公开(公告)号：US20190108966A1

公开(公告)日：2019-04-11

申请号：US16150675

申请日：2018-10-03

Applicant: KLA-TENCOR CORPORATION

Inventor： Gildardo R. Delgado ,  Rudy F. Garcia ,  Katerina Ioakeimidi ,  Frances Hill ,  Michael E. Romero

IPC: H01J37/06 ,  H01J37/28 ,  H01J19/24

CPC classification number: H01J37/073 ,  G02B27/0927 ,  H01J1/3044 ,  H01J1/34 ,  H01J19/24 ,  H01J37/06 ,  H01J37/26 ,  H01J37/28 ,  H01J40/06 ,  H01J40/18 ,  H01J2201/30411 ,  H01J2201/30449 ,  H01J2201/3048 ,  H01J2201/308 ,  H01J2201/3423 ,  H01J2201/3425 ,  H01J2201/3426 ,  H01J2237/06333 ,  H01J2237/24521 ,  H01J2237/24592 ,  H01J2237/2817 ,  H01L21/67288

Abstract: A photocathode structure, which can include an alkali halide, has a protective film on an exterior surface of the photocathode structure. The protective film includes ruthenium. This protective film can be, for example, ruthenium or an alloy of ruthenium and platinum. The protective film can have a thickness from 1 nm to 20 nm. The photocathode structure can be used in an electron beam tool like a scanning electron microscope.

公开(公告)号：US20190057834A1

公开(公告)日：2019-02-21

申请号：US15980399

申请日：2018-05-15

Applicant: Government of the United States of America, as Represented by the Secretary of Commerce

Inventor： Lawrence H. Friedman ,  Wen-Li WU

IPC: H01J37/147 ,  H01J37/20 ,  H01J37/22 ,  H01J37/06 ,  H01J37/10 ,  G01B15/04

CPC classification number: H01J37/1471 ,  G01B15/04 ,  G01B2210/56 ,  H01J37/06 ,  H01J37/10 ,  H01J37/20 ,  H01J37/22

Abstract: An electron reflectometer includes: a sample stage; a source that produces source electrons; a source collimator; and an electron detector that receives collimated reflected electrons.

公开(公告)号：US20190035596A1

公开(公告)日：2019-01-31

申请号：US16040366

申请日：2018-07-19

Applicant: Hitachi High-Technologies Corporation

Inventor： Hiroko TAKEUCHI ,  Akemi KONDO

IPC: H01J37/21 ,  H01J37/06 ,  H01J37/28 ,  G02B27/09 ,  G21K1/087

Abstract: An object of the invention is to provide a charged particle beam apparatus which improves an efficiency of a beam scan at the time of performing a focus adjustment and a measurement or an inspection based on a signal obtained by the beam scan. In order to achieve the object described above, there is proposed a charged particle beam apparatus including a lens which focuses a charged particle beam on a sample, wherein focus evaluation values of a plurality of images are calculated which are obtained under different focus conditions by the lens, the images which are obtained by beam radiation with different focus conditions and in which a predetermined condition is satisfied are subject to a processing according to the focus evaluation values, and an integrated image is generated by integrating the processed images subject to the processing according to the focus evaluation values.

公开(公告)号：US10134561B2

公开(公告)日：2018-11-20

申请号：US15591331

申请日：2017-05-10

Applicant: JEOL Ltd.

Inventor： Masaki Mukai

IPC: H01J37/24 ,  H01J37/05 ,  H01J37/06 ,  H01J37/147 ,  H01J37/26 ,  H01J37/317

Abstract: There is provided an electron microscope in which a crossover position can be kept constant. The electron microscope (100) includes: an electron source (110) for emitting an electron beam; an acceleration tube (170) having acceleration electrodes (170a-170f) and operative to accelerate the electron beam; a first electrode (160) operative such that a lens action is produced between this first electrode (160) and the initial stage of acceleration electrode (170a); an accelerating voltage supply (112) for supplying an accelerating voltage to the acceleration tube (170); a first electrode voltage supply (162) for supplying a voltage to the first electrode (160); and a controller (109b) for controlling the first electrode voltage supply (162). The lens action produced between the first electrode (160) and the initial stage of acceleration electrode (170a) forms a crossover (CO2) of the electron beam. The controller (109b) controls the first electrode voltage supply (162) such that, if the accelerating voltage is modified, the ratio between the voltage applied to the first electrode (160) and the voltage applied to the initial stage of acceleration electrode (170a) is kept constant.

公开(公告)号：US20180327126A1

公开(公告)日：2018-11-15

申请号：US16032333

申请日：2018-07-11

Applicant: TETRA LAVAL HOLDINGS & FINANCE S.A.

