公开(公告)号：US20240339288A1

公开(公告)日：2024-10-10

申请号：US18131287

申请日：2023-04-05

Applicant: Applied Materials, Inc.

Inventor： Alexandre Likhanskii ,  Peter F. Kurunczi ,  Nirbhav Singh Chopra ,  Anthony Renau ,  Joseph C. Olson ,  Frank Sinclair

IPC: H01J37/05 ,  H01J37/147 ,  H01J37/317

CPC classification number: H01J37/05 ,  H01J37/1472 ,  H01J37/3171 ,  H01J37/09 ,  H01J37/12 ,  H01J2237/053 ,  H01J2237/057 ,  H01J2237/1207 ,  H01J2237/2505

Abstract: An apparatus, including an electrodynamic mass analysis (EDMA) assembly. The EDMA assembly may include a first upper electrode, disposed above a beam axis; and a first lower electrode, disposed below the beam axis, opposite the first upper electrode, the EDMA assembly arranged to receive a first RF voltage signal at a first frequency. The apparatus may include a deflection assembly, disposed downstream to the EDMA assembly, the deflection assembly comprising a blocker, disposed along the beam axis. The apparatus may include an energy spread reducer (ESR), disposed downstream to the deflection assembly, the energy spread reducer arranged to receive a second RF voltage signal at a second frequency, twice the first frequency. The ESR may include an upper ESR electrode, disposed above the beam axis; and a lower ESR electrode, disposed below the beam axis.

公开(公告)号：US12096548B2

公开(公告)日：2024-09-17

申请号：US17949862

申请日：2022-09-21

Applicant: Applied Materials, Inc.

Inventor： Wai-Ming Tam ,  Klaus Becker ,  William Herron Park, Jr. ,  Frank Sinclair

IPC: H05H7/22 ,  H05H7/02

CPC classification number: H05H7/22 ,  H05H7/02 ,  H05H2007/025 ,  H05H2007/222

Abstract: An apparatus may include a drift tube assembly having a plurality of drift tubes to conduct an ion beam along a beam propagation direction. The plurality of drift tubes may define a multi-gap configuration corresponding to a plurality of acceleration gaps, wherein at least one powered drift tube of the drift tube assembly is coupled to receive an RF voltage signal. The apparatus may also include a DC electrode assembly that includes a conductor line, arranged within a resonator coil that is coupled to receive a DC voltage signal into the at least one powered drift tube. The DC electrode assembly may also include a DC electrode arrangement, connected to the conductor line and disposed within the at least one powered drift tube.

公开(公告)号：US20240249908A1

公开(公告)日：2024-07-25

申请号：US18101260

申请日：2023-01-25

Applicant: Applied Materials, Inc.

Inventor： Frank Sinclair ,  Paul Joseph Murphy ,  Bon-Woong Koo ,  Gregory Edward Stratoti ,  Tseh-Jen Hsieh ,  Glenn Green

IPC: H01J37/244 ,  C23C14/48 ,  H01J37/09 ,  H01J37/317

CPC classification number: H01J37/244 ,  C23C14/48 ,  H01J37/09 ,  H01J37/3171 ,  H01J2237/0453 ,  H01J2237/24564

Abstract: A dose cup assembly that results in less particles in a process chamber is disclosed. The dose cup assembly includes a faceplate attached to a back wall of the process chamber, and having an opening; an aperture plate defining a plurality of slots; and a tunnel having walls and sidewalls and having a proximal end and a distal end, located between the faceplate and the aperture plate, such that the proximal end is nearer to the faceplate and the distal end is nearer to the aperture plate; wherein at least one of the faceplate, the walls, the sidewalls or the aperture plate has one or more exposed outer surfaces that comprise silicon. The exposed outer surfaces may be silicon. In some embodiments, the faceplate, the walls, the sidewalls or the aperture plate may be graphite, aluminum, or stainless steel which is coated with silicon or silicon carbide.

公开(公告)号：US20240029997A1

公开(公告)日：2024-01-25

申请号：US18478826

申请日：2023-09-29

Applicant: Applied Materials, Inc.

Inventor： Paul J. Murphy ,  Frank Sinclair ,  Jun Lu ,  Daniel Tieger ,  Anthony Renau

IPC: H01J37/317 ,  H01J37/30 ,  C23C14/48

CPC classification number: H01J37/3171 ,  H01J37/3007 ,  C23C14/48 ,  H01L21/265

Abstract: An ion implanter may include an ion source, arranged to generate a continuous ion beam, a DC acceleration system, to accelerate the continuous ion beam, as well as an AC linear accelerator to receive the continuous ion beam and to output a bunched ion beam. The ion implanter may also include an energy spreading electrode assembly, to receive the bunched ion beam and to apply an RF voltage between a plurality of electrodes of the energy spreading electrode assembly, along a local direction of propagation of the bunched ion beam.

