semiconductor wafer contains a substrate having a plurality of active devices formed thereon. An analog circuit is formed on the substrate. The analog circuit can be an inductor, metal-insulator-metal capacitor, or resistor. The inductor is made with copper. A through substrate via (TSV) is formed in the substrate. A conductive material is deposited in the TSV in electrical contact with the analog circuit. An under bump metallization layer is formed on a backside of the substrate in electrical contact with the TSV. A solder material is deposited on the UBM layer. The solder material is reflowed to form a solder bump. A wire bond is formed on a top surface of the substrate. A redistribution layer is formed between the TSV and UBM. The analog circuit electrically connects through the TSV to the solder bump on the back side of the substrate.

摘要翻译： 半导体晶片包含其上形成有多个有源器件的衬底。 在基板上形成模拟电路。 模拟电路可以是电感，金属 - 绝缘体 - 金属电容或电阻。 电感由铜制成。 在衬底中形成贯穿衬底通孔（TSV）。 导电材料沉积在与模拟电路电接触的TSV中。 在与TSV电接触的衬底的背面上形成凸起下金属化层。 焊料材料沉积在UBM层上。 焊料材料被回流以形成焊料凸块。 在基板的顶表面上形成引线接合。 在TSV和UBM之间形成再分配层。 模拟电路通过TSV电连接到衬底背面的焊料凸块。

公开(公告)号：US08263437B2

公开(公告)日：2012-09-11

申请号：US12205755

申请日：2008-09-05

申请人： Yaojian Lin ,  Jianmin Fang ,  Kang Chen ,  Haijing Cao

发明人： Yaojian Lin ,  Jianmin Fang ,  Kang Chen ,  Haijing Cao

IPC分类号： H01L21/00

CPC分类号： H01L21/568 ,  H01L21/6835 ,  H01L23/5389 ,  H01L24/16 ,  H01L24/81 ,  H01L25/03 ,  H01L25/16 ,  H01L25/50 ,  H01L2224/04042 ,  H01L2224/0554 ,  H01L2224/0557 ,  H01L2224/05571 ,  H01L2224/05573 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/131 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/16235 ,  H01L2224/48091 ,  H01L2224/48247 ,  H01L2224/73265 ,  H01L2224/81001 ,  H01L2924/00011 ,  H01L2924/00014 ,  H01L2924/01029 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01322 ,  H01L2924/04941 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15174 ,  H01L2924/15184 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/19043 ,  H01L2924/19105 ,  H01L2924/30105 ,  H01L2924/014 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/81805 ,  H01L2224/05599 ,  H01L2224/0555 ,  H01L2224/0556

摘要： A semiconductor device has a first conductive layer formed over a sacrificial substrate. A first integrated passive device (IPD) is formed in a first region over the first conductive layer. A conductive pillar is formed over the first conductive layer. A high-resistivity encapsulant greater than 1.0 kohm-cm is formed over the first IPD to a top surface of the conductive pillar. A second IPD is formed over the encapsulant. The first encapsulant has a thickness of at least 50 micrometers to vertically separate the first and second IPDs. An insulating layer is formed over the second IPD. The sacrificial substrate is removed and a second semiconductor die is disposed on the first conductive layer. A first semiconductor die is formed in a second region over the substrate. A second encapsulant is formed over the second semiconductor die and a thermally conductive layer is formed over the second encapsulant.

摘要翻译： 半导体器件具有形成在牺牲衬底上的第一导电层。 第一集成无源器件（IPD）形成在第一导电层上的第一区域中。 在第一导电层上形成导电柱。 在第一IPD上形成大于1.0kohm-cm的高电阻率密封剂到导电柱的顶表面。 在密封剂上形成第二个IPD。 第一密封剂具有至少50微米的厚度以垂直分离第一和第二IPD。 绝缘层形成在第二IPD上。 去除牺牲基板，在第一导电层上设置第二半导体管芯。 第一半导体管芯形成在衬底上的第二区域中。 在第二半导体管芯上形成第二密封剂，并且在第二密封剂上形成导热层。

公开(公告)号：US20120146181A1

公开(公告)日：2012-06-14

申请号：US12964810

申请日：2010-12-10

申请人： Yaojian Lin ,  Kang Chen ,  Jianmin Fang

发明人： Yaojian Lin ,  Kang Chen ,  Jianmin Fang

IPC分类号： H01L23/48 ,  H01L21/56 ,  H01L21/50

CPC分类号： H01L23/49822 ,  H01L21/568 ,  H01L23/49816 ,  H01L23/5389 ,  H01L24/03 ,  H01L24/05 ,  H01L24/11 ,  H01L24/19 ,  H01L2224/03462 ,  H01L2224/03464 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/05552 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/05666 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/1145 ,  H01L2224/11462 ,  H01L2224/11464 ,  H01L2224/11849 ,  H01L2224/12105 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/20 ,  H01L2924/01029 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/181 ,  H01L2924/19042 ,  H01L2924/19104 ,  H01L2924/01074 ,  H01L2924/01082 ,  H01L2924/00

