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公开(公告)号:USD1051838S1
公开(公告)日:2024-11-19
申请号:US29818782
申请日:2021-12-10
Applicant: Applied Materials, Inc.
Designer: Bon-Woong Koo , Frank Sinclair , Alexandre Likhanskii , Svetlana Radovanov , Alexander Perel , Graham Wright , Jay T. Scheuer , Daniel Tieger , You Chia Li , Jay Johnson , Tseh-Jen Hsieh , Ronald Johnson
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公开(公告)号:US20240371602A1
公开(公告)日:2024-11-07
申请号:US18143666
申请日:2023-05-05
Applicant: Applied Materials, Inc.
Inventor: Frank Sinclair , Paul Joseph Murphy , Bon-Woong Koo , Gregory Edward Stratoti , Tseh-Jen Hsieh , Alexandre Likhanskii , Glenn Green
IPC: H01J37/317 , H01J37/08 , H01J37/147
Abstract: An ion implanter that includes an ion source to generate an ion beam, a platen disposed in a process chamber to support a workpiece that is treated with the ion beam, and a plasma flood gun that results in fewer particles in the process chamber is disclosed. The plasma flood gun includes at least one plasma chamber, each having at least one aperture through which low energy ions and electrons are emitted. A sweeper is located near the aperture, positioned so as to be between the aperture and the upstream components. The sweeper is heated using resistive elements or a halogen lamp so as to elevate its temperature, which limited the amount of deposition that occurs on the sweeper.
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公开(公告)号:US20240222070A1
公开(公告)日:2024-07-04
申请号:US18387987
申请日:2023-11-08
Applicant: Applied Materials, Inc.
Inventor: Stephen Krause , Gary J. Rosen , Matthew Gaucher , Jay T. Scheuer , Frank Sinclair , Jonathan Lowder , Pratim Palit , Daniel Hall
IPC: H01J37/304 , H01J37/244 , H01J37/317
CPC classification number: H01J37/304 , H01J37/244 , H01J37/3171 , H01J2237/24578
Abstract: An ion implanter to facilitate channeling of an ion beam into a crystalline structure of a workpiece is disclosed. The ion implanter comprises an ion source to generate an ion beam, a platen to support the workpiece having the crystalline structure, an Xray source to generate an Xray beam, wherein at least a portion of the Xray beam impacts the workpiece to produce diffracted Xrays, an Xray detector positioned to receive the diffracted Xrays, and a controller, in communication with the Xray source, the platen, and the Xray detector. The controller contains instructions, which enable the ion implanter to perform a rocking curve test after the workpiece is disposed on the platen and calculate an orientation of the platen for an ion implant process based on a result of the rocking curve test to facilitate channeling of the ion beam into the crystalline structure of the workpiece.
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公开(公告)号:US11895766B2
公开(公告)日:2024-02-06
申请号:US17502279
申请日:2021-10-15
Applicant: Applied Materials, Inc.
Inventor: David T. Blahnik , Charles T. Carlson , Robert B. Vopat , Frank Sinclair , Paul J. Murphy , Krag R. Senior
IPC: H05H7/22
CPC classification number: H05H7/22 , H05H2007/222
Abstract: Embodiments herein are directed to a linear accelerator assembly for an ion implanter. In some embodiments, a LINAC may include a coil resonator and a plurality of drift tubes coupled to the coil resonator by a set of flexible leads.
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公开(公告)号:US11856685B2
公开(公告)日:2023-12-26
申请号:US17479313
申请日:2021-09-20
Applicant: Applied Materials, Inc.
Inventor: Charles T. Carlson , Aaron P. Webb , Paul J. Murphy , Frank Sinclair , David Blahnik
IPC: H05H7/22
CPC classification number: H05H7/22
Abstract: A coil inductor for use with a LINAC is disclosed. The coil inductor comprises one or more tubes, wherein each tube comprises an interior support structure to strengthen the tubes. By supporting the tube, the amount of vibration is reduced, allowing the coil to resonate at its natural frequency. In some embodiments, the interior structure comprises one or more interior walls. These interior walls may be used to create a plurality of fluid channels that allow the flow of coolant through the tubes. An end cap may be disposed on the second end of the tubes to allow fluid communication between the supply fluid channels and the return fluid channels. The first ends of the one or more tubes may be connected to a manifold that includes a supply port and a return port for the passage of coolant.