公开(公告)号：US11812539B2

公开(公告)日：2023-11-07

申请号：US17506185

申请日：2021-10-20

Applicant: Applied Materials, Inc.

Inventor： Costel Biloiu ,  David T. Blahnik ,  Wai-Ming Tam ,  Charles T. Carlson ,  Frank Sinclair

IPC: H05H7/02 ,  H05H7/12 ,  H05H9/00

CPC classification number: H05H7/02 ,  H05H7/12 ,  H05H9/00 ,  H05H2007/025

Abstract: An exciter for a high frequency resonator. The exciter may include an exciter coil inner portion, extending along an exciter axis, an exciter coil loop, disposed at a distal end of the exciter coil inner portion. The exciter may also include a drive mechanism, including at least a rotation component to rotate the exciter coil loop around the exciter axis.

公开(公告)号：US11574796B1

公开(公告)日：2023-02-07

申请号：US17382041

申请日：2021-07-21

Applicant: Applied Materials, Inc.

Inventor： Jun Lu ,  Frank Sinclair ,  Shane W. Conley ,  Michael Honan

IPC: H01J37/00 ,  H01J37/30 ,  H01J37/02 ,  H01J37/317

Abstract: An aperture diaphragm capable of varying the size of an aperture in two dimensions is disclosed. The aperture diaphragm may be utilized in an ion implantation system, such as between the mass analyzer and the acceleration column. In this way, the aperture diaphragm may be used to control at least one parameter of the ion beam. These parameters may include angular spread in the height direction, angular spread in the width direction, beam current or cross-sectional area. Various embodiments of the aperture diaphragm are shown. In certain embodiments, the size of the aperture in the height and width directions may be independently controlled, while in other embodiments, the ratio between height and width is constant.

公开(公告)号：US11569063B2

公开(公告)日：2023-01-31

申请号：US17221033

申请日：2021-04-02

Applicant: Applied Materials, Inc.

Inventor： Paul J. Murphy ,  Frank Sinclair ,  Jun Lu ,  Daniel Tieger ,  Anthony Renau

IPC: H01J37/08 ,  H01J37/317 ,  H01J37/304 ,  H01J37/32 ,  H01J37/05

Abstract: An ion implanter may include an ion source, arranged to generate a continuous ion beam, a DC acceleration system, to accelerate the continuous ion beam, as well as an AC linear accelerator to receive the continuous ion beam and to output a bunched ion beam. The ion implanter may also include an energy spreading electrode assembly, to receive the bunched ion beam and to apply an RF voltage between a plurality of electrodes of the energy spreading electrode assembly, along a local direction of propagation of the bunched ion beam.

公开(公告)号：US20220319806A1

公开(公告)日：2022-10-06

申请号：US17221033

申请日：2021-04-02

Applicant: Applied Materials, Inc.

Inventor： Paul J. Murphy ,  Frank Sinclair ,  Jun Lu ,  Daniel Tieger ,  Anthony Renau

IPC: H01J37/317 ,  H01J37/08 ,  H01J37/05 ,  H01J37/304 ,  H01J37/32

Abstract: An ion implanter may include an ion source, arranged to generate a continuous ion beam, a DC acceleration system, to accelerate the continuous ion beam, as well as an AC linear accelerator to receive the continuous ion beam and to output a bunched ion beam. The ion implanter may also include an energy spreading electrode assembly, to receive the bunched ion beam and to apply an RF voltage between a plurality of electrodes of the energy spreading electrode assembly, along a local direction of propagation of the bunched ion beam.

公开(公告)号：USD956005S1

公开(公告)日：2022-06-28

申请号：US29706320

申请日：2019-09-19

Applicant: APPLIED Materials, Inc.

Designer： Robert C. Lindberg ,  Alexandre Likhanskii ,  Wayne LeBlanc ,  Frank Sinclair ,  Svetlana Radovanov

公开(公告)号：US20220037116A1

公开(公告)日：2022-02-03

申请号：US16984053

申请日：2020-08-03

Applicant: Applied Materials, Inc.

Inventor： Frank Sinclair

IPC: H01J37/317 ,  H01J37/32

Abstract: An ion implantation system, including an ion source and extraction system, arranged to generate an ion beam at a first energy, and a linear accelerator, disposed downstream of the ion source, the linear accelerator arranged to receive the ion beam as a bunched ion beam accelerate the ion beam to a second energy, greater than the first energy. The linear accelerator may include a plurality of acceleration stages, wherein a given acceleration stage of the plurality of acceleration stages comprises: a drift tube assembly, arranged to conduct the ion beam; a resonator, electrically coupled to the drift tube assembly; and an RF power assembly, coupled to the resonator, and arranged to output an RF signal to the resonator. As such, the given acceleration stage does not include a quadrupole element.