摘要： A semiconductor device has an adhesive layer formed over a carrier. A semiconductor die has bumps formed over an active surface of the semiconductor die. The semiconductor die is mounted to the carrier with the bumps partially disposed in the adhesive layer to form a gap between the semiconductor die and adhesive layer. An encapsulant is deposited over the semiconductor die and within the gap between the semiconductor die and adhesive layer. The carrier and adhesive layer are removed to expose the bumps from the encapsulant. An insulating layer is formed over the encapsulant. A conductive layer is formed over the insulating layer in a wound configuration to exhibit inductive properties and electrically connected to the bumps. The conductive layer is partially disposed within a footprint of the semiconductor die. The conductive layer has a separation from the semiconductor die as determined by the gap and insulating layer.

摘要翻译： 半导体器件具有形成在载体上的粘合层。 半导体管芯具有在半导体管芯的有效表面上形成的凸块。 半导体管芯安装到载体上，凸起部分地设置在粘合剂层中，以在半导体管芯和粘合剂层之间形成间隙。 密封剂沉积在半导体管芯上并且在半导体管芯和粘合剂层之间的间隙内。 去除载体和粘合剂层以从密封剂露出凸块。 绝缘层形成在密封剂上。 导电层以缠绕构型形成在绝缘层上，以呈现电感性能并与凸点电连接。 导电层部分地设置在半导体管芯的覆盖区内。 由间隙和绝缘层确定的导电层具有与半导体管芯的分离。

公开(公告)号：US20110163414A1

公开(公告)日：2011-07-07

申请号：US13048771

申请日：2011-03-15

申请人： Yaojian Lin ,  Haijing Cao ,  Kang Chen ,  Jianmin Fang

发明人： Yaojian Lin ,  Haijing Cao ,  Kang Chen ,  Jianmin Fang

IPC分类号： H01L29/86 ,  H01L29/92

CPC分类号： H01L23/3135 ,  H01L23/24 ,  H01L23/31 ,  H01L23/3114 ,  H01L23/3128 ,  H01L23/3157 ,  H01L23/5283 ,  H01L23/552 ,  H01L23/66 ,  H01L24/24 ,  H01L25/105 ,  H01L25/16 ,  H01L25/50 ,  H01L2223/6677 ,  H01L2224/04042 ,  H01L2224/0554 ,  H01L2224/0557 ,  H01L2224/05571 ,  H01L2224/05573 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/12105 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/24195 ,  H01L2224/73265 ,  H01L2224/81005 ,  H01L2225/1035 ,  H01L2225/1058 ,  H01L2924/00014 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01322 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15192 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/19041 ,  H01L2924/19104 ,  H01L2924/19105 ,  H01L2924/30105 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/05599 ,  H01L2224/0555 ,  H01L2224/0556

摘要： A semiconductor device includes a first conductive layer and conductive pillars disposed over the first conductive layer and directly contacting the first conductive layer. The semiconductor device includes an Integrated Passive Device (IPD) mounted to the first conductive layer such that the IPD is disposed between the conductive pillars. The IPD is self-aligned to the first conductive layer, and includes a metal-insulator-metal capacitor disposed over a first substrate and a wound conductive layer forming an inductor disposed over the first substrate. The semiconductor device includes a discrete capacitor mounted over the first conductive layer. The discrete capacitor is electrically connected to one of the conductive pillars. The semiconductor device includes an encapsulant disposed around the IPD, discrete capacitor, and conductive pillars, a first insulation layer disposed over the encapsulant and conductive pillars, and a second conductive layer disposed over the first insulating layer. The second conductive layer is electrically connected to the conductive pillars.

摘要翻译： 半导体器件包括第一导电层和设置在第一导电层之上并直接接触第一导电层的导电柱。 半导体器件包括安装到第一导电层的集成无源器件（IPD），使得IPD设置在导电柱之间。 IPD与第一导电层自对准，并且包括设置在第一基板上的金属 - 绝缘体 - 金属电容器和形成设置在第一基板上的电感器的缠绕导电层。 半导体器件包括安装在第一导电层上的分立电容器。 分立电容器电连接到导电柱之一。 半导体器件包括围绕IPD设置的密封剂，分立电容器和导电柱，设置在密封剂和导电柱上的第一绝缘层，以及设置在第一绝缘层上的第二导电层。 第二导电层电连接到导电柱。

