公开(公告)号：US11056319B2

公开(公告)日：2021-07-06

申请号：US16524646

申请日：2019-07-29

申请人： APPLIED Materials, Inc.

发明人： Costel Biloiu ,  Appu Naveen Thomas ,  Tyler Rockwell ,  Frank Sinclair ,  Christopher Campbell

IPC分类号： H01J37/32 ,  H01J37/08

摘要： An ion beam processing apparatus may include a plasma chamber, and a plasma plate, disposed alongside the plasma chamber, where the plasma plate defines a first extraction aperture. The apparatus may include a beam blocker, disposed within the plasma chamber and facing the extraction aperture. The apparatus may further include a non-planar electrode, disposed adjacent the beam blocker and outside of the plasma chamber; and an extraction plate, disposed outside the plasma plate, and defining a second extraction aperture, aligned with the first extraction aperture.

公开(公告)号：US20230197422A1

公开(公告)日：2023-06-22

申请号：US17556390

申请日：2021-12-20

申请人： Applied Materials, Inc.

发明人： Kevin T. Ryan ,  Appu Naveen Thomas ,  Adam Calkins ,  Jay R. Wallace ,  Tyler Rockwell ,  Solomon Belangedi Basame ,  Kevin M. Daniels ,  Kevin Richard Verrier

IPC分类号： H01J37/32

CPC分类号： H01J37/32807 ,  H01J37/32422 ,  H01J37/32623

摘要： A fastening assembly for fastening a beam blocker to an extraction plate, the fastening assembly including a mounting pin having a shaft portion, a base portion at a first end of the shaft portion, and a head portion at a second end of the shaft portion, a centering sleeve radially surrounding the shaft portion and axially abutting the base portion, the centering sleeve being radially compressible between the shaft portion and the extraction plate and between the shaft portion and the beam blocker, an annular spacer surrounding the centering sleeve and axially abutting the beam blocker, with the centering sleeve extending partially into the spacer, and a latching cap surrounding the shaft portion and axially abutting the spacer, with the shaft portion extending through a through hole of the latching cap, the through hole being smaller than the head portion in a direction perpendicular to an axis of mounting pin.

公开(公告)号：US20210035779A1

公开(公告)日：2021-02-04

申请号：US16524646

申请日：2019-07-29

申请人： APPLIED Materials, Inc.

发明人： Costel Biloiu ,  Appu Naveen Thomas ,  Tyler Rockwell ,  Frank Sinclair ,  Christopher Campbell

IPC分类号： H01J37/32 ,  H01J37/08

摘要： An ion beam processing apparatus may include a plasma chamber, and a plasma plate, disposed alongside the plasma chamber, where the plasma plate defines a first extraction aperture. The apparatus may include a beam blocker, disposed within the plasma chamber and facing the extraction aperture. The apparatus may further include a non-planar electrode, disposed adjacent the beam blocker and outside of the plasma chamber; and an extraction plate, disposed outside the plasma plate, and defining a second extraction aperture, aligned with the first extraction aperture.

公开(公告)号：US20230124509A1

公开(公告)日：2023-04-20

申请号：US17503334

申请日：2021-10-17

申请人： Applied Materials, Inc.

发明人： Costel Biloiu ,  Jay R. Wallace ,  Solomon Belangedi Basame ,  Kevin R. Anglin ,  Tyler Rockwell

IPC分类号： H01J37/32

摘要： An extraction assembly may include an extraction plate for placement along a side of a plasma chamber, and having an extraction aperture, elongated along a first direction, and having an aperture height, extending along a second direction, perpendicular to the first direction. The extraction plate defines an inner surface along the extraction aperture, lying in a first plane. A beam blocker is disposed over the extraction aperture, and has an outer surface, disposed in a second plane, different than the first plane. As such, the beam blocker overlaps with the extraction plate along a first edge of the extraction aperture by a first overlap distance, and overlaps with the extraction plate along a second edge of the extraction aperture by a second overlap distance, so as to define a first extraction slit, along the first edge, and a second extraction slit along the second edge.

公开(公告)号：US12106943B2

公开(公告)日：2024-10-01

申请号：US17329883

申请日：2021-05-25

申请人： Applied Materials, Inc.

发明人： Jay R. Wallace ,  Simon Ruffell ,  Kevin R. Anglin ,  Tyler Rockwell ,  Christopher Campbell ,  Kevin M. Daniels ,  Richard J. Hertel ,  Kevin T. Ryan

IPC分类号： H01J37/32

CPC分类号： H01J37/32642 ,  H01J37/32467 ,  H01J37/32724

摘要： A substrate holder assembly including a substrate platen, the substrate platen disposed to support a substrate at a substrate position, a halo ring, the halo ring being disposed around the substrate position, and an outer halo being disposed around the halo ring and defining a first aperture, wherein the outer halo is disposed to engage the halo ring, the halo ring being disposed at least partially within the first aperture, the halo ring defining a second aperture, concentrically positioned within the first aperture, wherein the outer halo and the halo ring are formed at least partially of silicon, silicon carbide, doped silicon, quartz, and ceramic.

公开(公告)号：US20240194438A1

公开(公告)日：2024-06-13

申请号：US18080555

申请日：2022-12-13

申请人： Applied Materials, Inc.

发明人： Costel Biloiu ,  Adam Calkins ,  Tyler Rockwell ,  Kevin M. Daniels ,  Christopher Campbell

IPC分类号： H01J37/09

CPC分类号： H01J37/09 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/0453 ,  H01J2237/20235

摘要： A processing system may include a plasma chamber and an extraction optics, disposed along a side of the plasma chamber. The extraction optics may include an extraction plate, having an outer side and an inner side, where the extraction plate defines at least one extraction aperture. The extraction optics may include a beam blocker, overlapping the at least one extraction aperture, and disposed towards the inner side of the extraction plate. The beam blocker may have a cross-section that defines a boomerang shape, and may comprise a first metallic material, where the extraction plate comprises a second metallic material. The processing system may further include a substrate platen, disposed outside of the plasma chamber, and movable along a scan direction with respect to the extraction aperture.

公开(公告)号：US20220384156A1

公开(公告)日：2022-12-01

申请号：US17329883

申请日：2021-05-25

申请人： Applied Materials, Inc.

发明人： Jay R. Wallace ,  Simon Ruffell ,  Kevin R. Anglin ,  Tyler Rockwell ,  Christopher Campbell ,  Kevin M. Daniels ,  Richard J. Hertel ,  Kevin T. Ryan

IPC分类号： H01J37/32

摘要： A substrate holder assembly including a substrate platen, the substrate platen disposed to support a substrate at a substrate position, a halo ring, the halo ring being disposed around the substrate position, and an outer halo being disposed around the halo ring and defining a first aperture, wherein the outer halo is disposed to engage the halo ring, the halo ring being disposed at least partially within the first aperture, the halo ring defining a second aperture, concentrically positioned within the first aperture, wherein the outer halo and the halo ring are formed at least partially of silicon, silicon carbide, doped silicon, quartz, and ceramic.