Inventor： Dominique CLOETTA ,  Urs HOSTETTLER ,  Werner HAAG ,  Simone BIANCO

IPC: B65B55/08 ,  H01J37/06 ,  A61L2/26 ,  A61L2/08 ,  H01J29/04

CPC classification number: B65B55/08 ,  A61L2/087 ,  A61L2/26 ,  A61L2202/11 ,  A61L2202/23 ,  H01J1/15 ,  H01J29/04 ,  H01J33/02 ,  H01J37/06

Abstract: Electron beam generator comprising an electron emitting device adapted to emit an electron beam when heated to an elevated temperature, wherein the electron emitting device comprises a filament having a spiral portion.

公开(公告)号：US10128077B2

公开(公告)日：2018-11-13

申请号：US15576687

申请日：2016-01-06

Applicant: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE

Inventor： Bok Lae Cho ,  In Young Park

IPC: H01J37/06 ,  H01J37/065 ,  H01J37/26

Abstract: The present invention relates to an electron gun for facilitating position adjustment, and an electron microscope including the same, the electron gun improving a vacuum structure so as to easily move a filament block or an electron tip of an electron gun without having bellows for maintaining a vacuum when the center axis of the filament block or the electron tip of the electron gun is mechanically misaligned with the center axis of a anode and a focusing lens.

公开(公告)号：US09953803B2

公开(公告)日：2018-04-24

申请号：US15049524

申请日：2016-02-22

Applicant: Hermes Microvision Inc.

Inventor： Wei Fang ,  Kevin Liu ,  Fei Wang ,  Jack Jau

IPC: H01J37/20 ,  H01J37/06

CPC classification number: H01J37/20 ,  H01J37/06 ,  H01J37/222 ,  H01J37/3045 ,  H01J2237/202 ,  H01J2237/2826 ,  H01L22/12

Abstract: A calibration method for calibrating the position error in the point of interest induced from the stage of the defect inspection tool is achieved by controlling the deflectors directly. The position error in the point of interest is obtained from the design layout database.

公开(公告)号：US20180025885A1

公开(公告)日：2018-01-25

申请号：US15548321

申请日：2016-02-04

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta IMAI ,  Hideo MORISHITA ,  Toshihide AGEMURA

IPC: H01J37/12 ,  H01J37/20 ,  H01J37/08 ,  H01J37/28 ,  H01J37/06

CPC classification number: H01J37/12 ,  H01J37/06 ,  H01J37/08 ,  H01J37/145 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/08 ,  H01J2237/121 ,  H01J2237/244 ,  H01J2237/2801

Abstract: This composite charged particle beam device comprises a first charged particle beam column (6), a second charged particle beam column (1) which is equipped with a deceleration system, and is equipped with a detector (3) inside the column, a test piece stage (10) on which a test piece (9) is placed, and an electric field correction electrode (13) which is provided around the tip of the first charged particle beam column, wherein the electric field correction electrode is an electrode that corrects the electric field distribution formed in the vicinity of the test piece, and the electric field correction electrode is positioned between the test piece and the first charged particle beam column, and on the opposite side from the second charged particle beam column with respect to the optical axis of the first charged particle beam column.

公开(公告)号：US09867272B2

公开(公告)日：2018-01-09

申请号：US14436859

申请日：2013-10-17

Applicant: Cornell University

Inventor： Amit Lal ,  Yue Shi ,  Serhan Ardanuc ,  June-Ho Hwang ,  Farhan Rana

IPC: H05H7/04 ,  H05H9/04 ,  H01J37/06 ,  H01J37/147

CPC classification number: H05H9/045 ,  H01J37/06 ,  H01J37/1472 ,  H01J2237/063 ,  H01J2237/15 ,  H05H7/04 ,  H05H9/042 ,  H05H2007/043 ,  H05H2007/046

Abstract: A system that generates short charged particle packets or pulses (e.g., electron packets) without requiring a fast-switching-laser source is described. This system may include a charged particle source that produces a stream of continuous charged particles to propagate along a charged particle path. The system also includes a charged particle deflector positioned in the charged particle path to deflect the stream of continuous charged particles to a set of directions different from the charged particle path. The system additionally includes a series of beam blockers located downstream from the charged particle deflector and spaced from one another in a linear configuration as a beam-blocker grating. This beam-blocker grating can interact with the deflected stream of charged particles and divide the stream of the charged particles into a set of short particle packets. In one embodiment, the charged particles are electrons. The beam blockers can be conductors.

公开(公告)号：US09754761B2

公开(公告)日：2017-09-05

申请号：US15162249

申请日：2016-05-23

Applicant: KLA-TENCOR CORPORATION

Inventor： Hong Xiao ,  Christopher Maher

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/20 ,  H01J37/06

CPC classification number: H01J37/1472 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/2817

Abstract: An inspection tool includes a controller that is configured to generate a scan pattern for an electron beam to image areas of interest on the wafer. The scan pattern minimizes dwell time of the electron beam on the surface of the wafer between the areas of interest. At least one stage speed and at least one raster pattern can be selected based on the areas of interest. The controller sends instructions to electron beam optics to direct the electron beam at the areas of interest on the surface of the wafer using the scan pattern.