公开(公告)号：US11556738B2

公开(公告)日：2023-01-17

申请号：US17060372

申请日：2020-10-01

Applicant: KLA Corporation

Inventor： Etay Lavert ,  Amnon Manassen ,  Yossi Simon ,  Dimitry Sanko ,  Avner Safrani

IPC: G06N20/00 ,  G06N5/04 ,  G06K9/62 ,  G06F3/0481 ,  G06T11/00

Abstract: A metrology system includes one or more through-focus imaging metrology sub-systems communicatively coupled to a controller having one or more processors configured to receive a plurality of training images captured at one or more focal positions. The one or more processors may generate a machine learning classifier based on the plurality of training images. The one or more processors may receive one or more target feature selections for one or more target overlay measurements corresponding to one or more target features. The one or more processors may determine one or more target focal positions based on the one or more target feature selections using the machine learning classifier. The one or more processors may receive one or more target images captured at the one or more target focal positions, the target images including the one or more target features of the target specimen, and determine overlay based thereon.

公开(公告)号：US20220328365A1

公开(公告)日：2022-10-13

申请号：US17519512

申请日：2021-11-04

Applicant: KLA CORPORATION

Inventor： Amnon Manassen ,  Vladimir Levinski ,  Ido Dolev ,  Yoram Uziel

IPC: H01L21/66 ,  H01L23/544

Abstract: A product includes a semiconductor substrate, with at least first and second thin-film layers disposed on the substrate and patterned to define a matrix of dies, which are separated by scribe lines and contain active areas circumscribed by the scribe lines. A plurality of overlay targets are formed in the first and second thin-film layers within each of the active areas, each overlay target having dimensions no greater than 10 μm×10 μm in a plane parallel to the substrate. The plurality of overlay targets include a first linear grating formed in the first thin-film layer and having a first grating vector, and a second linear grating formed in the second thin-film layer, in proximity to the first linear grating, and having a second grating vector parallel to the first grating vector.

公开(公告)号：US20220307824A1

公开(公告)日：2022-09-29

申请号：US17254253

申请日：2020-11-05

Applicant: KLA Corporation

Inventor： Roie Volkovich ,  Nachshon Rothman ,  Yossi Simon ,  Anna Golotsvan ,  Vladimir Levinski ,  Nireekshan K. Reddy ,  Amnon Manassen ,  Daria Negri ,  Yuri Paskover

IPC: G01B11/27 ,  H01L21/68 ,  H01L21/66

Abstract: A system for use with a misregistration metrology tool (MMT), the system including a database including a plurality of process variation (PV) categories and a corresponding plurality of parameter sets and a process variation accommodation engine (PVAE) including a measurement site process variation category associator (MSPVCA) operative to associate a measurement site being measured by the MMT, at least partially based on an MMT output relating to the measurement site, with a measurement site process variation category (MSPVC), the MSPVC being one of the plurality of PV categories, a measurement site parameter set retriever (MSPSR) operative to retrieve a measurement site parameter set (MSPS) corresponding to the MSPVC and a measurement site parameter set communicator (MSPSC) operative to communicate the MSPS to the MMT.

公开(公告)号：US20220299308A1

公开(公告)日：2022-09-22

申请号：US17204595

申请日：2021-03-17

Applicant: KLA Corporation

Inventor： Andrei V. Shchegrov ,  Ido Dolev ,  Yoram Uziel ,  Amnon Manassen

IPC: G01B9/02 ,  G01B11/27

Abstract: An interferometric overlay tool may include an interferometer and a controller. The interferometer may include one or more beamsplitters to split illumination including one or more wavelengths into a probe beam along a probe path and a reference beam along a reference path, one or more illumination optics to illuminate a grating-over-grating structure with the probe beam, one or more collection optics to collect a measurement beam from the grating-over-grating structure, one or more beam combiners to combine the measurement beam and the reference beam as an interference beam, and a variable phase delay configured to vary an optical path difference (OPD) in the interferometer. The controller may receive one or more interference signals representative of interferometric phase data associated with a plurality of OPD values and the one or more wavelengths from a detector and determine an overlay error of the grating-over-grating structure based on the interferometric phase data.

公开(公告)号：US11281112B2

公开(公告)日：2022-03-22

申请号：US16647092

申请日：2020-02-14

Applicant: KLA CORPORATION

Inventor： Daria Negri ,  Amnon Manassen ,  Gilad Laredo

IPC: G03F7/20 ,  G06T7/00

Abstract: A method of measuring misregistration in the manufacture of semiconductor device wafers including providing a multilayered semiconductor device wafer including at least a first layer and a second layer including at least one misregistration measurement target including a first periodic structure formed together with the first layer having a first pitch and a second periodic structure formed together with the second layer having a second pitch, imaging the first layer and the second layer at a depth of focus and using light having at least one first wavelength that causes images of both the first layer and the second layer to appear in at least one plane within the depth of focus and quantifying offset in the at least one plane between the images of the first layer and the second layer, thereby to calculate misregistration of the first layer and the second layer.