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公开(公告)号:US20230089170A1
公开(公告)日:2023-03-23
申请号:US17479313
申请日:2021-09-20
Applicant: Applied Materials, Inc.
Inventor: Charles T. Carlson , Aaron P. Webb , Paul J. Murphy , Frank Sinclair , David Blahnik
IPC: H05H7/22
Abstract: A coil inductor for use with a LINAC is disclosed. The coil inductor comprises one or more tubes, wherein each tube comprises an interior support structure to strengthen the tubes. By supporting the tube, the amount of vibration is reduced, allowing the coil to resonate at its natural frequency. In some embodiments, the interior structure comprises one or more interior walls. These interior walls may be used to create a plurality of fluid channels that allow the flow of coolant through the tubes. An end cap may be disposed on the second end of the tubes to allow fluid communication between the supply fluid channels and the return fluid channels. The first ends of the one or more tubes may be connected to a manifold that includes a supply port and a return port for the passage of coolant.
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公开(公告)号:US11482397B1
公开(公告)日:2022-10-25
申请号:US17338050
申请日:2021-06-03
Applicant: Applied Materials, Inc.
Inventor: Craig Richard Chaney , Frank Sinclair , Daniel R. Tieger
IPC: H01J37/00 , H01J37/08 , H01J9/02 , H01J37/317
Abstract: An ion source is provided. The ion source may include an ion source chamber, and a cathode disposed in the ion source chamber and configured to emit electrons to generate a plasma within the ion source chamber, the cathode comprising a refractory metal, wherein the refractory metal comprises a macrocrystalline structure.
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公开(公告)号:US11424097B2
公开(公告)日:2022-08-23
申请号:US16923304
申请日:2020-07-08
Applicant: APPLIED Materials, Inc.
Inventor: Bon-Woong Koo , Svetlana Radovanov , Frank Sinclair , You Chia Li , Peter Ewing , Ajdin Sarajlic , Christopher A. Rowland , Nunzio Carbone
IPC: H01J37/08 , H01J37/317
Abstract: Provided herein are approaches for increasing efficiency of ion sources. In some embodiments, an apparatus, such as an ion source, may include a chamber housing having a first end wall and a second end wall, and an extraction plate coupled to at least one of the first end wall and the second end wall. The extraction plate may include an extraction aperture. The apparatus may further include a tubular cathode extending between the first end wall and the second end wall.
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9.
公开(公告)号:US11388810B2
公开(公告)日:2022-07-12
申请号:US17024295
申请日:2020-09-17
Applicant: Applied Materials, Inc.
Inventor: Peter F. Kurunczi , David T. Blahnik , Frank Sinclair
IPC: H05H7/22 , H01J37/317 , H05H9/00
Abstract: An apparatus, system and method. An apparatus may include an RF power assembly, arranged to output an RF signal; a resonator, coupled to receive the RF signal, the resonator comprising a first output end and a second output end, and a drift tube assembly, configured to transmit an ion beam, and coupled to the resonator. As such, the drift tube assembly may include a first AC drift tube electrode, coupled to the first output end, and a second AC drift tube electrode, coupled to the second output end and separated from the first AC drift tube by a first gap. The RF power assembly may be switchable to switch output from a first Eigenmode frequency to a second Eigenmode frequency.
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公开(公告)号:US11361935B2
公开(公告)日:2022-06-14
申请号:US17092250
申请日:2020-11-07
Applicant: Applied Materials, Inc.
Inventor: Costel Biloiu , Jay R. Wallace , Kevin M. Daniels , Frank Sinclair , Christopher Campbell
Abstract: An extraction plate for an ion beam system. The extraction plate may include an insulator body that includes a peripheral portion, to connect to a first side of a plasma chamber, and further includes a central portion, defining a concave shape. As such, an extraction aperture may be arranged along a first surface of the central portion, where the first surface is oriented at a high angle with respect to the first side. The extraction plate may further include a patterned electrode, comprising a first portion and a second portion, affixed to an outer side of the insulator body, facing away from the plasma chamber, wherein the first portion is separated from the second portion by an insulating gap.
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