公开(公告)号：US20100264512A1

公开(公告)日：2010-10-21

申请号：US12826368

申请日：2010-06-29

申请人： Yaojian Lin ,  Jianmin Fang ,  Kang Chen ,  Haijing Cao

发明人： Yaojian Lin ,  Jianmin Fang ,  Kang Chen ,  Haijing Cao

IPC分类号： H01L23/522 ,  H01L21/02 ,  H01L21/768 ,  H01L29/86

CPC分类号： H01L27/016 ,  H01L21/6835 ,  H01L23/481 ,  H01L23/5223 ,  H01L23/5227 ,  H01L23/5228 ,  H01L23/552 ,  H01L24/11 ,  H01L24/13 ,  H01L27/14618 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/05111 ,  H01L2224/05124 ,  H01L2224/05139 ,  H01L2224/05144 ,  H01L2224/05147 ,  H01L2224/05155 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/11849 ,  H01L2224/13022 ,  H01L2224/16235 ,  H01L2224/48091 ,  H01L2224/48247 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15174 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/19011 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/19043 ,  H01L2924/30105 ,  H01L2924/3025 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2924/00012

摘要： A semiconductor device is made by providing an integrated passive device (IPD). Through-silicon vias (TSVs) are formed in the IPD. A capacitor is formed over a surface of the IPD by depositing a first metal layer over the IPD, depositing a resistive layer over the first metal layer, depositing a dielectric layer over the first metal layer, and depositing a second metal layer over the resistive and dielectric layers. The first metal layer and the resistive layer are electrically connected to form a resistor and the first metal layer forms a first inductor. A wafer supporter is mounted over the IPD using an adhesive material and a third metal layer is deposited over the IPD. The third metal layer forms a second inductor that is electrically connected to the capacitor and the resistor by the TSVs of the IPD. An interconnect structure is connected to the IPD.

公开(公告)号：US07749814B2

公开(公告)日：2010-07-06

申请号：US12047640

申请日：2008-03-13

申请人： Yaojian Lin ,  Haijing Cao ,  Kang Chen ,  Qing Zhang ,  Jianmin Fang

发明人： Yaojian Lin ,  Haijing Cao ,  Kang Chen ,  Qing Zhang ,  Jianmin Fang

IPC分类号： H01L21/00

CPC分类号： H01L27/016 ,  H01C1/01 ,  H01G4/33 ,  H01L21/6836 ,  H01L23/3114 ,  H01L23/3192 ,  H01L24/03 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L24/48 ,  H01L24/85 ,  H01L28/10 ,  H01L28/24 ,  H01L28/40 ,  H01L2221/68368 ,  H01L2221/68372 ,  H01L2224/02377 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/05548 ,  H01L2224/05567 ,  H01L2224/05571 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/05666 ,  H01L2224/13022 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13155 ,  H01L2224/48463 ,  H01L2224/73207 ,  H01L2224/85 ,  H01L2224/94 ,  H01L2924/00014 ,  H01L2924/0002 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01322 ,  H01L2924/04941 ,  H01L2924/09701 ,  H01L2924/10253 ,  H01L2924/14 ,  H01L2924/181 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/19043 ,  H01L2924/30105 ,  H01L2224/03 ,  H01L2224/11 ,  H01L2924/00012 ,  H01L2924/01023 ,  H01L2924/01082 ,  H01L2924/00 ,  H01L2224/05552 ,  H01L2224/45015 ,  H01L2924/207 ,  H01L2224/45099

摘要： A semiconductor device is made by providing a sacrificial substrate, forming a first insulating layer over the sacrificial substrate, forming a first passivation layer over the first insulating layer, forming a second insulating layer over the first passivation layer, forming an integrated passive device over the second insulating layer, forming a wafer support structure over the integrated passive device, removing the sacrificial substrate to expose the first insulating layer after forming the wafer support structure, and forming an interconnect structure over the first insulating layer in electrical contact with the integrated passive device. The integrated passive device includes an inductor, capacitor, or resistor. The sacrificial substrate is removed by mechanical grinding and wet etching. The wafer support structure can be glass, ceramic, silicon, or molding compound. The interconnect structure can include a solder bump, wire bond, and intermediate conduction layer formed on a backside of the semiconductor device.

摘要翻译： 半导体器件通过提供牺牲衬底制成，在牺牲衬底上形成第一绝缘层，在第一绝缘层之上形成第一钝化层，在第一钝化层上形成第二绝缘层，形成在第 第二绝缘层，在所述集成无源器件上形成晶片支撑结构，在形成所述晶片支撑结构之后移除所述牺牲衬底以暴露所述第一绝缘层，以及在所述第一绝缘层上形成与所述集成无源器件电接触的互连结构 。 集成无源器件包括电感器，电容器或电阻器。 通过机械研磨和湿蚀刻除去牺牲基板。 晶片支撑结构可以是玻璃，陶瓷，硅或模塑料。 互连结构可以包括在半导体器件的背面上形成的焊料凸块，引线接合和中间传导层。