公开(公告)号：US20210364279A1

公开(公告)日：2021-11-25

申请号：US17068328

申请日：2020-10-12

Applicant: KLA Corporation

Inventor： Amnon Manassen ,  Andrew V. Hill ,  Gilad Laredo

IPC: G01B11/27

Abstract: An overlay metrology tool may include an illumination source, illumination optics to illuminate an overlay target having periodic features with one or more illumination beams, collection optics to direct diffracted light from the periodic features of the overlay target to a detector, an adjustable pupil mask located at a pupil plane, and a controller. The adjustable pupil mask may include one or more individually-addressable control zones distributed across the one or more portions of the pupil plane to provide an adjustable pupil transmissivity distribution. The controller may direct the adjustable pupil mask to provide a selected pupil transmissivity distribution corresponding to a selected overlay metrology recipe, where the selected pupil transmissivity distribution corresponds to a selected configuration of the one or more control zones providing transmission of a selected set of diffraction orders from the target to the detector.

公开(公告)号：US11073768B2

公开(公告)日：2021-07-27

申请号：US16598146

申请日：2019-10-10

Applicant: KLA Corporation

Inventor： Andrew V. Hill ,  Amnon Manassen ,  Gilad Laredo ,  Yoel Feler ,  Mark Ghinovker ,  Vladimir Levinski

IPC: G03F7/20 ,  G01N21/956 ,  G01N21/95

Abstract: A metrology system may include a controller coupled to a scanning metrology tool that images a sample in motion along a scan direction. The controller may receive an image of a metrology target on the sample from the scanning metrology tool, where the metrology target comprises a first measurement group including cells distributed along a transverse direction orthogonal to the scan direction, and a second measurement group separated from the first measurement group along the scan direction including cells distributed along the transverse direction. The controller may further generate at least a first metrology measurement based on at least one of the cells in the first measurement group, and generate at least a second metrology measurement based on at least one of the cells in the second measurement group.

公开(公告)号：US20210096061A1

公开(公告)日：2021-04-01

申请号：US16586504

申请日：2019-09-27

Applicant: KLA Corporation

Inventor： Andrew V. Hill ,  Amnon Manassen ,  Yoram Uziel ,  Yossi Simon ,  Gilad Laredo

IPC: G01N21/17 ,  G01B11/25 ,  G06T7/00

Abstract: A metrology system may include a metrology tool to selectively perform metrology measurements in a static mode in which one or more metrology targets on a sample are stationary during a measurement or a scanning mode in which one or more metrology targets are in motion during a measurement, and a controller communicatively coupled to the translation stage and at least one of the one or more detectors. The controller may receive locations of metrology targets on the sample to be inspected, designate the metrology targets for inspection with the static mode or the scanning mode, direct the metrology tool to perform metrology measurements on the metrology targets in the static mode or the scanning mode based on the designation, and generate metrology data for the sample based on the metrology measurements on the metrology targets.

公开(公告)号：US20250076208A1

公开(公告)日：2025-03-06

申请号：US18822901

申请日：2024-09-03

Applicant: KLA Corporation

Inventor： Amnon Manassen ,  Kevin Peterlinz ,  Andrew V. Hill ,  Shankar Krishnan ,  Yonatan Vaknin ,  Ido Dolev ,  Suryanarayanan Ganesan ,  Chao Chang ,  Jongjin Kim ,  David Zimdars

IPC: G01N21/88 ,  G01N21/95 ,  G01N21/956

Abstract: A metrology system may include a dual frequency comb source providing a first comb beam with a first repetition rate and a second comb beam with a second repetition rate, a beamsplitter to generate one or more dual frequency comb illumination beams from the first comb beam and the second comb beam, and a beam combiner to form a dual frequency comb illumination beam from the first comb beam and the second comb beam. The system may further include an illumination sub-system to illuminate a sample with the dual frequency comb illumination beam through an objective lens, a collection sub-system to collect sample light from the sample with the objective lens, and a detector to capture a radio-frequency signal based on the sample light. The system may further extract spectral measurement data associated with the sample from the radio-frequency signal and generate metrology measurements based on the spectral measurement data.

公开(公告)号：US12235588B2

公开(公告)日：2025-02-25

申请号：US18110746

申请日：2023-02-16

Applicant: KLA Corporation

Inventor： Amnon Manassen ,  Andrew V. Hill ,  Vladimir Levinski

IPC: G03F7/00 ,  G01B9/02 ,  G01B11/27

Abstract: An overlay metrology system may include illumination optics to split illumination from an illumination source into primary and secondary illumination and direct the primary illumination to a sample including an overlay target with gratings in two or more layers and an objective lens to collect positive and negative diffraction from the constituent gratings. The system may further include collection optics to overlap the auxiliary illumination with at least some of the collected diffraction lobes to generate time-varying interference signals. The system may further include a controller to generate overlay measurements based on the time-varying interference signals.