公开(公告)号：US11333616B2

公开(公告)日：2022-05-17

申请号：US17053746

申请日：2020-10-08

Applicant: KLA CORPORATION

Inventor： Gilad Laredo

IPC: G01N21/88 ,  G01B11/06 ,  G01N21/95

Abstract: An adaptive focusing system including an optics module, an optics module height positioner (OMHP), a position sensor operative to generate a position output indicating a height of the optics module, a predictive height estimator operative to generate an estimated height value of a sample at each site of a plurality of sites, and generate a desired optics module height output for each of the sites, a regulator operative to generate, at least partially based on the desired optics module height output and a known height of the optics module, a sequence of optics module height control instructions for the plurality of sites, a driver operative to provide a sequence of control outputs to the OMHP and a model predictive controller (MPC) operative to monitor differences between a reported height of the optics module and an MPC-expected height of the optics module, thereby to generate system amelioration values.

公开(公告)号：US11346657B2

公开(公告)日：2022-05-31

申请号：US17068328

申请日：2020-10-12

Applicant: KLA Corporation

Inventor： Amnon Manassen ,  Andrew V. Hill ,  Gilad Laredo

IPC: G01B11/27

Abstract: An overlay metrology tool may include an illumination source, illumination optics to illuminate an overlay target having periodic features with one or more illumination beams, collection optics to direct diffracted light from the periodic features of the overlay target to a detector, an adjustable pupil mask located at a pupil plane, and a controller. The adjustable pupil mask may include one or more individually-addressable control zones distributed across the one or more portions of the pupil plane to provide an adjustable pupil transmissivity distribution. The controller may direct the adjustable pupil mask to provide a selected pupil transmissivity distribution corresponding to a selected overlay metrology recipe, where the selected pupil transmissivity distribution corresponds to a selected configuration of the one or more control zones providing transmission of a selected set of diffraction orders from the target to the detector.

公开(公告)号：US20210311401A1

公开(公告)日：2021-10-07

申请号：US17354307

申请日：2021-06-22

Applicant: KLA Corporation

Inventor： Andrew V. Hill ,  Amnon Manassen ,  Gilad Laredo ,  Yoel Feler ,  Mark Ghinovker ,  Vladimir Levinski

IPC: G03F7/20 ,  G01N21/956 ,  G01N21/95

Abstract: A metrology system may include a controller coupled to a scanning metrology tool that images a sample in motion along a scan direction. The controller may receive an image of a metrology target on the sample from the scanning metrology tool, where the metrology target comprises a first measurement group including cells distributed along a transverse direction orthogonal to the scan direction, and a second measurement group separated from the first measurement group along the scan direction including cells distributed along the transverse direction. The controller may further generate at least a first metrology measurement based on at least one of the cells in the first measurement group, and generate at least a second metrology measurement based on at least one of the cells in the second measurement group.

公开(公告)号：US20210191279A1

公开(公告)日：2021-06-24

申请号：US16647102

申请日：2020-02-14

Applicant: KLA CORPORATION

Inventor： Daria Negri ,  Amnon Manassen ,  Gilad Laredo

IPC: G03F7/20 ,  G06T7/00

Abstract: A system and method of measuring misregistration in the manufacture of semiconductor device wafers is disclosed. A first layer and the second layer are imaged in a first orientation with a misregistration metrology tool employing light having at least one first wavelength that causes images of both the first periodic structure and the second periodic structure to appear in at least two planes that are mutually separated by a perpendicular distance greater than 0.2 μm. The first layer and the second layer are imaged in a second orientation with the misregistration metrology tool employing light having the at least one first wavelength that causes images of both the first periodic structure and the second periodic structure to appear in the at least two planes. At least one parameter of the misregistration metrology tool is adjusted based on the resulting analysis.

公开(公告)号：US11281112B2

公开(公告)日：2022-03-22

申请号：US16647092

申请日：2020-02-14

Applicant: KLA CORPORATION

Inventor： Daria Negri ,  Amnon Manassen ,  Gilad Laredo

IPC: G03F7/20 ,  G06T7/00

Abstract: A method of measuring misregistration in the manufacture of semiconductor device wafers including providing a multilayered semiconductor device wafer including at least a first layer and a second layer including at least one misregistration measurement target including a first periodic structure formed together with the first layer having a first pitch and a second periodic structure formed together with the second layer having a second pitch, imaging the first layer and the second layer at a depth of focus and using light having at least one first wavelength that causes images of both the first layer and the second layer to appear in at least one plane within the depth of focus and quantifying offset in the at least one plane between the images of the first layer and the second layer, thereby to calculate misregistration of the first layer and the second layer.

