公开(公告)号：US11948781B2

公开(公告)日：2024-04-02

申请号：US17160042

申请日：2021-01-27

申请人： Applied Materials, Inc.

发明人： Christopher Campbell ,  Costel Biloiu ,  Peter F. Kurunczi ,  Jay R. Wallace ,  Kevin M. Daniels ,  Kevin T. Ryan ,  Minab B. Teferi ,  Frank Sinclair ,  Joseph C. Olson

IPC分类号： H01J37/32

CPC分类号： H01J37/32788 ,  H01J37/32568

摘要： A processing system may include a plasma chamber operable to generate a plasma, and an extraction assembly, arranged along a side of the plasma chamber. The extraction assembly may include an extraction plate including an extraction aperture, the extraction plate having a non-planar shape, and generating an extracted ion beam at a high angle of incidence with respect to a perpendicular to a plane of a substrate, when the plane of the substrate is arranged parallel to the side of the plasma chamber.

公开(公告)号：US20230197422A1

公开(公告)日：2023-06-22

申请号：US17556390

申请日：2021-12-20

申请人： Applied Materials, Inc.

发明人： Kevin T. Ryan ,  Appu Naveen Thomas ,  Adam Calkins ,  Jay R. Wallace ,  Tyler Rockwell ,  Solomon Belangedi Basame ,  Kevin M. Daniels ,  Kevin Richard Verrier

IPC分类号： H01J37/32

CPC分类号： H01J37/32807 ,  H01J37/32422 ,  H01J37/32623

摘要： A fastening assembly for fastening a beam blocker to an extraction plate, the fastening assembly including a mounting pin having a shaft portion, a base portion at a first end of the shaft portion, and a head portion at a second end of the shaft portion, a centering sleeve radially surrounding the shaft portion and axially abutting the base portion, the centering sleeve being radially compressible between the shaft portion and the extraction plate and between the shaft portion and the beam blocker, an annular spacer surrounding the centering sleeve and axially abutting the beam blocker, with the centering sleeve extending partially into the spacer, and a latching cap surrounding the shaft portion and axially abutting the spacer, with the shaft portion extending through a through hole of the latching cap, the through hole being smaller than the head portion in a direction perpendicular to an axis of mounting pin.

公开(公告)号：US11495430B2

公开(公告)日：2022-11-08

申请号：US16929626

申请日：2020-07-15

申请人： Applied Materials, Inc.

发明人： Jay R. Wallace ,  Costel Biloiu ,  Kevin M. Daniels

IPC分类号： H01J37/08 ,  H01J37/04

摘要： An ion beam processing system including a plasma chamber, a plasma plate, disposed alongside the plasma chamber, the plasma plate defining a first extraction aperture, a beam blocker, disposed within the plasma chamber and facing the extraction aperture, a blocker electrode, disposed on a surface of the beam blocker outside of the plasma chamber, and an extraction electrode disposed on a surface of the plasma plate outside of the plasma chamber.

公开(公告)号：US20220148843A1

公开(公告)日：2022-05-12

申请号：US17092250

申请日：2020-11-07

申请人： Applied Materials, Inc.

发明人： Costel Biloiu ,  Jay R. Wallace ,  Kevin M. Daniels ,  Frank Sinclair ,  Christopher Campbell

IPC分类号： H01J37/08 ,  H01J37/32

摘要： An extraction plate for an ion beam system. The extraction plate may include an insulator body that includes a peripheral portion, to connect to a first side of a plasma chamber, and further includes a central portion, defining a concave shape. As such, an extraction aperture may be arranged along a first surface of the central portion, where the first surface is oriented at a high angle with respect to the first side. The extraction plate may further include a patterned electrode, comprising a first portion and a second portion, affixed to an outer side of the insulator body, facing away from the plasma chamber, wherein the first portion is separated from the second portion by an insulating gap.

公开(公告)号：US12106943B2

公开(公告)日：2024-10-01

申请号：US17329883

申请日：2021-05-25

申请人： Applied Materials, Inc.

发明人： Jay R. Wallace ,  Simon Ruffell ,  Kevin R. Anglin ,  Tyler Rockwell ,  Christopher Campbell ,  Kevin M. Daniels ,  Richard J. Hertel ,  Kevin T. Ryan

IPC分类号： H01J37/32

CPC分类号： H01J37/32642 ,  H01J37/32467 ,  H01J37/32724

摘要： A substrate holder assembly including a substrate platen, the substrate platen disposed to support a substrate at a substrate position, a halo ring, the halo ring being disposed around the substrate position, and an outer halo being disposed around the halo ring and defining a first aperture, wherein the outer halo is disposed to engage the halo ring, the halo ring being disposed at least partially within the first aperture, the halo ring defining a second aperture, concentrically positioned within the first aperture, wherein the outer halo and the halo ring are formed at least partially of silicon, silicon carbide, doped silicon, quartz, and ceramic.

