公开(公告)号：US20240194438A1

公开(公告)日：2024-06-13

申请号：US18080555

申请日：2022-12-13

Applicant: Applied Materials, Inc.

Inventor： Costel Biloiu ,  Adam Calkins ,  Tyler Rockwell ,  Kevin M. Daniels ,  Christopher Campbell

IPC: H01J37/09

CPC classification number: H01J37/09 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/0453 ,  H01J2237/20235

Abstract: A processing system may include a plasma chamber and an extraction optics, disposed along a side of the plasma chamber. The extraction optics may include an extraction plate, having an outer side and an inner side, where the extraction plate defines at least one extraction aperture. The extraction optics may include a beam blocker, overlapping the at least one extraction aperture, and disposed towards the inner side of the extraction plate. The beam blocker may have a cross-section that defines a boomerang shape, and may comprise a first metallic material, where the extraction plate comprises a second metallic material. The processing system may further include a substrate platen, disposed outside of the plasma chamber, and movable along a scan direction with respect to the extraction aperture.

公开(公告)号：US20240128052A1

公开(公告)日：2024-04-18

申请号：US17964621

申请日：2022-10-12

Applicant: Applied Materials, Inc.

Inventor： Costel Biloiu ,  Adam Calkins ,  Benjamin Alexandrovich ,  Solomon Belangedi Basame ,  Kevin M. Daniels

IPC: H01J37/32 ,  H05H1/46

CPC classification number: H01J37/3211 ,  H05H1/4652

Abstract: An antenna assembly, comprising: an antenna; a dielectric enclosure surrounding the antenna; and a Faraday shield, disposed around the antenna, and arranged between the antenna and the dielectric enclosure, wherein the Faraday shield comprises a non-uniform opacity along an antenna axis of the antenna, wherein a first opacity of the Faraday shield at a first position along the antenna axis is greater than a second opacity of the Faraday shield at a second position along the antenna axis of the antenna.

公开(公告)号：US12014898B2

公开(公告)日：2024-06-18

申请号：US17485612

申请日：2021-09-27

Applicant: Applied Materials, Inc.

Inventor： Adam Calkins ,  Jeffrey E. Krampert

IPC: H01J37/32

CPC classification number: H01J37/3211 ,  H01J37/3244 ,  H01J37/32522 ,  H01J37/32119

Abstract: A processing system including an ion source having a plasma chamber to house a plasma, an extraction assembly, disposed along a side of the plasma chamber, and including at least one extraction aperture, and an antenna assembly extending through the plasma chamber. The antenna assembly may include a dielectric enclosure and a plurality of conductive antennas extending through the dielectric enclosure, the conductive antennas having respective gas ports formed therein for delivering a gas into the dielectric enclosure. The processing system may further include a temperature regulation system coupled to the conductive antennas and to the dielectric enclosure for monitoring a temperature of the dielectric enclosure and regulating the gas delivered to the conductive antennas for regulating the temperature of the dielectric enclosure.

公开(公告)号：US11270864B2

公开(公告)日：2022-03-08

申请号：US16828886

申请日：2020-03-24

Applicant: Applied Materials, Inc.

Inventor： Costel Biloiu ,  Adam Calkins ,  Alexander C. Kontos ,  James J. Howarth

IPC: H01J27/02 ,  H01J37/317 ,  H01J37/08

Abstract: Disclosed herein are approaches for adjusting extraction slits of an extraction plate using a set of adjustable beam blockers. In one approach, an ion extraction optics may include an extraction plate including a first opening and a second opening, and a first beam blocker extending over the first opening and a second beam blocker extending over the second opening. Each of the first and second beam blockers may include an inner slit defined by a first distance between an inner edge and the extraction plate, and an outer slit defined by a second distance between an outer edge and the extraction plate, wherein the first and second beam blockers are movable to vary at least one of the first distance and the second distance. As a result, extraction through the inner and outer slits of ion beamlets characterized by similar mean angles may be achieved.

公开(公告)号：US20230197422A1

公开(公告)日：2023-06-22

申请号：US17556390

申请日：2021-12-20

Applicant: Applied Materials, Inc.

Inventor： Kevin T. Ryan ,  Appu Naveen Thomas ,  Adam Calkins ,  Jay R. Wallace ,  Tyler Rockwell ,  Solomon Belangedi Basame ,  Kevin M. Daniels ,  Kevin Richard Verrier

IPC: H01J37/32

CPC classification number: H01J37/32807 ,  H01J37/32422 ,  H01J37/32623

Abstract: A fastening assembly for fastening a beam blocker to an extraction plate, the fastening assembly including a mounting pin having a shaft portion, a base portion at a first end of the shaft portion, and a head portion at a second end of the shaft portion, a centering sleeve radially surrounding the shaft portion and axially abutting the base portion, the centering sleeve being radially compressible between the shaft portion and the extraction plate and between the shaft portion and the beam blocker, an annular spacer surrounding the centering sleeve and axially abutting the beam blocker, with the centering sleeve extending partially into the spacer, and a latching cap surrounding the shaft portion and axially abutting the spacer, with the shaft portion extending through a through hole of the latching cap, the through hole being smaller than the head portion in a direction perpendicular to an axis of mounting pin.

公开(公告)号：US20230102972A1

公开(公告)日：2023-03-30

申请号：US17485612

申请日：2021-09-27

Applicant: Applied Materials, Inc.

Inventor： Adam Calkins ,  Jeffrey E. Krampert

IPC: H01J37/32

Abstract: A processing system including an ion source having a plasma chamber to house a plasma, an extraction assembly, disposed along a side of the plasma chamber, and including at least one extraction aperture, and an antenna assembly extending through the plasma chamber. The antenna assembly may include a dielectric enclosure and a plurality of conductive antennas extending through the dielectric enclosure, the conductive antennas having respective gas ports formed therein for delivering a gas into the dielectric enclosure. The processing system may further include a temperature regulation system coupled to the conductive antennas and to the dielectric enclosure for monitoring a temperature of the dielectric enclosure and regulating the gas delivered to the conductive antennas for regulating the temperature of the dielectric enclosure.

公开(公告)号：US20210305001A1

公开(公告)日：2021-09-30

申请号：US16828886

申请日：2020-03-24

Applicant: Applied Materials, Inc.

Inventor： Costel Biloiu ,  Adam Calkins ,  Alexander C. Kontos ,  James J. Howarth

IPC: H01J27/02 ,  H01J37/08 ,  H01J37/317

Abstract: Disclosed herein are approaches for adjusting extraction slits of an extraction plate using a set of adjustable beam blockers. In one approach, an ion extraction optics may include an extraction plate including a first opening and a second opening, and a first beam blocker extending over the first opening and a second beam blocker extending over the second opening. Each of the first and second beam blockers may include an inner slit defined by a first distance between an inner edge and the extraction plate, and an outer slit defined by a second distance between an outer edge and the extraction plate, wherein the first and second beam blockers are movable to vary at least one of the first distance and the second distance. As a result, extraction through the inner and outer slits of ion beamlets characterized by similar mean angles may be achieved.