公开(公告)号：US20210364279A1

公开(公告)日：2021-11-25

申请号：US17068328

申请日：2020-10-12

Applicant: KLA Corporation

Inventor： Amnon Manassen ,  Andrew V. Hill ,  Gilad Laredo

IPC: G01B11/27

Abstract: An overlay metrology tool may include an illumination source, illumination optics to illuminate an overlay target having periodic features with one or more illumination beams, collection optics to direct diffracted light from the periodic features of the overlay target to a detector, an adjustable pupil mask located at a pupil plane, and a controller. The adjustable pupil mask may include one or more individually-addressable control zones distributed across the one or more portions of the pupil plane to provide an adjustable pupil transmissivity distribution. The controller may direct the adjustable pupil mask to provide a selected pupil transmissivity distribution corresponding to a selected overlay metrology recipe, where the selected pupil transmissivity distribution corresponds to a selected configuration of the one or more control zones providing transmission of a selected set of diffraction orders from the target to the detector.

公开(公告)号：US11073768B2

公开(公告)日：2021-07-27

申请号：US16598146

申请日：2019-10-10

Applicant: KLA Corporation

Inventor： Andrew V. Hill ,  Amnon Manassen ,  Gilad Laredo ,  Yoel Feler ,  Mark Ghinovker ,  Vladimir Levinski

IPC: G03F7/20 ,  G01N21/956 ,  G01N21/95

Abstract: A metrology system may include a controller coupled to a scanning metrology tool that images a sample in motion along a scan direction. The controller may receive an image of a metrology target on the sample from the scanning metrology tool, where the metrology target comprises a first measurement group including cells distributed along a transverse direction orthogonal to the scan direction, and a second measurement group separated from the first measurement group along the scan direction including cells distributed along the transverse direction. The controller may further generate at least a first metrology measurement based on at least one of the cells in the first measurement group, and generate at least a second metrology measurement based on at least one of the cells in the second measurement group.

公开(公告)号：US20210096061A1

公开(公告)日：2021-04-01

申请号：US16586504

申请日：2019-09-27

Applicant: KLA Corporation

Inventor： Andrew V. Hill ,  Amnon Manassen ,  Yoram Uziel ,  Yossi Simon ,  Gilad Laredo

IPC: G01N21/17 ,  G01B11/25 ,  G06T7/00

Abstract: A metrology system may include a metrology tool to selectively perform metrology measurements in a static mode in which one or more metrology targets on a sample are stationary during a measurement or a scanning mode in which one or more metrology targets are in motion during a measurement, and a controller communicatively coupled to the translation stage and at least one of the one or more detectors. The controller may receive locations of metrology targets on the sample to be inspected, designate the metrology targets for inspection with the static mode or the scanning mode, direct the metrology tool to perform metrology measurements on the metrology targets in the static mode or the scanning mode based on the designation, and generate metrology data for the sample based on the metrology measurements on the metrology targets.

公开(公告)号：US11880141B2

公开(公告)日：2024-01-23

申请号：US17673131

申请日：2022-02-16

Applicant: KLA CORPORATION

Inventor： Daria Negri ,  Amnon Manassen ,  Gilad Laredo

IPC: G03F7/20 ,  G03F7/00 ,  G06T7/00

CPC classification number: G03F7/70633 ,  G03F7/70641 ,  G03F7/70683 ,  G06T7/0004 ,  G06T2207/30148

Abstract: A method of measuring misregistration in the manufacture of semiconductor device wafers including providing a multilayered semiconductor device wafer including at least a first layer and a second layer including at least one misregistration measurement target including a first periodic structure formed together with the first layer having a first pitch and a second periodic structure formed together with the second layer having a second pitch, imaging the first layer and the second layer at a depth of focus and using light having at least one first wavelength that causes images of both the first layer and the second layer to appear in at least one plane within the depth of focus and quantifying offset in the at least one plane between the images of the first layer and the second layer, thereby to calculate misregistration of the first layer and the second layer.

公开(公告)号：US20230359129A1

公开(公告)日：2023-11-09

申请号：US17210793

申请日：2021-03-24

Applicant: KLA Corporation

Inventor： Jonathan Madsen ,  Andrei V. Shchegrov ,  Amnon Manassen ,  Andrew V. Hill ,  Yossi Simon ,  Gilad Laredo ,  Yoram Uziel

IPC: G03F7/20 ,  H01J37/304 ,  G03F9/00 ,  H01J37/317

CPC classification number: G03F7/70633 ,  H01J37/3045 ,  G03F9/7084 ,  H01J37/3177 ,  H01J2237/31764

Abstract: A multi-column metrology tool may include two or more measurement columns distributed along a column direction, where the two or more measurement columns simultaneously probe two or more measurement regions on a sample including metrology targets. A measurement column may include an illumination sub-system to direct illumination to the sample, a collection sub-system including a collection lens to collect measurement signals from the sample and direct it to one or more detectors, and a column-positioning sub-system to adjust a position of the collection lens. A measurement region of a measurement column may be defined by a field of view of the collection lens and a range of the positioning system in the lateral plane. The tool may further include a sample-positioning sub-system to scan the sample along a scan path different than the column direction to position metrology targets within the measurement regions of the measurement columns for measurements.