公开(公告)号：US20240194438A1

公开(公告)日：2024-06-13

申请号：US18080555

申请日：2022-12-13

申请人： Applied Materials, Inc.

发明人： Costel Biloiu ,  Adam Calkins ,  Tyler Rockwell ,  Kevin M. Daniels ,  Christopher Campbell

IPC分类号： H01J37/09

CPC分类号： H01J37/09 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/0453 ,  H01J2237/20235

摘要： A processing system may include a plasma chamber and an extraction optics, disposed along a side of the plasma chamber. The extraction optics may include an extraction plate, having an outer side and an inner side, where the extraction plate defines at least one extraction aperture. The extraction optics may include a beam blocker, overlapping the at least one extraction aperture, and disposed towards the inner side of the extraction plate. The beam blocker may have a cross-section that defines a boomerang shape, and may comprise a first metallic material, where the extraction plate comprises a second metallic material. The processing system may further include a substrate platen, disposed outside of the plasma chamber, and movable along a scan direction with respect to the extraction aperture.

公开(公告)号：US20220384156A1

公开(公告)日：2022-12-01

申请号：US17329883

申请日：2021-05-25

申请人： Applied Materials, Inc.

发明人： Jay R. Wallace ,  Simon Ruffell ,  Kevin R. Anglin ,  Tyler Rockwell ,  Christopher Campbell ,  Kevin M. Daniels ,  Richard J. Hertel ,  Kevin T. Ryan

IPC分类号： H01J37/32

摘要： A substrate holder assembly including a substrate platen, the substrate platen disposed to support a substrate at a substrate position, a halo ring, the halo ring being disposed around the substrate position, and an outer halo being disposed around the halo ring and defining a first aperture, wherein the outer halo is disposed to engage the halo ring, the halo ring being disposed at least partially within the first aperture, the halo ring defining a second aperture, concentrically positioned within the first aperture, wherein the outer halo and the halo ring are formed at least partially of silicon, silicon carbide, doped silicon, quartz, and ceramic.

公开(公告)号：US20240128052A1

公开(公告)日：2024-04-18

申请号：US17964621

申请日：2022-10-12

申请人： Applied Materials, Inc.

发明人： Costel Biloiu ,  Adam Calkins ,  Benjamin Alexandrovich ,  Solomon Belangedi Basame ,  Kevin M. Daniels

IPC分类号： H01J37/32 ,  H05H1/46

CPC分类号： H01J37/3211 ,  H05H1/4652

摘要： An antenna assembly, comprising: an antenna; a dielectric enclosure surrounding the antenna; and a Faraday shield, disposed around the antenna, and arranged between the antenna and the dielectric enclosure, wherein the Faraday shield comprises a non-uniform opacity along an antenna axis of the antenna, wherein a first opacity of the Faraday shield at a first position along the antenna axis is greater than a second opacity of the Faraday shield at a second position along the antenna axis of the antenna.

公开(公告)号：US11361935B2

公开(公告)日：2022-06-14

申请号：US17092250

申请日：2020-11-07

申请人： Applied Materials, Inc.

发明人： Costel Biloiu ,  Jay R. Wallace ,  Kevin M. Daniels ,  Frank Sinclair ,  Christopher Campbell

IPC分类号： H01J37/08 ,  H01J37/32

摘要： An extraction plate for an ion beam system. The extraction plate may include an insulator body that includes a peripheral portion, to connect to a first side of a plasma chamber, and further includes a central portion, defining a concave shape. As such, an extraction aperture may be arranged along a first surface of the central portion, where the first surface is oriented at a high angle with respect to the first side. The extraction plate may further include a patterned electrode, comprising a first portion and a second portion, affixed to an outer side of the insulator body, facing away from the plasma chamber, wherein the first portion is separated from the second portion by an insulating gap.

公开(公告)号：US20210391155A1

公开(公告)日：2021-12-16

申请号：US17160042

申请日：2021-01-27

申请人： Applied Materials, Inc.

发明人： Christopher Campbell ,  Costel Biloiu ,  Peter F. Kurunczi ,  Jay R. Wallace ,  Kevin M. Daniels ,  Kevin T. Ryan ,  Minab B. Teferi ,  Frank Sinclair ,  Joseph C. Olson

IPC分类号： H01J37/32

摘要： A processing system may include a plasma chamber operable to generate a plasma, and an extraction assembly, arranged along a side of the plasma chamber. The extraction assembly may include an extraction plate including an extraction aperture, the extraction plate having a non-planar shape, and generating an extracted ion beam at a high angle of incidence with respect to a perpendicular to a plane of a substrate, when the plane of the substrate is arranged parallel to the side of the plasma chamber.