公开(公告)号：US12014898B2

公开(公告)日：2024-06-18

申请号：US17485612

申请日：2021-09-27

Applicant: Applied Materials, Inc.

Inventor： Adam Calkins ,  Jeffrey E. Krampert

IPC: H01J37/32

CPC classification number: H01J37/3211 ,  H01J37/3244 ,  H01J37/32522 ,  H01J37/32119

Abstract: A processing system including an ion source having a plasma chamber to house a plasma, an extraction assembly, disposed along a side of the plasma chamber, and including at least one extraction aperture, and an antenna assembly extending through the plasma chamber. The antenna assembly may include a dielectric enclosure and a plurality of conductive antennas extending through the dielectric enclosure, the conductive antennas having respective gas ports formed therein for delivering a gas into the dielectric enclosure. The processing system may further include a temperature regulation system coupled to the conductive antennas and to the dielectric enclosure for monitoring a temperature of the dielectric enclosure and regulating the gas delivered to the conductive antennas for regulating the temperature of the dielectric enclosure.

公开(公告)号：US20230102972A1

公开(公告)日：2023-03-30

申请号：US17485612

申请日：2021-09-27

Applicant: Applied Materials, Inc.

Inventor： Adam Calkins ,  Jeffrey E. Krampert

IPC: H01J37/32

Abstract: A processing system including an ion source having a plasma chamber to house a plasma, an extraction assembly, disposed along a side of the plasma chamber, and including at least one extraction aperture, and an antenna assembly extending through the plasma chamber. The antenna assembly may include a dielectric enclosure and a plurality of conductive antennas extending through the dielectric enclosure, the conductive antennas having respective gas ports formed therein for delivering a gas into the dielectric enclosure. The processing system may further include a temperature regulation system coupled to the conductive antennas and to the dielectric enclosure for monitoring a temperature of the dielectric enclosure and regulating the gas delivered to the conductive antennas for regulating the temperature of the dielectric enclosure.